DE602005006967D1 - Analyse-System und Teilchenstrahlgerät - Google Patents

Analyse-System und Teilchenstrahlgerät

Info

Publication number
DE602005006967D1
DE602005006967D1 DE602005006967T DE602005006967T DE602005006967D1 DE 602005006967 D1 DE602005006967 D1 DE 602005006967D1 DE 602005006967 T DE602005006967 T DE 602005006967T DE 602005006967 T DE602005006967 T DE 602005006967T DE 602005006967 D1 DE602005006967 D1 DE 602005006967D1
Authority
DE
Germany
Prior art keywords
analysis system
particle beam
beam device
particle
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005006967T
Other languages
English (en)
Inventor
Juergen Frosien
Stefan Lanio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Publication of DE602005006967D1 publication Critical patent/DE602005006967D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302—Contactless testing
    • G01R31/305—Contactless testing using electron beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46—Static spectrometers
    • H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
    • H01J49/488—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with retarding grids
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H01J2237/24465—Sectored detectors, e.g. quadrants
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24475—Scattered electron detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
DE602005006967T 2005-03-17 2005-03-17 Analyse-System und Teilchenstrahlgerät Active DE602005006967D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP05005886A EP1703537B9 (de) 2005-03-17 2005-03-17 Analyse-System und Teilchenstrahlgerät

Publications (1)

Publication Number Publication Date
DE602005006967D1 true DE602005006967D1 (de) 2008-07-03

Family

ID=35509284

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005006967T Active DE602005006967D1 (de) 2005-03-17 2005-03-17 Analyse-System und Teilchenstrahlgerät

Country Status (6)

Country Link
US (1) US7439500B2 (de)
EP (1) EP1703537B9 (de)
JP (1) JP4523558B2 (de)
KR (1) KR100776067B1 (de)
DE (1) DE602005006967D1 (de)
TW (1) TWI330861B (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008101714A2 (en) * 2007-02-22 2008-08-28 Applied Materials Israel, Ltd. High throughput sem tool
EP2132763B1 (de) * 2007-02-22 2014-05-07 Applied Materials Israel Ltd. Sem-werkzeug mit hohem durchsatz
EP2051278B1 (de) * 2007-10-17 2011-09-07 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Energiefilter für eine Elektronenstrahlvorrichtung mit kalter Feldemission
US7838833B1 (en) * 2007-11-30 2010-11-23 Kla-Tencor Technologies Corporation Apparatus and method for e-beam dark imaging with perspective control
TWI479570B (zh) 2007-12-26 2015-04-01 Nawotec Gmbh 從樣本移除材料之方法及系統
EP2219204B1 (de) 2009-02-12 2012-03-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Anordnung und Verfahren zur Kontrastverbesserung in einer Vorrichtung mit geladenem Partikelstrahl zur Inspektion eines Probestücks
EP2441083B1 (de) 2009-06-12 2021-03-31 Carl Zeiss Microscopy, LLC Verfahren und system zur erhitzung des spitzenapex einer quelle für geladene partikel
JP5694317B2 (ja) * 2009-07-17 2015-04-01 ケーエルエー−テンカー・コーポレーションＫｌａ−Ｔｅｎｃｏｒ Ｃｏｒｐｏｒａｔｉｏｎ 荷電粒子エネルギー分析器装置および方法
CN103069536B (zh) * 2010-04-09 2016-04-06 卡尔蔡司Smt有限责任公司 带电粒子探测系统和多小波束检查系统
DE102010061178A1 (de) * 2010-12-13 2012-06-14 Gsi Helmholtzzentrum Für Schwerionenforschung Gmbh Chromatischer Energiefilter
JP5638606B2 (ja) * 2010-12-27 2014-12-10 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム
EP2511939B1 (de) * 2011-04-13 2016-03-23 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Anordnung und Verfahren zur Kontrastverbesserung in einem Teilchenstrahlapparat zur Inspektion eines Probestücks
JP5663412B2 (ja) 2011-06-16 2015-02-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2013062158A1 (ko) * 2011-10-27 2013-05-02 에스엔유 프리시젼 주식회사 주사전자현미경용 빈필터 제어방법 및 전자빔 정렬 기능을 구비한 주사전자현미경
EP2629317B1 (de) * 2012-02-20 2015-01-28 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Teilchenstrahlvorrichtung mit dynamischem Fokus und Verfahren zu deren Betrieb
EP2654069B1 (de) * 2012-04-16 2016-02-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Mehrkanaldetektor, Optik dafür und Betriebsverfahren dafür
EP2682978B1 (de) * 2012-07-05 2016-10-19 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Verunreinigungsverringerungselektrode für Partikeldetektor
EP2747121A1 (de) * 2012-12-21 2014-06-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Sekundärelektronenoptik und -detektionsvorrichtung
JP6216515B2 (ja) * 2013-01-30 2017-10-18 株式会社日立ハイテクノロジーズ 電子ビーム装置、及び電子ビーム観察方法
US8933414B2 (en) * 2013-02-27 2015-01-13 Fei Company Focused ion beam low kV enhancement
WO2015029201A1 (ja) * 2013-08-30 2015-03-05 株式会社日立製作所 スピン検出器、及び荷電粒子線装置および光電子分光装置
EP2879155B1 (de) * 2013-12-02 2018-04-25 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Mehrstrahlsystem mit Hochdurchsatz-EBI
JP5899299B2 (ja) * 2014-12-05 2016-04-06 株式会社日立ハイテクノロジーズ 荷電粒子線装置
SG11201707201SA (en) * 2015-03-24 2017-10-30 Kla Tencor Corp Method and system for charged particle microscopy with improved image beam stabilization and interrogation
US10192716B2 (en) * 2015-09-21 2019-01-29 Kla-Tencor Corporation Multi-beam dark field imaging
JP6882972B2 (ja) * 2017-10-24 2021-06-02 株式会社日立ハイテク 荷電粒子線装置、断面形状推定プログラム
US20200303156A1 (en) * 2019-03-20 2020-09-24 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Beam splitter for a charged particle device

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1128107A (en) * 1965-06-23 1968-09-25 Hitachi Ltd Scanning electron microscope
GB8327737D0 (en) * 1983-10-17 1983-11-16 Texas Instruments Ltd Electron detector
NL8602177A (nl) * 1986-08-27 1988-03-16 Philips Nv Electronen detectie met energie discriminatie.
DE3888712D1 (de) * 1987-02-02 1994-05-05 Integrated Circuit Testing Detektorobjectiv für Rastermikroskope.
JPH071686B2 (ja) * 1988-09-22 1995-01-11 株式会社日立製作所 イオンマイクロアナライザ
DE3941178A1 (de) * 1989-12-13 1991-06-20 Siemens Ag Verfahren zur quantitativen potentialmessung mit einer korpuskularsonde
US5146090A (en) * 1990-06-11 1992-09-08 Siemens Aktiengesellschaft Particle beam apparatus having an immersion lens arranged in an intermediate image of the beam
GB2282480B (en) * 1990-07-05 1995-07-26 Olivetti Systems & Networks S Integrated circuit structure analysis
JPH0467550A (ja) * 1990-07-05 1992-03-03 Fujitsu Ltd 電子ビーム装置及びその画像取得方法
JPH05251039A (ja) * 1992-03-04 1993-09-28 Ebara Corp 二次イオン質量分析計
US5644132A (en) * 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
WO1996008835A1 (en) * 1994-09-13 1996-03-21 Metrologix, Inc. Particle beam detector providing z-axis and topographic contrast
US5894124A (en) * 1995-03-17 1999-04-13 Hitachi, Ltd. Scanning electron microscope and its analogous device
JP3434165B2 (ja) 1997-04-18 2003-08-04 株式会社日立製作所 走査電子顕微鏡
JPH1167139A (ja) * 1997-08-25 1999-03-09 Hitachi Ltd 走査電子顕微鏡
JP3661592B2 (ja) * 1998-03-27 2005-06-15 株式会社日立製作所 パターン検査装置
KR20000034962A (ko) * 1998-11-19 2000-06-26 하이든 마틴 하전입자의 이중-모드 검출 장치 및 방법
JP3728956B2 (ja) * 1998-12-22 2005-12-21 株式会社日立製作所 回路パターン検査装置
WO2001075929A1 (fr) * 2000-03-31 2001-10-11 Hitachi, Ltd. Microscope electronique a balayage
JP2001357808A (ja) * 2000-06-14 2001-12-26 Hitachi Ltd 回路パターン検査装置および方法
US6888150B2 (en) * 2001-12-13 2005-05-03 Sony International (Europe) Gmbh Method for defect and conductivity engineering of a conducting nanoscaled structure

Also Published As

Publication number Publication date
KR100776067B1 (ko) 2007-11-15
JP4523558B2 (ja) 2010-08-11
US20060226361A1 (en) 2006-10-12
TW200634884A (en) 2006-10-01
TWI330861B (en) 2010-09-21
US7439500B2 (en) 2008-10-21
KR20060101263A (ko) 2006-09-22
JP2006261111A (ja) 2006-09-28
EP1703537B9 (de) 2008-10-22
EP1703537B1 (de) 2008-05-21
EP1703537A1 (de) 2006-09-20

Similar Documents

Publication Publication Date Title
DE602005006967D1 (de) Analyse-System und Teilchenstrahlgerät
BRPI0719184A2 (pt) Análise e gerenciamento de sistema
DE602006011699D1 (de) Bremssteuervorrichtung und Steuerungsverfahren dafür
DE602006003491D1 (de) Beobachtungsvorrichtung und Beobachtungsverfahren
DE602006019198D1 (de) Probe- und haltevorrichtung
DE602006011600D1 (de) Audiocodierungseinrichtung und audiocodierungsverfahren
DE602006005034D1 (de) Distanzmessverfahren und Distanzmessvorrichtung
DE602005013583D1 (de) Testgerät und Testverfahren
BRPI0615288A2 (pt) dispositivo e método de medida de distância
DE602006004651D1 (de) Zykloneneinheit und Schadstoffsammelvorrichtung dieselbe enthaltend
DE602006014957D1 (de) Audiocodierungseinrichtung und audiocodierungsverfahren
DE602006009191D1 (de) Bildaufnahmegerät und -verfahren
DE602006018919D1 (de) Fahrzeug und spurerkennungsvorrichtung
DE602006011667D1 (de) Lithografische Vorrichtung und Positionierungsvorrichtung
DE602006021274D1 (de) Ultraschallvorrichtung und ultraschallverfahren
DE602006000743D1 (de) Abstandsmessgerät, Abstandsmessverfahren und Abstandsmessprogramm
BRPI0821646A2 (pt) Análise de partícula em um citômetro acústico
DE602006008682D1 (de) Bildgebungsanordnung und Prüfverfahren
FI20060449A0 (fi) Mammografiamenetelmä ja mammografialaite
DE602006000627D1 (de) Dreidimensionales Messverfahren und dreidimensionale Messvorrichtung
DE602006007909D1 (de) Bildabdeckungsvorrichtung und Bildverteilungssystem
DE602006015747D1 (de) Navigationsgerät und Navigationsverarbeitungsverfahren
DE602006017012D1 (de) Mikrofluidische Vorrichtung
DE602006006780D1 (de) Client-Server System und Servervorrichtung
DE602006020231D1 (de) Detektionsvorrichtung und -verfahren

Legal Events

Date Code Title Description
8364 No opposition during term of opposition