DE602004027261D1 - Immersionslithographiesystem und überwachungsverfahren dafür - Google Patents

Immersionslithographiesystem und überwachungsverfahren dafür

Info

Publication number
DE602004027261D1
DE602004027261D1 DE602004027261T DE602004027261T DE602004027261D1 DE 602004027261 D1 DE602004027261 D1 DE 602004027261D1 DE 602004027261 T DE602004027261 T DE 602004027261T DE 602004027261 T DE602004027261 T DE 602004027261T DE 602004027261 D1 DE602004027261 D1 DE 602004027261D1
Authority
DE
Germany
Prior art keywords
slithography
immersion
monitoring method
method therefor
therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004027261T
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English (en)
Inventor
Harry J Levinson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
GlobalFoundries Inc
Original Assignee
GlobalFoundries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by GlobalFoundries Inc filed Critical GlobalFoundries Inc
Publication of DE602004027261D1 publication Critical patent/DE602004027261D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
DE602004027261T 2003-08-11 2004-07-23 Immersionslithographiesystem und überwachungsverfahren dafür Active DE602004027261D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/638,927 US7061578B2 (en) 2003-08-11 2003-08-11 Method and apparatus for monitoring and controlling imaging in immersion lithography systems
PCT/US2004/023875 WO2005017625A2 (en) 2003-08-11 2004-07-23 Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Publications (1)

Publication Number Publication Date
DE602004027261D1 true DE602004027261D1 (de) 2010-07-01

Family

ID=34135772

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004027261T Active DE602004027261D1 (de) 2003-08-11 2004-07-23 Immersionslithographiesystem und überwachungsverfahren dafür

Country Status (8)

Country Link
US (1) US7061578B2 (de)
EP (1) EP1654593B1 (de)
JP (1) JP2007502539A (de)
KR (1) KR101152366B1 (de)
CN (1) CN1826559A (de)
DE (1) DE602004027261D1 (de)
TW (1) TWI359470B (de)
WO (1) WO2005017625A2 (de)

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TW200511470A (en) 2005-03-16
EP1654593B1 (de) 2010-05-19
WO2005017625A2 (en) 2005-02-24
JP2007502539A (ja) 2007-02-08
US7061578B2 (en) 2006-06-13
KR101152366B1 (ko) 2012-06-05
EP1654593A2 (de) 2006-05-10
KR20060058713A (ko) 2006-05-30
US20050037269A1 (en) 2005-02-17
WO2005017625A3 (en) 2005-09-01
CN1826559A (zh) 2006-08-30

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