DE69321994D1 - Anlage für die Herstellung von Reinigungswasser - Google Patents

Anlage für die Herstellung von Reinigungswasser

Info

Publication number
DE69321994D1
DE69321994D1 DE69321994T DE69321994T DE69321994D1 DE 69321994 D1 DE69321994 D1 DE 69321994D1 DE 69321994 T DE69321994 T DE 69321994T DE 69321994 T DE69321994 T DE 69321994T DE 69321994 D1 DE69321994 D1 DE 69321994D1
Authority
DE
Germany
Prior art keywords
plant
production
cleaning water
cleaning
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69321994T
Other languages
English (en)
Other versions
DE69321994T2 (de
Inventor
Hiroshi Nagai
Yukio Ikeda
Takayuki Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of DE69321994D1 publication Critical patent/DE69321994D1/de
Application granted granted Critical
Publication of DE69321994T2 publication Critical patent/DE69321994T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F9/00—Multistage treatment of water, waste water or sewage
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/20—Treatment of water, waste water, or sewage by degassing, i.e. liberation of dissolved gases
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/28—Treatment of water, waste water, or sewage by sorption
    • C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
    • C02F1/444—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by ultrafiltration or microfiltration
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3227—Units with two or more lamps
DE69321994T 1992-05-28 1993-05-28 Anlage für die Herstellung von Reinigungswasser Expired - Fee Related DE69321994T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4160091A JP2652301B2 (ja) 1992-05-28 1992-05-28 洗浄水製造装置

Publications (2)

Publication Number Publication Date
DE69321994D1 true DE69321994D1 (de) 1998-12-17
DE69321994T2 DE69321994T2 (de) 1999-06-24

Family

ID=15707667

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69321994T Expired - Fee Related DE69321994T2 (de) 1992-05-28 1993-05-28 Anlage für die Herstellung von Reinigungswasser

Country Status (5)

Country Link
US (1) US5614088A (de)
EP (1) EP0572035B1 (de)
JP (1) JP2652301B2 (de)
KR (1) KR100254098B1 (de)
DE (1) DE69321994T2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR970008315A (ko) * 1995-07-26 1997-02-24 김광호 반도체장치
JPH11290848A (ja) * 1998-04-08 1999-10-26 Chiyoda Kohan Co Ltd 濾過方法及び装置
DE19900805C2 (de) 1999-01-12 2002-06-13 Infineon Technologies Ag Verfahren und Vorrichtung zur Erzeugung von Reinstwasser
JP4565364B2 (ja) * 1999-08-02 2010-10-20 栗田工業株式会社 超純水製造供給装置の抗菌方法及び抗菌装置
US6328881B1 (en) 2000-03-08 2001-12-11 Barnstead Thermolyne Corporation Water purification system and method including dispensed volume sensing and control
USRE40310E1 (en) 2000-03-08 2008-05-13 Barnstead Thermolyne Corporation Water purification system and method including dispensed volume sensing and control
JP3966501B2 (ja) * 2002-03-18 2007-08-29 オルガノ株式会社 超純水製造装置
JP4736339B2 (ja) * 2004-03-29 2011-07-27 栗田工業株式会社 送液手段および送液方法
JP4742509B2 (ja) * 2004-03-31 2011-08-10 栗田工業株式会社 純水供給システム
JP4860915B2 (ja) * 2004-12-17 2012-01-25 パナソニック株式会社 送液手段および送液方法
FR2896792B1 (fr) 2006-01-27 2008-07-18 Millipore Corp Systeme et procede de purification d'eau
FR2896793B1 (fr) 2006-01-27 2008-08-08 Millipore Corp Systeme et procede de purification d'eau
JP5072062B2 (ja) * 2006-03-13 2012-11-14 栗田工業株式会社 水素ガス溶解洗浄水の製造方法、製造装置及び洗浄装置
JP2009154158A (ja) * 2009-04-03 2009-07-16 Kurita Water Ind Ltd 純水供給システム
US8552719B2 (en) * 2009-08-03 2013-10-08 Microfier, Inc. Method and apparatus for the purification and analytical evaluation of highly purified liquids
JP2010115652A (ja) * 2010-01-08 2010-05-27 Kurita Water Ind Ltd 純水供給システム
DE102010043662B4 (de) * 2010-11-09 2012-06-14 Michael Eumann Brauereiabwasseraufbereitungsverfahren sowie Brauereiabwasseraufbereitungsvorrichtung
JP5874223B2 (ja) * 2011-07-08 2016-03-02 栗田工業株式会社 オゾン水供給装置及びオゾン水供給方法
US9607864B2 (en) * 2012-05-23 2017-03-28 Stmicroelectronics, Inc. Dual medium filter for ion and particle filtering during semiconductor processing
CN105753202B (zh) * 2016-05-03 2018-03-23 海南立昇净水科技实业有限公司 一种纯净水机的控制方法及其控制系统
JP6981331B2 (ja) * 2018-03-23 2021-12-15 栗田工業株式会社 超純水供給装置
CN111320236A (zh) * 2018-12-14 2020-06-23 福建钦榕环保科技有限公司 一种气水混合均匀的带状软式超滤膜
WO2020206206A1 (en) * 2019-04-05 2020-10-08 Ecolab Usa Inc. Clean-in-place using ultrasoft water
WO2023076340A1 (en) * 2021-10-26 2023-05-04 Regeneron Pharmaceuticals, Inc. Systems and methods for generating laboratory water and distributing laboratory water at different temperatures

Family Cites Families (27)

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Publication number Priority date Publication date Assignee Title
US3774763A (en) * 1970-10-15 1973-11-27 Culligan Int Co Water purification system
US3870033A (en) * 1973-11-30 1975-03-11 Aqua Media Ultra pure water process and apparatus
US4280912A (en) * 1978-05-22 1981-07-28 Darco Water Systems, Inc. Water purification unit and method
US4179373A (en) * 1978-09-14 1979-12-18 Consolidated Foods Corporation Shutoff and bypass valve
US4470911A (en) * 1983-10-11 1984-09-11 Autotrol Corporation Microcomputer controlled demand/scheduled water softener with variable capacity
JPS60166040A (ja) * 1984-02-08 1985-08-29 Hitachi Ltd イオン交換樹脂の調整法
US4548716A (en) * 1984-07-25 1985-10-22 Lucas Boeve Method of producing ultrapure, pyrogen-free water
US4595498A (en) * 1984-12-27 1986-06-17 Thomson Components-Mostek Corporation Water-polishing loop
JPS61181589A (ja) * 1985-02-06 1986-08-14 Nippon Paint Co Ltd 脱イオン純水製造装置
US4784772A (en) * 1986-06-17 1988-11-15 Mitsui Toatsu Chemicals, Incorporated Method for the production and use of ultrapure water and apparatus therefor
JPS63108724A (ja) * 1986-10-27 1988-05-13 Japan Organo Co Ltd 半導体洗浄用超純水の製造方法
JPS6476726A (en) * 1987-09-17 1989-03-22 Hitachi Ltd Manufacture of semiconductor
JPS63305917A (ja) * 1987-06-05 1988-12-13 Hitachi Ltd 超純水製造方法及びその製造装置
US4784763A (en) * 1987-07-13 1988-11-15 Labconco Corporation Water purification machine
JPS6438186A (en) * 1987-07-31 1989-02-08 Organo Kk Controlling method for ultrapure water producing device
US4808187A (en) * 1987-10-05 1989-02-28 Iowa State University Research Foundation, Inc. Tactile stimulus receptor for a hand prosthesis
US4808287A (en) * 1987-12-21 1989-02-28 Hark Ernst F Water purification process
JP2661946B2 (ja) * 1988-03-11 1997-10-08 忠弘 大見 超純水供配管装置
JPH01307487A (ja) * 1988-06-02 1989-12-12 Kurita Water Ind Ltd 超純水供給端末殺菌装置
JPH0649187B2 (ja) * 1988-06-29 1994-06-29 忠弘 大見 超純水供給配管装置
US5024766A (en) * 1988-11-09 1991-06-18 Shahzad Mahmud Point of use deionized water purification unit
JP2768732B2 (ja) * 1989-05-01 1998-06-25 神鋼パンテック株式会社 加熱脱気超純水装置
JPH0647105B2 (ja) * 1989-12-19 1994-06-22 株式会社荏原総合研究所 純水又は超純水の精製方法及び装置
US5082557A (en) * 1990-04-02 1992-01-21 Rainsoft Water Conditioning Co. Control head for water purifier
JPH0790219B2 (ja) * 1990-08-01 1995-10-04 日本錬水株式会社 純水製造装置及び製造方法
US5068030A (en) * 1990-11-09 1991-11-26 Oxford Science Industrial Co., Ltd. Water filtering sterilizing and heating apparatus
US5128043A (en) * 1991-02-13 1992-07-07 Wildermuth Glen W Method and apparatus for purifying liquids

Also Published As

Publication number Publication date
KR940005500A (ko) 1994-03-21
JP2652301B2 (ja) 1997-09-10
EP0572035B1 (de) 1998-11-11
JPH05329470A (ja) 1993-12-14
EP0572035A2 (de) 1993-12-01
KR100254098B1 (ko) 2000-04-15
DE69321994T2 (de) 1999-06-24
EP0572035A3 (en) 1993-12-29
US5614088A (en) 1997-03-25

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee