DE60225956D1 - Schleifmittelzusammensetzung und Polierverfahren unter Verwendung derselben - Google Patents

Schleifmittelzusammensetzung und Polierverfahren unter Verwendung derselben

Info

Publication number
DE60225956D1
DE60225956D1 DE60225956T DE60225956T DE60225956D1 DE 60225956 D1 DE60225956 D1 DE 60225956D1 DE 60225956 T DE60225956 T DE 60225956T DE 60225956 T DE60225956 T DE 60225956T DE 60225956 D1 DE60225956 D1 DE 60225956D1
Authority
DE
Germany
Prior art keywords
same
polishing method
abrasive composition
abrasive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60225956T
Other languages
English (en)
Other versions
DE60225956T2 (de
Inventor
Akihiro Kawase
Masao Okamura
Yutaka Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujimi Inc
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18891966&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60225956(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Fujimi Inc filed Critical Fujimi Inc
Application granted granted Critical
Publication of DE60225956D1 publication Critical patent/DE60225956D1/de
Publication of DE60225956T2 publication Critical patent/DE60225956T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002—Preparing wafers
    • H01L21/02005—Preparing bulk and homogeneous wafers
    • H01L21/02008—Multistep processes
    • H01L21/0201—Specific process step
    • H01L21/02024—Mirror polishing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
DE60225956T 2001-02-02 2002-01-30 Polierzusammensetzung und Polierverfahren unter ihrer Verwendung Expired - Lifetime DE60225956T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001027276A JP3440419B2 (ja) 2001-02-02 2001-02-02 研磨用組成物およびそれを用いた研磨方法
JP2001027276 2001-02-02

Publications (2)

Publication Number Publication Date
DE60225956D1 true DE60225956D1 (de) 2008-05-21
DE60225956T2 DE60225956T2 (de) 2009-05-20

Family

ID=18891966

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60225956T Expired - Lifetime DE60225956T2 (de) 2001-02-02 2002-01-30 Polierzusammensetzung und Polierverfahren unter ihrer Verwendung

Country Status (8)

Country Link
US (1) US6852009B2 (de)
EP (1) EP1229094B1 (de)
JP (1) JP3440419B2 (de)
CN (1) CN1266243C (de)
DE (1) DE60225956T2 (de)
MY (1) MY129070A (de)
SG (1) SG114523A1 (de)
TW (1) TWI245335B (de)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6953389B2 (en) * 2001-08-09 2005-10-11 Cheil Industries, Inc. Metal CMP slurry compositions that favor mechanical removal of oxides with reduced susceptibility to micro-scratching
JP4593064B2 (ja) * 2002-09-30 2010-12-08 株式会社フジミインコーポレーテッド 研磨用組成物及びそれを用いた研磨方法
JP4212861B2 (ja) * 2002-09-30 2009-01-21 株式会社フジミインコーポレーテッド 研磨用組成物及びそれを用いたシリコンウエハの研磨方法、並びにリンス用組成物及びそれを用いたシリコンウエハのリンス方法
DE10247201A1 (de) * 2002-10-10 2003-12-18 Wacker Siltronic Halbleitermat Verfahren zur Herstellung einer polierten Siliciumscheibe
JP2004266155A (ja) * 2003-03-03 2004-09-24 Jsr Corp 化学機械研磨用水系分散体およびこれを用いた化学機械研磨方法ならびに半導体装置の製造方法
US7481949B2 (en) * 2002-11-08 2009-01-27 Wako Pure Chemical Industries, Ltd Polishing composition and rinsing composition
JP2004247428A (ja) * 2003-02-12 2004-09-02 Fujimi Inc 研磨用組成物及びそれを用いる研磨方法
KR100570122B1 (ko) * 2003-05-12 2006-04-11 학교법인 한양학원 나노토포그라피 효과를 보상할 수 있는 화학기계적 연마용슬러리 조성물 및 이를 이용한 반도체소자의 표면 평탄화방법
JP4668528B2 (ja) * 2003-09-05 2011-04-13 株式会社フジミインコーポレーテッド 研磨用組成物
JP4974447B2 (ja) * 2003-11-26 2012-07-11 株式会社フジミインコーポレーテッド 研磨用組成物及び研磨方法
JPWO2005090511A1 (ja) * 2004-03-19 2008-01-31 ▲吉▼田 和昭 研磨用組成物および研磨方法
JP2005268665A (ja) * 2004-03-19 2005-09-29 Fujimi Inc 研磨用組成物
JP2005268667A (ja) * 2004-03-19 2005-09-29 Fujimi Inc 研磨用組成物
JP2005347737A (ja) * 2004-05-07 2005-12-15 Nissan Chem Ind Ltd シリコンウェハー用研磨組成物
JP2006005246A (ja) * 2004-06-18 2006-01-05 Fujimi Inc リンス用組成物及びそれを用いたリンス方法
JP4814502B2 (ja) * 2004-09-09 2011-11-16 株式会社フジミインコーポレーテッド 研磨用組成物及びそれを用いた研磨方法
US8350466B2 (en) 2004-09-17 2013-01-08 Semiconductor Energy Laboratory Co., Ltd. Display device and manufacturing method thereof
US7753751B2 (en) 2004-09-29 2010-07-13 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating the display device
US8772783B2 (en) * 2004-10-14 2014-07-08 Semiconductor Energy Laboratory Co., Ltd. Display device
TW200619368A (en) * 2004-10-28 2006-06-16 Nissan Chemical Ind Ltd Polishing composition for silicon wafer
JP4808394B2 (ja) * 2004-10-29 2011-11-02 株式会社フジミインコーポレーテッド 研磨用組成物
JP4487753B2 (ja) * 2004-12-10 2010-06-23 株式会社Ｓｕｍｃｏ シリコンウェーハ用のアルカリエッチング液及び該エッチング液を用いたエッチング方法
TWI323741B (en) * 2004-12-16 2010-04-21 K C Tech Co Ltd Abrasive particles, polishing slurry, and producing method thereof
US7351662B2 (en) * 2005-01-07 2008-04-01 Dupont Air Products Nanomaterials Llc Composition and associated method for catalyzing removal rates of dielectric films during chemical mechanical planarization
KR100662546B1 (ko) * 2005-03-07 2006-12-28 제일모직주식회사 실리콘 웨이퍼의 표면 품질을 개선하는 연마용 슬러리 조성물 및 이를 이용한 연마방법
US7452481B2 (en) 2005-05-16 2008-11-18 Kabushiki Kaisha Kobe Seiko Sho Polishing slurry and method of reclaiming wafers
JPWO2006126432A1 (ja) * 2005-05-27 2008-12-25 日産化学工業株式会社 シリコンウェハー用研磨組成物
KR100641348B1 (ko) * 2005-06-03 2006-11-03 주식회사 케이씨텍 Ｃｍｐ용 슬러리와 이의 제조 방법 및 기판의 연마 방법
JP2007103515A (ja) * 2005-09-30 2007-04-19 Fujimi Inc 研磨方法
JP2007214205A (ja) * 2006-02-07 2007-08-23 Fujimi Inc 研磨用組成物
JP4582798B2 (ja) * 2006-02-09 2010-11-17 ニチコン株式会社 電解コンデンサの駆動用電解液及びこれを用いた電解コンデンサ
JP4582797B2 (ja) * 2006-02-09 2010-11-17 ニチコン株式会社 電解コンデンサの駆動用電解液及びこれを用いた電解コンデンサ
DE102006008689B4 (de) 2006-02-24 2012-01-26 Lanxess Deutschland Gmbh Poliermittel und dessen Verwendung
JP5087855B2 (ja) * 2006-04-05 2012-12-05 株式会社Ｓｕｍｃｏ 熱処理評価用ウェーハ、熱処理評価方法、および半導体ウェーハの製造方法
JP5518334B2 (ja) 2006-07-05 2014-06-11 デュポン エア プロダクツ ナノマテリアルズ，リミティド ライアビリティ カンパニー シリコンウエハ用研磨組成物、シリコンウエハの研磨方法およびシリコンウエハ用研磨組成物キット
JP5204960B2 (ja) 2006-08-24 2013-06-05 株式会社フジミインコーポレーテッド 研磨用組成物及び研磨方法
JP5335183B2 (ja) * 2006-08-24 2013-11-06 株式会社フジミインコーポレーテッド 研磨用組成物及び研磨方法
KR100839355B1 (ko) * 2006-11-28 2008-06-19 삼성전자주식회사 기판의 재생 방법
JP5148948B2 (ja) * 2007-08-23 2013-02-20 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 研磨用スラリーのリサイクル方法
US8017524B2 (en) * 2008-05-23 2011-09-13 Cabot Microelectronics Corporation Stable, high rate silicon slurry
JP5474400B2 (ja) * 2008-07-03 2014-04-16 株式会社フジミインコーポレーテッド 半導体用濡れ剤、それを用いた研磨用組成物および研磨方法
WO2010052983A1 (ja) * 2008-11-10 2010-05-14 旭硝子株式会社 研磨用組成物および半導体集積回路装置の製造方法
JP5492603B2 (ja) * 2010-03-02 2014-05-14 株式会社フジミインコーポレーテッド 研磨用組成物及びそれを用いた研磨方法
US8232208B2 (en) * 2010-06-15 2012-07-31 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Stabilized chemical mechanical polishing composition and method of polishing a substrate
JP5551042B2 (ja) * 2010-09-30 2014-07-16 株式会社クラレ 化学的機械的研磨法およびそれに用いられるスラリー
WO2012127398A1 (en) * 2011-03-22 2012-09-27 Basf Se A chemical mechanical polishing (cmp) composition comprising a polymeric polyamine
JP2011181948A (ja) * 2011-04-25 2011-09-15 Fujimi Inc 研磨用組成物及びそれを用いた研磨パッドの目詰まり低減方法
AU2013330344B2 (en) 2012-09-17 2018-07-05 W. R. Grace & Co.-Conn. Chromatography media and devices
JP6469574B2 (ja) 2012-09-17 2019-02-13 ダブリュー・アール・グレース・アンド・カンパニー−コーンＷ Ｒ Ｇｒａｃｅ ＆ Ｃｏ−Ｃｏｎｎ 官能化粒状保持体ならびにその製造法及び使用法
PL3094390T3 (pl) 2014-01-16 2021-12-06 W.R. Grace & Co. - Conn. Nośniki do chromatografii powinowactwa i urządzenia do chromatografii
JP6914189B2 (ja) 2014-05-02 2021-08-04 ダブリュー・アール・グレース・アンド・カンパニー−コーンＷ Ｒ Ｇｒａｃｅ ＆ Ｃｏ−Ｃｏｎｎ 官能化担体材料並びに官能化担体材料を作製及び使用する方法
EP3261114B1 (de) * 2015-02-19 2021-01-13 Fujimi Incorporated Zusammensetzung für siliciumwafer-polierung und polierverfahren
WO2016196906A1 (en) 2015-06-05 2016-12-08 W. R. Grace & Co.-Conn. Adsorbent bioprocessing clarification agents and methods of making and using the same
US10683439B2 (en) 2018-03-15 2020-06-16 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Polishing composition and method of polishing a substrate having enhanced defect inhibition
US20220049125A1 (en) 2018-12-12 2022-02-17 Basf Se Chemical mechanical polishing of substrates containing copper and ruthenium
JP2022512429A (ja) 2018-12-12 2022-02-03 ビーエーエスエフ ソシエタス・ヨーロピア 銅及びルテニウムを含有する基板の化学機械研磨
KR20210102931A (ko) 2018-12-12 2021-08-20 바스프 에스이 구리 및 루테늄을 포함하는 기판의 화학적 기계적 폴리싱
WO2023032714A1 (ja) * 2021-09-01 2023-03-09 株式会社フジミインコーポレーテッド 研磨用組成物

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169337A (en) 1978-03-30 1979-10-02 Nalco Chemical Company Process for polishing semi-conductor materials
US4462188A (en) 1982-06-21 1984-07-31 Nalco Chemical Company Silica sol compositions for polishing silicon wafers
US4588421A (en) 1984-10-15 1986-05-13 Nalco Chemical Company Aqueous silica compositions for polishing silicon wafers
JPS63272460A (ja) 1987-04-28 1988-11-09 Mitsubishi Monsanto Chem Co ウエハ−用研磨剤組成物
US5084071A (en) * 1989-03-07 1992-01-28 International Business Machines Corporation Method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
US5230833A (en) 1989-06-09 1993-07-27 Nalco Chemical Company Low sodium, low metals silica polishing slurries
US5916819A (en) * 1996-07-17 1999-06-29 Micron Technology, Inc. Planarization fluid composition chelating agents and planarization method using same
US6099604A (en) 1997-08-21 2000-08-08 Micron Technology, Inc. Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto
AU2080999A (en) * 1997-12-23 1999-07-12 Akzo Nobel N.V. A composition for chemical mechanical polishing
JPH11349925A (ja) 1998-06-05 1999-12-21 Fujimi Inc エッジポリッシング用組成物
JP4090589B2 (ja) 1998-09-01 2008-05-28 株式会社フジミインコーポレーテッド 研磨用組成物
DE69942615D1 (de) * 1998-10-23 2010-09-02 Fujifilm Electronic Materials Eine chemisch-mechanisch polierende aufschlämmung, eine beschleunigerlösung enthaltend
US6569216B1 (en) * 1998-11-27 2003-05-27 Kao Corporation Abrasive fluid compositions
JP2000160139A (ja) * 1998-12-01 2000-06-13 Fujimi Inc 研磨用組成物およびそれを用いた研磨方法
JP3972274B2 (ja) 1998-12-02 2007-09-05 信越半導体株式会社 半導体シリコンウェーハ研磨用研磨剤及び研磨方法
JP3551238B2 (ja) 1999-09-07 2004-08-04 三菱住友シリコン株式会社 シリコンウェーハの研磨液及びこれを用いた研磨方法
US6440856B1 (en) * 1999-09-14 2002-08-27 Jsr Corporation Cleaning agent for semiconductor parts and method for cleaning semiconductor parts
US6280490B1 (en) * 1999-09-27 2001-08-28 Fujimi America Inc. Polishing composition and method for producing a memory hard disk
JP4213858B2 (ja) 2000-02-03 2009-01-21 花王株式会社 研磨液組成物
US6454820B2 (en) * 2000-02-03 2002-09-24 Kao Corporation Polishing composition
JP4585100B2 (ja) 2000-08-24 2010-11-24 日本化学工業株式会社 研磨使用済み液の再生方法

Also Published As

Publication number Publication date
EP1229094B1 (de) 2008-04-09
US20020151252A1 (en) 2002-10-17
EP1229094A2 (de) 2002-08-07
CN1369534A (zh) 2002-09-18
EP1229094A3 (de) 2003-10-22
JP2002226836A (ja) 2002-08-14
CN1266243C (zh) 2006-07-26
JP3440419B2 (ja) 2003-08-25
US6852009B2 (en) 2005-02-08
TWI245335B (en) 2005-12-11
MY129070A (en) 2007-03-30
SG114523A1 (en) 2005-09-28
DE60225956T2 (de) 2009-05-20

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