DE602004027971D1 - Selbstaktivierender Einfrequenz-Festkörperringlaser, Laserschockbestrahlungsverfahren und diese verwendendes System - Google Patents
Selbstaktivierender Einfrequenz-Festkörperringlaser, Laserschockbestrahlungsverfahren und diese verwendendes SystemInfo
- Publication number
- DE602004027971D1 DE602004027971D1 DE602004027971T DE602004027971T DE602004027971D1 DE 602004027971 D1 DE602004027971 D1 DE 602004027971D1 DE 602004027971 T DE602004027971 T DE 602004027971T DE 602004027971 T DE602004027971 T DE 602004027971T DE 602004027971 D1 DE602004027971 D1 DE 602004027971D1
- Authority
- DE
- Germany
- Prior art keywords
- laser
- single frequency
- resonator
- self
- gain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title abstract 2
- 230000035939 shock Effects 0.000 title 1
- 239000007787 solid Substances 0.000 title 1
- 230000010355 oscillation Effects 0.000 abstract 3
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 238000001514 detection method Methods 0.000 abstract 1
- 230000001939 inductive effect Effects 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1123—Q-switching
- H01S3/115—Q-switching using intracavity electro-optic devices
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
- H04M1/0206—Portable telephones comprising a plurality of mechanically joined movable body parts, e.g. hinged housings
- H04M1/0208—Portable telephones comprising a plurality of mechanically joined movable body parts, e.g. hinged housings characterized by the relative motions of the body parts
- H04M1/0214—Foldable telephones, i.e. with body parts pivoting to an open position around an axis parallel to the plane they define in closed position
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D10/00—Modifying the physical properties by methods other than heat treatment or deformation
- C21D10/005—Modifying the physical properties by methods other than heat treatment or deformation by laser shock processing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
- H01S3/083—Ring lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/2333—Double-pass amplifiers
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04M—TELEPHONIC COMMUNICATION
- H04M1/00—Substation equipment, e.g. for use by subscribers
- H04M1/02—Constructional features of telephone sets
- H04M1/0202—Portable telephone sets, e.g. cordless phones, mobile phones or bar type handsets
- H04M1/0206—Portable telephones comprising a plurality of mechanically joined movable body parts, e.g. hinged housings
- H04M1/0208—Portable telephones comprising a plurality of mechanically joined movable body parts, e.g. hinged housings characterized by the relative motions of the body parts
- H04M1/0225—Rotatable telephones, i.e. the body parts pivoting to an open position around an axis perpendicular to the plane they define in closed position
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D2221/00—Treating localised areas of an article
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10038—Amplitude control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10076—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating using optical phase conjugation, e.g. phase conjugate reflection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/107—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using electro-optic devices, e.g. exhibiting Pockels or Kerr effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1305—Feedback control systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thermal Sciences (AREA)
- Signal Processing (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Lasers (AREA)
- Laser Beam Processing (AREA)
- Laser Surgery Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47149003P | 2003-05-16 | 2003-05-16 | |
US10/696,989 US7180918B2 (en) | 2003-05-16 | 2003-10-30 | Self-seeded single-frequency solid-state ring laser and system using same |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602004027971D1 true DE602004027971D1 (de) | 2010-08-19 |
Family
ID=33032731
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602004027971T Active DE602004027971D1 (de) | 2003-05-16 | 2004-05-10 | Selbstaktivierender Einfrequenz-Festkörperringlaser, Laserschockbestrahlungsverfahren und diese verwendendes System |
Country Status (8)
Country | Link |
---|---|
US (3) | US7180918B2 (de) |
EP (1) | EP1478062B1 (de) |
JP (1) | JP4040601B2 (de) |
KR (2) | KR100715371B1 (de) |
AT (1) | ATE473530T1 (de) |
DE (1) | DE602004027971D1 (de) |
ES (1) | ES2347554T3 (de) |
TW (1) | TWI244814B (de) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20050205529A1 (en) * | 2004-03-22 | 2005-09-22 | The Regents Of The University Of California | Calibration system for laser peening |
US20100193481A1 (en) * | 2004-11-29 | 2010-08-05 | Electro Scientific Industries, Inc. | Laser constructed with multiple output couplers to generate multiple output beams |
DE102005057077B4 (de) | 2004-11-30 | 2011-04-14 | Hyundai Motor Co. | Vorrichtung zum Scannen von Zuständen von Motoröl |
US8111986B1 (en) | 2004-12-22 | 2012-02-07 | Clariphy Communications, Inc. | Testing of transmitters for communication links by software simulation of reference channel and/or reference receiver |
US7853149B2 (en) * | 2005-03-08 | 2010-12-14 | Clariphy Communications, Inc. | Transmitter frequency peaking for optical fiber channels |
US7876803B1 (en) * | 2007-03-21 | 2011-01-25 | Lockheed Martin Corporation | High-power, pulsed ring fiber oscillator and method |
EP1969686B1 (de) * | 2005-12-05 | 2019-04-03 | Adelaide Research & Innovation Pty Ltd | Gütegeschalteter laser |
DE102005059501A1 (de) * | 2005-12-06 | 2007-06-14 | Deutsches Zentrum für Luft- und Raumfahrt e.V. | Mehrfachpuls-Lichtemissionsvorrichtung und Verfahren zur Erzeugung einer Pulsfolge von Laserlicht-Mehrfachpulsen |
DE102006006582B4 (de) * | 2006-02-13 | 2009-06-10 | Jenoptik Laser, Optik, Systeme Gmbh | Laser und Verfahren zur Erzeugung gepulster Laserstrahlung |
US7897895B2 (en) * | 2006-05-01 | 2011-03-01 | General Electric Company | System and method for controlling the power level of a laser apparatus in a laser shock peening process |
JP4811111B2 (ja) * | 2006-05-11 | 2011-11-09 | 三菱電機株式会社 | 再生増幅器およびレーザ装置 |
US7732731B2 (en) * | 2006-09-15 | 2010-06-08 | Gsi Group Corporation | Method and system for laser processing targets of different types on a workpiece |
US7692854B2 (en) * | 2007-10-22 | 2010-04-06 | Coherent, Inc. | Repetitively pulsed laser and amplifier with dual resonator for pulse-energy management |
US7649924B2 (en) * | 2006-11-15 | 2010-01-19 | Coherent, Inc. | First-pulse suppression in a regenerative amplifier |
US8723073B2 (en) * | 2008-02-07 | 2014-05-13 | Cymer, Llc | Illumination apparatus and method for controlling energy of a laser source |
GB0813980D0 (en) | 2008-07-31 | 2008-09-10 | Univ St Andrews | Control of relaxation oscillations in intracavity optical parametric oscillato rs |
GB0906482D0 (en) | 2009-04-15 | 2009-05-20 | Univ St Andrews | intra-cavity optical parametric oscillator |
KR101049195B1 (ko) * | 2009-09-09 | 2011-07-14 | 주식회사 자원메디칼 | 레이저 장치 |
JP5765730B2 (ja) * | 2010-03-11 | 2015-08-19 | ギガフォトン株式会社 | 極端紫外光生成装置 |
WO2011133358A2 (en) * | 2010-04-19 | 2011-10-27 | Massachusetts Institute Of Technology | Mode-locking with reduced nonlinearity using gain-matched output couplers |
JP2012038866A (ja) * | 2010-08-05 | 2012-02-23 | High Energy Accelerator Research Organization | レーザー発振装置 |
JP2013065804A (ja) * | 2010-12-20 | 2013-04-11 | Gigaphoton Inc | レーザ装置およびそれを備える極端紫外光生成システム |
WO2013082566A1 (en) * | 2011-12-01 | 2013-06-06 | Huawei Technologies Co., Ltd. | Self-seeded colorless burst-mode transmitter using reflective semiconductor optical amplifier and injection-locked fabry-perot laser |
CN103203543B (zh) * | 2013-02-04 | 2015-03-11 | 中国航空工业集团公司北京航空制造工程研究所 | 一种用于激光冲击强化叶片的水约束层的喷射方法和装置 |
JP6246561B2 (ja) * | 2013-11-01 | 2017-12-13 | 株式会社ディスコ | レーザー加工方法およびレーザー加工装置 |
EP3588698B1 (de) * | 2015-01-09 | 2023-09-06 | LSP Technologies, Inc. | Verfahren und vorrichtung zur verwendung in laserschockstrahlungsprozessen |
US11858065B2 (en) | 2015-01-09 | 2024-01-02 | Lsp Technologies, Inc. | Method and system for use in laser shock peening and laser bond inspection process |
US10483714B2 (en) * | 2016-03-30 | 2019-11-19 | Saab Ab | Q-switched laser with stabilized output energy |
US10633881B1 (en) | 2017-03-24 | 2020-04-28 | Jeanne Cairns Sinquefield | Easy to assemble, above ground extreme weather shelter |
KR101898682B1 (ko) | 2017-06-28 | 2018-09-14 | 주식회사 풍산 | 강관의 레이저 피닝 장치 및 그 방법 |
US10658814B2 (en) | 2017-10-23 | 2020-05-19 | Microsoft Technology Licensing, Llc | Laser diode priming to reduce latency |
US10361537B2 (en) | 2017-10-23 | 2019-07-23 | Microsoft Technology Licensing, Llc | Dynamic supply voltage control circuit for laser diode |
KR102496546B1 (ko) * | 2017-12-19 | 2023-02-06 | 비아 메카닉스 가부시키가이샤 | 레이저 가공장치, 레이저 가공방법 및 이를 위한 프로그램을 기록한 기록매체 |
CN112355483B (zh) * | 2020-10-30 | 2021-08-24 | 北京理工大学 | 一种飞秒激光在硅表面制备亚微米同心圆环的方法 |
Family Cites Families (72)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3478280A (en) * | 1966-10-14 | 1969-11-11 | Gen Electric | Pulse width modulated laser |
US3824492A (en) * | 1972-06-22 | 1974-07-16 | United Aircraft Corp | Solid state single frequency laser |
US3724930A (en) * | 1972-07-21 | 1973-04-03 | Us Air Force | Method of forming and cooling pinhole spatial filter for high power laser |
US3836866A (en) * | 1973-01-29 | 1974-09-17 | Gte Sylvania Inc | Q-switched laser mode selection system |
JPS6025133B2 (ja) * | 1976-04-28 | 1985-06-17 | 旭光学工業株式会社 | マニピユレタ− |
US4191928A (en) * | 1978-01-11 | 1980-03-04 | The United States Of America As Represented By The United States Department Of Energy | Laser system using regenerative amplifier |
US4401477A (en) * | 1982-05-17 | 1983-08-30 | Battelle Development Corporation | Laser shock processing |
US4539462A (en) * | 1983-01-24 | 1985-09-03 | Westinghouse Electric Corp. | Robotic laser beam delivery apparatus |
US4623229A (en) * | 1983-09-29 | 1986-11-18 | Photon Sources, Inc. | Articulated laser arm |
US4698479A (en) * | 1984-02-06 | 1987-10-06 | Spectra-Physics, Inc. | Beam delivery system for a CO2 laser |
US4794222A (en) * | 1986-06-30 | 1988-12-27 | Manabu Funayama | Laser beam machining apparatus |
JPS6343384A (ja) | 1986-08-09 | 1988-02-24 | Fuji Electric Co Ltd | 固体レ−ザ発振装置の集光装置 |
US4803694A (en) * | 1987-07-08 | 1989-02-07 | Amada Company, Limited | Laser resonator |
GB8813315D0 (en) * | 1988-06-06 | 1988-07-13 | Serrano J P | Beam delivery system |
JPH02108489A (ja) * | 1988-10-17 | 1990-04-20 | Fanuc Ltd | 多関節型レーザロボットの手首機構 |
JPH02260479A (ja) | 1989-03-30 | 1990-10-23 | Toshiba Corp | レーザ発振装置 |
US4937421A (en) * | 1989-07-03 | 1990-06-26 | General Electric Company | Laser peening system and method |
US5022033A (en) * | 1989-10-30 | 1991-06-04 | The United States Of America As Represented By The United States Department Of Energy | Ring laser having an output at a single frequency |
CA2072070A1 (en) * | 1990-01-11 | 1991-07-12 | Harold M. Epstein | Material properties |
US5075893A (en) * | 1990-12-07 | 1991-12-24 | Battelle Memorial Institute | Unpolarized laser oscillators |
CA2103670A1 (en) * | 1991-02-28 | 1992-08-29 | Harold M. Epstein | Laser systems |
US5142118A (en) * | 1991-05-14 | 1992-08-25 | Progressive Tool & Industries Co. | Laser welding unit |
DE4143414C2 (de) * | 1991-09-03 | 1996-06-20 | Precitec Gmbh | Werkzeugkopf mit automatisch verstellbarer Fokussierungsoptik |
US5285310A (en) * | 1992-01-21 | 1994-02-08 | Regents Of The University Of California | High power regenerative laser amplifier |
US5239408A (en) * | 1992-01-21 | 1993-08-24 | Regents Of The University Of California | High power, high beam quality regenerative amplifier |
GB2276973A (en) * | 1993-03-20 | 1994-10-12 | Gec Ferranti Defence Syst | A pulsed laser |
JPH0745897A (ja) * | 1993-07-30 | 1995-02-14 | Matsushita Electric Ind Co Ltd | ポッケルスセルqスイッチ付きyagレーザ発振器 |
US5449879A (en) * | 1993-10-07 | 1995-09-12 | Laser Machining, Inc. | Laser beam delivery system for heat treating work surfaces |
EP0666326B1 (de) * | 1993-12-07 | 2001-03-28 | Toyota Jidosha Kabushiki Kaisha | Laser-Schock-Behandlungsverfahren unter Verwendung eines Licht-absorbierenden Materials mit kontrollierter Dicke |
JP3373638B2 (ja) | 1994-03-09 | 2003-02-04 | 株式会社東芝 | レーザーピーニング方法 |
JPH08148740A (ja) * | 1994-11-21 | 1996-06-07 | Miyachi Technos Corp | 固体レーザマーキング装置 |
JP3141715B2 (ja) * | 1994-12-22 | 2001-03-05 | 松下電器産業株式会社 | レーザ加工方法 |
US6215097B1 (en) * | 1994-12-22 | 2001-04-10 | General Electric Company | On the fly laser shock peening |
US5525429A (en) * | 1995-03-06 | 1996-06-11 | General Electric Company | Laser shock peening surface enhancement for gas turbine engine high strength rotor alloy repair |
US5569018A (en) * | 1995-03-06 | 1996-10-29 | General Electric Company | Technique to prevent or divert cracks |
FR2735056B1 (fr) * | 1995-06-09 | 1997-08-22 | Bouygues Offshore | Installation pour travailler une zone d'un tube au moyen d'un faisceau laser et application aux tubes d'une canalisation sur une barge de pose en mer ou de recuperation de cette canalisation. |
US5689363A (en) * | 1995-06-12 | 1997-11-18 | The Regents Of The University Of California | Long-pulse-width narrow-bandwidth solid state laser |
US5741559A (en) * | 1995-10-23 | 1998-04-21 | Lsp Technologies, Inc. | Laser peening process and apparatus |
JP3728006B2 (ja) * | 1996-03-29 | 2005-12-21 | ゼネラル・エレクトリック・カンパニイ | ガスタービン機関のファンの羽根 |
US5674328A (en) * | 1996-04-26 | 1997-10-07 | General Electric Company | Dry tape covered laser shock peening |
US5674329A (en) * | 1996-04-26 | 1997-10-07 | General Electric Company | Adhesive tape covered laser shock peening |
JPH10242913A (ja) * | 1997-02-24 | 1998-09-11 | Ando Electric Co Ltd | 光周波数安定化光源 |
US5986234A (en) * | 1997-03-28 | 1999-11-16 | The Regents Of The University Of California | High removal rate laser-based coating removal system |
JPH1197782A (ja) | 1997-09-24 | 1999-04-09 | Hamamatsu Photonics Kk | 固体レーザ装置 |
US6064035A (en) * | 1997-12-30 | 2000-05-16 | Lsp Technologies, Inc. | Process chamber for laser peening |
US6188704B1 (en) * | 1998-01-26 | 2001-02-13 | Rocky Mountain Instrument Co. | Diode-pumped laser drive |
US7099593B1 (en) * | 1998-02-17 | 2006-08-29 | University Of Michigan | Self-synchronization of an optical packet network using seed pulses extracted from within the packets |
US6122097A (en) * | 1998-04-16 | 2000-09-19 | Positive Light, Inc. | System and method for amplifying an optical pulse using a diode-pumped, Q-switched, extracavity frequency-doubled laser to pump an optical amplifier |
US6198069B1 (en) * | 1998-08-13 | 2001-03-06 | The Regents Of The University Of California | Laser beam temporal and spatial tailoring for laser shock processing |
JP2000117480A (ja) * | 1998-10-15 | 2000-04-25 | Fanuc Ltd | レーザ加工機 |
US6373876B1 (en) * | 1998-10-26 | 2002-04-16 | Lsp Technologies, Inc. | Single mode oscillator for a laser peening laser |
US6259055B1 (en) * | 1998-10-26 | 2001-07-10 | Lsp Technologies, Inc. | Apodizers for laser peening systems |
JP3940504B2 (ja) * | 1998-10-30 | 2007-07-04 | 株式会社東芝 | 光ファイバ伝送式レーザ装置、パルスレーザ発振器および光ファイバ導光装置 |
JP2000164958A (ja) | 1998-11-26 | 2000-06-16 | Matsushita Electric Ind Co Ltd | Ld励起レーザ発振方法とレーザ発振器、これによるレーザ加工装置 |
US6282224B1 (en) * | 1999-01-13 | 2001-08-28 | Raytheon Company | Non-planar Q-switched ring laser system |
US6197133B1 (en) * | 1999-02-16 | 2001-03-06 | General Electric Company | Short-pulse high-peak laser shock peening |
US6381391B1 (en) * | 1999-02-19 | 2002-04-30 | The Regents Of The University Of Michigan | Method and system for generating a broadband spectral continuum and continuous wave-generating system utilizing same |
US6198756B1 (en) * | 1999-04-15 | 2001-03-06 | Coherent, Inc. | CW far-UV laser system with two active resonators |
US6392192B1 (en) * | 1999-09-15 | 2002-05-21 | W. A. Whitney Co. | Real time control of laser beam characteristics in a laser-equipped machine tool |
US6384368B1 (en) * | 1999-05-05 | 2002-05-07 | Lsp Technologies, Inc. | Laser amplifier with variable and matched wavelength pumping |
US6281471B1 (en) * | 1999-12-28 | 2001-08-28 | Gsi Lumonics, Inc. | Energy-efficient, laser-based method and system for processing target material |
GB0024533D0 (en) | 2000-10-06 | 2000-11-22 | Geola Uab | A laser system |
US6693928B2 (en) * | 2000-10-10 | 2004-02-17 | Spectrasensors, Inc. | Technique for filtering chirp from optical signals |
JP2002208750A (ja) * | 2000-11-10 | 2002-07-26 | Keyence Corp | レーザー発振器およびそのレーザーパルス制御方法 |
JP3383832B2 (ja) * | 2000-12-25 | 2003-03-10 | 川崎重工業株式会社 | レーザ照射装置 |
JP2002208749A (ja) | 2001-01-12 | 2002-07-26 | Mitsubishi Heavy Ind Ltd | 波長変換素子を有するレーザ装置 |
US6657160B2 (en) | 2001-01-25 | 2003-12-02 | The Regents Of The University Of California | Laser peening of components of thin cross-section |
JP2002246677A (ja) * | 2001-02-14 | 2002-08-30 | Toshiba Corp | レーザ発振器とレーザ加工装置 |
US6867390B2 (en) * | 2001-04-30 | 2005-03-15 | Lsp Technologies, Inc | Automated positioning of mobile laser peening head |
US6528763B1 (en) * | 2001-04-30 | 2003-03-04 | Lsp Technologies, Inc. | Laser search peening for exfoliation corrosion detection |
JP2002344051A (ja) | 2001-05-11 | 2002-11-29 | Japan Atom Energy Res Inst | 光共振器、それを備えたレーザー発振器及び波長変換装置 |
KR100415088B1 (ko) * | 2001-10-15 | 2004-01-13 | 주식회사 하이닉스반도체 | 반도체장치의 제조방법 |
-
2003
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- 2004-05-10 DE DE602004027971T patent/DE602004027971D1/de active Active
- 2004-05-10 AT AT04252704T patent/ATE473530T1/de not_active IP Right Cessation
- 2004-05-10 ES ES04252704T patent/ES2347554T3/es active Active
- 2004-05-10 EP EP04252704A patent/EP1478062B1/de active Active
- 2004-05-12 JP JP2004142668A patent/JP4040601B2/ja active Active
- 2004-05-17 KR KR1020040034954A patent/KR100715371B1/ko active IP Right Grant
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KR100945295B1 (ko) | 2010-03-04 |
ES2347554T3 (es) | 2010-11-02 |
US8207474B2 (en) | 2012-06-26 |
EP1478062B1 (de) | 2010-07-07 |
US20060043079A1 (en) | 2006-03-02 |
US7180918B2 (en) | 2007-02-20 |
US7573001B2 (en) | 2009-08-11 |
ATE473530T1 (de) | 2010-07-15 |
TW200522456A (en) | 2005-07-01 |
US20090294424A1 (en) | 2009-12-03 |
EP1478062A2 (de) | 2004-11-17 |
JP4040601B2 (ja) | 2008-01-30 |
KR20040099177A (ko) | 2004-11-26 |
TWI244814B (en) | 2005-12-01 |
KR20060016129A (ko) | 2006-02-21 |
JP2005045211A (ja) | 2005-02-17 |
KR100715371B1 (ko) | 2007-05-08 |
US20040228376A1 (en) | 2004-11-18 |
EP1478062A3 (de) | 2006-04-26 |
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