DE602004029353D1 - Baffle mit einer steuerung der ablagerung von verunreinigungen mit einem kapazitaetsdifferenz - druckwandler - Google Patents

Baffle mit einer steuerung der ablagerung von verunreinigungen mit einem kapazitaetsdifferenz - druckwandler

Info

Publication number
DE602004029353D1
DE602004029353D1 DE602004029353T DE602004029353T DE602004029353D1 DE 602004029353 D1 DE602004029353 D1 DE 602004029353D1 DE 602004029353 T DE602004029353 T DE 602004029353T DE 602004029353 T DE602004029353 T DE 602004029353T DE 602004029353 D1 DE602004029353 D1 DE 602004029353D1
Authority
DE
Germany
Prior art keywords
contamination
baffle
deposition
control
pressure transmitter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004029353T
Other languages
English (en)
Inventor
Jeffrey D Lischer
Robert Traverso
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MKS Instruments Inc
Original Assignee
MKS Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MKS Instruments Inc filed Critical MKS Instruments Inc
Publication of DE602004029353D1 publication Critical patent/DE602004029353D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L19/00Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
    • G01L19/06Means for preventing overload or deleterious influence of the measured medium on the measuring device or vice versa
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0072Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
    • G01L9/0075Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a ceramic diaphragm, e.g. alumina, fused quartz, glass
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L19/00Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
    • G01L19/06Means for preventing overload or deleterious influence of the measured medium on the measuring device or vice versa
    • G01L19/0627Protection against aggressive medium in general
    • G01L19/0636Protection against aggressive medium in general using particle filters
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/12Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in capacitance, i.e. electric circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
DE602004029353T 2003-05-16 2004-05-10 Baffle mit einer steuerung der ablagerung von verunreinigungen mit einem kapazitaetsdifferenz - druckwandler Active DE602004029353D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/440,391 US6993973B2 (en) 2003-05-16 2003-05-16 Contaminant deposition control baffle for a capacitive pressure transducer
PCT/US2004/014639 WO2004104543A1 (en) 2003-05-16 2004-05-10 Contaminant deposition control baffle with capacitance difference pressure transducer

Publications (1)

Publication Number Publication Date
DE602004029353D1 true DE602004029353D1 (de) 2010-11-11

Family

ID=33417996

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004029353T Active DE602004029353D1 (de) 2003-05-16 2004-05-10 Baffle mit einer steuerung der ablagerung von verunreinigungen mit einem kapazitaetsdifferenz - druckwandler

Country Status (7)

Country Link
US (1) US6993973B2 (de)
EP (1) EP1627214B1 (de)
JP (1) JP4607889B2 (de)
KR (1) KR101061408B1 (de)
DE (1) DE602004029353D1 (de)
TW (1) TWI316602B (de)
WO (1) WO2004104543A1 (de)

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JP5997771B2 (ja) 2011-09-29 2016-09-28 エム ケー エス インストルメンツ インコーポレーテッドMks Instruments,Incorporated 改良された電極構造体を有する静電容量型圧力センサ
KR101588725B1 (ko) 2011-10-11 2016-01-26 엠케이에스 인스트루먼츠, 인코포레이티드 압력 센서
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US20190064022A1 (en) * 2016-02-25 2019-02-28 Inficon ag Capacitive vacuum measuring cell having a multi-electrode
CN107976279A (zh) * 2017-12-15 2018-05-01 北京创昱科技有限公司 一种真空测量装置
DK3737926T3 (da) * 2018-01-09 2023-01-16 Kistler Holding Ag Beskyttelsesanordning
JP7085898B2 (ja) * 2018-05-25 2022-06-17 東京エレクトロン株式会社 ラジカル失活部品及びこれを用いたプラズマ処理装置
CN110132484A (zh) * 2019-05-31 2019-08-16 江苏鲁汶仪器有限公司 一种离子束刻蚀系统的真空测量工具的保护装置
CN110987282A (zh) * 2019-11-29 2020-04-10 中国科学院微电子研究所 一种防沉积匀气环
KR102252221B1 (ko) * 2020-02-26 2021-05-14 엠케이프리시젼 주식회사 축전 용량식 진공게이지
US11287342B2 (en) 2020-03-20 2022-03-29 Mks Instruments, Inc. Capacitance manometer with improved baffle for improved detection accuracy
CN114264403A (zh) * 2021-12-03 2022-04-01 北京晨晶精仪电子有限公司 真空规颗粒阻挡结构
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US6993973B2 (en) 2006-02-07
EP1627214B1 (de) 2010-09-29
KR20060012297A (ko) 2006-02-07
EP1627214A1 (de) 2006-02-22
TWI316602B (en) 2009-11-01
US20040226382A1 (en) 2004-11-18
TW200513638A (en) 2005-04-16
JP2007502433A (ja) 2007-02-08
WO2004104543A1 (en) 2004-12-02
JP4607889B2 (ja) 2011-01-05
KR101061408B1 (ko) 2011-09-01

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