DE68909438T2 - Katalysator für stromlose Plattierung. - Google Patents
Katalysator für stromlose Plattierung.Info
- Publication number
- DE68909438T2 DE68909438T2 DE89300598T DE68909438T DE68909438T2 DE 68909438 T2 DE68909438 T2 DE 68909438T2 DE 89300598 T DE89300598 T DE 89300598T DE 68909438 T DE68909438 T DE 68909438T DE 68909438 T2 DE68909438 T2 DE 68909438T2
- Authority
- DE
- Germany
- Prior art keywords
- electroless plating
- plating catalyst
- catalyst
- electroless
- plating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
- C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/422—Plated through-holes or plated via connections characterised by electroless plating method; pretreatment therefor
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63018132A JPH01195281A (ja) | 1988-01-28 | 1988-01-28 | 無電解めつき用触媒 |
JP63110862A JP2513270B2 (ja) | 1988-05-06 | 1988-05-06 | 無電解めっき用触媒溶液 |
SG156694A SG156694G (en) | 1988-01-28 | 1994-10-24 | Catalyst for electroless plating |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68909438D1 DE68909438D1 (de) | 1993-11-04 |
DE68909438T2 true DE68909438T2 (de) | 1994-02-10 |
Family
ID=27282095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE89300598T Expired - Fee Related DE68909438T2 (de) | 1988-01-28 | 1989-01-23 | Katalysator für stromlose Plattierung. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4986848A (de) |
EP (1) | EP0328263B1 (de) |
DE (1) | DE68909438T2 (de) |
SG (1) | SG156694G (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5405656A (en) * | 1990-04-02 | 1995-04-11 | Nippondenso Co., Ltd. | Solution for catalytic treatment, method of applying catalyst to substrate and method of forming electrical conductor |
US5380560A (en) * | 1992-07-28 | 1995-01-10 | International Business Machines Corporation | Palladium sulfate solution for the selective seeding of the metal interconnections on polyimide dielectrics for electroless metal deposition |
DE69308715T2 (de) * | 1992-10-15 | 1997-06-19 | Tamglass Eng Oy | Verfahren und Ofen zum Biegen von Glastafeln |
EP0817557A3 (de) * | 1996-07-03 | 1998-05-06 | Nisshinbo Industries, Inc. | Material zur Abschirmung gegen die elektromagnetische Ausstrahlung und dessen Herstellungsverfahren |
US6174647B1 (en) * | 1998-01-26 | 2001-01-16 | Shipley Company, L.L.C. | Metallization process and component |
US7045461B2 (en) * | 2000-01-07 | 2006-05-16 | Nikkon Materials Co., Ltd. | Metal plating method, pretreatment agent, and semiconductor wafer and semiconductor device obtained using these |
WO2001049898A1 (fr) * | 2000-01-07 | 2001-07-12 | Nikko Materials Co., Ltd. | Procede de galvanoplastie, agent de pretraitement et tranche de semi-conducteurs et dispositif semi-conducteur utilisant cette derniere |
US6780467B2 (en) | 2000-04-25 | 2004-08-24 | Nikko Materials Co., Ltd. | Plating pretreatment agent and metal plating method using the same |
WO2002092877A2 (en) * | 2001-05-11 | 2002-11-21 | Ebara Corporation | Catalyst-imparting treatment solution and electroless plating method |
KR100568389B1 (ko) * | 2001-06-28 | 2006-04-05 | 가부시키 가이샤 닛코 마테리알즈 | 표면처리제, 그것을 사용한 표면처리물 및 무전해니켈도금방법 |
EP1694479A2 (de) * | 2003-11-29 | 2006-08-30 | Cross Match Technologies, Inc. | Polymerkeramikschlicker und verfahren zur herstellung von keramikrohlingen daraus |
US7665908B2 (en) * | 2006-12-15 | 2010-02-23 | Finisar Corporation | Integrating optoelectronic components into a molded communications module having integrated plastic circuit structures |
JP5041214B2 (ja) | 2007-06-15 | 2012-10-03 | ソニー株式会社 | 金属薄膜の形成方法および電子デバイスの製造方法 |
CN101838802B (zh) * | 2009-03-20 | 2012-06-06 | 比亚迪股份有限公司 | 一种用于化学镀的活化液及非金属表面活化方法 |
WO2011118439A1 (ja) * | 2010-03-23 | 2011-09-29 | Jx日鉱日石金属株式会社 | 無電解めっき前処理剤、それを用いる無電解めっき方法及び無電解めっき物 |
US8591636B2 (en) * | 2010-12-14 | 2013-11-26 | Rohm And Haas Electronics Materials Llc | Plating catalyst and method |
US8895441B2 (en) * | 2012-02-24 | 2014-11-25 | Lam Research Corporation | Methods and materials for anchoring gapfill metals |
JP6272673B2 (ja) * | 2013-10-30 | 2018-01-31 | ローム・アンド・ハース電子材料株式会社 | 無電解めっき用触媒液 |
JP7228468B2 (ja) | 2019-05-28 | 2023-02-24 | 上村工業株式会社 | プリント配線基板の製造方法 |
CN111763930B (zh) * | 2020-07-14 | 2022-04-19 | 赤壁市聚茂新材料科技有限公司 | 一种非钯活化镀铜工艺及其敏化剂、活化剂 |
JP2022030643A (ja) * | 2020-08-07 | 2022-02-18 | イビデン株式会社 | プリント配線板の製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2116389C3 (de) * | 1971-03-30 | 1980-04-03 | Schering Ag, 1000 Berlin Und 4619 Bergkamen | Lösung zur Aktivierung von Oberflächen für die Metallisierung |
US3962494A (en) * | 1971-07-29 | 1976-06-08 | Photocircuits Division Of Kollmorgan Corporation | Sensitized substrates for chemical metallization |
US3960573A (en) * | 1972-08-07 | 1976-06-01 | Photocircuits Division Of Kollmorgan Corporation | Novel precious metal sensitizing solutions |
US3978252A (en) * | 1973-03-23 | 1976-08-31 | Macdermid Incorporated | Method of improving the adhesion between a molded resin substrate and a metal film deposited thereon |
US3962496A (en) * | 1974-11-07 | 1976-06-08 | Photocircuits Division Of Kollmorgen | Composition and method for neutralizing and sensitizing resinous surfaces and improved sensitized resinous surfaces for adherent metallization |
US3962497A (en) * | 1975-03-11 | 1976-06-08 | Oxy Metal Industries Corporation | Method for treating polymeric substrates prior to plating |
US4301196A (en) * | 1978-09-13 | 1981-11-17 | Kollmorgen Technologies Corp. | Electroless copper deposition process having faster plating rates |
JPS6024380A (ja) * | 1983-07-20 | 1985-02-07 | Hitachi Ltd | パラジウム活性化液 |
-
1989
- 1989-01-19 US US07/298,967 patent/US4986848A/en not_active Expired - Fee Related
- 1989-01-23 DE DE89300598T patent/DE68909438T2/de not_active Expired - Fee Related
- 1989-01-23 EP EP89300598A patent/EP0328263B1/de not_active Expired - Lifetime
-
1994
- 1994-10-24 SG SG156694A patent/SG156694G/en unknown
Also Published As
Publication number | Publication date |
---|---|
SG156694G (en) | 1995-03-17 |
US4986848A (en) | 1991-01-22 |
DE68909438D1 (de) | 1993-11-04 |
EP0328263A3 (en) | 1990-05-02 |
EP0328263A2 (de) | 1989-08-16 |
EP0328263B1 (de) | 1993-09-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |