DE69024938D1 - Verfahren zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase - Google Patents

Verfahren zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase

Info

Publication number
DE69024938D1
DE69024938D1 DE69024938T DE69024938T DE69024938D1 DE 69024938 D1 DE69024938 D1 DE 69024938D1 DE 69024938 T DE69024938 T DE 69024938T DE 69024938 T DE69024938 T DE 69024938T DE 69024938 D1 DE69024938 D1 DE 69024938D1
Authority
DE
Germany
Prior art keywords
liquid
vaporization chamber
vapored
presenting
reagents
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69024938T
Other languages
English (en)
Other versions
DE69024938T2 (de
Inventor
Michel Soubeyrand
Richard Mccurdy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Pilkington North America Inc
Original Assignee
Libbey Owens Ford Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Libbey Owens Ford Co filed Critical Libbey Owens Ford Co
Publication of DE69024938D1 publication Critical patent/DE69024938D1/de
Application granted granted Critical
Publication of DE69024938T2 publication Critical patent/DE69024938T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/229—Non-specific enumeration
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
DE69024938T 1989-10-17 1990-10-15 Verfahren zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase Expired - Lifetime DE69024938T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US42263689A 1989-10-17 1989-10-17
US07/591,121 US5090985A (en) 1989-10-17 1990-10-04 Method for preparing vaporized reactants for chemical vapor deposition
PCT/US1990/005905 WO1991005743A1 (en) 1989-10-17 1990-10-15 Method for preparing vaporized reactants for chemical vapor deposition

Publications (2)

Publication Number Publication Date
DE69024938D1 true DE69024938D1 (de) 1996-02-29
DE69024938T2 DE69024938T2 (de) 1996-08-14

Family

ID=27025695

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69024938T Expired - Lifetime DE69024938T2 (de) 1989-10-17 1990-10-15 Verfahren zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase

Country Status (25)

Country Link
US (1) US5090985A (de)
EP (1) EP0450016B1 (de)
JP (1) JP3078835B2 (de)
KR (1) KR0147042B1 (de)
CN (1) CN1025322C (de)
AT (1) ATE133147T1 (de)
AU (1) AU632175B2 (de)
BR (1) BR9005227A (de)
CA (1) CA2027761A1 (de)
CZ (1) CZ502090A3 (de)
DE (1) DE69024938T2 (de)
ES (1) ES2082007T3 (de)
HU (1) HU213646B (de)
IE (1) IE903601A1 (de)
MX (1) MX173282B (de)
MY (1) MY107107A (de)
NO (1) NO304109B1 (de)
NZ (1) NZ235700A (de)
PL (1) PL167110B1 (de)
PT (1) PT95613B (de)
RO (1) RO111756B1 (de)
RU (1) RU2062258C1 (de)
TR (1) TR25795A (de)
WO (1) WO1991005743A1 (de)
YU (1) YU47521B (de)

Families Citing this family (82)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2916085B2 (ja) * 1994-08-31 1999-07-05 三ツ星ベルト株式会社 ガラス着色用発色剤
US5279851A (en) * 1991-04-03 1994-01-18 Nippon Sheet Glass Co., Ltd. Method of manufacturing a conductive glass with high strength and wear resistance
US5192589A (en) * 1991-09-05 1993-03-09 Micron Technology, Inc. Low-pressure chemical vapor deposition process for depositing thin titanium nitride films having low and stable resistivity
CA2104590C (en) * 1991-12-26 2007-05-08 David A. Russo Coated glass article
US5863337A (en) * 1993-02-16 1999-01-26 Ppg Industries, Inc. Apparatus for coating a moving glass substrate
US5599387A (en) * 1993-02-16 1997-02-04 Ppg Industries, Inc. Compounds and compositions for coating glass with silicon oxide
US5356718A (en) * 1993-02-16 1994-10-18 Ppg Industries, Inc. Coating apparatus, method of coating glass, compounds and compositions for coating glasss and coated glass substrates
US6428623B2 (en) * 1993-05-14 2002-08-06 Micron Technology, Inc. Chemical vapor deposition apparatus with liquid feed
FR2707671B1 (fr) * 1993-07-12 1995-09-15 Centre Nat Rech Scient Procédé et dispositif d'introduction de précurseurs dans une enceinte de dépôt chimique en phase vapeur.
JPH0781965A (ja) * 1993-07-22 1995-03-28 Sumitomo Electric Ind Ltd ガス生成装置並びに光導波路及び光ファイバ母材を製造する方法及び装置
US5431800A (en) * 1993-11-05 1995-07-11 The University Of Toledo Layered electrodes with inorganic thin films and method for producing the same
US5356451A (en) * 1993-12-20 1994-10-18 Corning Incorporated Method and apparatus for vaporization of liquid reactants
US5665424A (en) * 1994-03-11 1997-09-09 Sherman; Dan Method for making glass articles having a permanent protective coating
US5723172A (en) * 1994-03-11 1998-03-03 Dan Sherman Method for forming a protective coating on glass
US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
US5632797A (en) 1994-12-30 1997-05-27 Corning Incorporated Method of providing vaporized halide-free, silicon-containing compounds
US5653813A (en) * 1995-04-03 1997-08-05 Novellus Systems, Inc. Cyclone evaporator
US5725904A (en) * 1995-06-02 1998-03-10 Elf Atochem North America, Inc. Liquid methyltin halide compositions
US5773086A (en) * 1996-08-13 1998-06-30 Libbey-Owens-Ford Co. Method of coating flat glass with indium oxide
US5952047A (en) * 1997-03-28 1999-09-14 Dowa Mining Co., Ltd. CVD precursors and film preparation method using the same
KR100291482B1 (ko) * 1997-06-24 2001-06-01 시부키 유키오 이산화티탄 결정배향막을 갖는 재료 및 그 제조방법
US6045864A (en) 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
US6265026B1 (en) * 1998-01-16 2001-07-24 The Regents Of The University Of California Vapor phase deposition
US6964731B1 (en) * 1998-12-21 2005-11-15 Cardinal Cg Company Soil-resistant coating for glass surfaces
US6660365B1 (en) 1998-12-21 2003-12-09 Cardinal Cg Company Soil-resistant coating for glass surfaces
US6974629B1 (en) * 1999-08-06 2005-12-13 Cardinal Cg Company Low-emissivity, soil-resistant coating for glass surfaces
US6602606B1 (en) 1999-05-18 2003-08-05 Nippon Sheet Glass Co., Ltd. Glass sheet with conductive film, method of manufacturing the same, and photoelectric conversion device using the same
JP2001114533A (ja) 1999-10-20 2001-04-24 Nippon Sheet Glass Co Ltd 透明導電膜付きガラス板およびこれを用いたガラス物品
KR20010047128A (ko) * 1999-11-18 2001-06-15 이경수 액체원료 기화방법 및 그에 사용되는 장치
KR20010066533A (ko) * 1999-12-31 2001-07-11 정종순 안정한 코팅용 기화물 생성방법 및 장치
US6160143A (en) * 2000-02-18 2000-12-12 Artisan Industries Inc. Method for the concentration and separation of sterols
US6921579B2 (en) * 2000-09-11 2005-07-26 Cardinal Cg Company Temporary protective covers
AU2001292660A1 (en) 2000-09-11 2002-03-26 Cardinal Cg Company Hydrophilic surfaces carrying temporary protective covers
US6802315B2 (en) 2001-03-21 2004-10-12 Hollingsorth & Vose Company Vapor deposition treated electret filter media
US6521295B1 (en) 2001-04-17 2003-02-18 Pilkington North America, Inc. Chemical vapor deposition of antimony-doped metal oxide and the coated article made thereby
US6902813B2 (en) * 2001-09-11 2005-06-07 Cardinal Cg Company Hydrophilic surfaces carrying temporary protective covers
US6827974B2 (en) * 2002-03-29 2004-12-07 Pilkington North America, Inc. Method and apparatus for preparing vaporized reactants for chemical vapor deposition
US6838114B2 (en) 2002-05-24 2005-01-04 Micron Technology, Inc. Methods for controlling gas pulsing in processes for depositing materials onto micro-device workpieces
US7118783B2 (en) * 2002-06-26 2006-10-10 Micron Technology, Inc. Methods and apparatus for vapor processing of micro-device workpieces
EP1517863B1 (de) * 2002-06-28 2007-08-15 Prysmian Cavi e Sistemi Energia S.r.l. Verfahren und vorrichtung zum verdampfen eines flüssigen vorlaüfers beim herstellen einer glasvorform
US6821347B2 (en) 2002-07-08 2004-11-23 Micron Technology, Inc. Apparatus and method for depositing materials onto microelectronic workpieces
US6955725B2 (en) * 2002-08-15 2005-10-18 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US6926775B2 (en) * 2003-02-11 2005-08-09 Micron Technology, Inc. Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces
US7335396B2 (en) * 2003-04-24 2008-02-26 Micron Technology, Inc. Methods for controlling mass flow rates and pressures in passageways coupled to reaction chambers and systems for depositing material onto microfeature workpieces in reaction chambers
US7235138B2 (en) * 2003-08-21 2007-06-26 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for batch deposition of materials on microfeature workpieces
US7344755B2 (en) * 2003-08-21 2008-03-18 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces; methods for conditioning ALD reaction chambers
US7422635B2 (en) * 2003-08-28 2008-09-09 Micron Technology, Inc. Methods and apparatus for processing microfeature workpieces, e.g., for depositing materials on microfeature workpieces
US7056806B2 (en) * 2003-09-17 2006-06-06 Micron Technology, Inc. Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
US7282239B2 (en) 2003-09-18 2007-10-16 Micron Technology, Inc. Systems and methods for depositing material onto microfeature workpieces in reaction chambers
US7323231B2 (en) * 2003-10-09 2008-01-29 Micron Technology, Inc. Apparatus and methods for plasma vapor deposition processes
US7581511B2 (en) * 2003-10-10 2009-09-01 Micron Technology, Inc. Apparatus and methods for manufacturing microfeatures on workpieces using plasma vapor processes
US7258892B2 (en) * 2003-12-10 2007-08-21 Micron Technology, Inc. Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition
WO2005063646A1 (en) * 2003-12-22 2005-07-14 Cardinal Cg Company Graded photocatalytic coatings
US7584942B2 (en) 2004-03-31 2009-09-08 Micron Technology, Inc. Ampoules for producing a reaction gas and systems for depositing materials onto microfeature workpieces in reaction chambers
US20050249873A1 (en) * 2004-05-05 2005-11-10 Demetrius Sarigiannis Apparatuses and methods for producing chemically reactive vapors used in manufacturing microelectronic devices
US8133554B2 (en) 2004-05-06 2012-03-13 Micron Technology, Inc. Methods for depositing material onto microfeature workpieces in reaction chambers and systems for depositing materials onto microfeature workpieces
US7699932B2 (en) * 2004-06-02 2010-04-20 Micron Technology, Inc. Reactors, systems and methods for depositing thin films onto microfeature workpieces
US7604865B2 (en) * 2004-07-12 2009-10-20 Cardinal Cg Company Low-maintenance coatings
US7326469B2 (en) * 2004-09-16 2008-02-05 General Electric Company Coating system and process and apparatus for depositing a coating system
US8092660B2 (en) * 2004-12-03 2012-01-10 Cardinal Cg Company Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
US7923114B2 (en) * 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US20060165873A1 (en) * 2005-01-25 2006-07-27 Micron Technology, Inc. Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processes
DE112006002201T5 (de) * 2005-08-18 2008-07-03 Innovative Thin Films, Ltd., Toledo Verfahren und Vorrichtung zum Beschichten von Substraten durch Spray-Pyrolyse
US20070098891A1 (en) * 2005-10-31 2007-05-03 Eastman Kodak Company Vapor deposition apparatus and method
WO2007124291A2 (en) * 2006-04-19 2007-11-01 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
DE102006027932A1 (de) 2006-06-14 2007-12-20 Aixtron Ag Verfahren zum selbstlimitierenden Abscheiden ein oder mehrerer Monolagen
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
ATE528420T1 (de) * 2006-09-08 2011-10-15 Pilkington Group Ltd Tieftemperaturverfahren zur herstellung eines mit zinkoxid beschichteten gegenstands
CA2664368A1 (en) 2007-09-14 2009-03-19 Cardinal Cg Company Low-maintenance coating technology
EP2055803A1 (de) * 2007-10-29 2009-05-06 Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO Verfahren zur Herstellung einer Abscheidung aus einer Dampfphase
US8197940B2 (en) * 2008-07-25 2012-06-12 Ppg Industries Ohio, Inc. Aqueous suspension for pyrolytic spray coating
US8495973B2 (en) * 2009-11-03 2013-07-30 Protonex Technology Corporation Thin film vaporizer
KR101104632B1 (ko) * 2010-04-06 2012-01-12 주식회사 마이크로이즈 기화기 및 박막증착시스템
CN102824864B (zh) * 2011-06-15 2015-03-11 中国南玻集团股份有限公司 汽化混合装置
US8840858B2 (en) 2011-07-06 2014-09-23 Corning Incorporated Apparatus for mixing vaporized precursor and gas and method therefor
US9302291B2 (en) 2011-08-05 2016-04-05 3M Innovative Properties Company Systems and methods for processing vapor
CN102584019B (zh) * 2012-01-31 2014-07-02 绥中滨海经济区红杉科技有限公司 化学汽相沉积法镀制玻璃减反射膜的设备及方法
CN113534609A (zh) * 2015-10-13 2021-10-22 因普里亚公司 有机锡氧化物氢氧化物图案化组合物、前驱物及图案化
EP3387163B1 (de) 2015-12-11 2020-04-29 Cardinal CG Company Verfahren zur beidseitigen beschichtung eines substrats
EP3541762B1 (de) 2016-11-17 2022-03-02 Cardinal CG Company Statisch-dissipative beschichtungstechnologie
CN111517625A (zh) * 2020-06-18 2020-08-11 福州新福兴浮法玻璃有限公司 一种用于生产无表观缺陷玻璃的锡槽
WO2024052668A1 (en) 2022-09-06 2024-03-14 Pilkington Group Limited Process for depositing a layer

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2815299A (en) * 1955-10-24 1957-12-03 Nat Res Corp Method of producing an adherent molybdenum coating on a metal substrate
US3414428A (en) * 1964-10-20 1968-12-03 Allied Chem Chromizing compositions and methods and continuous production of chromium halides for chromizing
US3535103A (en) * 1968-04-10 1970-10-20 Atomic Energy Commission Method of making metal alloy powders
US4082864A (en) * 1974-06-17 1978-04-04 Fiber Materials, Inc. Reinforced metal matrix composite
US4212663A (en) * 1978-01-26 1980-07-15 Corning Glass Works Reactants delivery system for optical waveguide manufacturing
US4245569A (en) * 1979-03-26 1981-01-20 Combustion Engineering, Inc. Scrubber bypass system
US4249916A (en) * 1979-07-30 1981-02-10 Texas Utilities Services, Inc. Absorber tower isolation system
US4293594A (en) * 1980-08-22 1981-10-06 Westinghouse Electric Corp. Method for forming conductive, transparent coating on a substrate
CH640571A5 (fr) * 1981-03-06 1984-01-13 Battelle Memorial Institute Procede et dispositif pour deposer sur un substrat une couche de matiere minerale.
JPS5843320A (ja) * 1981-09-10 1983-03-14 Babcock Hitachi Kk 脱硝装置
US4924936A (en) * 1987-08-05 1990-05-15 M&T Chemicals Inc. Multiple, parallel packed column vaporizer
JPH01246366A (ja) * 1988-03-28 1989-10-02 Koujiyundo Kagaku Kenkyusho:Kk 酸化膜の製造方法とその装置

Also Published As

Publication number Publication date
EP0450016B1 (de) 1996-01-17
AU6529790A (en) 1991-05-16
KR0147042B1 (ko) 1998-08-17
PL167110B1 (pl) 1995-07-31
PT95613B (pt) 1997-08-29
IE903601A1 (en) 1991-04-24
ATE133147T1 (de) 1996-02-15
HU213646B (en) 1997-09-29
HUT57682A (en) 1991-12-30
AU632175B2 (en) 1992-12-17
BR9005227A (pt) 1991-09-17
CN1025322C (zh) 1994-07-06
NO912320D0 (no) 1991-06-14
EP0450016A1 (de) 1991-10-09
NO304109B1 (no) 1998-10-26
ES2082007T3 (es) 1996-03-16
WO1991005743A1 (en) 1991-05-02
YU47521B (sh) 1995-10-03
MX173282B (es) 1994-02-14
RU2062258C1 (ru) 1996-06-20
JP3078835B2 (ja) 2000-08-21
NZ235700A (en) 1992-12-23
HU907561D0 (en) 1991-10-28
RO111756B1 (ro) 1997-01-30
NO912320L (no) 1991-06-14
KR920701064A (ko) 1992-08-11
PT95613A (pt) 1991-09-13
CZ502090A3 (cs) 1998-10-14
US5090985A (en) 1992-02-25
TR25795A (tr) 1993-09-01
JPH04502305A (ja) 1992-04-23
MY107107A (en) 1995-09-30
EP0450016A4 (en) 1993-03-03
CA2027761A1 (en) 1991-04-18
YU194490A (sh) 1993-10-20
DE69024938T2 (de) 1996-08-14
CN1051899A (zh) 1991-06-05

Similar Documents

Publication Publication Date Title
DE69024938D1 (de) Verfahren zur darstellung dampfförmiger reagenzien für die chemische abscheidung aus der dampfphase
US5451260A (en) Method and apparatus for CVD using liquid delivery system with an ultrasonic nozzle
RU2046111C1 (ru) Способ нанесения покрытия из оксида металла на стеклянную подложку
US5151296A (en) Method for forming polycrystalline film by chemical vapor deposition process
WO2001098556A3 (en) Temperature controlled gas feedthrough
WO2000042236A3 (en) Processing system and method for chemical vapor deposition
GB1448848A (en) Method for increasing rate of coating using vaporized reactants
DE69013007T2 (de) Verfahren zur chemischen abscheidung aus der dampfphase von nitriden der übergangsmetalle.
JPS53110973A (en) Method and apparatus for manufacturing compounds
KR20040078643A (ko) 증기를 증착실에 공급하는 방법 및 화학 증착 기화기
EP0052979B1 (de) Herstellung von Verbindungen der Gruppen IIIB-VB
WO2001066834A3 (en) Chemical vapor deposition process for fabricating layered superlattice materials
US5140003A (en) Method for manufacturing layers from an oxide-ceramic superconductor material on a substrate using a cvd-process
TH9846EX (th) วิธีการสำหรับเตรียมสารเข้าทำปฏิกิริยาในรูปไอที่ใช้ ในการเคลือบ ด้วยไอสารเคมี
GB1031519A (en) Method of producing vapours of controlled composition
JPH06115913A (ja) 炭窒化ほう素の合成法
NO884603L (no) Fremgangsmaate til paafoering av metallsilisider for fremstilling av integrerte kretser.
JP3964976B2 (ja) Ｃｖｄ用ストロンチウム源物質およびこれを用いた成膜法
JPS57120335A (en) Manufacture of semiconductor device
KR980011761A (ko) 반도체 소자 제조장치
KR20010066533A (ko) 안정한 코팅용 기화물 생성방법 및 장치
JPH0665751B2 (ja) 気相成長装置
TH9846A (th) วิธีการสำหรับเตรียมสารเข้าทำปฏิกิริยาในรูปไอที่ใช้ ในการเคลือบ ด้วยไอสารเคมี
JPH10237656A (ja) 化学気相成長装置
JPS64733A (en) Film formation method and device thereof

Legal Events

Date Code Title Description
8364 No opposition during term of opposition