DE68923638T2 - Korrekturverfahren für Maske. - Google Patents
Korrekturverfahren für Maske.Info
- Publication number
- DE68923638T2 DE68923638T2 DE68923638T DE68923638T DE68923638T2 DE 68923638 T2 DE68923638 T2 DE 68923638T2 DE 68923638 T DE68923638 T DE 68923638T DE 68923638 T DE68923638 T DE 68923638T DE 68923638 T2 DE68923638 T2 DE 68923638T2
- Authority
- DE
- Germany
- Prior art keywords
- mask
- correction procedure
- correction
- procedure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
- G03F1/74—Repair or correction of mask defects by charged particle beam [CPB], e.g. focused ion beam
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/139—Defect coating
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6975888A JP2525221B2 (ja) | 1988-03-25 | 1988-03-25 | マスク修正装置 |
JP6975988A JP2623109B2 (ja) | 1988-03-25 | 1988-03-25 | マスク修正方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE68923638D1 DE68923638D1 (de) | 1995-09-07 |
DE68923638T2 true DE68923638T2 (de) | 1996-01-18 |
Family
ID=26410917
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE68923638T Expired - Fee Related DE68923638T2 (de) | 1988-03-25 | 1989-03-28 | Korrekturverfahren für Maske. |
Country Status (3)
Country | Link |
---|---|
US (1) | US4906326A (de) |
EP (1) | EP0334680B1 (de) |
DE (1) | DE68923638T2 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10236027B3 (de) * | 2002-08-06 | 2004-02-26 | Texas Instruments Deutschland Gmbh | Verfahren zum Überprüfen einer Maske |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5225771A (en) * | 1988-05-16 | 1993-07-06 | Dri Technology Corp. | Making and testing an integrated circuit using high density probe points |
US5362591A (en) * | 1989-10-09 | 1994-11-08 | Hitachi Ltd. Et Al. | Mask having a phase shifter and method of manufacturing same |
DE69123610T2 (de) * | 1990-02-02 | 1997-04-24 | Canon Kk | Belichtungsverfahren |
US5024725A (en) * | 1990-02-06 | 1991-06-18 | International Business Machines Corp. | Method for self-inducted repair of circuit shorts and near-shorts |
NL9000502A (nl) * | 1990-03-05 | 1991-10-01 | Philips Nv | Werkwijze voor het herstellen van een defect in een lithografisch masker. |
JP2901201B2 (ja) * | 1990-08-18 | 1999-06-07 | 三菱電機株式会社 | フォトマスク |
US5153083A (en) * | 1990-12-05 | 1992-10-06 | At&T Bell Laboratories | Method of making phase-shifting lithographic masks |
US5266349A (en) * | 1991-02-25 | 1993-11-30 | Specialty Coating Systems Inc. | Method of discrete conformal coating |
US5246801A (en) * | 1991-09-20 | 1993-09-21 | At&T Bell Laboratories | Method of repairing indentations in phase-shifting lithographic masks |
US5246799A (en) * | 1991-09-20 | 1993-09-21 | At&T Bell Laboratories | Method of removing excess material, for repairing phase-shifting lithographic masks |
US5304437A (en) * | 1992-04-03 | 1994-04-19 | At&T Bell Laboratories | Mask for x-ray pattern delineation |
US5272024A (en) * | 1992-04-08 | 1993-12-21 | International Business Machines Corporation | Mask-structure and process to repair missing or unwanted phase-shifting elements |
US5669971A (en) * | 1994-04-06 | 1997-09-23 | Specialty Coating Systems, Inc. | Selective coating apparatus |
US5582939A (en) * | 1995-07-10 | 1996-12-10 | Micron Technology, Inc. | Method for fabricating and using defect-free phase shifting masks |
US5830612A (en) * | 1996-01-24 | 1998-11-03 | Fujitsu Limited | Method of detecting a deficiency in a charged-particle-beam exposure mask |
TW341719B (en) * | 1996-03-01 | 1998-10-01 | Canon Kk | Surface position detecting method and scanning exposure method using the same |
US6016357A (en) * | 1997-06-16 | 2000-01-18 | International Business Machines Corporation | Feedback method to repair phase shift masks |
US6074571A (en) * | 1997-09-30 | 2000-06-13 | International Business Machines Corporation | Cut and blast defect to avoid chrome roll over annealing |
US5981110A (en) * | 1998-02-17 | 1999-11-09 | International Business Machines Corporation | Method for repairing photomasks |
KR100548535B1 (ko) | 1999-04-27 | 2006-02-02 | 주식회사 하이닉스반도체 | 반도체 소자의 위상 반전 마스크의 리페어 방법 |
US6415431B1 (en) * | 2000-02-18 | 2002-07-02 | International Business Machines Corporation | Repair of phase shift materials to enhance adhesion |
US20030000921A1 (en) * | 2001-06-29 | 2003-01-02 | Ted Liang | Mask repair with electron beam-induced chemical etching |
JP3626453B2 (ja) * | 2001-12-27 | 2005-03-09 | 株式会社東芝 | フォトマスクの修正方法及び修正装置 |
US20050103272A1 (en) | 2002-02-25 | 2005-05-19 | Leo Elektronenmikroskopie Gmbh | Material processing system and method |
DE10230755A1 (de) * | 2002-07-09 | 2004-01-22 | Carl Zeiss Jena Gmbh | Anordnung zur Herstellung von Photomasken |
US7303841B2 (en) * | 2004-03-26 | 2007-12-04 | Taiwan Semiconductor Manufacturing Company | Repair of photolithography masks by sub-wavelength artificial grating technology |
JP2005286161A (ja) * | 2004-03-30 | 2005-10-13 | Ebara Corp | 形状修復方法及び装置、並びにそれらを用いた半導体デバイス製造方法 |
DE102006043874B4 (de) * | 2006-09-15 | 2020-07-09 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zur Reparatur von Photolithographiemasken |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5423473A (en) * | 1977-07-25 | 1979-02-22 | Cho Lsi Gijutsu Kenkyu Kumiai | Photomask and method of inspecting mask pattern using same |
US4200668A (en) * | 1978-09-05 | 1980-04-29 | Western Electric Company, Inc. | Method of repairing a defective photomask |
JPS5568632A (en) * | 1978-11-20 | 1980-05-23 | Hitachi Ltd | Manufacture of photomask |
JPS58173835A (ja) * | 1982-04-06 | 1983-10-12 | Fuji Xerox Co Ltd | レジストパタ−ンの欠陥修正方法 |
JPS62215957A (ja) * | 1986-03-18 | 1987-09-22 | Nippon Denso Co Ltd | ハ−ドマスクの製造方法 |
US4778693A (en) * | 1986-10-17 | 1988-10-18 | Quantronix Corporation | Photolithographic mask repair system |
-
1989
- 1989-03-24 US US07/328,459 patent/US4906326A/en not_active Expired - Lifetime
- 1989-03-28 DE DE68923638T patent/DE68923638T2/de not_active Expired - Fee Related
- 1989-03-28 EP EP89303016A patent/EP0334680B1/de not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10236027B3 (de) * | 2002-08-06 | 2004-02-26 | Texas Instruments Deutschland Gmbh | Verfahren zum Überprüfen einer Maske |
US7160650B2 (en) | 2002-08-06 | 2007-01-09 | Texas Instruments Incorporated | Method of inspecting a mask |
Also Published As
Publication number | Publication date |
---|---|
EP0334680A3 (de) | 1991-02-06 |
US4906326A (en) | 1990-03-06 |
EP0334680B1 (de) | 1995-08-02 |
DE68923638D1 (de) | 1995-09-07 |
EP0334680A2 (de) | 1989-09-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |