DE60221346D1 - Gasanalysator unter Verwendung von thermischen Sensoren - Google Patents

Gasanalysator unter Verwendung von thermischen Sensoren

Info

Publication number
DE60221346D1
DE60221346D1 DE60221346T DE60221346T DE60221346D1 DE 60221346 D1 DE60221346 D1 DE 60221346D1 DE 60221346 T DE60221346 T DE 60221346T DE 60221346 T DE60221346 T DE 60221346T DE 60221346 D1 DE60221346 D1 DE 60221346D1
Authority
DE
Germany
Prior art keywords
gas analyzer
thermal sensors
sensors
thermal
analyzer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60221346T
Other languages
English (en)
Other versions
DE60221346T2 (de
Inventor
Kurt Weckstroem
Mika Hietala
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Instrumentarium Oyj
Original Assignee
Instrumentarium Oyj
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Instrumentarium Oyj filed Critical Instrumentarium Oyj
Application granted granted Critical
Publication of DE60221346D1 publication Critical patent/DE60221346D1/de
Publication of DE60221346T2 publication Critical patent/DE60221346T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3504Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
DE60221346T 2002-03-22 2002-03-22 Gasanalysator unter Verwendung von thermischen Sensoren Expired - Lifetime DE60221346T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02396036A EP1347290B1 (de) 2002-03-22 2002-03-22 Gasanalysator unter Verwendung von thermischen Sensoren

Publications (2)

Publication Number Publication Date
DE60221346D1 true DE60221346D1 (de) 2007-09-06
DE60221346T2 DE60221346T2 (de) 2008-04-17

Family

ID=27771969

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60221346T Expired - Lifetime DE60221346T2 (de) 2002-03-22 2002-03-22 Gasanalysator unter Verwendung von thermischen Sensoren

Country Status (3)

Country Link
US (1) US6694800B2 (de)
EP (1) EP1347290B1 (de)
DE (1) DE60221346T2 (de)

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US7080545B2 (en) * 2002-10-17 2006-07-25 Advanced Technology Materials, Inc. Apparatus and process for sensing fluoro species in semiconductor processing systems
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US7223611B2 (en) * 2003-10-07 2007-05-29 Hewlett-Packard Development Company, L.P. Fabrication of nanowires
DE102004006677A1 (de) * 2004-02-11 2005-09-15 Kendro Laboratory Products Gmbh Infrarot-Gassensor und Verfahren zur Gaskonzentrationsmessung mit diesem Sensor
US7407738B2 (en) * 2004-04-02 2008-08-05 Pavel Kornilovich Fabrication and use of superlattice
US7247531B2 (en) 2004-04-30 2007-07-24 Hewlett-Packard Development Company, L.P. Field-effect-transistor multiplexing/demultiplexing architectures and methods of forming the same
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US7683435B2 (en) 2004-04-30 2010-03-23 Hewlett-Packard Development Company, L.P. Misalignment-tolerant multiplexing/demultiplexing architectures
US7069768B2 (en) * 2004-06-08 2006-07-04 Instrumentarium Corp. Method and apparatus for eliminating and compensating thermal transients in gas analyzer
DE102004028077A1 (de) * 2004-06-09 2005-12-29 Tyco Electronics Raychem Gmbh Gassensoranordnung mit verkürzter Einschwingzeit
US20060024814A1 (en) * 2004-07-29 2006-02-02 Peters Kevin F Aptamer-functionalized electrochemical sensors and methods of fabricating and using the same
US7375012B2 (en) * 2005-02-28 2008-05-20 Pavel Kornilovich Method of forming multilayer film
US20060211253A1 (en) * 2005-03-16 2006-09-21 Ing-Shin Chen Method and apparatus for monitoring plasma conditions in an etching plasma processing facility
WO2006121321A1 (en) * 2005-05-10 2006-11-16 Sensata Technologies Holland B.V. Sensor module package
US7659504B1 (en) * 2005-05-18 2010-02-09 Ric Investments, Llc Optical sensor with an optical element transmissive to warming radiation
TWI402098B (zh) * 2005-06-22 2013-07-21 Advanced Tech Materials 整合式氣體混合用之裝置及方法
US20080006775A1 (en) * 2006-06-22 2008-01-10 Arno Jose I Infrared gas detection systems and methods
US7656302B2 (en) * 2006-11-20 2010-02-02 Honeywell International Inc. Sensing chamber with enhanced ambient atmospheric flow
US8383046B1 (en) * 2007-04-16 2013-02-26 Murthy Tata Analyzer apparatus for measuring dissolved volatile substances and method
US7824100B2 (en) * 2007-08-08 2010-11-02 General Electric Company Temperature measurement device that estimates and compensates for incident radiation
US7535007B1 (en) * 2008-02-26 2009-05-19 Honeywell International Inc. Multiple chamber dual channel infrared gas detection system
EP2169369A1 (de) 2008-09-25 2010-03-31 General Electric Company Miniatur-Thermosäulensensor
WO2010138930A2 (en) 2009-05-29 2010-12-02 Advanced Technology Materials, Inc. Tpir apparatus for monitoring tungsten hexafluoride processing to detect gas phase nucleation, and method and system utilizing same
DE102009037706A1 (de) * 2009-08-17 2011-02-24 Opsolution Nanophotonics Gmbh Verfahren und Vorrichtung zur Bestimmung der Konzentration von NO2 in Gasgemischen
WO2012126470A1 (en) * 2011-03-23 2012-09-27 Danfoss Ixa A/S High temperature gas sensor
AU2012346560B2 (en) * 2011-12-02 2015-05-14 Senseair Ab Epoxy molded gas cell for optical measurement and method of forming
GB2500238B (en) * 2012-03-15 2014-04-30 Crowcon Detection Instr Ltd Passively cooled gas detector
US9250126B2 (en) 2012-10-26 2016-02-02 Excelitas Technologies Singapore Pte. Ltd Optical sensing element arrangement with integral package
CN103884671A (zh) * 2014-03-12 2014-06-25 中国计量学院 一种不分光红外(ndir)co2气体传感器
DE102016012971B4 (de) 2016-10-28 2023-02-09 Drägerwerk AG & Co. KGaA Vorrichtung zur Konzentrationsbestimmung mindestens einer Gaskomponente in einem Atemgasgemisch
US10466174B2 (en) * 2016-12-13 2019-11-05 Infineon Technologies Ag Gas analyzer including a radiation source comprising a black-body radiator with at least one through-hole and a collimator
US11047779B2 (en) 2017-12-04 2021-06-29 Montana Instruments Corporation Analytical instruments, methods, and components
CN110068375A (zh) * 2019-05-27 2019-07-30 金卡智能集团股份有限公司 一种基于能量计量的燃气计量方法
US11956924B1 (en) 2020-08-10 2024-04-09 Montana Instruments Corporation Quantum processing circuitry cooling systems and methods

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Also Published As

Publication number Publication date
US6694800B2 (en) 2004-02-24
DE60221346T2 (de) 2008-04-17
EP1347290A1 (de) 2003-09-24
US20030177814A1 (en) 2003-09-25
EP1347290B1 (de) 2007-07-25

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