DE60141848D1 - Verfahren und vorrichtung zur höhenabtastenden interferometrie mit phasendifferenz-analyse - Google Patents

Verfahren und vorrichtung zur höhenabtastenden interferometrie mit phasendifferenz-analyse

Info

Publication number
DE60141848D1
DE60141848D1 DE60141848T DE60141848T DE60141848D1 DE 60141848 D1 DE60141848 D1 DE 60141848D1 DE 60141848 T DE60141848 T DE 60141848T DE 60141848 T DE60141848 T DE 60141848T DE 60141848 D1 DE60141848 D1 DE 60141848D1
Authority
DE
Germany
Prior art keywords
profile
abbeasting
interferometry
heavy
phase differential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60141848T
Other languages
English (en)
Inventor
Groot Peter De
James W Kramer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zygo Corp
Original Assignee
Zygo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zygo Corp filed Critical Zygo Corp
Application granted granted Critical
Publication of DE60141848D1 publication Critical patent/DE60141848D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/303—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces using photoelectric detection means
DE60141848T 2000-11-02 2001-11-02 Verfahren und vorrichtung zur höhenabtastenden interferometrie mit phasendifferenz-analyse Expired - Lifetime DE60141848D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US24544300P 2000-11-02 2000-11-02
PCT/US2001/051152 WO2002040938A2 (en) 2000-11-02 2001-11-02 Height scanning interferometry method and apparatus including phase gap analysis

Publications (1)

Publication Number Publication Date
DE60141848D1 true DE60141848D1 (de) 2010-05-27

Family

ID=22926671

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60141848T Expired - Lifetime DE60141848D1 (de) 2000-11-02 2001-11-02 Verfahren und vorrichtung zur höhenabtastenden interferometrie mit phasendifferenz-analyse

Country Status (7)

Country Link
US (1) US6775006B2 (de)
EP (1) EP1332332B1 (de)
JP (1) JP4279550B2 (de)
AT (1) ATE464534T1 (de)
AU (1) AU2002241784A1 (de)
DE (1) DE60141848D1 (de)
WO (1) WO2002040938A2 (de)

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FR2817030B1 (fr) * 2000-11-17 2003-03-28 Centre Nat Rech Scient Procede et dispositif d'imagerie microscopique interferentielle d'un objet a haute cadence
JP3852561B2 (ja) * 2001-03-21 2006-11-29 三菱電機株式会社 画像表示装置および画像表示方法
US20030020902A1 (en) * 2001-07-18 2003-01-30 Yonathan Japha Method for inspection of optical elements
US7365858B2 (en) * 2001-12-18 2008-04-29 Massachusetts Institute Of Technology Systems and methods for phase measurements
US7557929B2 (en) 2001-12-18 2009-07-07 Massachusetts Institute Of Technology Systems and methods for phase measurements
KR100984809B1 (ko) * 2002-05-02 2010-10-04 지고 코포레이션 주사 간섭계를 위한 위상 갭 분석
US7869057B2 (en) 2002-09-09 2011-01-11 Zygo Corporation Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis
US7139081B2 (en) * 2002-09-09 2006-11-21 Zygo Corporation Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures
US7106454B2 (en) * 2003-03-06 2006-09-12 Zygo Corporation Profiling complex surface structures using scanning interferometry
CN1784587B (zh) 2003-03-06 2010-09-08 齐戈股份有限公司 使用扫描干涉测量形成复杂表面结构的轮廓
US7324214B2 (en) 2003-03-06 2008-01-29 Zygo Corporation Interferometer and method for measuring characteristics of optically unresolved surface features
US7271918B2 (en) * 2003-03-06 2007-09-18 Zygo Corporation Profiling complex surface structures using scanning interferometry
DE10328412B4 (de) * 2003-06-19 2005-11-17 Medizinisches Laserzentrum Lübeck GmbH Verfahren zur interferometrischen Bestimmmung optischer Ebenenabstände mit Subnanometer-Genauigkeit
TWI334921B (en) * 2003-09-15 2010-12-21 Zygo Corp Surface profiling using an interference pattern matching template
TWI335417B (en) 2003-10-27 2011-01-01 Zygo Corp Method and apparatus for thin film measurement
US7428057B2 (en) 2005-01-20 2008-09-23 Zygo Corporation Interferometer for determining characteristics of an object surface, including processing and calibration
US7884947B2 (en) 2005-01-20 2011-02-08 Zygo Corporation Interferometry for determining characteristics of an object surface, with spatially coherent illumination
GB0502677D0 (en) * 2005-02-09 2005-03-16 Taylor Hobson Ltd Apparatus for and a method of determining a surface characteristic
ES2749378T3 (es) * 2005-05-19 2020-03-20 Zygo Corp Análisis de señales de interferometría de baja coherencia para estructuras de película delgada
US7595891B2 (en) * 2005-07-09 2009-09-29 Kla-Tencor Corporation Measurement of the top surface of an object with/without transparent thin films in white light interferometry
WO2007044786A2 (en) 2005-10-11 2007-04-19 Zygo Corporation Interferometry method and system including spectral decomposition
WO2008011510A2 (en) 2006-07-21 2008-01-24 Zygo Corporation Compensation of systematic effects in low coherence interferometry
JP5502491B2 (ja) 2006-12-22 2014-05-28 ザイゴ コーポレーション 表面特徴の特性測定のための装置および方法
US7889355B2 (en) 2007-01-31 2011-02-15 Zygo Corporation Interferometry for lateral metrology
US8072611B2 (en) 2007-10-12 2011-12-06 Zygo Corporation Interferometric analysis of under-resolved features
KR101274517B1 (ko) 2007-11-13 2013-06-13 지고 코포레이션 편광 스캐닝을 이용한 간섭계
US8126677B2 (en) 2007-12-14 2012-02-28 Zygo Corporation Analyzing surface structure using scanning interferometry
US8662962B2 (en) * 2008-06-30 2014-03-04 3M Innovative Properties Company Sandpaper with non-slip coating layer and method of using
US8004688B2 (en) 2008-11-26 2011-08-23 Zygo Corporation Scan error correction in low coherence scanning interferometry
EP2314982B1 (de) 2009-10-20 2020-12-02 Mitutoyo Corporation Verfahren und Vorrichtung zur Bestimmung der Höhe einer Reihe räumlicher Positionen auf einer Probe, die ein Profil einer Oberfläche mithilfe der Weißlicht-Interferometrie definieren
JP5493152B2 (ja) * 2010-08-06 2014-05-14 株式会社ミツトヨ 形状測定装置
US8780334B1 (en) * 2011-12-14 2014-07-15 Zygo Corporation Topographical profiling with coherence scanning interferometry
US9020293B2 (en) 2012-02-07 2015-04-28 National Cheung Kung University Integration of filters and phase unwrapping algorithms for removing noise in image reconstruction
EP2662661A1 (de) * 2012-05-07 2013-11-13 Leica Geosystems AG Messgerät mit einem Interferometer und einem ein dichtes Linienspektrum definierenden Absorptionsmedium
LU92173B1 (en) * 2013-03-20 2014-09-22 Iee Sarl Distance determination method
KR101613829B1 (ko) * 2014-05-08 2016-04-20 조춘식 미분 모아레를 이용한 3차원 형상 측정방법 및 장치
US9632038B2 (en) * 2014-08-20 2017-04-25 Kla-Tencor Corporation Hybrid phase unwrapping systems and methods for patterned wafer measurement
US11513080B2 (en) * 2016-09-09 2022-11-29 Hamilton Sundstrand Corporation Inspection systems for additive manufacturing systems
CN108007397A (zh) * 2018-01-09 2018-05-08 常州华达科捷光电仪器有限公司 一种激光测准系统
US10996335B2 (en) * 2018-05-09 2021-05-04 Microsoft Technology Licensing, Llc Phase wrapping determination for time-of-flight camera
WO2021207722A1 (en) * 2020-04-10 2021-10-14 The Research Foundation For The States University Of New York System and method for 3d image scanning
US11333616B2 (en) * 2020-07-30 2022-05-17 Kla Corporation Adaptive focusing system for a scanning metrology tool

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5402234A (en) * 1992-08-31 1995-03-28 Zygo Corporation Method and apparatus for the rapid acquisition of data in coherence scanning interferometry
US5398113A (en) * 1993-02-08 1995-03-14 Zygo Corporation Method and apparatus for surface topography measurement by spatial-frequency analysis of interferograms
US5438413A (en) * 1993-03-03 1995-08-01 Kla Instruments Corporation Process for measuring overlay misregistration during semiconductor wafer fabrication
US5471303A (en) * 1994-04-29 1995-11-28 Wyko Corporation Combination of white-light scanning and phase-shifting interferometry for surface profile measurements
US5987189A (en) * 1996-12-20 1999-11-16 Wyko Corporation Method of combining multiple sets of overlapping surface-profile interferometric data to produce a continuous composite map
US5784164A (en) * 1997-03-20 1998-07-21 Zygo Corporation Method and apparatus for automatically and simultaneously determining best focus and orientation of objects to be measured by broad-band interferometric means
US5953124A (en) * 1998-01-19 1999-09-14 Zygo Corporation Interferometric methods and systems using low coherence illumination
US6195168B1 (en) * 1999-07-22 2001-02-27 Zygo Corporation Infrared scanning interferometry apparatus and method
US6597460B2 (en) * 2000-05-19 2003-07-22 Zygo Corporation Height scanning interferometer for determining the absolute position and surface profile of an object with respect to a datum
US6493093B2 (en) * 2001-04-12 2002-12-10 Veeco Instruments Inc. Bat-wing attenuation in white-light interferometry

Also Published As

Publication number Publication date
WO2002040938A2 (en) 2002-05-23
US6775006B2 (en) 2004-08-10
EP1332332B1 (de) 2010-04-14
EP1332332A2 (de) 2003-08-06
AU2002241784A1 (en) 2002-05-27
US20020135775A1 (en) 2002-09-26
JP2004514125A (ja) 2004-05-13
JP4279550B2 (ja) 2009-06-17
WO2002040938A3 (en) 2002-08-01
ATE464534T1 (de) 2010-04-15

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