DE59404708D1 - Funktionalisierte Photoinitiatoren, Macromere daraus und deren Verwendung - Google Patents
Funktionalisierte Photoinitiatoren, Macromere daraus und deren VerwendungInfo
- Publication number
- DE59404708D1 DE59404708D1 DE59404708T DE59404708T DE59404708D1 DE 59404708 D1 DE59404708 D1 DE 59404708D1 DE 59404708 T DE59404708 T DE 59404708T DE 59404708 T DE59404708 T DE 59404708T DE 59404708 D1 DE59404708 D1 DE 59404708D1
- Authority
- DE
- Germany
- Prior art keywords
- alkyl
- groups
- unsubstituted
- alkoxy
- substituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 abstract 5
- 125000000229 (C1-C4)alkoxy group Chemical group 0.000 abstract 5
- 125000004209 (C1-C8) alkyl group Chemical group 0.000 abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 2
- 125000004642 (C1-C12) alkoxy group Chemical group 0.000 abstract 1
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 abstract 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 abstract 1
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 abstract 1
- -1 C1-C8-hydroxyalkyl Chemical group 0.000 abstract 1
- 125000004406 C3-C8 cycloalkylene group Chemical group 0.000 abstract 1
- 125000000041 C6-C10 aryl group Chemical group 0.000 abstract 1
- 239000013543 active substance Substances 0.000 abstract 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 abstract 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/20—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by nitrogen atoms not being part of nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/24—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a ring other than a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/26—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
- C07C271/28—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring to a carbon atom of a non-condensed six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/32—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings
- C07C271/38—Esters of carbamic acids having oxygen atoms of carbamate groups bound to carbon atoms of rings other than six-membered aromatic rings with the nitrogen atom of at least one of the carbamate groups bound to a carbon atom of a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B37/00—Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
- C08B37/0006—Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid
- C08B37/0009—Homoglycans, i.e. polysaccharides having a main chain consisting of one single sugar, e.g. colominic acid alpha-D-Glucans, e.g. polydextrose, alternan, glycogen; (alpha-1,4)(alpha-1,6)-D-Glucans; (alpha-1,3)(alpha-1,4)-D-Glucans, e.g. isolichenan or nigeran; (alpha-1,4)-D-Glucans; (alpha-1,3)-D-Glucans, e.g. pseudonigeran; Derivatives thereof
- C08B37/0012—Cyclodextrin [CD], e.g. cycle with 6 units (alpha), with 7 units (beta) and with 8 units (gamma), large-ring cyclodextrin or cycloamylose with 9 units or more; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08B—POLYSACCHARIDES; DERIVATIVES THEREOF
- C08B37/00—Preparation of polysaccharides not provided for in groups C08B1/00 - C08B35/00; Derivatives thereof
- C08B37/006—Heteroglycans, i.e. polysaccharides having more than one sugar residue in the main chain in either alternating or less regular sequence; Gellans; Succinoglycans; Arabinogalactans; Tragacanth or gum tragacanth or traganth from Astragalus; Gum Karaya from Sterculia urens; Gum Ghatti from Anogeissus latifolia; Derivatives thereof
- C08B37/0063—Glycosaminoglycans or mucopolysaccharides, e.g. keratan sulfate; Derivatives thereof, e.g. fucoidan
- C08B37/0072—Hyaluronic acid, i.e. HA or hyaluronan; Derivatives thereof, e.g. crosslinked hyaluronic acid (hylan) or hyaluronates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/12—Chemical modification
- C08J7/16—Chemical modification with polymerisable compounds
- C08J7/18—Chemical modification with polymerisable compounds using wave energy or particle radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/041—Lenses
- G02B1/043—Contact lenses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
- Y10S522/904—Monomer or polymer contains initiating group
- Y10S522/905—Benzophenone group
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31645—Next to addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31971—Of carbohydrate
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH200693 | 1993-07-02 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE59404708D1 true DE59404708D1 (de) | 1998-01-15 |
Family
ID=4223706
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE59404708T Expired - Lifetime DE59404708D1 (de) | 1993-07-02 | 1994-06-24 | Funktionalisierte Photoinitiatoren, Macromere daraus und deren Verwendung |
Country Status (23)
Country | Link |
---|---|
US (4) | US5527925A (de) |
EP (1) | EP0632329B1 (de) |
JP (1) | JP4053612B2 (de) |
KR (1) | KR950003265A (de) |
CN (1) | CN1102825A (de) |
AT (1) | ATE160888T1 (de) |
AU (1) | AU683256B2 (de) |
CA (1) | CA2127200A1 (de) |
CZ (1) | CZ161094A3 (de) |
DE (1) | DE59404708D1 (de) |
DK (1) | DK0632329T3 (de) |
ES (1) | ES2109647T3 (de) |
FI (1) | FI943129A (de) |
GR (1) | GR3025768T3 (de) |
HK (1) | HK1003846A1 (de) |
HU (1) | HU219502B (de) |
IL (1) | IL110171A (de) |
MX (1) | MX9404973A (de) |
NO (1) | NO302026B1 (de) |
NZ (1) | NZ260892A (de) |
PL (1) | PL180201B1 (de) |
TW (1) | TW328535B (de) |
ZA (1) | ZA944758B (de) |
Families Citing this family (187)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5760100B1 (en) | 1994-09-06 | 2000-11-14 | Ciba Vision Corp | Extended wear ophthalmic lens |
JP3647093B2 (ja) * | 1994-11-17 | 2005-05-11 | 株式会社メニコン | 親水性化酸素透過性コンタクトレンズ及びその製造法 |
TW434456B (en) * | 1994-12-30 | 2001-05-16 | Novartis Ag | A compound as functionalized photoinitiator, its production process, its corresponding oligomers or polymers and its application in coating a substrate |
DE59504366D1 (de) * | 1994-12-30 | 1999-01-07 | Novartis Ag | Polymere auf der grundlage von blockcopolymeren |
TW353086B (en) * | 1994-12-30 | 1999-02-21 | Novartis Ag | Method for multistep coating of a surface |
CN1173228A (zh) * | 1995-02-03 | 1998-02-11 | 诺瓦提斯公司 | 含光引发剂的交联聚合物 |
US5789462A (en) * | 1995-09-13 | 1998-08-04 | Seikagaku Kogyo Kabushiki Kaisha (Seikagaku Corporation) | Photocured crosslinked-hyaluronic acid contact lens |
GB9522683D0 (en) | 1995-11-06 | 1996-01-10 | Coates Brothers Plc | Photoinitiator |
US6579596B1 (en) * | 1997-04-15 | 2003-06-17 | Fuji Xerox Co., Ltd. | Composite material and process for production thereof |
DE19727554A1 (de) * | 1997-06-28 | 1999-01-07 | Huels Chemische Werke Ag | Verfahren zur Hydrophilierung der Oberfläche polymerer Substrate mit einem Makroinitiator als Primer |
WO1999014253A1 (en) * | 1997-09-16 | 1999-03-25 | Novartis Ag | Crosslinkable polyurea polymers |
WO1999015917A1 (en) | 1997-09-23 | 1999-04-01 | Novartis Ag | Method for hydrogel surface treatment and article formed therefrom |
US5981617A (en) * | 1998-01-20 | 1999-11-09 | Kim; Hee Jung | Irradiation of gas permeable contact lenses by far infrared light |
US6007833A (en) * | 1998-03-19 | 1999-12-28 | Surmodics, Inc. | Crosslinkable macromers bearing initiator groups |
US6410044B1 (en) | 1998-03-19 | 2002-06-25 | Surmodics, Inc. | Crosslinkable macromers |
US7547445B2 (en) * | 1998-03-19 | 2009-06-16 | Surmodics, Inc. | Crosslinkable macromers |
TW473488B (en) * | 1998-04-30 | 2002-01-21 | Novartis Ag | Composite materials, biomedical articles formed thereof and process for their manufacture |
US6509323B1 (en) | 1998-07-01 | 2003-01-21 | California Institute Of Technology | Linear cyclodextrin copolymers |
US7091192B1 (en) | 1998-07-01 | 2006-08-15 | California Institute Of Technology | Linear cyclodextrin copolymers |
EP1002807A1 (de) * | 1998-11-20 | 2000-05-24 | Novartis AG | Funktionalisiertes Harz aus Polyallylamin |
SE9900935D0 (sv) * | 1999-03-16 | 1999-03-16 | Pharmacia & Upjohn Bv | Macromolecular compounds |
AU4752200A (en) * | 1999-05-10 | 2000-11-21 | Ciba Specialty Chemicals Holding Inc. | Novel photoinitiators and their applications |
JP2003503160A (ja) * | 1999-06-30 | 2003-01-28 | ノバルティス アクチエンゲゼルシャフト | 眼科用成形物 |
US6376568B1 (en) | 1999-07-29 | 2002-04-23 | Ciba Specialty Chemicals Corporation | Surface-active photoinitiators |
GB2352718A (en) * | 1999-08-04 | 2001-02-07 | Coates Brothers Plc | Photoinitiators |
ATE270590T1 (de) * | 1999-09-22 | 2004-07-15 | Surmodics Inc | Initiationsgruppentragendes wasserlösliches beschichtungsmittel und beschichtungsverfahren |
JP2001158813A (ja) | 1999-10-27 | 2001-06-12 | Novartis Ag | 材料表面を被覆する方法 |
EP1095711B1 (de) * | 1999-10-27 | 2004-01-28 | Novartis AG | Verfahren für die Oberflächenbeschichtung von Materialien |
JP2001163932A (ja) | 1999-10-27 | 2001-06-19 | Novartis Ag | 材料表面を改質する方法 |
EP1095966B1 (de) * | 1999-10-27 | 2006-01-11 | Novartis AG | Verfahren zur Oberflächenmodifizierung von Materialien |
JP2001163933A (ja) * | 1999-10-27 | 2001-06-19 | Novartis Ag | 材料表面を改質する方法 |
KR100595404B1 (ko) * | 2000-04-06 | 2006-07-03 | 삼성토탈 주식회사 | 방충필름용 수지 조성물 및 방충필름 |
US6613703B1 (en) | 2000-04-27 | 2003-09-02 | Kimberly-Clark Worldwide, Inc. | Thermoplastic nonwoven web chemically reacted with a cyclodextrin compound |
CA2415871A1 (en) * | 2000-08-24 | 2002-02-28 | Novartis Ag | Process for surface modifying substrates and modified substrates resulting therefrom |
US6448301B1 (en) | 2000-09-08 | 2002-09-10 | 3M Innovative Properties Company | Crosslinkable polymeric compositions and use thereof |
AU2002221680A1 (en) * | 2000-10-16 | 2002-04-29 | Novartis Ag | Process for coating a material surface |
JP2002182166A (ja) * | 2000-12-11 | 2002-06-26 | Toray Ind Inc | プラスチック成形品およびそれからなるコンタクトレンズ |
US6774178B2 (en) | 2001-01-05 | 2004-08-10 | Novartis Ag | Tinted, high Dk ophthalmic molding and a method for making same |
DE10132506A1 (de) * | 2001-07-05 | 2003-01-23 | Wacker Polymer Systems Gmbh | Lösungsmittelfrei herstellbare Beschichtungsmittel für verschmutzungsresistente Beschichtungen |
US6596786B2 (en) | 2001-08-17 | 2003-07-22 | Alcatel | Radiation-curable coating composition including oligomeric photoinitiator and/or oligomeric adhesion promoter |
TW200407367A (en) * | 2001-11-13 | 2004-05-16 | Novartis Ag | Method for modifying the surface of biomedical articles |
US7348055B2 (en) * | 2001-12-21 | 2008-03-25 | Surmodics, Inc. | Reagent and method for providing coatings on surfaces |
AR038269A1 (es) * | 2002-01-09 | 2005-01-12 | Novartis Ag | Articulos polimericos que tienen un recubrimiento lubrico, y metodo para fabricarlos |
CA2483004A1 (en) * | 2002-04-26 | 2003-11-06 | Ciba Specialty Chemicals Holding Inc. | Incorporable photoinitiator |
CN104383554B (zh) | 2002-09-06 | 2018-06-08 | 天蓝制药公司 | 用于传递治疗剂的以环糊精为基础的聚合物 |
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US5210111A (en) * | 1991-08-22 | 1993-05-11 | Ciba-Geigy Corporation | Crosslinked hydrogels derived from hydrophilic polymer backbones |
DE59305382D1 (de) * | 1992-08-05 | 1997-03-20 | Ciba Geigy Ag | Kontaktlinsen aus lipophilisierten Cyclodextrinen |
-
1994
- 1994-06-17 TW TW083105582A patent/TW328535B/zh active
- 1994-06-24 EP EP94810380A patent/EP0632329B1/de not_active Expired - Lifetime
- 1994-06-24 AT AT94810380T patent/ATE160888T1/de not_active IP Right Cessation
- 1994-06-24 DK DK94810380.9T patent/DK0632329T3/da active
- 1994-06-24 DE DE59404708T patent/DE59404708D1/de not_active Expired - Lifetime
- 1994-06-24 US US08/265,597 patent/US5527925A/en not_active Expired - Lifetime
- 1994-06-24 ES ES94810380T patent/ES2109647T3/es not_active Expired - Lifetime
- 1994-06-28 AU AU66039/94A patent/AU683256B2/en not_active Ceased
- 1994-06-29 FI FI943129A patent/FI943129A/fi unknown
- 1994-06-30 MX MX9404973A patent/MX9404973A/es not_active IP Right Cessation
- 1994-06-30 NZ NZ260892A patent/NZ260892A/en unknown
- 1994-06-30 PL PL94304064A patent/PL180201B1/pl unknown
- 1994-06-30 CA CA002127200A patent/CA2127200A1/en not_active Abandoned
- 1994-06-30 IL IL11017194A patent/IL110171A/xx not_active IP Right Cessation
- 1994-07-01 ZA ZA944758A patent/ZA944758B/xx unknown
- 1994-07-01 CZ CZ941610A patent/CZ161094A3/cs unknown
- 1994-07-01 NO NO942495A patent/NO302026B1/no not_active IP Right Cessation
- 1994-07-01 CN CN94108127A patent/CN1102825A/zh active Pending
- 1994-07-01 HU HU9402005A patent/HU219502B/hu not_active IP Right Cessation
- 1994-07-01 JP JP15108794A patent/JP4053612B2/ja not_active Expired - Fee Related
- 1994-07-02 KR KR1019940015819A patent/KR950003265A/ko active IP Right Grant
-
1995
- 1995-06-06 US US08/469,399 patent/US5612391A/en not_active Expired - Lifetime
- 1995-06-06 US US08/465,993 patent/US5612389A/en not_active Expired - Lifetime
- 1995-06-06 US US08/469,410 patent/US5621018A/en not_active Expired - Lifetime
-
1997
- 1997-12-23 GR GR970403419T patent/GR3025768T3/el unknown
-
1998
- 1998-04-01 HK HK98102732A patent/HK1003846A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
US5612391A (en) | 1997-03-18 |
JPH0789925A (ja) | 1995-04-04 |
PL180201B1 (pl) | 2001-01-31 |
NO302026B1 (no) | 1998-01-12 |
DK0632329T3 (da) | 1998-05-04 |
IL110171A0 (en) | 1994-10-07 |
IL110171A (en) | 1999-04-11 |
CN1102825A (zh) | 1995-05-24 |
HU9402005D0 (en) | 1994-09-28 |
CA2127200A1 (en) | 1995-01-03 |
ATE160888T1 (de) | 1997-12-15 |
NO942495L (no) | 1995-01-03 |
AU683256B2 (en) | 1997-11-06 |
HK1003846A1 (en) | 1998-11-06 |
EP0632329A1 (de) | 1995-01-04 |
HU219502B (hu) | 2001-04-28 |
MX9404973A (es) | 1995-01-31 |
US5527925A (en) | 1996-06-18 |
US5612389A (en) | 1997-03-18 |
NZ260892A (en) | 1996-02-27 |
PL304064A1 (en) | 1995-01-09 |
FI943129A0 (fi) | 1994-06-29 |
NO942495D0 (no) | 1994-07-01 |
GR3025768T3 (en) | 1998-03-31 |
ES2109647T3 (es) | 1998-01-16 |
JP4053612B2 (ja) | 2008-02-27 |
AU6603994A (en) | 1995-02-23 |
HUT69305A (en) | 1995-09-28 |
FI943129A (fi) | 1995-01-03 |
TW328535B (en) | 1998-03-21 |
US5621018A (en) | 1997-04-15 |
ZA944758B (en) | 1995-01-03 |
KR950003265A (ko) | 1995-02-16 |
CZ161094A3 (en) | 1995-01-18 |
EP0632329B1 (de) | 1997-12-03 |
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