DE60318905D1 - Optisches Element - Google Patents

Optisches Element

Info

Publication number
DE60318905D1
DE60318905D1 DE60318905T DE60318905T DE60318905D1 DE 60318905 D1 DE60318905 D1 DE 60318905D1 DE 60318905 T DE60318905 T DE 60318905T DE 60318905 T DE60318905 T DE 60318905T DE 60318905 D1 DE60318905 D1 DE 60318905D1
Authority
DE
Germany
Prior art keywords
optical element
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60318905T
Other languages
English (en)
Other versions
DE60318905T2 (de
Inventor
Tsuyoshi Kaneko
Satoshi Kito
Tetsuo Hiramatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Publication of DE60318905D1 publication Critical patent/DE60318905D1/de
Application granted granted Critical
Publication of DE60318905T2 publication Critical patent/DE60318905T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/025—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using glue
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00278—Lenticular sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00365—Production of microlenses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0037—Arrays characterized by the distribution or form of lenses
    • G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/027—Mountings, adjusting means, or light-tight connections, for optical elements for lenses the lens being in the form of a sphere or ball
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01—Embodiments of or processes related to ink-jet heads
    • B41J2202/09—Ink jet technology used for manufacturing optical filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0075—Arrays characterized by non-optical structures, e.g. having integrated holding or alignment means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Ophthalmology & Optometry (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)
DE60318905T 2002-09-25 2003-09-04 Optisches Element Expired - Lifetime DE60318905T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002279064 2002-09-25
JP2002279064A JP3719431B2 (ja) 2002-09-25 2002-09-25 光学部品およびその製造方法、表示装置および撮像素子

Publications (2)

Publication Number Publication Date
DE60318905D1 true DE60318905D1 (de) 2008-03-13
DE60318905T2 DE60318905T2 (de) 2009-01-29

Family

ID=32040444

Family Applications (2)

Application Number Title Priority Date Filing Date
DE60318905T Expired - Lifetime DE60318905T2 (de) 2002-09-25 2003-09-04 Optisches Element
DE60302526T Expired - Lifetime DE60302526T2 (de) 2002-09-25 2003-09-04 Herstellungsverfahren für ein optisches Element

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE60302526T Expired - Lifetime DE60302526T2 (de) 2002-09-25 2003-09-04 Herstellungsverfahren für ein optisches Element

Country Status (6)

Country Link
US (1) US7179728B2 (de)
EP (2) EP1582892B1 (de)
JP (1) JP3719431B2 (de)
KR (1) KR100739085B1 (de)
CN (1) CN1490635A (de)
DE (2) DE60318905T2 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4088779B2 (ja) 2003-04-25 2008-05-21 セイコーエプソン株式会社 光ファイバ間の結合構造および結合方法
JP3800199B2 (ja) * 2003-05-16 2006-07-26 セイコーエプソン株式会社 マイクロレンズの製造方法
JP4155099B2 (ja) * 2003-05-16 2008-09-24 セイコーエプソン株式会社 マイクロレンズの製造方法
JP4120813B2 (ja) 2003-06-12 2008-07-16 セイコーエプソン株式会社 光学部品およびその製造方法
JP3719441B2 (ja) 2003-08-01 2005-11-24 セイコーエプソン株式会社 光素子およびその製造方法、光モジュール、光伝達装置
JP4241259B2 (ja) * 2003-08-06 2009-03-18 セイコーエプソン株式会社 マイクロレンズの製造方法
KR100589225B1 (ko) 2004-05-31 2006-06-19 엘지전자 주식회사 향상된 시야각을 갖는 마이크로렌즈 배열 시트
DE102004030418A1 (de) * 2004-06-24 2006-01-19 Robert Bosch Gmbh Mikrostrukturierter Infrarot-Sensor und ein Verfahren zu seiner Herstellung
JP2006030634A (ja) * 2004-07-16 2006-02-02 Seiko Epson Corp マイクロレンズの製造方法
KR100636349B1 (ko) 2004-09-24 2006-10-19 엘지전자 주식회사 마이크로렌즈 배열 시트 및 그 제작방법
JP2006323147A (ja) * 2005-05-19 2006-11-30 Seiko Epson Corp マイクロレンズの製造方法、マイクロレンズ、及び光学膜、プロジェクション用スクリーン、プロジェクターシステム、電気光学装置、電子機器
JP2006350177A (ja) * 2005-06-20 2006-12-28 Seiko Epson Corp 光学シートの製造方法、光学シート、面状照明装置、電気光学装置
JP2007010707A (ja) * 2005-06-28 2007-01-18 Seiko Epson Corp 光学シートの製造方法、光学シート、バックライトユニット、表示装置、電子機器
JP2007036140A (ja) * 2005-07-29 2007-02-08 Seiko Epson Corp 光素子およびその製造方法
JP2007080884A (ja) * 2005-09-09 2007-03-29 Asahi Glass Co Ltd 発光装置の製造方法、発光装置および発光装置の中間部品
KR100774218B1 (ko) * 2006-09-28 2007-11-08 엘지전자 주식회사 렌즈, 그 제조방법 및 발광 소자 패키지
US8115920B2 (en) * 2007-11-14 2012-02-14 3M Innovative Properties Company Method of making microarrays
JP2010223975A (ja) * 2009-03-19 2010-10-07 Dhs:Kk レンズアレイの製造方法及びレンズアレイ
JP2011076800A (ja) * 2009-09-29 2011-04-14 Fujifilm Corp 有機ｅｌ素子及びその製造方法
SG194130A1 (en) * 2011-04-12 2013-11-29 Pixeloptics Inc Adhesive dispensing profile enhancement
JP2013037164A (ja) * 2011-08-08 2013-02-21 Sony Corp 拡散シート、バックライト、液晶表示装置および拡散シートの製造方法
TW201316383A (zh) * 2011-10-12 2013-04-16 Univ Nat Taiwan 於非soi基板上製作矽波導之方法
US8828484B2 (en) * 2013-01-28 2014-09-09 Taiwan Semiconductor Manufacturing Co., Ltd. Self-alignment due to wettability difference of an interface
US20160327747A1 (en) * 2013-11-08 2016-11-10 Empire Technology Development Llc Printed ball lens and methods for their fabrication
CN105116612B (zh) * 2015-09-22 2018-05-18 京东方科技集团股份有限公司 光学膜片、背光模组及显示装置
US9804367B2 (en) * 2015-11-04 2017-10-31 Omnivision Technologies, Inc. Wafer-level hybrid compound lens and method for fabricating same
CN106526722B (zh) * 2016-11-09 2018-04-24 中南大学 一种控制微型液滴形状的方法
KR102095003B1 (ko) 2017-01-03 2020-03-30 주식회사 엘지화학 수지 입자의 제조 방법
DE102017003721A1 (de) * 2017-03-01 2018-09-06 Docter Optics Se Verfahren zum Herstellen eines Mikroprojektors für ein Projektionsdisplay
KR102167540B1 (ko) * 2018-05-21 2020-10-20 (주)유니젯 다층기판의 제조방법

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Publication number Priority date Publication date Assignee Title
US4689291A (en) 1985-08-30 1987-08-25 Xerox Corporation Pedestal-type microlens fabrication process
JPS6283337A (ja) 1985-10-04 1987-04-16 Hoya Corp マイクロレンズアレ−の製造方法
JPH02165932A (ja) 1988-12-20 1990-06-26 Seiko Epson Corp マイクロレンズアレイの製造方法
US5229016A (en) 1991-08-08 1993-07-20 Microfab Technologies, Inc. Method and apparatus for dispensing spherical-shaped quantities of liquid solder
JP3198003B2 (ja) 1993-12-24 2001-08-13 学校法人桐蔭学園 耐光性フィブロイン−天然色素複合体
US5498444A (en) 1994-02-28 1996-03-12 Microfab Technologies, Inc. Method for producing micro-optical components
JPH0882759A (ja) 1994-09-09 1996-03-26 Canon Inc 走査光学装置
JP3241251B2 (ja) * 1994-12-16 2001-12-25 キヤノン株式会社 電子放出素子の製造方法及び電子源基板の製造方法
US5846694A (en) 1996-02-13 1998-12-08 The Regents Of The University Of California Microminiature optical waveguide structure and method for fabrication
JP3764199B2 (ja) 1996-03-05 2006-04-05 株式会社リコー 光源装置
GB9611582D0 (en) * 1996-06-04 1996-08-07 Thin Film Technology Consultan 3D printing and forming of structures
CN100485904C (zh) 1996-09-19 2009-05-06 精工爱普生株式会社 矩阵式显示元件及其制造方法
DE19712297A1 (de) 1997-03-24 1998-10-01 Bosch Gmbh Robert Verfahren zur Herstellung von lichtführenden Strukturen
EP1376229B1 (de) 1997-08-08 2010-10-13 Dai Nippon Printing Co., Ltd. Lithographieplatte und Verfahren zu derer Herstellung
JP3920461B2 (ja) 1998-06-15 2007-05-30 大日本印刷株式会社 レンズおよびその製造方法
ATE434259T1 (de) * 1997-10-14 2009-07-15 Patterning Technologies Ltd Methode zur herstellung eines elektrischen kondensators
JP4217294B2 (ja) 1998-04-28 2009-01-28 Ｈｏｙａ株式会社 光学素子の接着装置
US6074888A (en) 1998-08-18 2000-06-13 Trw Inc. Method for fabricating semiconductor micro epi-optical components
JP2000108216A (ja) 1998-10-02 2000-04-18 Canon Inc マイクロレンズアレイの製造方法
JP4275233B2 (ja) 1999-01-06 2009-06-10 大日本印刷株式会社 光学素子およびその製造方法
JP2000280367A (ja) 1999-03-30 2000-10-10 Seiko Epson Corp マイクロレンズの製造装置及び製造方法
JP2001208958A (ja) 2000-01-26 2001-08-03 Fuji Photo Film Co Ltd 光学装置
US20010048968A1 (en) 2000-02-16 2001-12-06 Cox W. Royall Ink-jet printing of gradient-index microlenses
US6625351B2 (en) 2000-02-17 2003-09-23 Microfab Technologies, Inc. Ink-jet printing of collimating microlenses onto optical fibers
TW463058B (en) 2000-10-20 2001-11-11 Ind Tech Res Inst Method for fabricating microlens in batch and product manufactured the same
JP3899879B2 (ja) 2000-11-21 2007-03-28 セイコーエプソン株式会社 カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、インクジェットヘッドの制御装置、材料の吐出方法及び材料の吐出装置、並びに電子機器
JP3491155B2 (ja) 2000-11-21 2004-01-26 セイコーエプソン株式会社 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置
JP2002169004A (ja) 2000-11-29 2002-06-14 Ind Technol Res Inst バッチ生産マイクロレンズアレイ及びその製造方法
JP2002202426A (ja) 2000-12-28 2002-07-19 Matsushita Electric Ind Co Ltd 光導波路の製造方法
CN1193249C (zh) 2001-02-12 2005-03-16 财团法人工业技术研究院 整体化微球透镜的光纤对准元件
GB2373095A (en) * 2001-03-09 2002-09-11 Seiko Epson Corp Patterning substrates with evaporation residues
JP3998921B2 (ja) 2001-05-11 2007-10-31 日本電信電話株式会社 マイクロレンズ形成方法
JP4141674B2 (ja) 2001-10-22 2008-08-27 セイコーエプソン株式会社 液滴吐出ヘッド、その拭取り方法およびこれを備えた電子機器
JP4161590B2 (ja) 2002-02-22 2008-10-08 セイコーエプソン株式会社 マイクロレンズの製造方法、マイクロレンズ、光学膜、プロジェクション用スクリーン、及びプロジェクターシステム

Also Published As

Publication number Publication date
EP1582892B1 (de) 2008-01-23
US7179728B2 (en) 2007-02-20
JP2004117660A (ja) 2004-04-15
CN1490635A (zh) 2004-04-21
DE60302526D1 (de) 2006-01-05
JP3719431B2 (ja) 2005-11-24
KR20040027369A (ko) 2004-04-01
DE60318905T2 (de) 2009-01-29
DE60302526T2 (de) 2006-08-10
KR100739085B1 (ko) 2007-07-13
EP1411376A1 (de) 2004-04-21
EP1582892A1 (de) 2005-10-05
US20040106223A1 (en) 2004-06-03
EP1411376B1 (de) 2005-11-30

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Legal Events

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