DE69020890T2 - Reinluftraum für eine Halbleiterfertigungsanlage. - Google Patents

Reinluftraum für eine Halbleiterfertigungsanlage.

Info

Publication number
DE69020890T2
DE69020890T2 DE69020890T DE69020890T DE69020890T2 DE 69020890 T2 DE69020890 T2 DE 69020890T2 DE 69020890 T DE69020890 T DE 69020890T DE 69020890 T DE69020890 T DE 69020890T DE 69020890 T2 DE69020890 T2 DE 69020890T2
Authority
DE
Germany
Prior art keywords
semiconductor manufacturing
clean air
manufacturing plant
air room
room
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69020890T
Other languages
English (en)
Other versions
DE69020890D1 (de
Inventor
Shousuke Shinoda
Yukio Sugihara
Tetsua Yamashita
Yoshihiro Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
N M B SEMICONDUCTOR TATEYAMA K
Original Assignee
N M B SEMICONDUCTOR TATEYAMA K
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by N M B SEMICONDUCTOR TATEYAMA K filed Critical N M B SEMICONDUCTOR TATEYAMA K
Publication of DE69020890D1 publication Critical patent/DE69020890D1/de
Application granted granted Critical
Publication of DE69020890T2 publication Critical patent/DE69020890T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
    • F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
    • F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
    • F24F3/167—Clean rooms, i.e. enclosed spaces in which a uniform flow of filtered air is distributed
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F7/00—Ventilation
    • F24F7/04—Ventilation with ducting systems, e.g. by double walls; with natural circulation
    • F24F7/06—Ventilation with ducting systems, e.g. by double walls; with natural circulation with forced air circulation, e.g. by fan positioning of a ventilator in or against a conduit
DE69020890T 1990-04-05 1990-08-22 Reinluftraum für eine Halbleiterfertigungsanlage. Expired - Lifetime DE69020890T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2090570A JPH03291436A (ja) 1990-04-05 1990-04-05 半導体製造工場のクリーンルーム

Publications (2)

Publication Number Publication Date
DE69020890D1 DE69020890D1 (de) 1995-08-17
DE69020890T2 true DE69020890T2 (de) 1995-11-23

Family

ID=14002089

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69020890T Expired - Lifetime DE69020890T2 (de) 1990-04-05 1990-08-22 Reinluftraum für eine Halbleiterfertigungsanlage.

Country Status (5)

Country Link
US (1) US5096477A (de)
EP (1) EP0450142B1 (de)
JP (1) JPH03291436A (de)
KR (1) KR950012146B1 (de)
DE (1) DE69020890T2 (de)

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JP3090088B2 (ja) * 1997-02-07 2000-09-18 富士電機株式会社 クリーンルームのファンフィルタユニット
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US5900047A (en) * 1997-11-26 1999-05-04 Sony Corporation Exhaust system for a semiconductor etcher that utilizes corrosive gas
AU6424098A (en) * 1998-03-11 1999-09-27 Inter-Engineering Crystal Group N.V. Production facility for integrated circuits
JP3092705B2 (ja) * 1998-06-25 2000-09-25 日本電気株式会社 空調装置
US6932850B1 (en) 1998-06-29 2005-08-23 Pall Corporation Pleated filter and a method for making the same
JP3375294B2 (ja) * 1998-12-17 2003-02-10 東京エレクトロン株式会社 処理装置、処理システムおよび該装置における清浄エアの供給方法
FR2788843B1 (fr) * 1999-01-26 2001-04-13 U N I R Ultra Propre Nutrition Dispositif de protection rapprochee de produits sensibles par diffusion d'air sterile, avec des extremites d'interface protegees
DE19913886A1 (de) * 1999-03-26 2000-09-28 Siemens Ag Anlage zur Fertigung von Halbleiterprodukten
DE19913918C1 (de) * 1999-03-26 2000-10-19 Siemens Ag Anlage zur Fertigung von Halbleiterprodukten, insbesondere zur Bearbeitung von Wafern
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JP2002147811A (ja) * 2000-11-08 2002-05-22 Sharp Corp クリーンルーム
CN1193193C (zh) * 2000-12-21 2005-03-16 松下电器产业株式会社 净化室及半导体装置的制造方法
JP4038352B2 (ja) * 2001-08-24 2008-01-23 株式会社日立産機システム クリーンルーム
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KR100474577B1 (ko) * 2002-07-06 2005-03-08 삼성전자주식회사 청정 공기 덕트 및 청정실용 공기 제공 장치
US7105037B2 (en) * 2002-10-31 2006-09-12 Advanced Technology Materials, Inc. Semiconductor manufacturing facility utilizing exhaust recirculation
KR100502187B1 (ko) * 2003-03-21 2005-07-20 삼성전자주식회사 공기 유속 제어 장치 및 이를 이용한 청정실 공조 시스템
KR100524875B1 (ko) * 2003-06-28 2005-10-31 엘지.필립스 엘시디 주식회사 청정시스템
DE10350678A1 (de) * 2003-10-30 2005-06-16 Gebhardt Ventilatoren Gmbh & Co. Zuluftgerät, insbesondere zur Befestigung an Decken von Reinräumen
EP1544553B1 (de) * 2003-12-18 2009-10-07 M+W Zander Products GmbH Einrichtung zur Konditionierung von Umluft, vorzugsweise von Reinluft
KR20060056709A (ko) * 2004-11-22 2006-05-25 삼성전자주식회사 도어 입구에 에어 커튼을 가지는 반도체 제조 장비
US9339900B2 (en) 2005-08-18 2016-05-17 Futrfab, Inc. Apparatus to support a cleanspace fabricator
US7513822B2 (en) * 2005-06-18 2009-04-07 Flitsch Frederick A Method and apparatus for a cleanspace fabricator
US11024527B2 (en) 2005-06-18 2021-06-01 Frederick A. Flitsch Methods and apparatus for novel fabricators with Cleanspace
US10627809B2 (en) 2005-06-18 2020-04-21 Frederick A. Flitsch Multilevel fabricators
US9457442B2 (en) * 2005-06-18 2016-10-04 Futrfab, Inc. Method and apparatus to support process tool modules in a cleanspace fabricator
US9159592B2 (en) 2005-06-18 2015-10-13 Futrfab, Inc. Method and apparatus for an automated tool handling system for a multilevel cleanspace fabricator
US10651063B2 (en) 2005-06-18 2020-05-12 Frederick A. Flitsch Methods of prototyping and manufacturing with cleanspace fabricators
US8229585B2 (en) 2005-09-18 2012-07-24 Flitsch Frederick A Methods and apparatus for vertically orienting substrate processing tools in a clean space
US9059227B2 (en) 2005-06-18 2015-06-16 Futrfab, Inc. Methods and apparatus for vertically orienting substrate processing tools in a clean space
US7467024B2 (en) * 2005-08-26 2008-12-16 Flitsch Frederick A Method and apparatus for an elevator system for a multilevel cleanspace fabricator
US7462213B2 (en) * 2005-10-26 2008-12-09 Spengler Charles W Method of minimizing cross contamination between clean air rooms in a common enclosure
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CN101373092B (zh) * 2007-08-20 2010-09-08 沈嘉琦 容积式通风净化装置
DE202008003864U1 (de) * 2008-03-19 2009-08-13 Tinnefeld, Hans Klimatisierungssystem für Räume
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CN103008312B (zh) * 2012-11-29 2015-01-21 北京七星华创电子股份有限公司 一种空气调节监测系统
CN103240246B (zh) * 2013-05-15 2015-11-11 上海市时代中学 用于中央空调清洗的机器人
DE102015012053A1 (de) * 2015-09-14 2017-03-16 M+W Group GmbH Fertigungsanlage zur Herstellung von integrierten Schaltkreisen aus Halbleiter-Wafern sowie Waffelelement für eine Fertigungsanlage
CN110284737A (zh) * 2019-07-23 2019-09-27 中国电子工程设计院有限公司 一种洁净生产厂房布置结构
CN110439335A (zh) * 2019-08-13 2019-11-12 世源科技工程有限公司 一种洁净厂房
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WO2021111550A1 (ja) * 2019-12-04 2021-06-10 日立グローバルライフソリューションズ株式会社 空調システム
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Also Published As

Publication number Publication date
KR910019268A (ko) 1991-11-30
KR950012146B1 (ko) 1995-10-14
EP0450142B1 (de) 1995-07-12
US5096477A (en) 1992-03-17
EP0450142A3 (en) 1992-09-30
DE69020890D1 (de) 1995-08-17
EP0450142A2 (de) 1991-10-09
JPH03291436A (ja) 1991-12-20

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