DE68910387T2 - Verfahren und Vorrichtung zur Beschichtung feiner Pulver. - Google Patents

Verfahren und Vorrichtung zur Beschichtung feiner Pulver.

Info

Publication number
DE68910387T2
DE68910387T2 DE68910387T DE68910387T DE68910387T2 DE 68910387 T2 DE68910387 T2 DE 68910387T2 DE 68910387 T DE68910387 T DE 68910387T DE 68910387 T DE68910387 T DE 68910387T DE 68910387 T2 DE68910387 T2 DE 68910387T2
Authority
DE
Germany
Prior art keywords
fine powders
coating fine
coating
powders
fine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68910387T
Other languages
English (en)
Other versions
DE68910387D1 (de
Inventor
Eiki Takeshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Nisshin Co Ltd
Original Assignee
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nisshin Steel Co Ltd filed Critical Nisshin Steel Co Ltd
Application granted granted Critical
Publication of DE68910387D1 publication Critical patent/DE68910387D1/de
Publication of DE68910387T2 publication Critical patent/DE68910387T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/223—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating specially adapted for coating particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/10—Metallic powder containing lubricating or binding agents; Metallic powder containing organic material
    • B22F1/102—Metallic powder coated with organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/16—Metallic particles coated with a non-metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/17—Metallic particles coated with metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
    • B22F1/18—Non-metallic particles coated with metal
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
    • C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
    • C04B41/4584—Coating or impregnating of particulate or fibrous ceramic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
DE68910387T 1988-06-09 1989-06-08 Verfahren und Vorrichtung zur Beschichtung feiner Pulver. Expired - Fee Related DE68910387T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP14063688 1988-06-09
JP1074770A JP2909744B2 (ja) 1988-06-09 1989-03-27 微粉末を被覆する方法と装置

Publications (2)

Publication Number Publication Date
DE68910387D1 DE68910387D1 (de) 1993-12-09
DE68910387T2 true DE68910387T2 (de) 1994-06-01

Family

ID=26415957

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68910387T Expired - Fee Related DE68910387T2 (de) 1988-06-09 1989-06-08 Verfahren und Vorrichtung zur Beschichtung feiner Pulver.

Country Status (4)

Country Link
US (1) US4940523A (de)
EP (1) EP0345795B1 (de)
JP (1) JP2909744B2 (de)
DE (1) DE68910387T2 (de)

Families Citing this family (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW237562B (de) 1990-11-09 1995-01-01 Semiconductor Energy Res Co Ltd
US6979840B1 (en) 1991-09-25 2005-12-27 Semiconductor Energy Laboratory Co., Ltd. Thin film transistors having anodized metal film between the gate wiring and drain wiring
GB9302387D0 (en) * 1993-02-06 1993-03-24 Osprey Metals Ltd Production of powder
JP3545783B2 (ja) * 1993-08-12 2004-07-21 株式会社日清製粉グループ本社 被覆粒子の製造方法
US6024909A (en) * 1993-08-12 2000-02-15 Agency Of Industrial Science & Technology Coated ceramic particles, a ceramic-base sinter and a process for producing the same
US6024915A (en) * 1993-08-12 2000-02-15 Agency Of Industrial Science & Technology Coated metal particles, a metal-base sinter and a process for producing same
GB2282824A (en) * 1993-10-14 1995-04-19 Secr Defence Reinforcement particles pre-coated with metal matrix; particle-reinforced metal matrix composites
US5501875A (en) * 1994-12-27 1996-03-26 Dow Corning Corporation Metal coated silica precursor powders
AU6350896A (en) * 1995-07-17 1997-02-18 Westaim Technologies Inc. Composite powders
US6423419B1 (en) 1995-07-19 2002-07-23 Teer Coatings Limited Molybdenum-sulphur coatings
JPH09188830A (ja) * 1996-01-05 1997-07-22 Nisshin Steel Co Ltd 高光輝性メタリック顔料
US6355146B1 (en) * 1996-04-03 2002-03-12 The Regents Of The University Of California Sputtering process and apparatus for coating powders
US6042892A (en) * 1996-10-25 2000-03-28 Pohang Iron & Steel Co., Ltd. Apparatus for coating zinc on steel sheet, and method therefor
JP3351981B2 (ja) * 1997-03-19 2002-12-03 日新製鋼株式会社 耐候性の優れた高光輝性メタリック顔料
US20040052984A1 (en) 1997-05-13 2004-03-18 Toth Richard E. Apparatus and method of treating fine powders
JP4945814B2 (ja) * 1997-05-13 2012-06-06 アロメット コーポレイション タフコートされた硬い粉末およびその焼結製品
JP3512590B2 (ja) * 1997-05-19 2004-03-29 日新製鋼株式会社 耐候性の優れたメタリック顔料
JP3512592B2 (ja) * 1997-06-03 2004-03-29 日新製鋼株式会社 耐候性の優れたメタリック塗料
US6007685A (en) * 1997-06-19 1999-12-28 Lucent Technologies Inc. Deposition of highly doped silicon dioxide films
US6071357A (en) * 1997-09-26 2000-06-06 Guruswamy; Sivaraman Magnetostrictive composites and process for manufacture by dynamic compaction
AU6472798A (en) * 1998-03-19 1999-10-11 University Of Florida Process for depositing atomic to nanometer particle coatings on host particles
US6395149B1 (en) * 1998-06-30 2002-05-28 3M Innovative Properties Company Method of making light colored, electrically conductive coated particles
US6406745B1 (en) * 1999-06-07 2002-06-18 Nanosphere, Inc. Methods for coating particles and particles produced thereby
US6524381B1 (en) 2000-03-31 2003-02-25 Flex Products, Inc. Methods for producing enhanced interference pigments
US6241858B1 (en) * 1999-09-03 2001-06-05 Flex Products, Inc. Methods and apparatus for producing enhanced interference pigments
GB0007731D0 (en) * 2000-03-31 2000-05-17 Altro Ltd Coloured silicon carbide
US6586098B1 (en) 2000-07-27 2003-07-01 Flex Products, Inc. Composite reflective flake based pigments comprising reflector layers on bothside of a support layer
US6686042B1 (en) 2000-09-22 2004-02-03 Flex Products, Inc. Optically variable pigments and foils with enhanced color shifting properties
US6569529B1 (en) 2000-10-10 2003-05-27 Flex Product, Inc. Titanium-containing interference pigments and foils with color shifting properties
US20030181337A1 (en) * 2001-06-25 2003-09-25 Holcomb Matthew J. Layer deposition on superconductor particles by sputtering or evaporation
JP5183002B2 (ja) * 2001-08-03 2013-04-17 東洋アルミニウム株式会社 メタリック顔料組成物、塗料組成物、インキ組成物、樹脂組成物、ゴム組成物およびメタリック顔料組成物の製造方法
JP2003107778A (ja) 2001-09-27 2003-04-09 Fujitsu Ltd カラートナー及びこれを用いる画像形成装置
US20030148027A1 (en) * 2002-02-05 2003-08-07 Holcomb Matthew J. Method and apparatus for forming coated units
US20040101454A1 (en) * 2002-09-05 2004-05-27 Johnson D. Lynn Supported metallic catalyst and method of making same
JP3620842B2 (ja) * 2002-12-25 2005-02-16 孝之 阿部 多角バレルスパッタ装置、多角バレルスパッタ方法及びそれにより形成された被覆微粒子、被覆微粒子の製造方法
WO2004075624A2 (en) * 2003-02-24 2004-09-10 Gnxpert Color, Inc. System and methods for achieving signaling
JP2005264297A (ja) * 2004-03-22 2005-09-29 Takayuki Abe 微粒子
JP4052517B2 (ja) * 2004-06-25 2008-02-27 孝之 阿部 担持微粒子の製造方法
GB2418208B (en) * 2004-09-18 2007-06-06 Rolls Royce Plc Component coating
US20060172065A1 (en) * 2005-02-01 2006-08-03 Carlotto John A Vacuum deposition of coating materials on powders
US8062552B2 (en) * 2005-05-19 2011-11-22 Brookhaven Science Associates, Llc Electrocatalyst for oxygen reduction with reduced platinum oxidation and dissolution rates
KR20070044879A (ko) * 2005-10-26 2007-05-02 주식회사 피앤아이 금속, 합금 및 세라믹 나노 입자가 균일하게 진공 증착된파우더의 형성 방법 및 그 제조 장치
US7682577B2 (en) 2005-11-07 2010-03-23 Geo2 Technologies, Inc. Catalytic exhaust device for simplified installation or replacement
US7682578B2 (en) 2005-11-07 2010-03-23 Geo2 Technologies, Inc. Device for catalytically reducing exhaust
AU2006249295A1 (en) 2005-12-15 2007-07-05 Jds Uniphase Corporation Security device with metameric features using diffractive pigment flakes
US7722828B2 (en) 2005-12-30 2010-05-25 Geo2 Technologies, Inc. Catalytic fibrous exhaust system and method for catalyzing an exhaust gas
WO2007095376A2 (en) * 2006-02-15 2007-08-23 Kennametal Inc. Method and apparatus for coating particulates utilizing physical vapor deposition
US7563415B2 (en) * 2006-03-03 2009-07-21 Geo2 Technologies, Inc Catalytic exhaust filter device
US8173562B2 (en) 2006-05-23 2012-05-08 Ivoclar Vivadent Ag Shaded zirconia ceramics
EP2359771B1 (de) 2006-05-23 2016-05-11 Ivoclar Vivadent AG Verfahren zur Herstellung von gefärbten Rohlingen und dentalen Formteilen
JP5248000B2 (ja) * 2006-09-11 2013-07-24 山陽特殊製鋼株式会社 ＣｏＷ系ターゲット材およびその製造方法
WO2009009288A1 (en) * 2007-07-10 2009-01-15 Parker-Hannifin Corporation Combination glass/ceramic particles for emi shielding
DE102007049635A1 (de) 2007-10-17 2009-04-23 Willert-Porada, Monika, Prof. Dr. Verfahren zur Beschichtung von Partikeln in einem Mikrowellen-Plasma-Wirbelschichtreaktor
DE102009021056A1 (de) * 2008-10-30 2010-05-12 BAM Bundesanstalt für Materialforschung und -prüfung Verfahren und Vorrichtung zum Aufbringen oder Einbetten von Partikeln auf oder in eine durch Plasmabeschichtung aufgebrachte Schicht
JP5277442B2 (ja) * 2009-08-03 2013-08-28 株式会社ユーテック 微粒子
WO2011099760A2 (ko) * 2010-02-09 2011-08-18 서강대학교산학협력단 입자 및 그 제조방법
CN101972854A (zh) * 2010-11-09 2011-02-16 铜陵铜基粉体科技有限公司 雾化法制备低氧低松比铜基粉末的方法
DE102011101661A1 (de) * 2011-05-13 2012-11-15 Wieland Dental + Technik Gmbh & Co. Kg Verfahren zur Dotierung oder zum Einfärben von Keramik, Glaskeramik oder Glas
CN103160795A (zh) * 2011-12-19 2013-06-19 北京有色金属研究总院 用于粉体颗粒表面镀膜的对靶磁控溅射装置及镀膜方法
JP2014046231A (ja) * 2012-08-29 2014-03-17 Hitachi Chemical Co Ltd カーボンナノチューブ合成用触媒の製造方法
JP6301053B2 (ja) 2012-08-29 2018-03-28 日立化成株式会社 ドラムスパッタ装置
JP2014047127A (ja) * 2012-09-04 2014-03-17 Toyo Tanso Kk 金属−炭素複合材、金属−炭素複合材の製造方法及び摺動部材
CN103046012A (zh) * 2012-11-16 2013-04-17 中国船舶重工集团公司第七二五研究所 一种真空磁控溅射制备热喷涂用包覆型复合粉末的方法
JP5661965B1 (ja) * 2014-06-17 2015-01-28 株式会社ジーエル・マテリアルズホールディングス 有機系太陽電池用材料及びそれを用いた有機系太陽電池、並びに、その材料の製造方法
JP5753304B1 (ja) * 2014-08-29 2015-07-22 株式会社ジーエル・マテリアルズホールディングス セラミックスナノ粒子が担持されたアルミニウム又はアルミニウム合金粉体及びそれを用いたセラミックス−アルミニウム系複合材料、並びに、その粉体の製造方法
JPWO2016208243A1 (ja) * 2015-06-22 2018-04-05 株式会社ユーテック 導電性材料及びその製造方法、導電性材料エアゾール及びその製造方法、接点及びその作製方法
US10793945B2 (en) * 2015-07-22 2020-10-06 Furuya Metal Co., Ltd. Powder coating apparatus
US10017844B2 (en) 2015-12-18 2018-07-10 General Electric Company Coated articles and method for making
EP3395784A1 (de) * 2017-04-20 2018-10-31 Rolex Sa Keramikbauteil für uhr
EP3612503B1 (de) 2017-04-20 2023-09-27 Rolex Sa Herstellung eines keramik-bauteils
JP6447700B2 (ja) * 2017-11-15 2019-01-09 日立化成株式会社 カーボンナノチューブ合成用触媒の製造方法
US10392263B1 (en) * 2018-01-19 2019-08-27 United States of America as represented by the Adminstrator of NASA Modification of pigments using atomic layer deposition (ALD) in varying electrical resistivity
DE102019215044A1 (de) * 2019-09-30 2021-04-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Niederdruck-Beschichtungsanlage und Verfahren zur Beschichtung von Partikel- oder Faser-Kollektiven mittels physikalischer oder chemischer Gasphasenabscheidung
WO2021167067A1 (ja) * 2020-02-21 2021-08-26 株式会社ユーパテンター 複合装置及び被覆微粒子の製造方法
CN112846203A (zh) * 2020-12-29 2021-05-28 有研粉末新材料(合肥)有限公司 一种铁基复合粉末的水雾化制备方法
CN113245544B (zh) * 2021-06-08 2021-10-01 西安欧中材料科技有限公司 一种制备金属-陶瓷包覆粉末的装置及方法
JP7013062B1 (ja) * 2021-10-14 2022-01-31 株式会社クリエイティブコーティングス 粉体の成膜方法及び装置
DE102022105410B3 (de) 2022-03-08 2023-07-27 Maik Vieluf Vorrichtung und Verfahren zur Beschichtung von Partikeln
CN115283669B (zh) * 2022-08-08 2023-10-13 洛阳金鹭硬质合金工具有限公司 一种高温炉辊表面防护涂层用热喷涂粉末及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1435344A (en) * 1973-08-31 1976-05-12 Boc International Ltd Sputtering apparatus
GB1497782A (en) * 1975-02-13 1978-01-12 Atomic Energy Authority Uk Apparatus for depositing material
US4080281A (en) * 1976-04-09 1978-03-21 Tsunehiko Endo Apparatus for making metal films
US4302311A (en) * 1979-11-19 1981-11-24 The United States Of America As Represented By The United States Department Of Energy Sputter coating of microspherical substrates by levitation
JPS62250172A (ja) * 1986-04-24 1987-10-31 Nisshin Steel Co Ltd 超微粉末を被覆する方法と装置

Also Published As

Publication number Publication date
EP0345795A1 (de) 1989-12-13
US4940523A (en) 1990-07-10
DE68910387D1 (de) 1993-12-09
JPH02153068A (ja) 1990-06-12
JP2909744B2 (ja) 1999-06-23
EP0345795B1 (de) 1993-11-03

Similar Documents

Publication Publication Date Title
DE68910387T2 (de) Verfahren und Vorrichtung zur Beschichtung feiner Pulver.
DE69033739T2 (de) Verfahren und Vorrichtung zur Sputterbeschichtung gestufter Wafer - Fall B
DE69000378D1 (de) Verfahren und vorrichtung zum agglomerieren von pulver.
DE69125054D1 (de) Verfahren und Vorrichtung zur Mustererkennung
DE3883957T2 (de) Verfahren und Vorrichtung zur Kontrolle der Oberflächenladung in der Ionen-Implantation.
DE69003703T2 (de) Verfahren und Vorrichtung zur Formung von dreidimensional zusammengesetzten Bahnen.
DE69008477D1 (de) Verfahren und Vorrichtung zur Zielerkennung.
DE68924563T2 (de) Verfahren und Vorrichtung zur Oberflächenanalyse.
DE3582006D1 (de) Verfahren und vorrichtung zur materialbeschichtung.
DE69002726D1 (de) Verfahren und vorrichtung zum granulieren und ueberziehen.
DE68913171T2 (de) Verfahren und Vorrichtung zur Bilderzeugung.
DE3481359D1 (de) Verfahren und vorrichtung zur herstellung von feinem magnetischem pulver.
DE68909539D1 (de) Verfahren und vorrichtung zur kontrolle eines quasi-geschlossenen elektromagnetischen schirmes.
DE69002098T2 (de) Verfahren und Vorrichtung zum Überziehen von Pulver.
DE69112113D1 (de) Verfahren und Vorrichtung zur Oberflächenmodifizierung von Metallteilen.
DE3870587D1 (de) Verfahren und vorrichtung zur feinzerkleinerung.
DE69106421T2 (de) Verfahren und Vorrichtung zur Herstellung von Metallpulver.
DE69021546D1 (de) Verfahren und Vorrichtung zur Photodetektion.
DE59105635D1 (de) Vorrichtung und verfahren zur materialverdampfung.
DE3868527D1 (de) Verfahren und vorrichtung zum pulverbeschichten von gegenstaenden.
DE69007222D1 (de) Verfahren und Vorrichtung zur Elektroplattierung.
DE69224505T2 (de) Verfahren und vorrichtung zur herstellung von metallpulver
DE69021544D1 (de) Verfahren und Vorrichtung zur Photodetektion.
DE3879192T2 (de) Verfahren und vorrichtung zur elektrodesionisation.
ATA139790A (de) Verfahren und vorrichtung zur rückwirkungsfreien abs-regelung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee