DE60331221D1 - Integrierter Leistungs-Schaltkreis mit verteiltem Gattertreiber - Google Patents

Integrierter Leistungs-Schaltkreis mit verteiltem Gattertreiber

Info

Publication number
DE60331221D1
DE60331221D1 DE60331221T DE60331221T DE60331221D1 DE 60331221 D1 DE60331221 D1 DE 60331221D1 DE 60331221 T DE60331221 T DE 60331221T DE 60331221 T DE60331221 T DE 60331221T DE 60331221 D1 DE60331221 D1 DE 60331221D1
Authority
DE
Germany
Prior art keywords
gate driver
power circuit
integrated power
distributed gate
segments
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60331221T
Other languages
English (en)
Inventor
Donald Ray Disney
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Power Integrations Inc
Original Assignee
Power Integrations Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Power Integrations Inc filed Critical Power Integrations Inc
Application granted granted Critical
Publication of DE60331221D1 publication Critical patent/DE60331221D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body
    • H01L23/4824—Pads with extended contours, e.g. grid structure, branch structure, finger structure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02M—APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC, OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWER SUPPLY SYSTEMS; CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUT POWER; CONTROL OR REGULATION THEREOF
    • H02M1/00—Details of apparatus for conversion
    • H02M1/08—Circuits specially adapted for the generation of control voltages for semiconductor devices incorporated in static converters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/13—Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304—Transistor
    • H01L2924/1306—Field-effect transistor [FET]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/13—Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304—Transistor
    • H01L2924/1306—Field-effect transistor [FET]
    • H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/14—Integrated circuits
DE60331221T 2002-04-22 2003-04-22 Integrierter Leistungs-Schaltkreis mit verteiltem Gattertreiber Expired - Lifetime DE60331221D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/127,989 US6583663B1 (en) 2002-04-22 2002-04-22 Power integrated circuit with distributed gate driver

Publications (1)

Publication Number Publication Date
DE60331221D1 true DE60331221D1 (de) 2010-03-25

Family

ID=22433025

Family Applications (2)

Application Number Title Priority Date Filing Date
DE60331276T Expired - Lifetime DE60331276D1 (de) 2002-04-22 2003-04-22 Integrierter Leistungs-Schaltkreis mit verteiltem Gattertreiber
DE60331221T Expired - Lifetime DE60331221D1 (de) 2002-04-22 2003-04-22 Integrierter Leistungs-Schaltkreis mit verteiltem Gattertreiber

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE60331276T Expired - Lifetime DE60331276D1 (de) 2002-04-22 2003-04-22 Integrierter Leistungs-Schaltkreis mit verteiltem Gattertreiber

Country Status (5)

Country Link
US (2) US6583663B1 (de)
EP (2) EP1357601B1 (de)
JP (3) JP2004007606A (de)
AT (2) ATE458277T1 (de)
DE (2) DE60331276D1 (de)

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WO2002009060A2 (en) 2000-07-26 2002-01-31 Livewave, Inc. Methods and systems for networked camera control
US6635544B2 (en) 2001-09-07 2003-10-21 Power Intergrations, Inc. Method of fabricating a high-voltage transistor with a multi-layered extended drain structure
US7786533B2 (en) * 2001-09-07 2010-08-31 Power Integrations, Inc. High-voltage vertical transistor with edge termination structure
US6573558B2 (en) * 2001-09-07 2003-06-03 Power Integrations, Inc. High-voltage vertical transistor with a multi-layered extended drain structure
US8093621B2 (en) 2008-12-23 2012-01-10 Power Integrations, Inc. VTS insulated gate bipolar transistor
US8653583B2 (en) 2007-02-16 2014-02-18 Power Integrations, Inc. Sensing FET integrated with a high-voltage transistor
US7557406B2 (en) * 2007-02-16 2009-07-07 Power Integrations, Inc. Segmented pillar layout for a high-voltage vertical transistor
US7859037B2 (en) * 2007-02-16 2010-12-28 Power Integrations, Inc. Checkerboarded high-voltage vertical transistor layout
JP5196222B2 (ja) * 2007-05-28 2013-05-15 富士電機株式会社 ゲート耐圧試験装置及び方法
US7875962B2 (en) * 2007-10-15 2011-01-25 Power Integrations, Inc. Package for a power semiconductor device
US7924065B2 (en) * 2008-07-17 2011-04-12 Continental Automotive Gmbh Control circuit for a power field-effect transistor and method for configuring a control circuit for a power field-effect transistor
US7964912B2 (en) 2008-09-18 2011-06-21 Power Integrations, Inc. High-voltage vertical transistor with a varied width silicon pillar
US7871882B2 (en) 2008-12-20 2011-01-18 Power Integrations, Inc. Method of fabricating a deep trench insulated gate bipolar transistor
US20100155831A1 (en) * 2008-12-20 2010-06-24 Power Integrations, Inc. Deep trench insulated gate bipolar transistor
EP2256852A1 (de) * 2009-05-27 2010-12-01 Belenos Clean Power Holding AG System um Zellen einer Brennstoffzelle kurzzuschliessen
US8207455B2 (en) * 2009-07-31 2012-06-26 Power Integrations, Inc. Power semiconductor package with bottom surface protrusions
US8115457B2 (en) * 2009-07-31 2012-02-14 Power Integrations, Inc. Method and apparatus for implementing a power converter input terminal voltage discharge circuit
US8207577B2 (en) * 2009-09-29 2012-06-26 Power Integrations, Inc. High-voltage transistor structure with reduced gate capacitance
US7893754B1 (en) 2009-10-02 2011-02-22 Power Integrations, Inc. Temperature independent reference circuit
US8634218B2 (en) 2009-10-06 2014-01-21 Power Integrations, Inc. Monolithic AC/DC converter for generating DC supply voltage
US8310845B2 (en) * 2010-02-10 2012-11-13 Power Integrations, Inc. Power supply circuit with a control terminal for different functional modes of operation
US8653600B2 (en) 2012-06-01 2014-02-18 Power Integrations, Inc. High-voltage monolithic schottky device structure
US9553081B2 (en) * 2012-11-30 2017-01-24 Enpirion, Inc. Semiconductor device including a redistribution layer and metallic pillars coupled thereto
US9978862B2 (en) * 2013-04-30 2018-05-22 Infineon Technologies Austria Ag Power transistor with at least partially integrated driver stage
US9799643B2 (en) 2013-05-23 2017-10-24 Infineon Technologies Austria Ag Gate voltage control for III-nitride transistors
US9455621B2 (en) 2013-08-28 2016-09-27 Power Integrations, Inc. Controller IC with zero-crossing detector and capacitor discharge switching element
US9543396B2 (en) 2013-12-13 2017-01-10 Power Integrations, Inc. Vertical transistor device structure with cylindrically-shaped regions
US10325988B2 (en) 2013-12-13 2019-06-18 Power Integrations, Inc. Vertical transistor device structure with cylindrically-shaped field plates
US9530765B1 (en) 2015-04-30 2016-12-27 Silanna Asia Pte Ltd Distributing capacitance with gate driver for power switch
US9667154B2 (en) 2015-09-18 2017-05-30 Power Integrations, Inc. Demand-controlled, low standby power linear shunt regulator
US9973183B2 (en) * 2015-09-28 2018-05-15 Power Integrations, Inc. Field-effect transistor device with partial finger current sensing FETs
US20170093282A1 (en) * 2015-09-30 2017-03-30 The Silanna Group Pty Ltd. Power Converter with Low Threshold Voltage Transistor
US9602009B1 (en) 2015-12-08 2017-03-21 Power Integrations, Inc. Low voltage, closed loop controlled energy storage circuit
US9629218B1 (en) 2015-12-28 2017-04-18 Power Integrations, Inc. Thermal protection for LED bleeder in fault condition
US11898987B2 (en) * 2020-09-10 2024-02-13 Raytheon Company SAW-based hydrogel testing for detecting viruses or other antigens
US11437911B2 (en) 2020-12-22 2022-09-06 Power Integrations, Inc. Variable drive strength in response to a power converter operating condition

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JP3071915B2 (ja) * 1991-12-20 2000-07-31 株式会社東芝 出力回路
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JP3173268B2 (ja) * 1994-01-06 2001-06-04 富士電機株式会社 Ｍｉｓ電界効果トランジスタを備えた半導体装置
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JPH08321604A (ja) * 1995-05-25 1996-12-03 Toshiba Corp 半導体装置の製造方法
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JP3698828B2 (ja) * 1996-08-29 2005-09-21 富士通株式会社 信号伝送システム、半導体装置モジュール、入力バッファ回路、及び半導体装置
JP3269475B2 (ja) * 1998-02-16 2002-03-25 日本電気株式会社 半導体装置
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JP2000332191A (ja) * 1999-05-17 2000-11-30 Toshiba Corp ハイブリッド型半導体装置
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JP3647728B2 (ja) * 2000-08-01 2005-05-18 松下電器産業株式会社 スイッチング電源装置及びスイッチング電源用半導体装置
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Also Published As

Publication number Publication date
EP1513197A3 (de) 2007-08-29
EP1513197A2 (de) 2005-03-09
DE60331276D1 (de) 2010-04-01
ATE458277T1 (de) 2010-03-15
EP1357601A2 (de) 2003-10-29
JP2004260224A (ja) 2004-09-16
US20030206047A1 (en) 2003-11-06
US6583663B1 (en) 2003-06-24
JP2004007606A (ja) 2004-01-08
EP1357601B1 (de) 2010-02-17
ATE457527T1 (de) 2010-02-15
US6680646B2 (en) 2004-01-20
EP1513197B1 (de) 2010-02-10
JP2008277842A (ja) 2008-11-13
EP1357601A3 (de) 2007-08-29
JP4917571B2 (ja) 2012-04-18

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Legal Events

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8364 No opposition during term of opposition