DE60229549D1 - Induktionsheizgerät und verfahren zum kontrollierten erheizen von einem artikel - Google Patents
Induktionsheizgerät und verfahren zum kontrollierten erheizen von einem artikelInfo
- Publication number
- DE60229549D1 DE60229549D1 DE60229549T DE60229549T DE60229549D1 DE 60229549 D1 DE60229549 D1 DE 60229549D1 DE 60229549 T DE60229549 T DE 60229549T DE 60229549 T DE60229549 T DE 60229549T DE 60229549 D1 DE60229549 D1 DE 60229549D1
- Authority
- DE
- Germany
- Prior art keywords
- article
- processing chamber
- susceptor
- induction heater
- controlled heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/10—Induction heating apparatus, other than furnaces, for specific applications
- H05B6/105—Induction heating apparatus, other than furnaces, for specific applications using a susceptor
- H05B6/108—Induction heating apparatus, other than furnaces, for specific applications using a susceptor for heating a fluid
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/10—Heating of the reaction chamber or the substrate
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/017,492 US6896738B2 (en) | 2001-10-30 | 2001-10-30 | Induction heating devices and methods for controllably heating an article |
PCT/US2002/034090 WO2003039195A2 (en) | 2001-10-30 | 2002-10-24 | Induction heating devices and methods for controllably heating an article |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60229549D1 true DE60229549D1 (de) | 2008-12-04 |
Family
ID=21782889
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60229549T Expired - Lifetime DE60229549D1 (de) | 2001-10-30 | 2002-10-24 | Induktionsheizgerät und verfahren zum kontrollierten erheizen von einem artikel |
Country Status (11)
Country | Link |
---|---|
US (3) | US6896738B2 (de) |
EP (1) | EP1449407B1 (de) |
JP (1) | JP2005508097A (de) |
KR (1) | KR20050039709A (de) |
CN (1) | CN1611095A (de) |
AT (1) | ATE412331T1 (de) |
AU (1) | AU2002348053A1 (de) |
CA (1) | CA2464855A1 (de) |
DE (1) | DE60229549D1 (de) |
TW (1) | TWI274081B (de) |
WO (1) | WO2003039195A2 (de) |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6613587B1 (en) * | 2002-04-11 | 2003-09-02 | Micron Technology, Inc. | Method of replacing at least a portion of a semiconductor substrate deposition chamber liner |
US7256375B2 (en) * | 2002-08-30 | 2007-08-14 | Asm International N.V. | Susceptor plate for high temperature heat treatment |
CN100517612C (zh) * | 2003-04-02 | 2009-07-22 | 株式会社上睦可 | 半导体晶片用热处理夹具 |
JP2005197464A (ja) * | 2004-01-07 | 2005-07-21 | Rohm Co Ltd | 半導体装置の製造方法 |
US7230274B2 (en) | 2004-03-01 | 2007-06-12 | Cree, Inc | Reduction of carrot defects in silicon carbide epitaxy |
US7173285B2 (en) | 2004-03-18 | 2007-02-06 | Cree, Inc. | Lithographic methods to reduce stacking fault nucleation sites |
US7109521B2 (en) * | 2004-03-18 | 2006-09-19 | Cree, Inc. | Silicon carbide semiconductor structures including multiple epitaxial layers having sidewalls |
US7365289B2 (en) * | 2004-05-18 | 2008-04-29 | The United States Of America As Represented By The Department Of Health And Human Services | Production of nanostructures by curie point induction heating |
WO2005113854A2 (en) * | 2004-05-18 | 2005-12-01 | Board Of Trustees Of The University Of Arkansas | Apparatus and methods of making nanostructures by inductive heating |
US7473873B2 (en) * | 2004-05-18 | 2009-01-06 | The Board Of Trustees Of The University Of Arkansas | Apparatus and methods for synthesis of large size batches of carbon nanostructures |
US9612215B2 (en) | 2004-07-22 | 2017-04-04 | Toyo Tanso Co., Ltd. | Susceptor |
US20060060145A1 (en) * | 2004-09-17 | 2006-03-23 | Van Den Berg Jannes R | Susceptor with surface roughness for high temperature substrate processing |
US20060065634A1 (en) * | 2004-09-17 | 2006-03-30 | Van Den Berg Jannes R | Low temperature susceptor cleaning |
US8052794B2 (en) * | 2005-09-12 | 2011-11-08 | The United States Of America As Represented By The Secretary Of The Navy | Directed reagents to improve material uniformity |
ITMI20052498A1 (it) * | 2005-12-28 | 2007-06-29 | Lpe Spa | Camera di reazione a temperatura differenziata |
CA2584950A1 (en) * | 2006-04-26 | 2007-10-26 | Kansai Paint Co., Ltd. | Powder primer composition and method for forming coating film |
US8823057B2 (en) | 2006-11-06 | 2014-09-02 | Cree, Inc. | Semiconductor devices including implanted regions for providing low-resistance contact to buried layers and related devices |
JP5138212B2 (ja) * | 2006-12-25 | 2013-02-06 | 東京エレクトロン株式会社 | 成膜装置 |
JP5051875B2 (ja) * | 2006-12-25 | 2012-10-17 | 東京エレクトロン株式会社 | 成膜装置および成膜方法 |
JP5202839B2 (ja) * | 2006-12-25 | 2013-06-05 | 東京エレクトロン株式会社 | 成膜装置および成膜方法 |
JP5126095B2 (ja) * | 2008-02-05 | 2013-01-23 | 東京エレクトロン株式会社 | 加熱装置及び加熱方法 |
US9328417B2 (en) * | 2008-11-01 | 2016-05-03 | Ultratech, Inc. | System and method for thin film deposition |
US8536582B2 (en) | 2008-12-01 | 2013-09-17 | Cree, Inc. | Stable power devices on low-angle off-cut silicon carbide crystals |
US8574528B2 (en) | 2009-09-04 | 2013-11-05 | University Of South Carolina | Methods of growing a silicon carbide epitaxial layer on a substrate to increase and control carrier lifetime |
CN102465335B (zh) * | 2010-11-18 | 2014-07-16 | 南京大学 | 一种用于半导体材料热壁外延生长系统的加热装置 |
CN103160810B (zh) * | 2011-12-09 | 2016-04-20 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种用于感应加热的托盘及等离子体加工设备 |
CN103422073A (zh) * | 2012-05-24 | 2013-12-04 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 用于感应加热的托盘及等离子体加工设备 |
CN103794528B (zh) * | 2012-10-30 | 2016-09-28 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 半导体加工设备 |
US10047457B2 (en) * | 2013-09-16 | 2018-08-14 | Applied Materials, Inc. | EPI pre-heat ring |
JP6097681B2 (ja) | 2013-12-24 | 2017-03-15 | 昭和電工株式会社 | SiCエピタキシャルウェハの製造装置およびSiCエピタキシャルウェハの製造方法 |
KR101431606B1 (ko) * | 2014-02-24 | 2014-08-22 | (주)앤피에스 | 기판 처리 장치 |
CN104046964B (zh) * | 2014-07-01 | 2016-05-11 | 清华大学 | 热功率密度径向分布可调的电磁感应加热装置 |
JP6444641B2 (ja) * | 2014-07-24 | 2018-12-26 | 株式会社ニューフレアテクノロジー | 成膜装置、サセプタ、及び成膜方法 |
JP2017055086A (ja) * | 2015-09-11 | 2017-03-16 | 昭和電工株式会社 | SiCエピタキシャルウェハの製造方法及びSiCエピタキシャルウェハの製造装置 |
CN108603290B (zh) * | 2015-10-01 | 2021-09-10 | 环球晶圆股份有限公司 | Cvd设备 |
US10407769B2 (en) * | 2016-03-18 | 2019-09-10 | Goodrich Corporation | Method and apparatus for decreasing the radial temperature gradient in CVI/CVD furnaces |
JP6635871B2 (ja) * | 2016-05-11 | 2020-01-29 | 東京エレクトロン株式会社 | 成膜装置 |
Family Cites Families (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US633121A (en) * | 1897-09-29 | 1899-09-19 | Arthur John Cuming | Spring-frame for bicycles. |
US3424628A (en) | 1966-01-24 | 1969-01-28 | Western Electric Co | Methods and apparatus for treating semi-conductive materials with gases |
US3868924A (en) * | 1969-06-30 | 1975-03-04 | Siemens Ag | Apparatus for indiffusing dopants into semiconductor material |
US3845738A (en) * | 1973-09-12 | 1974-11-05 | Rca Corp | Vapor deposition apparatus with pyrolytic graphite heat shield |
FR2581711B1 (fr) | 1985-05-13 | 1987-11-20 | Labo Electronique Physique | Dispositif pour la regulation, l'interruption ou la commutation de fluides |
FR2591616A1 (fr) | 1985-12-17 | 1987-06-19 | Labo Electronique Physique | Chambre de reacteur pour croissance epitaxiale en phase vapeur des materiaux semiconducteurs. |
FR2596070A1 (fr) * | 1986-03-21 | 1987-09-25 | Labo Electronique Physique | Dispositif comprenant un suscepteur plan tournant parallelement a un plan de reference autour d'un axe perpendiculaire a ce plan |
FR2599558B1 (fr) | 1986-05-27 | 1988-09-02 | Labo Electronique Physique | Procede de realisation d'un dispositif semi-conducteur, incluant le depot en phase vapeur de couches sur un substrat |
US4699805A (en) * | 1986-07-03 | 1987-10-13 | Motorola Inc. | Process and apparatus for the low pressure chemical vapor deposition of thin films |
JPS6427225A (en) * | 1987-07-22 | 1989-01-30 | Fujitsu Ltd | Vapor growth system |
US4845332A (en) * | 1987-09-16 | 1989-07-04 | National Steel Corp. | Galvanneal induction furnace temperature control system |
FR2628985B1 (fr) | 1988-03-22 | 1990-12-28 | Labo Electronique Physique | Reacteur d'epitaxie a paroi protegee contre les depots |
FR2628984B1 (fr) | 1988-03-22 | 1990-12-28 | Labo Electronique Physique | Reacteur d'epitaxie a planetaire |
FR2638020B1 (fr) | 1988-10-14 | 1990-12-28 | Labo Electronique Physique | Reacteur d'epitaxie a collecteur de gaz ameliore |
FR2648890B1 (fr) | 1989-06-27 | 1991-09-13 | Labo Electronique Physique | Dispositif de protection contre une surpression |
US5119540A (en) | 1990-07-24 | 1992-06-09 | Cree Research, Inc. | Apparatus for eliminating residual nitrogen contamination in epitaxial layers of silicon carbide and resulting product |
JPH07176482A (ja) | 1991-05-31 | 1995-07-14 | At & T Corp | エピタキシャル成長方法および装置 |
US5226383A (en) | 1992-03-12 | 1993-07-13 | Bell Communications Research, Inc. | Gas foil rotating substrate holder |
US5558721A (en) | 1993-11-15 | 1996-09-24 | The Furukawa Electric Co., Ltd. | Vapor phase growth system and a gas-drive motor |
US5468299A (en) | 1995-01-09 | 1995-11-21 | Tsai; Charles S. | Device comprising a flat susceptor rotating parallel to a reference surface about a shaft perpendicular to this surface |
SE9500326D0 (sv) | 1995-01-31 | 1995-01-31 | Abb Research Ltd | Method for protecting the susceptor during epitaxial growth by CVD and a device for epitaxial growth by CVD |
SE9502288D0 (sv) | 1995-06-26 | 1995-06-26 | Abb Research Ltd | A device and a method for epitaxially growing objects by CVD |
US6030661A (en) | 1995-08-04 | 2000-02-29 | Abb Research Ltd. | Device and a method for epitaxially growing objects by CVD |
SE9503428D0 (sv) | 1995-10-04 | 1995-10-04 | Abb Research Ltd | A method for epitaxially growing objects and a device for such a growth |
SE9503426D0 (sv) | 1995-10-04 | 1995-10-04 | Abb Research Ltd | A device for heat treatment of objects and a method for producing a susceptor |
DE19603323A1 (de) * | 1996-01-30 | 1997-08-07 | Siemens Ag | Verfahren und Vorrichtung zum Herstellen von SiC durch CVD mit verbesserter Gasausnutzung |
EP0956376B1 (de) | 1996-02-26 | 2002-01-09 | Abb Research Ltd. | Suszeptor für vorrichtung zum epitaktischem züchten von objekten und solche vorrichtung |
SE9600705D0 (sv) * | 1996-02-26 | 1996-02-26 | Abb Research Ltd | A susceptor for a device for epitaxially growing objects and such a device |
SE9600704D0 (sv) * | 1996-02-26 | 1996-02-26 | Abb Research Ltd | A susceptor for a device for epitaxially growing objects and such a device |
US5747113A (en) | 1996-07-29 | 1998-05-05 | Tsai; Charles Su-Chang | Method of chemical vapor deposition for producing layer variation by planetary susceptor rotation |
DE19642673A1 (de) | 1996-10-16 | 1998-04-23 | Widia Gmbh | Mikrowellenofen und Bauteile hierfür |
US6039812A (en) | 1996-10-21 | 2000-03-21 | Abb Research Ltd. | Device for epitaxially growing objects and method for such a growth |
US5759263A (en) | 1996-12-05 | 1998-06-02 | Abb Research Ltd. | Device and a method for epitaxially growing objects by cvd |
US5667587A (en) * | 1996-12-18 | 1997-09-16 | Northrop Gruman Corporation | Apparatus for growing silicon carbide crystals |
US5788777A (en) | 1997-03-06 | 1998-08-04 | Burk, Jr.; Albert A. | Susceptor for an epitaxial growth factor |
US6217662B1 (en) * | 1997-03-24 | 2001-04-17 | Cree, Inc. | Susceptor designs for silicon carbide thin films |
EP1019953A1 (de) * | 1997-09-30 | 2000-07-19 | Infineon Technologies AG | Verfahren zum thermischen ausheilen von durch implantation dotierten siliziumcarbid-halbleitern |
US6005226A (en) | 1997-11-24 | 1999-12-21 | Steag-Rtp Systems | Rapid thermal processing (RTP) system with gas driven rotating substrate |
DE19803423C2 (de) * | 1998-01-29 | 2001-02-08 | Siemens Ag | Substrathalterung für SiC-Epitaxie und Verfahren zum Herstellen eines Einsatzes für einen Suszeptor |
SE9801190D0 (sv) | 1998-04-06 | 1998-04-06 | Abb Research Ltd | A method and a device for epitaxial growth of objects by Chemical Vapour Deposition |
FR2786208B1 (fr) * | 1998-11-25 | 2001-02-09 | Centre Nat Rech Scient | Procede de croissance cristalline sur substrat et reacteur pour sa mise en oeuvre |
US6449428B2 (en) | 1998-12-11 | 2002-09-10 | Mattson Technology Corp. | Gas driven rotating susceptor for rapid thermal processing (RTP) system |
US6368404B1 (en) * | 1999-04-23 | 2002-04-09 | Emcore Corporation | Induction heated chemical vapor deposition reactor |
US6331212B1 (en) * | 2000-04-17 | 2001-12-18 | Avansys, Llc | Methods and apparatus for thermally processing wafers |
US6399510B1 (en) * | 2000-09-12 | 2002-06-04 | Applied Materials, Inc. | Bi-directional processing chamber and method for bi-directional processing of semiconductor substrates |
US6569250B2 (en) * | 2001-01-08 | 2003-05-27 | Cree, Inc. | Gas-driven rotation apparatus and method for forming silicon carbide layers |
-
2001
- 2001-10-30 US US10/017,492 patent/US6896738B2/en not_active Expired - Lifetime
-
2002
- 2002-10-24 JP JP2003541310A patent/JP2005508097A/ja active Pending
- 2002-10-24 KR KR1020047006333A patent/KR20050039709A/ko not_active Application Discontinuation
- 2002-10-24 CN CNA028265289A patent/CN1611095A/zh active Pending
- 2002-10-24 EP EP02784266A patent/EP1449407B1/de not_active Expired - Lifetime
- 2002-10-24 AU AU2002348053A patent/AU2002348053A1/en not_active Abandoned
- 2002-10-24 WO PCT/US2002/034090 patent/WO2003039195A2/en active Application Filing
- 2002-10-24 CA CA002464855A patent/CA2464855A1/en not_active Abandoned
- 2002-10-24 AT AT02784266T patent/ATE412331T1/de not_active IP Right Cessation
- 2002-10-24 DE DE60229549T patent/DE60229549D1/de not_active Expired - Lifetime
- 2002-10-29 TW TW091132074A patent/TWI274081B/zh not_active IP Right Cessation
-
2003
- 2003-11-14 US US10/714,214 patent/US7390367B1/en not_active Expired - Lifetime
-
2008
- 2008-05-15 US US12/121,072 patent/US9155131B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
TW200302290A (en) | 2003-08-01 |
US9155131B2 (en) | 2015-10-06 |
CN1611095A (zh) | 2005-04-27 |
US20090136686A1 (en) | 2009-05-28 |
EP1449407B1 (de) | 2008-10-22 |
JP2005508097A (ja) | 2005-03-24 |
US6896738B2 (en) | 2005-05-24 |
EP1449407A2 (de) | 2004-08-25 |
US20080127894A1 (en) | 2008-06-05 |
WO2003039195A3 (en) | 2003-12-04 |
US7390367B1 (en) | 2008-06-24 |
US20030079689A1 (en) | 2003-05-01 |
CA2464855A1 (en) | 2003-05-08 |
ATE412331T1 (de) | 2008-11-15 |
KR20050039709A (ko) | 2005-04-29 |
WO2003039195A2 (en) | 2003-05-08 |
TWI274081B (en) | 2007-02-21 |
AU2002348053A1 (en) | 2003-05-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE60229549D1 (de) | Induktionsheizgerät und verfahren zum kontrollierten erheizen von einem artikel | |
ATE440376T1 (de) | Verarbeitungssystem und verfahren zum thermischen behandeln eines substrats | |
DE60237009D1 (de) | Verfahren und vorrichtung zur temperaturregelung eines objektes | |
ATE526845T1 (de) | Haareisen und verfahren zur glättung von haaren | |
DE69808916D1 (de) | Verfahren und vorrichtung zum wärmebehandeln von metallische ringen | |
DE60329425D1 (de) | Hochfrequenzheizvorrichtung und Steuerungsverfahren für dieselbe | |
DE60130092D1 (de) | Verfahren zum Erwärmen von Plättchen | |
WO2003040513A3 (en) | In situ thermal processing of a hydrocarbon containing formation | |
DE69933432D1 (de) | Vorrichtung zum induktionsheizvorrichtung und verfahren zur regelung der thermischen verteilung | |
TW373063B (en) | Method of heat treating object and apparatus for the same | |
ATE282458T1 (de) | Vorrichtung zum oberflächlichen erwärmen von gewebe | |
EP1293577A3 (de) | Induktionswärmebehandlung unter Verwendung eines leitenden Schirmes | |
IL139313A0 (en) | Method, device and receptacle for heating pre-prepared meals | |
DE60228194D1 (de) | Verfahren und vorrichtung zum schnellen aufheizen von nmr-proben | |
DE69838398D1 (de) | Methode und vorrichtung zum behandeln mit plasma | |
NO174068C (no) | Fremgangsmåte for oppvarming av en transportrörledning, transportrörledning innrettet for oppvarming, samt fremgangsmåte for fremstilling av denne transportrörledningen | |
DE60305212D1 (de) | Vorrichtung und verfahren für die induktionserwärmung von teilen elektrisch leitender und nichtmagnetischer materialien | |
HK1071425A1 (en) | Processing of organic material | |
DE60110428D1 (de) | Verfahren und einrichtung zur wärmebehandlung von schneidwerkzeugen | |
DE50104127D1 (de) | Verfahren und vorrichtung zum thermischen behandeln von objekten | |
DE59913615D1 (de) | Verfahren und vorrichtung zum thermischen behandeln von substraten | |
DE59600430D1 (de) | Verfahren und vorrichtung zum abkühlen von heissem brikettiertem eisenschwamm | |
EP1375680A4 (de) | Verfahren zur entfernung von kesselstein für induktionsheizvorrichtung und induktionsheizvorrichtung | |
DE59900377D1 (de) | Heizeinrichtung und verfahren für eine induktive wärmebehandlung | |
DE69828414D1 (de) | Mukosale zytotoxische t-lymphozytenantwort |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |