DE602005012868D1 - Zusammensetzungen, die lichtempfindliche fluorchemikalien enthalten, und verwendungen davon - Google Patents

Zusammensetzungen, die lichtempfindliche fluorchemikalien enthalten, und verwendungen davon

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Publication number
DE602005012868D1
DE602005012868D1 DE200560012868 DE602005012868T DE602005012868D1 DE 602005012868 D1 DE602005012868 D1 DE 602005012868D1 DE 200560012868 DE200560012868 DE 200560012868 DE 602005012868 T DE602005012868 T DE 602005012868T DE 602005012868 D1 DE602005012868 D1 DE 602005012868D1
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DE
Germany
Prior art keywords
group
carbon atoms
fluorem
chemicals
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE200560012868
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English (en)
Inventor
Junkang J Liu
George G I Moore
Mark J Pellerite
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
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3M Innovative Properties Co
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Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of DE602005012868D1 publication Critical patent/DE602005012868D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/22—Esters containing halogen
    • C08F220/24—Esters containing halogen containing perhaloalkyl radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C08K5/101—Esters; Ether-esters of monocarboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04—Homopolymers or copolymers of esters
    • C09J133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09J133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
DE200560012868 2004-12-29 2005-12-28 Zusammensetzungen, die lichtempfindliche fluorchemikalien enthalten, und verwendungen davon Active DE602005012868D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US64026004P 2004-12-29 2004-12-29
PCT/US2005/047403 WO2006071981A1 (en) 2004-12-29 2005-12-28 Compositions containing photosensitive fluorochemical and uses thereof

Publications (1)

Publication Number Publication Date
DE602005012868D1 true DE602005012868D1 (de) 2009-04-02

Family

ID=36190705

Family Applications (1)

Application Number Title Priority Date Filing Date
DE200560012868 Active DE602005012868D1 (de) 2004-12-29 2005-12-28 Zusammensetzungen, die lichtempfindliche fluorchemikalien enthalten, und verwendungen davon

Country Status (10)

Country Link
US (1) US7682771B2 (de)
EP (1) EP1833862B1 (de)
JP (1) JP5074207B2 (de)
KR (1) KR101290491B1 (de)
CN (1) CN101107280B (de)
AT (1) ATE423150T1 (de)
DE (1) DE602005012868D1 (de)
ES (1) ES2321537T3 (de)
RU (1) RU2007123778A (de)
WO (1) WO2006071981A1 (de)

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US7553540B2 (en) 2005-12-30 2009-06-30 E. I. Du Pont De Nemours And Company Fluoropolymer coated films useful for photovoltaic modules
US8012542B2 (en) * 2005-12-30 2011-09-06 E.I. Du Pont De Nemours And Company Fluoropolymer coating compositions containing adhesive polymers and substrate coating process
US7754838B2 (en) * 2006-08-08 2010-07-13 E.I. Du Pont De Nemours And Company Poly(meth)acrylamides and poly(meth)acrylates containing fluorinated amide
WO2008079394A1 (en) * 2006-12-21 2008-07-03 E. I. Du Pont De Nemours And Company Crosslinkable vinyl fluoride copolymers
US8168297B2 (en) * 2007-04-23 2012-05-01 E. I. Du Pont De Nemours And Company Fluoropolymer coated film, process for forming the same, and fluoropolymer liquid composition
WO2008154345A1 (en) * 2007-06-06 2008-12-18 3M Innovative Properties Company Fluorinated ether compositions and methods of using the same
CN102317403A (zh) * 2008-12-18 2012-01-11 3M创新有限公司 使含烃地层与氟化醚组合物接触的方法
KR20120101289A (ko) * 2009-06-30 2012-09-13 아사히 가라스 가부시키가이샤 표면 처리제, 물품 및 함불소 에테르 화합물
US9334423B2 (en) * 2012-08-31 2016-05-10 Basf Se Compositions comprising an acrylic block copolymer and a UV-curable copolymer and methods of making and using the same
SG11201504889VA (en) * 2012-12-20 2015-07-30 3M Innovative Properties Co Fluoropolymer composition including an oligomer having an ultraviolet absorbing group
EP2935373A4 (de) 2012-12-20 2016-07-27 3M Innovative Properties Co Copolymere mit ultraviolettlicht-absorbierenden gruppen und fluorpolymerzusammensetzungen damit
JP6294513B2 (ja) 2014-06-25 2018-03-14 スリーエム イノベイティブ プロパティズ カンパニー 少なくとも１つのオリゴマーを含むフルオロポリマー組成物
US11110689B2 (en) 2014-06-25 2021-09-07 3M Innovative Properties Company Pressure sensitive adhesive composition including ultraviolet light-absorbing oligomer
US9994732B1 (en) 2014-09-12 2018-06-12 Steven Martin Johnson Polysilazane and fluoroacrylate coating composition
CN105647502B (zh) * 2014-11-10 2018-09-04 中国石油天然气股份有限公司 一种稠油降粘剂及其制备方法
WO2016210140A1 (en) 2015-06-25 2016-12-29 3M Innovative Properties Company Copolymer including ultraviolet light-absorbing group and compositions including the same
JP6645800B2 (ja) * 2015-10-22 2020-02-14 株式会社ブリヂストン 粘着シート及び粘着シートの製造方法
US10562065B1 (en) 2015-11-03 2020-02-18 Newtech Llc Systems and methods for application of polysilazane and fluoroacrylate coating compositions
US10584264B1 (en) 2016-02-25 2020-03-10 Newtech Llc Hydrophobic and oleophobic coating compositions
CN107513127A (zh) * 2016-06-17 2017-12-26 默克专利股份有限公司 含氟聚合物
WO2018178814A1 (en) 2017-03-27 2018-10-04 3M Innovative Properties Company Film constructions and articles
CN109758970B (zh) * 2018-12-12 2021-03-23 衢州学院 一种纳米纤维素基含氟高分子表面活性剂及其制备方法
DE102019106081A1 (de) * 2019-03-11 2020-09-17 Joanneum Research Forschungsgesellschaft Mbh Oligomere Hexafluorpropylenoxidderivate
JP2021024932A (ja) * 2019-08-02 2021-02-22 三菱ケミカル株式会社 共重合体、硬化性重合体組成物、硬化物、積層体

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US3250808A (en) * 1963-10-31 1966-05-10 Du Pont Fluorocarbon ethers derived from hexafluoropropylene epoxide
US3553179A (en) * 1968-05-06 1971-01-05 Du Pont Acrylate-type esters of perfluoropoly-oxa-alkaneamidoalkyl alcohols and their polymers
US3544537A (en) * 1968-05-31 1970-12-01 Du Pont Poly(perfluoroalkoxy)polyfluoroalkyl acrylate-type esters and their polymers
US4178303A (en) * 1979-01-26 1979-12-11 Gaf Corporation (2-Cyano-3,3-diphenylacryloxy) alkylene acrylic acid esters
US4348530A (en) * 1980-02-05 1982-09-07 Ciba-Geigy Corporation Thioxanthonecarboxylic acids, esters, thioesters and amides with reactive functional groups
JPS56167139A (en) * 1980-05-27 1981-12-22 Daikin Ind Ltd Sensitive material
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US5484822A (en) * 1991-06-24 1996-01-16 Polaroid Corporation Process and composition for cladding optic fibers
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DE4413436A1 (de) * 1994-04-18 1995-10-19 Basf Lacke & Farben Verfahren zur Lackierung von Gegenständen unter Verwendung strahlungshärtbarer Pulverlacke
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WO2001030873A1 (en) * 1999-10-27 2001-05-03 3M Innovative Properties Company Fluorochemical sulfonamide surfactants
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US6395459B1 (en) * 2000-09-29 2002-05-28 Eastman Kodak Company Method of forming a protective overcoat for imaged elements and related articles
US6592659B1 (en) * 2001-11-15 2003-07-15 3M Innovative Properties Company Compositions for aqueous delivery of fluorinated silanes
JP4436030B2 (ja) * 2002-05-10 2010-03-24 スリーエム イノベイティブ プロパティズ カンパニー アクリル系剥離剤前駆体、剥離剤物品及び剥離剤物品の製造方法
KR20050014834A (ko) * 2002-05-24 2005-02-07 쓰리엠 이노베이티브 프로퍼티즈 컴파니 퍼플루오로폴리에테르 및 연장제를 포함하는 섬유 기질처리용 플루오로화합물 조성물
AU2003239605B2 (en) 2002-05-24 2008-11-20 3M Innovative Properties Company Fluorochemical composition comprising a fluorinated polyether and treatment of a fibrous substrate therewith
US6841079B2 (en) * 2002-05-31 2005-01-11 3M Innovative Properties Company Fluorochemical treatment for silicon articles
US6923921B2 (en) * 2002-12-30 2005-08-02 3M Innovative Properties Company Fluorinated polyether compositions
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Also Published As

Publication number Publication date
ATE423150T1 (de) 2009-03-15
EP1833862A1 (de) 2007-09-19
JP5074207B2 (ja) 2012-11-14
JP2008527091A (ja) 2008-07-24
US20060199029A1 (en) 2006-09-07
US7682771B2 (en) 2010-03-23
CN101107280B (zh) 2011-07-06
EP1833862B1 (de) 2009-02-18
RU2007123778A (ru) 2009-02-10
ES2321537T3 (es) 2009-06-08
KR101290491B1 (ko) 2013-07-26
KR20070103396A (ko) 2007-10-23
CN101107280A (zh) 2008-01-16
WO2006071981A1 (en) 2006-07-06

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