DE69029222T2 - Lichtempfindliche Zusammensetzung - Google Patents

Lichtempfindliche Zusammensetzung

Info

Publication number
DE69029222T2
DE69029222T2 DE69029222T DE69029222T DE69029222T2 DE 69029222 T2 DE69029222 T2 DE 69029222T2 DE 69029222 T DE69029222 T DE 69029222T DE 69029222 T DE69029222 T DE 69029222T DE 69029222 T2 DE69029222 T2 DE 69029222T2
Authority
DE
Germany
Prior art keywords
photosensitive composition
photosensitive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69029222T
Other languages
English (en)
Other versions
DE69029222D1 (de
Inventor
Toshiaki Aoai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69029222D1 publication Critical patent/DE69029222D1/de
Application granted granted Critical
Publication of DE69029222T2 publication Critical patent/DE69029222T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
DE69029222T 1989-04-28 1990-04-24 Lichtempfindliche Zusammensetzung Expired - Fee Related DE69029222T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1110604A JP2584672B2 (ja) 1989-04-28 1989-04-28 感光性組成物

Publications (2)

Publication Number Publication Date
DE69029222D1 DE69029222D1 (de) 1997-01-09
DE69029222T2 true DE69029222T2 (de) 1997-04-30

Family

ID=14540055

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69029222T Expired - Fee Related DE69029222T2 (de) 1989-04-28 1990-04-24 Lichtempfindliche Zusammensetzung

Country Status (4)

Country Link
US (1) US5254432A (de)
EP (1) EP0395346B1 (de)
JP (1) JP2584672B2 (de)
DE (1) DE69029222T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2584671B2 (ja) * 1989-04-26 1997-02-26 富士写真フイルム株式会社 感光性組成物
JP3064595B2 (ja) * 1991-04-26 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
EP0528395B1 (de) * 1991-08-19 1997-06-18 Fuji Photo Film Co., Ltd. Vorsensibilisierte Platte zur Herstellung einer lithographischen Druckplatte
JPH05181281A (ja) * 1991-11-01 1993-07-23 Fuji Photo Film Co Ltd フオトレジスト組成物及びエツチング方法
JP2672783B2 (ja) * 1994-05-05 1997-11-05 モートン インターナショナル，インコーポレイティド アミノアルキルホスホネートを含む磁気記録用バインダー
US5952154A (en) * 1998-05-29 1999-09-14 Morton International, Inc. Photoimageable composition having improved flexibility
JP2001264979A (ja) * 2000-03-22 2001-09-28 Fuji Photo Film Co Ltd ポジ型感光性平版印刷版
US8158981B2 (en) * 2006-09-25 2012-04-17 Hitachi Chemical Company, Ltd. Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film
JP5743783B2 (ja) * 2011-07-27 2015-07-01 富士フイルム株式会社 感光性組成物、平版印刷版原版、及びポリウレタン
GB201117093D0 (en) 2011-10-05 2011-11-16 Fujifilm Imaging Colorants Ltd Dispersions, process for preparing dispersions, inks and users
CN111032718B (zh) * 2017-08-30 2022-12-02 陶氏环球技术有限责任公司 溶剂型粘合剂组合物

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522393A1 (de) * 1965-03-17 1969-07-24 Agfa Gevaert Ag Gelatineschichten mit verbesserten physikalischen Eigenschaften
US3635709A (en) * 1966-12-15 1972-01-18 Polychrome Corp Light-sensitive lithographic plate
US3867147A (en) * 1969-05-20 1975-02-18 Hoechst Co American Light-sensitive diazo compounds and reproduction material employing the same
US3660097A (en) * 1969-11-28 1972-05-02 Polychrome Corp Diazo-polyurethane light-sensitive compositions
GB1377978A (en) * 1970-11-25 1974-12-18 Kansai Paint Co Ltd Composition for preparing electroconductive resin
US3754972A (en) * 1971-03-29 1973-08-28 Ppg Industries Inc Phosphate esters and their use as adhesive promoters
US4289838A (en) * 1972-12-14 1981-09-15 Polychrome Corporation Diazo-unsaturated monomer light sensitive compositions
DE2719372A1 (de) * 1977-04-30 1978-11-02 Bayer Ag Verfahren zur herstellung von fuellstoffverstaerkten polyurethanelastomeren
DE2948554A1 (de) * 1979-12-03 1981-06-04 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch
JPS60247637A (ja) * 1984-05-23 1985-12-07 Agency Of Ind Science & Technol 感光性樹脂組成物
JPS6095722A (ja) * 1983-10-28 1985-05-29 Sony Corp 磁気記録媒体
EP0155231B2 (de) * 1984-03-07 1997-01-15 Ciba-Geigy Ag Verfahren zur Herstellung von Abbildungen
EP0168636A3 (de) * 1984-06-18 1988-01-13 Fuji Photo Film Co., Ltd. Verfahren zur Bildung von Mehrschichtenüberzügen
US4732840A (en) * 1985-03-22 1988-03-22 Fuji Photo Film Co., Ltd. Planographic printing plate method using light sensitive material including phenolic resol with dibenzylic ether groups
DE3615612A1 (de) * 1986-05-09 1987-11-12 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
DE3615613A1 (de) * 1986-05-09 1987-11-12 Hoechst Ag Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial
US4877711A (en) * 1986-05-19 1989-10-31 Fuji Photo Film Co., Ltd. Light-sensitive diazo photopolymerizable composition with polyurethane having carbon-carbon unsaturated and a carboxyl group
JPH07120039B2 (ja) * 1986-11-14 1995-12-20 富士写真フイルム株式会社 感光性組成物
JPH0684420B2 (ja) * 1986-12-26 1994-10-26 三菱レイヨン株式会社 活性エネルギ−線硬化性樹脂組成物
JP2593305B2 (ja) * 1987-02-02 1997-03-26 日本ペイント株式会社 ポジ型感光性樹脂組成物
JPH0727208B2 (ja) * 1987-04-20 1995-03-29 富士写真フイルム株式会社 感光性組成物
JPS63265242A (ja) * 1987-04-23 1988-11-01 Fuji Photo Film Co Ltd 多色画像形成方法
JPH0814696B2 (ja) * 1987-09-17 1996-02-14 富士写真フイルム株式会社 感光性樹脂組成物

Also Published As

Publication number Publication date
JP2584672B2 (ja) 1997-02-26
JPH02287546A (ja) 1990-11-27
DE69029222D1 (de) 1997-01-09
US5254432A (en) 1993-10-19
EP0395346A3 (de) 1992-01-29
EP0395346A2 (de) 1990-10-31
EP0395346B1 (de) 1996-11-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee