DE602004030481D1 - Bühnensystem, belichtungsvorrichtung und belichtungsverfahren - Google Patents

Bühnensystem, belichtungsvorrichtung und belichtungsverfahren

Info

Publication number
DE602004030481D1
DE602004030481D1 DE602004030481T DE602004030481T DE602004030481D1 DE 602004030481 D1 DE602004030481 D1 DE 602004030481D1 DE 602004030481 T DE602004030481 T DE 602004030481T DE 602004030481 T DE602004030481 T DE 602004030481T DE 602004030481 D1 DE602004030481 D1 DE 602004030481D1
Authority
DE
Germany
Prior art keywords
holder
substrate
exposure
liquid
stage system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004030481T
Other languages
English (en)
Inventor
Yasufumi Nishii
Kenichi Shiraishi
Hirotaka Kohno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Publication of DE602004030481D1 publication Critical patent/DE602004030481D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
DE602004030481T 2003-12-15 2004-12-15 Bühnensystem, belichtungsvorrichtung und belichtungsverfahren Active DE602004030481D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003416712 2003-12-15
PCT/JP2004/018702 WO2005057636A1 (ja) 2003-12-15 2004-12-15 ステージ装置、露光装置、及び露光方法

Publications (1)

Publication Number Publication Date
DE602004030481D1 true DE602004030481D1 (de) 2011-01-20

Family

ID=34675168

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004030481T Active DE602004030481D1 (de) 2003-12-15 2004-12-15 Bühnensystem, belichtungsvorrichtung und belichtungsverfahren

Country Status (9)

Country Link
US (3) US7982857B2 (de)
EP (1) EP1699073B1 (de)
JP (8) JP4720506B2 (de)
KR (8) KR101941351B1 (de)
CN (1) CN100487860C (de)
AT (1) ATE491221T1 (de)
DE (1) DE602004030481D1 (de)
HK (1) HK1092280A1 (de)
WO (1) WO2005057636A1 (de)

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