DE69325650D1 - Einrichtung zur Erzeugung magnetischer Felder in Arbeitsspalten, die zur Bestrahlung einer Fläche mit atomaren und molekularen Ionen nutzbar sind - Google Patents

Einrichtung zur Erzeugung magnetischer Felder in Arbeitsspalten, die zur Bestrahlung einer Fläche mit atomaren und molekularen Ionen nutzbar sind

Info

Publication number
DE69325650D1
DE69325650D1 DE69325650T DE69325650T DE69325650D1 DE 69325650 D1 DE69325650 D1 DE 69325650D1 DE 69325650 T DE69325650 T DE 69325650T DE 69325650 T DE69325650 T DE 69325650T DE 69325650 D1 DE69325650 D1 DE 69325650D1
Authority
DE
Germany
Prior art keywords
irradiate
atomic
magnetic fields
molecular ions
generating magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69325650T
Other languages
English (en)
Other versions
DE69325650T2 (de
Inventor
Hilton F Glavish
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Ion Equipment Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Application granted granted Critical
Publication of DE69325650D1 publication Critical patent/DE69325650D1/de
Publication of DE69325650T2 publication Critical patent/DE69325650T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/08—Deviation, concentration or focusing of the beam by electric or magnetic means
    • G21K1/093—Deviation, concentration or focusing of the beam by electric or magnetic means by magnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F3/00—Cores, Yokes, or armatures
    • H01F3/02—Cores, Yokes, or armatures made from sheets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F7/00—Magnets
    • H01F7/06—Electromagnets; Actuators including electromagnets
    • H01F7/20—Electromagnets; Actuators including electromagnets without armatures
    • H01F7/202—Electromagnets for high magnetic field strength
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70—Arrangements for deflecting ray or beam
    • H01J29/72—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J29/76—Deflecting by magnetic fields only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/26—Arrangements for deflecting ray or beam
    • H01J3/28—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines
    • H01J3/32—Arrangements for deflecting ray or beam along one straight line or along two perpendicular straight lines by magnetic fields only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
DE69325650T 1992-02-28 1993-03-01 Einrichtung zur Erzeugung magnetischer Felder in Arbeitsspalten, die zur Bestrahlung einer Fläche mit atomaren und molekularen Ionen nutzbar sind Expired - Lifetime DE69325650T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/843,391 US5311028A (en) 1990-08-29 1992-02-28 System and method for producing oscillating magnetic fields in working gaps useful for irradiating a surface with atomic and molecular ions

Publications (2)

Publication Number Publication Date
DE69325650D1 true DE69325650D1 (de) 1999-08-19
DE69325650T2 DE69325650T2 (de) 1999-12-30

Family

ID=25289833

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69325650T Expired - Lifetime DE69325650T2 (de) 1992-02-28 1993-03-01 Einrichtung zur Erzeugung magnetischer Felder in Arbeitsspalten, die zur Bestrahlung einer Fläche mit atomaren und molekularen Ionen nutzbar sind

Country Status (6)

Country Link
US (3) US5311028A (de)
EP (2) EP0632929A4 (de)
JP (3) JP3475253B2 (de)
KR (1) KR100333111B1 (de)
DE (1) DE69325650T2 (de)
WO (1) WO1993017445A1 (de)

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DE69325650T2 (de) 1999-12-30
US5483077A (en) 1996-01-09
EP0632929A4 (de) 1995-08-02
WO1993017445A1 (en) 1993-09-02
EP0631358A2 (de) 1994-12-28
EP0632929A1 (de) 1995-01-11
EP0631358A3 (de) 1995-08-02
US5393984A (en) 1995-02-28
JP2005191011A (ja) 2005-07-14
JPH10513301A (ja) 1998-12-15
JP3975363B2 (ja) 2007-09-12
JP3734173B2 (ja) 2006-01-11
KR100333111B1 (ko) 2002-11-07
US5311028A (en) 1994-05-10
KR950701130A (ko) 1995-02-20
JP2004103555A (ja) 2004-04-02
EP0631358B1 (de) 1999-07-14

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