DE69218924D1 - System zur Erzeugung eines Plasmas mit hoher Dichte - Google Patents

System zur Erzeugung eines Plasmas mit hoher Dichte

Info

Publication number
DE69218924D1
DE69218924D1 DE69218924T DE69218924T DE69218924D1 DE 69218924 D1 DE69218924 D1 DE 69218924D1 DE 69218924 T DE69218924 T DE 69218924T DE 69218924 T DE69218924 T DE 69218924T DE 69218924 D1 DE69218924 D1 DE 69218924D1
Authority
DE
Germany
Prior art keywords
plasma
chamber
source
source chamber
high density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69218924T
Other languages
English (en)
Other versions
DE69218924T2 (de
Inventor
Gregor Campbell
Robert Conn
David Pearson
Alexis Dechambrier
Tatsuo Yomei-Ryo Yomei-C Shoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SPP Process Technology Systems UK Ltd
Original Assignee
Plasma & Materials Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24610292&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69218924(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Plasma & Materials Tech filed Critical Plasma & Materials Tech
Publication of DE69218924D1 publication Critical patent/DE69218924D1/de
Application granted granted Critical
Publication of DE69218924T2 publication Critical patent/DE69218924T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32688—Multi-cusp fields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
DE69218924T 1991-02-04 1992-02-04 System zur Erzeugung eines Plasmas mit hoher Dichte Expired - Lifetime DE69218924T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/650,788 US5122251A (en) 1989-06-13 1991-02-04 High density plasma deposition and etching apparatus
PCT/US1992/000976 WO1992014258A1 (en) 1991-02-04 1992-02-04 High density plasma deposition and etching apparatus

Publications (2)

Publication Number Publication Date
DE69218924D1 true DE69218924D1 (de) 1997-05-15
DE69218924T2 DE69218924T2 (de) 1998-01-15

Family

ID=24610292

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69218924T Expired - Lifetime DE69218924T2 (de) 1991-02-04 1992-02-04 System zur Erzeugung eines Plasmas mit hoher Dichte

Country Status (9)

Country Link
US (1) US5122251A (de)
EP (1) EP0570484B1 (de)
JP (1) JP3271765B2 (de)
KR (1) KR100231221B1 (de)
AT (1) ATE151569T1 (de)
AU (1) AU1352192A (de)
DE (1) DE69218924T2 (de)
ES (1) ES2102497T3 (de)
WO (1) WO1992014258A1 (de)

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KR100231221B1 (ko) 1999-11-15
EP0570484B1 (de) 1997-04-09
ES2102497T3 (es) 1997-08-01
WO1992014258A1 (en) 1992-08-20
DE69218924T2 (de) 1998-01-15
EP0570484A1 (de) 1993-11-24
JPH06506084A (ja) 1994-07-07
JP3271765B2 (ja) 2002-04-08
KR930703694A (ko) 1993-11-30
ATE151569T1 (de) 1997-04-15
US5122251A (en) 1992-06-16

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