DE60030658D1 - Verfahren und Vorrichtung zur Überprüfung von Gegenständen - Google Patents

Verfahren und Vorrichtung zur Überprüfung von Gegenständen

Info

Publication number
DE60030658D1
DE60030658D1 DE60030658T DE60030658T DE60030658D1 DE 60030658 D1 DE60030658 D1 DE 60030658D1 DE 60030658 T DE60030658 T DE 60030658T DE 60030658 T DE60030658 T DE 60030658T DE 60030658 D1 DE60030658 D1 DE 60030658D1
Authority
DE
Germany
Prior art keywords
checking objects
checking
objects
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60030658T
Other languages
English (en)
Other versions
DE60030658T2 (de
Inventor
Boaz Kenan
Avner Karpol
Silviu Reinhorn
Emanuel Elyasaf
Shimon Yalov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23760017&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60030658(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of DE60030658D1 publication Critical patent/DE60030658D1/de
Publication of DE60030658T2 publication Critical patent/DE60030658T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605Workpiece metrology
    • G03F7/70616Monitoring the printed patterns
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/4788Diffraction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/48Laser speckle optics
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84Inspecting
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47Scattering, i.e. diffuse reflection
    • G01N21/4788Diffraction
    • G01N2021/479Speckle
DE60030658T 1999-11-17 2000-11-16 Verfahren und Vorrichtung zur Überprüfung von Gegenständen Expired - Fee Related DE60030658T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/443,247 US6369888B1 (en) 1999-11-17 1999-11-17 Method and apparatus for article inspection including speckle reduction
US443247 1999-11-17

Publications (2)

Publication Number Publication Date
DE60030658D1 true DE60030658D1 (de) 2006-10-26
DE60030658T2 DE60030658T2 (de) 2007-09-13

Family

ID=23760017

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60030658T Expired - Fee Related DE60030658T2 (de) 1999-11-17 2000-11-16 Verfahren und Vorrichtung zur Überprüfung von Gegenständen

Country Status (4)

Country Link
US (7) US6369888B1 (de)
EP (1) EP1102058B1 (de)
JP (1) JP5117645B2 (de)
DE (1) DE60030658T2 (de)

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US20050128473A1 (en) 2005-06-16
US7463352B2 (en) 2008-12-09
US20020080348A1 (en) 2002-06-27
US6369888B1 (en) 2002-04-09
US6429931B1 (en) 2002-08-06
US20040201842A1 (en) 2004-10-14
JP2001274081A (ja) 2001-10-05
US6556294B2 (en) 2003-04-29
EP1102058B1 (de) 2006-09-13
EP1102058A1 (de) 2001-05-23
US6924891B2 (en) 2005-08-02
US20030197858A1 (en) 2003-10-23
US6587194B2 (en) 2003-07-01
US20020067478A1 (en) 2002-06-06
US6798505B2 (en) 2004-09-28
JP5117645B2 (ja) 2013-01-16
US20020057427A1 (en) 2002-05-16

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