DE69220629T2 - Verfahren und Vorrichtung zur Herstellung eines Musters eines Aufzeichnungselementes - Google Patents
Verfahren und Vorrichtung zur Herstellung eines Musters eines AufzeichnungselementesInfo
- Publication number
- DE69220629T2 DE69220629T2 DE69220629T DE69220629T DE69220629T2 DE 69220629 T2 DE69220629 T2 DE 69220629T2 DE 69220629 T DE69220629 T DE 69220629T DE 69220629 T DE69220629 T DE 69220629T DE 69220629 T2 DE69220629 T2 DE 69220629T2
- Authority
- DE
- Germany
- Prior art keywords
- pattern
- making
- recording element
- recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US74213391A | 1991-08-08 | 1991-08-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69220629D1 DE69220629D1 (de) | 1997-08-07 |
DE69220629T2 true DE69220629T2 (de) | 1997-12-18 |
Family
ID=24983622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69220629T Expired - Fee Related DE69220629T2 (de) | 1991-08-08 | 1992-08-07 | Verfahren und Vorrichtung zur Herstellung eines Musters eines Aufzeichnungselementes |
Country Status (5)
Country | Link |
---|---|
US (3) | US5330878A (de) |
EP (1) | EP0528285B1 (de) |
JP (1) | JP3254248B2 (de) |
CA (1) | CA2075026A1 (de) |
DE (1) | DE69220629T2 (de) |
Families Citing this family (65)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2892765B2 (ja) * | 1990-04-27 | 1999-05-17 | 株式会社日立製作所 | パターン構造を有する素子の製造方法 |
CA2075026A1 (en) * | 1991-08-08 | 1993-02-09 | William E. Nelson | Method and apparatus for patterning an imaging member |
US6219015B1 (en) | 1992-04-28 | 2001-04-17 | The Board Of Directors Of The Leland Stanford, Junior University | Method and apparatus for using an array of grating light valves to produce multicolor optical images |
US5684566A (en) * | 1995-05-24 | 1997-11-04 | Svg Lithography Systems, Inc. | Illumination system and method employing a deformable mirror and diffractive optical elements |
US5841579A (en) | 1995-06-07 | 1998-11-24 | Silicon Light Machines | Flat diffraction grating light valve |
JPH09114397A (ja) * | 1995-10-19 | 1997-05-02 | Mitsubishi Electric Corp | ディスプレイデバイスおよびディスプレイ装置 |
US5834160A (en) * | 1996-01-16 | 1998-11-10 | Lucent Technologies Inc. | Method and apparatus for forming fine patterns on printed circuit board |
WO1998004950A1 (en) * | 1996-07-25 | 1998-02-05 | Anvik Corporation | Seamless, maskless lithography system using spatial light modulator |
US5982553A (en) | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
US6088102A (en) | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
SE9800665D0 (sv) * | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
EP0953877B1 (de) * | 1998-04-29 | 2003-12-10 | CST GmbH | Verfahren zur Herstellung von Siebdruckformen sowie eine Belichtungsvorrichtung hierfür |
US6271808B1 (en) | 1998-06-05 | 2001-08-07 | Silicon Light Machines | Stereo head mounted display using a single display device |
US6101036A (en) | 1998-06-23 | 2000-08-08 | Silicon Light Machines | Embossed diffraction grating alone and in combination with changeable image display |
US6130770A (en) | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
US6303986B1 (en) | 1998-07-29 | 2001-10-16 | Silicon Light Machines | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
DE19944760A1 (de) * | 1999-09-17 | 2001-03-22 | Basys Print Gmbh Systeme Fuer | Vorrichtung und Verfahren zur Kompensation von Inhomogenitäten bei Abbildungssystemen |
EP1226571A4 (de) * | 1999-09-17 | 2003-01-29 | Bioarray Solutions Llc | System und verfahren zur erzeugung programmierbarer beleuchtungsmuster |
SE522531C2 (sv) * | 1999-11-24 | 2004-02-17 | Micronic Laser Systems Ab | Metod och anordning för märkning av halvledare |
TW508653B (en) | 2000-03-24 | 2002-11-01 | Asml Netherlands Bv | Lithographic projection apparatus and integrated circuit manufacturing method |
FI109054B (fi) * | 2000-06-21 | 2002-05-15 | Rauno Salmi | Menetelmä yksilöivän merkinnän tekemiseksi piirilevyyn |
DE10031162A1 (de) * | 2000-06-27 | 2002-01-10 | Heidelberger Druckmasch Ag | System zur Belichtung einer Druckform |
JP2002072491A (ja) * | 2000-09-01 | 2002-03-12 | Airex Inc | プリント基板製造装置 |
DE10046518A1 (de) * | 2000-09-15 | 2002-04-04 | Fraunhofer Ges Forschung | Verfahren zur Verbesserung der Bildqualität und zur Erhöhung der Schreibgeschwindigkeit bei Belichtung lichtempfindlicher Schichten |
US6624880B2 (en) | 2001-01-18 | 2003-09-23 | Micronic Laser Systems Ab | Method and apparatus for microlithography |
US6707591B2 (en) | 2001-04-10 | 2004-03-16 | Silicon Light Machines | Angled illumination for a single order light modulator based projection system |
US6753947B2 (en) * | 2001-05-10 | 2004-06-22 | Ultratech Stepper, Inc. | Lithography system and method for device manufacture |
US6782205B2 (en) | 2001-06-25 | 2004-08-24 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
US6747781B2 (en) | 2001-06-25 | 2004-06-08 | Silicon Light Machines, Inc. | Method, apparatus, and diffuser for reducing laser speckle |
US7095484B1 (en) * | 2001-06-27 | 2006-08-22 | University Of South Florida | Method and apparatus for maskless photolithography |
US6829092B2 (en) | 2001-08-15 | 2004-12-07 | Silicon Light Machines, Inc. | Blazed grating light valve |
US6785001B2 (en) * | 2001-08-21 | 2004-08-31 | Silicon Light Machines, Inc. | Method and apparatus for measuring wavelength jitter of light signal |
JP4068838B2 (ja) * | 2001-12-07 | 2008-03-26 | 株式会社日立製作所 | 半導体装置の製造方法 |
US6800238B1 (en) | 2002-01-15 | 2004-10-05 | Silicon Light Machines, Inc. | Method for domain patterning in low coercive field ferroelectrics |
US6665048B2 (en) | 2002-01-22 | 2003-12-16 | Creo Inc. | Method for imaging a continuously moving object |
JP3938714B2 (ja) | 2002-05-16 | 2007-06-27 | 大日本スクリーン製造株式会社 | 露光装置 |
US6767751B2 (en) | 2002-05-28 | 2004-07-27 | Silicon Light Machines, Inc. | Integrated driver process flow |
US6728023B1 (en) | 2002-05-28 | 2004-04-27 | Silicon Light Machines | Optical device arrays with optimized image resolution |
JP4201178B2 (ja) | 2002-05-30 | 2008-12-24 | 大日本スクリーン製造株式会社 | 画像記録装置 |
US6822797B1 (en) | 2002-05-31 | 2004-11-23 | Silicon Light Machines, Inc. | Light modulator structure for producing high-contrast operation using zero-order light |
US6829258B1 (en) | 2002-06-26 | 2004-12-07 | Silicon Light Machines, Inc. | Rapidly tunable external cavity laser |
US6813059B2 (en) | 2002-06-28 | 2004-11-02 | Silicon Light Machines, Inc. | Reduced formation of asperities in contact micro-structures |
US6714337B1 (en) | 2002-06-28 | 2004-03-30 | Silicon Light Machines | Method and device for modulating a light beam and having an improved gamma response |
US6801354B1 (en) | 2002-08-20 | 2004-10-05 | Silicon Light Machines, Inc. | 2-D diffraction grating for substantially eliminating polarization dependent losses |
US7057795B2 (en) * | 2002-08-20 | 2006-06-06 | Silicon Light Machines Corporation | Micro-structures with individually addressable ribbon pairs |
KR101049608B1 (ko) * | 2002-08-24 | 2011-07-14 | 매스크리스 리소그래피 인코퍼레이티드 | 연속적인 직접-기록 광 리쏘그래피 장치 및 방법 |
US6712480B1 (en) | 2002-09-27 | 2004-03-30 | Silicon Light Machines | Controlled curvature of stressed micro-structures |
US6806997B1 (en) | 2003-02-28 | 2004-10-19 | Silicon Light Machines, Inc. | Patterned diffractive light modulator ribbon for PDL reduction |
US6829077B1 (en) | 2003-02-28 | 2004-12-07 | Silicon Light Machines, Inc. | Diffractive light modulator with dynamically rotatable diffraction plane |
JP4390189B2 (ja) | 2003-04-10 | 2009-12-24 | 大日本スクリーン製造株式会社 | パターン描画装置 |
JPWO2005081034A1 (ja) * | 2004-02-25 | 2007-10-25 | 株式会社ニコン | 二次元調光デバイス、露光装置、及び露光方法 |
JP2005311084A (ja) * | 2004-04-21 | 2005-11-04 | Canon Inc | 露光装置、デバイス製造方法、パターン生成装置及びメンテナンス方法 |
JP4601482B2 (ja) * | 2004-07-29 | 2010-12-22 | 新光電気工業株式会社 | 描画装置および描画方法 |
JP2006128194A (ja) * | 2004-10-26 | 2006-05-18 | Canon Inc | 露光装置及びデバイス製造方法 |
DE102004059973A1 (de) * | 2004-12-13 | 2006-06-22 | Imi Intelligent Medical Implants Ag | Vorrichtung zur Steuerung der elektrischen Ladung an Stimulationselektroden |
WO2006105911A2 (de) * | 2005-04-02 | 2006-10-12 | Punch Graphix Prepress Germany Gmbh | Belichtungsvorrichtung für druckplatten |
EP1877869A2 (de) | 2005-05-02 | 2008-01-16 | Radove GmbH | Lithographieverfahren zur maskenlosen musterübertragung auf ein lichtempfindliches substrat |
JP4753625B2 (ja) | 2005-05-31 | 2011-08-24 | 大日本スクリーン製造株式会社 | パターン描画装置およびブロック数決定方法 |
JP2009109550A (ja) | 2007-10-26 | 2009-05-21 | Adtec Engineeng Co Ltd | 直描露光装置 |
NL2007577A (en) | 2010-11-10 | 2012-05-14 | Asml Netherlands Bv | Optimization of source, mask and projection optics. |
JP6106970B2 (ja) * | 2012-07-02 | 2017-04-05 | 株式会社ニコン | 空間光変調器および露光装置 |
US10328685B2 (en) | 2013-12-16 | 2019-06-25 | General Electric Company | Diode laser fiber array for powder bed fabrication or repair |
US10532556B2 (en) | 2013-12-16 | 2020-01-14 | General Electric Company | Control of solidification in laser powder bed fusion additive manufacturing using a diode laser fiber array |
RU2606607C2 (ru) * | 2015-05-27 | 2017-01-10 | 3М Инновейтив Пропертиз Компани | Полирующие композиции, устойчивые к воздействию отрицательных температур |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2441472A1 (de) * | 1974-08-29 | 1976-03-11 | Siemens Ag | Anordnung zum lichtoptischen rechnergesteuerten zeichnen von masken fuer halbleiter-bauelemente |
ZA8244B (en) * | 1981-01-16 | 1982-11-24 | Grace W R & Co | Method and apparatus for making printed circuit boards |
US4436806A (en) * | 1981-01-16 | 1984-03-13 | W. R. Grace & Co. | Method and apparatus for making printed circuit boards |
US4638309A (en) * | 1983-09-08 | 1987-01-20 | Texas Instruments Incorporated | Spatial light modulator drive system |
EP0155000B1 (de) * | 1984-03-16 | 1991-08-14 | Sharp Kabushiki Kaisha | Verfahren zur Herstellung eines optischen Speicherelements |
US4577932A (en) * | 1984-05-08 | 1986-03-25 | Creo Electronics Corporation | Multi-spot modulator using a laser diode |
US5151718A (en) * | 1990-12-31 | 1992-09-29 | Texas Instruments Incorporated | System and method for solid state illumination for dmd devices |
CA2075026A1 (en) * | 1991-08-08 | 1993-02-09 | William E. Nelson | Method and apparatus for patterning an imaging member |
US5530878A (en) * | 1994-11-17 | 1996-06-25 | Sun Microsystems, Inc. | Simplified power system with a single power converter providing low power consumption and a soft on/off feature |
-
1992
- 1992-07-30 CA CA002075026A patent/CA2075026A1/en not_active Abandoned
- 1992-08-07 DE DE69220629T patent/DE69220629T2/de not_active Expired - Fee Related
- 1992-08-07 EP EP92113461A patent/EP0528285B1/de not_active Expired - Lifetime
- 1992-08-07 JP JP21173392A patent/JP3254248B2/ja not_active Expired - Fee Related
-
1993
- 1993-04-14 US US08/047,254 patent/US5330878A/en not_active Expired - Lifetime
-
1994
- 1994-05-16 US US08/242,926 patent/US5482818A/en not_active Expired - Lifetime
-
1995
- 1995-06-07 US US08/478,159 patent/US5672464A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP3254248B2 (ja) | 2002-02-04 |
JPH05206006A (ja) | 1993-08-13 |
CA2075026A1 (en) | 1993-02-09 |
EP0528285B1 (de) | 1997-07-02 |
EP0528285A1 (de) | 1993-02-24 |
DE69220629D1 (de) | 1997-08-07 |
US5482818A (en) | 1996-01-09 |
US5672464A (en) | 1997-09-30 |
US5330878A (en) | 1994-07-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |