DE69320151T2 - Flachen magnetronzerstäubungsanlage - Google Patents

Flachen magnetronzerstäubungsanlage

Info

Publication number
DE69320151T2
DE69320151T2 DE69320151T DE69320151T DE69320151T2 DE 69320151 T2 DE69320151 T2 DE 69320151T2 DE 69320151 T DE69320151 T DE 69320151T DE 69320151 T DE69320151 T DE 69320151T DE 69320151 T2 DE69320151 T2 DE 69320151T2
Authority
DE
Germany
Prior art keywords
magnetic
pole piece
central magnet
magnets
lobe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69320151T
Other languages
English (en)
Other versions
DE69320151D1 (de
Inventor
Barry W Manley
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MANLEY KELLEY BOULDER COL US
Original Assignee
MANLEY KELLEY BOULDER COL US
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25398683&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69320151(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by MANLEY KELLEY BOULDER COL US filed Critical MANLEY KELLEY BOULDER COL US
Application granted granted Critical
Publication of DE69320151D1 publication Critical patent/DE69320151D1/de
Publication of DE69320151T2 publication Critical patent/DE69320151T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3452—Magnet distribution
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
DE69320151T 1992-06-01 1993-05-25 Flachen magnetronzerstäubungsanlage Expired - Fee Related DE69320151T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/891,707 US5262028A (en) 1992-06-01 1992-06-01 Planar magnetron sputtering magnet assembly
PCT/US1993/004898 WO1993024674A1 (en) 1992-06-01 1993-05-25 Improved planar magnetron sputtering magnet assembly

Publications (2)

Publication Number Publication Date
DE69320151D1 DE69320151D1 (de) 1998-09-10
DE69320151T2 true DE69320151T2 (de) 1999-01-14

Family

ID=25398683

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69320151T Expired - Fee Related DE69320151T2 (de) 1992-06-01 1993-05-25 Flachen magnetronzerstäubungsanlage

Country Status (9)

Country Link
US (1) US5262028A (de)
EP (1) EP0600070B1 (de)
JP (1) JP3473954B2 (de)
AT (1) ATE169349T1 (de)
AU (1) AU4388293A (de)
DE (1) DE69320151T2 (de)
DK (1) DK0600070T3 (de)
ES (1) ES2122024T3 (de)
WO (1) WO1993024674A1 (de)

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US5980707A (en) * 1998-12-18 1999-11-09 Sierra Applied Sciences, Inc. Apparatus and method for a magnetron cathode with moving magnet assembly
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US6183614B1 (en) 1999-02-12 2001-02-06 Applied Materials, Inc. Rotating sputter magnetron assembly
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US6290825B1 (en) * 1999-02-12 2001-09-18 Applied Materials, Inc. High-density plasma source for ionized metal deposition
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US6146509A (en) * 1999-06-11 2000-11-14 Scivac Inverted field circular magnetron sputtering device
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US6299740B1 (en) 2000-01-19 2001-10-09 Veeco Instrument, Inc. Sputtering assembly and target therefor
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US6863699B1 (en) * 2000-11-03 2005-03-08 Front Edge Technology, Inc. Sputter deposition of lithium phosphorous oxynitride material
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US6740212B2 (en) * 2002-10-18 2004-05-25 Qi Hua Fan Rectangular magnetron sputtering cathode with high target utilization
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US7513982B2 (en) * 2004-01-07 2009-04-07 Applied Materials, Inc. Two dimensional magnetron scanning for flat panel sputtering
US20060049040A1 (en) * 2004-01-07 2006-03-09 Applied Materials, Inc. Apparatus and method for two dimensional magnetron scanning for sputtering onto flat panels
US8500975B2 (en) * 2004-01-07 2013-08-06 Applied Materials, Inc. Method and apparatus for sputtering onto large flat panels
US7087145B1 (en) 2005-03-10 2006-08-08 Robert Choquette Sputtering cathode assembly
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US7846579B2 (en) 2005-03-25 2010-12-07 Victor Krasnov Thin film battery with protective packaging
US8470141B1 (en) * 2005-04-29 2013-06-25 Angstrom Sciences, Inc. High power cathode
US7316763B2 (en) * 2005-05-24 2008-01-08 Applied Materials, Inc. Multiple target tiles with complementary beveled edges forming a slanted gap therebetween
JP2008542535A (ja) * 2005-06-04 2008-11-27 アプライド マテリアルズ ゲーエムベーハー アンド コンパニー カーゲー スパッタ用マグネトロン
JP2007092136A (ja) 2005-09-29 2007-04-12 Shin Meiwa Ind Co Ltd マグネトロンスパッタリング用の磁石構造体およびカソード電極ユニット並びにマグネトロンスパッタリング装置
US7498587B2 (en) * 2006-05-01 2009-03-03 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
BRPI0711644B1 (pt) * 2006-05-16 2019-03-19 Oerlikon Trading Ag, Trübbach Fonte de arco voltaico com um alvo e processo para a produção de peças revestidas por arco voltaico
DE602006002264D1 (de) * 2006-06-01 2008-09-25 Varian Spa Magnetanordnung für eine Sputter-Ionenpumpe
US8236152B2 (en) * 2006-11-24 2012-08-07 Ascentool International Ltd. Deposition system
JP5217051B2 (ja) * 2006-11-27 2013-06-19 オムロン株式会社 薄膜製造方法
US7862927B2 (en) 2007-03-02 2011-01-04 Front Edge Technology Thin film battery and manufacturing method
US7862627B2 (en) 2007-04-27 2011-01-04 Front Edge Technology, Inc. Thin film battery substrate cutting and fabrication process
US8870974B2 (en) 2008-02-18 2014-10-28 Front Edge Technology, Inc. Thin film battery fabrication using laser shaping
US8628645B2 (en) 2007-09-04 2014-01-14 Front Edge Technology, Inc. Manufacturing method for thin film battery
JP4526582B2 (ja) * 2007-11-30 2010-08-18 パナソニック株式会社 スパッタリング装置およびスパッタリング方法
US8016982B2 (en) * 2007-11-30 2011-09-13 Panasonic Corporation Sputtering apparatus and sputtering method
US10043642B2 (en) * 2008-02-01 2018-08-07 Oerlikon Surface Solutions Ag, Pfäffikon Magnetron sputtering source and arrangement with adjustable secondary magnet arrangement
WO2010021613A1 (en) * 2008-08-20 2010-02-25 Ascentool, Inc. Deposition system
KR101094995B1 (ko) 2009-08-25 2011-12-19 금오공과대학교 산학협력단 스퍼터링 장치
US8502494B2 (en) 2009-08-28 2013-08-06 Front Edge Technology, Inc. Battery charging apparatus and method
WO2012035603A1 (ja) * 2010-09-13 2012-03-22 株式会社シンクロン 磁場発生装置、マグネトロンカソード及びスパッタ装置
CN103562433B (zh) * 2011-05-30 2016-05-04 日立金属株式会社 跑道形状的磁控溅射用磁场产生装置
US8865340B2 (en) 2011-10-20 2014-10-21 Front Edge Technology Inc. Thin film battery packaging formed by localized heating
US9887429B2 (en) 2011-12-21 2018-02-06 Front Edge Technology Inc. Laminated lithium battery
US8864954B2 (en) 2011-12-23 2014-10-21 Front Edge Technology Inc. Sputtering lithium-containing material with multiple targets
US9077000B2 (en) 2012-03-29 2015-07-07 Front Edge Technology, Inc. Thin film battery and localized heat treatment
US9257695B2 (en) 2012-03-29 2016-02-09 Front Edge Technology, Inc. Localized heat treatment of battery component films
WO2014010148A1 (ja) * 2012-07-11 2014-01-16 キヤノンアネルバ株式会社 スパッタリング装置および磁石ユニット
US9159964B2 (en) 2012-09-25 2015-10-13 Front Edge Technology, Inc. Solid state battery having mismatched battery cells
US8753724B2 (en) 2012-09-26 2014-06-17 Front Edge Technology Inc. Plasma deposition on a partially formed battery through a mesh screen
US9356320B2 (en) 2012-10-15 2016-05-31 Front Edge Technology Inc. Lithium battery having low leakage anode
JP2015017304A (ja) * 2013-07-11 2015-01-29 ソニー株式会社 磁界発生装置、及びスパッタリング装置
TWI527924B (zh) * 2014-02-12 2016-04-01 兆陽真空動力股份有限公司 電磁控濺鍍陰極
US9968016B2 (en) * 2014-08-11 2018-05-08 Toyota Motor Engineering & Manufacturing North America, Inc. Magnetic field shield
US10008739B2 (en) 2015-02-23 2018-06-26 Front Edge Technology, Inc. Solid-state lithium battery with electrolyte
JP6607251B2 (ja) * 2015-03-19 2019-11-20 日立金属株式会社 マグネトロンスパッタリング用磁場発生装置
DE102016116568A1 (de) 2016-09-05 2018-03-08 Von Ardenne Gmbh Sputtervorrichtung und -verfahren
US20190043701A1 (en) * 2017-08-02 2019-02-07 HIA, Inc. Inverted magnetron for processing of thin film materials
CN111868877B (zh) * 2017-12-05 2023-08-18 欧瑞康表面解决方案普费菲孔股份公司 磁控溅射源和涂覆系统布置
GB201817176D0 (en) * 2018-10-22 2018-12-05 Univ Sheffield Apparatus and methods for targeted drug delivery
CN113755808A (zh) * 2021-09-28 2021-12-07 北海惠科半导体科技有限公司 磁控溅射装置及其控制方法

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Also Published As

Publication number Publication date
JPH07507360A (ja) 1995-08-10
EP0600070A4 (de) 1994-10-26
ATE169349T1 (de) 1998-08-15
WO1993024674A1 (en) 1993-12-09
ES2122024T3 (es) 1998-12-16
AU4388293A (en) 1993-12-30
JP3473954B2 (ja) 2003-12-08
DE69320151D1 (de) 1998-09-10
DK0600070T3 (da) 1999-05-10
EP0600070B1 (de) 1998-08-05
EP0600070A1 (de) 1994-06-08
US5262028A (en) 1993-11-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee