DE69228905T4 - Halbleiterspeichergerät - Google Patents
HalbleiterspeichergerätInfo
- Publication number
- DE69228905T4 DE69228905T4 DE69228905T DE69228905T DE69228905T4 DE 69228905 T4 DE69228905 T4 DE 69228905T4 DE 69228905 T DE69228905 T DE 69228905T DE 69228905 T DE69228905 T DE 69228905T DE 69228905 T4 DE69228905 T4 DE 69228905T4
- Authority
- DE
- Germany
- Prior art keywords
- storage device
- semiconductor storage
- semiconductor
- storage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0466—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/861—Diodes
- H01L29/8616—Charge trapping diodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B69/00—Erasable-and-programmable ROM [EPROM] devices not provided for in groups H10B41/00 - H10B63/00, e.g. ultraviolet erasable-and-programmable ROM [UVEPROM] devices
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21510491 | 1991-08-27 | ||
JP4033493A JP2965415B2 (ja) | 1991-08-27 | 1992-02-20 | 半導体記憶装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69228905T2 DE69228905T2 (de) | 1999-08-12 |
DE69228905T4 true DE69228905T4 (de) | 2000-05-18 |
Family
ID=26372195
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69228905T Expired - Lifetime DE69228905T4 (de) | 1991-08-27 | 1992-06-30 | Halbleiterspeichergerät |
DE69228905A Expired - Lifetime DE69228905D1 (de) | 1991-08-27 | 1992-06-30 | Halbleiterspeichergerät |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69228905A Expired - Lifetime DE69228905D1 (de) | 1991-08-27 | 1992-06-30 | Halbleiterspeichergerät |
Country Status (5)
Country | Link |
---|---|
US (1) | US5359554A (de) |
EP (1) | EP0529234B1 (de) |
JP (1) | JP2965415B2 (de) |
KR (1) | KR970002002B1 (de) |
DE (2) | DE69228905T4 (de) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5699298A (en) * | 1996-05-22 | 1997-12-16 | Macronix International Co., Ltd. | Flash memory erase with controlled band-to-band tunneling current |
IL125604A (en) | 1997-07-30 | 2004-03-28 | Saifun Semiconductors Ltd | Non-volatile electrically erasable and programmble semiconductor memory cell utilizing asymmetrical charge |
US6768165B1 (en) | 1997-08-01 | 2004-07-27 | Saifun Semiconductors Ltd. | Two bit non-volatile electrically erasable and programmable semiconductor memory cell utilizing asymmetrical charge trapping |
US6633496B2 (en) | 1997-12-12 | 2003-10-14 | Saifun Semiconductors Ltd. | Symmetric architecture for memory cells having widely spread metal bit lines |
US6430077B1 (en) | 1997-12-12 | 2002-08-06 | Saifun Semiconductors Ltd. | Method for regulating read voltage level at the drain of a cell in a symmetric array |
US6633499B1 (en) | 1997-12-12 | 2003-10-14 | Saifun Semiconductors Ltd. | Method for reducing voltage drops in symmetric array architectures |
US6030871A (en) * | 1998-05-05 | 2000-02-29 | Saifun Semiconductors Ltd. | Process for producing two bit ROM cell utilizing angled implant |
US6215148B1 (en) | 1998-05-20 | 2001-04-10 | Saifun Semiconductors Ltd. | NROM cell with improved programming, erasing and cycling |
US6348711B1 (en) | 1998-05-20 | 2002-02-19 | Saifun Semiconductors Ltd. | NROM cell with self-aligned programming and erasure areas |
ITMI981124A1 (it) * | 1998-05-21 | 1999-11-21 | Sgs Thomson Microelectronics | Metodo processo e dispositivo per l'individuazione di difetti puntuali che provocano correnti di leakage in un dispositivo di memoria non |
US6429063B1 (en) | 1999-10-26 | 2002-08-06 | Saifun Semiconductors Ltd. | NROM cell with generally decoupled primary and secondary injection |
US6490204B2 (en) | 2000-05-04 | 2002-12-03 | Saifun Semiconductors Ltd. | Programming and erasing methods for a reference cell of an NROM array |
US6928001B2 (en) | 2000-12-07 | 2005-08-09 | Saifun Semiconductors Ltd. | Programming and erasing methods for a non-volatile memory cell |
US6396741B1 (en) | 2000-05-04 | 2002-05-28 | Saifun Semiconductors Ltd. | Programming of nonvolatile memory cells |
US6614692B2 (en) | 2001-01-18 | 2003-09-02 | Saifun Semiconductors Ltd. | EEPROM array and method for operation thereof |
US6674667B2 (en) * | 2001-02-13 | 2004-01-06 | Micron Technology, Inc. | Programmable fuse and antifuse and method therefor |
US6584017B2 (en) * | 2001-04-05 | 2003-06-24 | Saifun Semiconductors Ltd. | Method for programming a reference cell |
US6677805B2 (en) * | 2001-04-05 | 2004-01-13 | Saifun Semiconductors Ltd. | Charge pump stage with body effect minimization |
US6636440B2 (en) | 2001-04-25 | 2003-10-21 | Saifun Semiconductors Ltd. | Method for operation of an EEPROM array, including refresh thereof |
US6643181B2 (en) | 2001-10-24 | 2003-11-04 | Saifun Semiconductors Ltd. | Method for erasing a memory cell |
US7098107B2 (en) * | 2001-11-19 | 2006-08-29 | Saifun Semiconductor Ltd. | Protective layer in memory device and method therefor |
US6885585B2 (en) * | 2001-12-20 | 2005-04-26 | Saifun Semiconductors Ltd. | NROM NOR array |
US6583007B1 (en) | 2001-12-20 | 2003-06-24 | Saifun Semiconductors Ltd. | Reducing secondary injection effects |
US7190620B2 (en) * | 2002-01-31 | 2007-03-13 | Saifun Semiconductors Ltd. | Method for operating a memory device |
US6975536B2 (en) | 2002-01-31 | 2005-12-13 | Saifun Semiconductors Ltd. | Mass storage array and methods for operation thereof |
US6700818B2 (en) * | 2002-01-31 | 2004-03-02 | Saifun Semiconductors Ltd. | Method for operating a memory device |
US6914820B1 (en) | 2002-05-06 | 2005-07-05 | Multi Level Memory Technology | Erasing storage nodes in a bi-directional nonvolatile memory cell |
US6747896B2 (en) | 2002-05-06 | 2004-06-08 | Multi Level Memory Technology | Bi-directional floating gate nonvolatile memory |
US7221591B1 (en) * | 2002-05-06 | 2007-05-22 | Samsung Electronics Co., Ltd. | Fabricating bi-directional nonvolatile memory cells |
US6917544B2 (en) | 2002-07-10 | 2005-07-12 | Saifun Semiconductors Ltd. | Multiple use memory chip |
US6826107B2 (en) | 2002-08-01 | 2004-11-30 | Saifun Semiconductors Ltd. | High voltage insertion in flash memory cards |
US6992932B2 (en) | 2002-10-29 | 2006-01-31 | Saifun Semiconductors Ltd | Method circuit and system for read error detection in a non-volatile memory array |
US7136304B2 (en) | 2002-10-29 | 2006-11-14 | Saifun Semiconductor Ltd | Method, system and circuit for programming a non-volatile memory array |
US6963505B2 (en) * | 2002-10-29 | 2005-11-08 | Aifun Semiconductors Ltd. | Method circuit and system for determining a reference voltage |
US6967896B2 (en) | 2003-01-30 | 2005-11-22 | Saifun Semiconductors Ltd | Address scramble |
US7178004B2 (en) | 2003-01-31 | 2007-02-13 | Yan Polansky | Memory array programming circuit and a method for using the circuit |
US7142464B2 (en) * | 2003-04-29 | 2006-11-28 | Saifun Semiconductors Ltd. | Apparatus and methods for multi-level sensing in a memory array |
US6961277B2 (en) * | 2003-07-08 | 2005-11-01 | Micron Technology, Inc. | Method of refreshing a PCRAM memory device |
US7123532B2 (en) | 2003-09-16 | 2006-10-17 | Saifun Semiconductors Ltd. | Operating array cells with matched reference cells |
US6954393B2 (en) * | 2003-09-16 | 2005-10-11 | Saifun Semiconductors Ltd. | Reading array cell with matched reference cell |
WO2005094178A2 (en) | 2004-04-01 | 2005-10-13 | Saifun Semiconductors Ltd. | Method, circuit and systems for erasing one or more non-volatile memory cells |
US7366025B2 (en) * | 2004-06-10 | 2008-04-29 | Saifun Semiconductors Ltd. | Reduced power programming of non-volatile cells |
US7317633B2 (en) | 2004-07-06 | 2008-01-08 | Saifun Semiconductors Ltd | Protection of NROM devices from charge damage |
US7095655B2 (en) | 2004-08-12 | 2006-08-22 | Saifun Semiconductors Ltd. | Dynamic matching of signal path and reference path for sensing |
US7638850B2 (en) | 2004-10-14 | 2009-12-29 | Saifun Semiconductors Ltd. | Non-volatile memory structure and method of fabrication |
US7535765B2 (en) | 2004-12-09 | 2009-05-19 | Saifun Semiconductors Ltd. | Non-volatile memory device and method for reading cells |
EP1684307A1 (de) | 2005-01-19 | 2006-07-26 | Saifun Semiconductors Ltd. | Verfahren, Schaltung und System zum Löschen einer oder mehrerer nichtflüchtiger Speicherzellen |
US8053812B2 (en) | 2005-03-17 | 2011-11-08 | Spansion Israel Ltd | Contact in planar NROM technology |
US8400841B2 (en) | 2005-06-15 | 2013-03-19 | Spansion Israel Ltd. | Device to program adjacent storage cells of different NROM cells |
US7184313B2 (en) | 2005-06-17 | 2007-02-27 | Saifun Semiconductors Ltd. | Method circuit and system for compensating for temperature induced margin loss in non-volatile memory cells |
US7804126B2 (en) | 2005-07-18 | 2010-09-28 | Saifun Semiconductors Ltd. | Dense non-volatile memory array and method of fabrication |
US7668017B2 (en) | 2005-08-17 | 2010-02-23 | Saifun Semiconductors Ltd. | Method of erasing non-volatile memory cells |
US7221138B2 (en) | 2005-09-27 | 2007-05-22 | Saifun Semiconductors Ltd | Method and apparatus for measuring charge pump output current |
US7352627B2 (en) | 2006-01-03 | 2008-04-01 | Saifon Semiconductors Ltd. | Method, system, and circuit for operating a non-volatile memory array |
US7808818B2 (en) | 2006-01-12 | 2010-10-05 | Saifun Semiconductors Ltd. | Secondary injection for NROM |
US7760554B2 (en) | 2006-02-21 | 2010-07-20 | Saifun Semiconductors Ltd. | NROM non-volatile memory and mode of operation |
US7692961B2 (en) | 2006-02-21 | 2010-04-06 | Saifun Semiconductors Ltd. | Method, circuit and device for disturb-control of programming nonvolatile memory cells by hot-hole injection (HHI) and by channel hot-electron (CHE) injection |
US8253452B2 (en) | 2006-02-21 | 2012-08-28 | Spansion Israel Ltd | Circuit and method for powering up an integrated circuit and an integrated circuit utilizing same |
US7638835B2 (en) | 2006-02-28 | 2009-12-29 | Saifun Semiconductors Ltd. | Double density NROM with nitride strips (DDNS) |
US7701779B2 (en) | 2006-04-27 | 2010-04-20 | Sajfun Semiconductors Ltd. | Method for programming a reference cell |
US7605579B2 (en) | 2006-09-18 | 2009-10-20 | Saifun Semiconductors Ltd. | Measuring and controlling current consumption and output current of charge pumps |
ES2582217B2 (es) * | 2016-05-02 | 2017-02-16 | Klapcap Solutions, S.L. | Dispositivo de rellenado de cápsulas de bebidas y método de rellenado de cápsulas de bebidas. |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4360900A (en) * | 1978-11-27 | 1982-11-23 | Texas Instruments Incorporated | Non-volatile semiconductor memory elements |
GB8308309D0 (en) * | 1983-03-25 | 1983-05-05 | Qmc Ind Res | Information holding device |
KR910008830B1 (ko) * | 1988-08-18 | 1991-10-21 | 현대전자산업 주식회사 | 산화물벽과 질화물벽을 이용한 트렌치 측면벽 도핑방법 및 그 반도체 소자 |
JP2615922B2 (ja) * | 1988-10-14 | 1997-06-04 | 松下電器産業株式会社 | 半導体不揮発性メモリ |
US5162880A (en) * | 1989-09-27 | 1992-11-10 | Kabushiki Kaisha Toshiba | Nonvolatile memory cell having gate insulation film with carrier traps therein |
JPH03112167A (ja) * | 1989-09-27 | 1991-05-13 | Toshiba Corp | 不揮発性メモリセル |
JPH03209728A (ja) * | 1989-10-11 | 1991-09-12 | Mitsubishi Electric Corp | 半導体装置 |
JP2957615B2 (ja) * | 1989-11-27 | 1999-10-06 | 三菱電機株式会社 | 不揮発性半導体記憶装置 |
US5032545A (en) * | 1990-10-30 | 1991-07-16 | Micron Technology, Inc. | Process for preventing a native oxide from forming on the surface of a semiconductor material and integrated circuit capacitors produced thereby |
-
1992
- 1992-02-20 JP JP4033493A patent/JP2965415B2/ja not_active Expired - Fee Related
- 1992-06-30 EP EP92111022A patent/EP0529234B1/de not_active Expired - Lifetime
- 1992-06-30 DE DE69228905T patent/DE69228905T4/de not_active Expired - Lifetime
- 1992-06-30 US US07/906,671 patent/US5359554A/en not_active Expired - Lifetime
- 1992-06-30 DE DE69228905A patent/DE69228905D1/de not_active Expired - Lifetime
- 1992-08-26 KR KR92015377A patent/KR970002002B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP0529234B1 (de) | 1999-04-14 |
EP0529234A3 (de) | 1995-06-28 |
KR970002002B1 (en) | 1997-02-20 |
EP0529234A2 (de) | 1993-03-03 |
JP2965415B2 (ja) | 1999-10-18 |
DE69228905D1 (de) | 1999-05-20 |
JPH05121765A (ja) | 1993-05-18 |
DE69228905T2 (de) | 1999-08-12 |
US5359554A (en) | 1994-10-25 |
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