DE602005008666D1 - Vorrichtung zur Erzeugung eines Polarisationsmusters - Google Patents

Vorrichtung zur Erzeugung eines Polarisationsmusters

Info

Publication number
DE602005008666D1
DE602005008666D1 DE602005008666T DE602005008666T DE602005008666D1 DE 602005008666 D1 DE602005008666 D1 DE 602005008666D1 DE 602005008666 T DE602005008666 T DE 602005008666T DE 602005008666 T DE602005008666 T DE 602005008666T DE 602005008666 D1 DE602005008666 D1 DE 602005008666D1
Authority
DE
Germany
Prior art keywords
generating
polarization pattern
polarization
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005008666T
Other languages
English (en)
Inventor
Michael A Albert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of DE602005008666D1 publication Critical patent/DE602005008666D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/06—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of fluids in transparent cells
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
DE602005008666T 2004-05-25 2005-05-20 Vorrichtung zur Erzeugung eines Polarisationsmusters Active DE602005008666D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/852,099 US7324280B2 (en) 2004-05-25 2004-05-25 Apparatus for providing a pattern of polarization

Publications (1)

Publication Number Publication Date
DE602005008666D1 true DE602005008666D1 (de) 2008-09-18

Family

ID=34936768

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005008666T Active DE602005008666D1 (de) 2004-05-25 2005-05-20 Vorrichtung zur Erzeugung eines Polarisationsmusters

Country Status (9)

Country Link
US (3) US7324280B2 (de)
EP (2) EP1749241A1 (de)
JP (2) JP4361513B2 (de)
KR (1) KR100665138B1 (de)
CN (1) CN100487520C (de)
DE (1) DE602005008666D1 (de)
SG (1) SG117600A1 (de)
TW (1) TWI280460B (de)
WO (1) WO2005116772A1 (de)

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TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
TWI609410B (zh) 2004-02-06 2017-12-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
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DE102006038643B4 (de) 2006-08-17 2009-06-10 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102007042047A1 (de) * 2006-09-06 2008-03-27 Carl Zeiss Smt Ag Teilsystem einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
KR20080073196A (ko) * 2007-02-05 2008-08-08 엘지전자 주식회사 Ｍｉｍｏ 시스템에서 효율적인 채널 품질 정보 전송 방법
DE102008013567A1 (de) 2007-05-08 2008-11-13 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
US20080285000A1 (en) * 2007-05-17 2008-11-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4971932B2 (ja) * 2007-10-01 2012-07-11 キヤノン株式会社 照明光学系、露光装置、デバイス製造方法および偏光制御ユニット
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US8045161B2 (en) * 2008-03-18 2011-10-25 The Board Of Trustees Of The University Of Illinois Robust determination of the anisotropic polarizability of nanoparticles using coherent confocal microscopy
US8334976B2 (en) 2008-03-18 2012-12-18 The Board Of Trustees Of The University Of Illinois Second-order nonlinear susceptibility of a nanoparticle using coherent confocal microscopy
NL1036786A1 (nl) * 2008-05-08 2009-11-11 Asml Netherlands Bv Lithographic apparatus and method.
JP5319766B2 (ja) * 2008-06-20 2013-10-16 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光学系及びマイクロリソグラフィ露光方法
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US8553204B2 (en) * 2009-05-20 2013-10-08 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
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GB2521443B (en) * 2013-12-20 2016-06-29 Vizeye Ltd Apparatus and method for inducing polarization perception in an observer
JP6619619B2 (ja) 2015-11-04 2019-12-11 日東電工株式会社 偏光子、偏光板および偏光子の製造方法
CN105785581B (zh) * 2016-05-09 2018-06-22 湖州中科光电技术有限公司 一种用于产生旋转对称偏振光的微结构器件的设计方法
CN110160002B (zh) * 2018-02-12 2022-02-25 深圳市绎立锐光科技开发有限公司 一种照明系统

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US7324280B2 (en) 2008-01-29
SG117600A1 (en) 2005-12-29
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