DE69413665T2 - Passivierungsverfahren für eine ferroelektrische integrierte Schaltung, das harte keramische Materialien benutzt - Google Patents
Passivierungsverfahren für eine ferroelektrische integrierte Schaltung, das harte keramische Materialien benutztInfo
- Publication number
- DE69413665T2 DE69413665T2 DE69413665T DE69413665T DE69413665T2 DE 69413665 T2 DE69413665 T2 DE 69413665T2 DE 69413665 T DE69413665 T DE 69413665T DE 69413665 T DE69413665 T DE 69413665T DE 69413665 T2 DE69413665 T2 DE 69413665T2
- Authority
- DE
- Germany
- Prior art keywords
- integrated circuit
- ceramic materials
- passivation process
- hard ceramic
- ferroelectric integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3157—Partial encapsulation or coating
- H01L23/3192—Multilayer coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19041—Component type being a capacitor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/958—Passivation layer
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/212,495 US5438023A (en) | 1994-03-11 | 1994-03-11 | Passivation method and structure for a ferroelectric integrated circuit using hard ceramic materials or the like |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69413665D1 DE69413665D1 (de) | 1998-11-05 |
DE69413665T2 true DE69413665T2 (de) | 1999-06-17 |
Family
ID=22791262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69413665T Expired - Fee Related DE69413665T2 (de) | 1994-03-11 | 1994-12-09 | Passivierungsverfahren für eine ferroelektrische integrierte Schaltung, das harte keramische Materialien benutzt |
Country Status (4)
Country | Link |
---|---|
US (2) | US5438023A (de) |
EP (1) | EP0671765B1 (de) |
JP (1) | JP2921556B2 (de) |
DE (1) | DE69413665T2 (de) |
Families Citing this family (73)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5698473A (en) * | 1994-03-16 | 1997-12-16 | Advanced Micro Devices, Inc. | Method for forming a silane based boron phosphorous silicate planarization structure |
US5705041A (en) * | 1994-04-07 | 1998-01-06 | Texas Instruments Incorporated | Method of minimizing surface effects in thin ferroelectrics |
JP2907322B2 (ja) * | 1995-05-18 | 1999-06-21 | 日本電気株式会社 | 不揮発性半導体記憶装置 |
US6004839A (en) * | 1996-01-17 | 1999-12-21 | Nec Corporation | Semiconductor device with conductive plugs |
US6172590B1 (en) | 1996-01-22 | 2001-01-09 | Surgx Corporation | Over-voltage protection device and method for making same |
KR100207459B1 (ko) * | 1996-02-21 | 1999-07-15 | 윤종용 | 강유전체 메모리 장치 및 그 제조 방법 |
US5716875A (en) * | 1996-03-01 | 1998-02-10 | Motorola, Inc. | Method for making a ferroelectric device |
US5593914A (en) * | 1996-03-19 | 1997-01-14 | Radiant Technologies, Inc. | Method for constructing ferroelectric capacitor-like structures on silicon dioxide surfaces |
KR100200704B1 (ko) * | 1996-06-07 | 1999-06-15 | 윤종용 | 강유전체 메모리 장치 및 그 제조 방법 |
US5736759A (en) * | 1996-07-24 | 1998-04-07 | Nec Research Institute, Inc. | Reduced fatigue ferroelectric element |
US5920453A (en) * | 1996-08-20 | 1999-07-06 | Ramtron International Corporation | Completely encapsulated top electrode of a ferroelectric capacitor |
US6027947A (en) * | 1996-08-20 | 2000-02-22 | Ramtron International Corporation | Partially or completely encapsulated top electrode of a ferroelectric capacitor |
US5864932A (en) * | 1996-08-20 | 1999-02-02 | Ramtron International Corporation | Partially or completely encapsulated top electrode of a ferroelectric capacitor |
EP0837504A3 (de) * | 1996-08-20 | 1999-01-07 | Ramtron International Corporation | Teilweise oder ganz eingekapselte ferroelektrische Anordnung |
US5990513A (en) * | 1996-10-08 | 1999-11-23 | Ramtron International Corporation | Yield enhancement technique for integrated circuit processing to reduce effects of undesired dielectric moisture retention and subsequent hydrogen out-diffusion |
US5902131A (en) * | 1997-05-09 | 1999-05-11 | Ramtron International Corporation | Dual-level metalization method for integrated circuit ferroelectric devices |
KR100269306B1 (ko) * | 1997-07-31 | 2000-10-16 | 윤종용 | 저온처리로안정화되는금속산화막으로구성된완충막을구비하는집적회로장치및그제조방법 |
DE19738549C1 (de) * | 1997-09-03 | 1998-12-10 | Siemens Ag | Verpackte integrierte Schaltung |
KR100269309B1 (ko) | 1997-09-29 | 2000-10-16 | 윤종용 | 고집적강유전체메모리장치및그제조방법 |
JPH11145410A (ja) * | 1997-11-13 | 1999-05-28 | Toshiba Corp | 半導体装置およびその製造方法 |
US6091132A (en) * | 1997-12-19 | 2000-07-18 | Stmicroelectronics, Inc. | Passivation for integrated circuit sensors |
US6064094A (en) * | 1998-03-10 | 2000-05-16 | Oryx Technology Corporation | Over-voltage protection system for integrated circuits using the bonding pads and passivation layer |
US6229167B1 (en) * | 1998-03-24 | 2001-05-08 | Rohm Co., Ltd. | Semiconductor device and method of manufacturing the same |
KR100268453B1 (ko) * | 1998-03-30 | 2000-11-01 | 윤종용 | 반도체 장치 및 그것의 제조 방법 |
US6207465B1 (en) * | 1998-04-17 | 2001-03-27 | Symetrix Corporation | Method of fabricating ferroelectric integrated circuit using dry and wet etching |
JP3236262B2 (ja) * | 1998-06-16 | 2001-12-10 | 松下電器産業株式会社 | 強誘電体メモリ装置 |
US6352940B1 (en) * | 1998-06-26 | 2002-03-05 | Intel Corporation | Semiconductor passivation deposition process for interfacial adhesion |
US6750110B1 (en) * | 1998-07-23 | 2004-06-15 | Micron Technology, Inc. | Continuous good step coverage CVD platinum metal deposition |
US6586790B2 (en) * | 1998-07-24 | 2003-07-01 | Kabushiki Kaisha Toshiba | Semiconductor device and method for manufacturing the same |
US6509601B1 (en) | 1998-07-31 | 2003-01-21 | Samsung Electronics Co., Ltd. | Semiconductor memory device having capacitor protection layer and method for manufacturing the same |
US6249014B1 (en) | 1998-10-01 | 2001-06-19 | Ramtron International Corporation | Hydrogen barrier encapsulation techniques for the control of hydrogen induced degradation of ferroelectric capacitors in conjunction with multilevel metal processing for non-volatile integrated circuit memory devices |
EP0996160A1 (de) | 1998-10-12 | 2000-04-26 | STMicroelectronics S.r.l. | Kontaktaufbau für ein Halbleiterbauelement |
US6174735B1 (en) | 1998-10-23 | 2001-01-16 | Ramtron International Corporation | Method of manufacturing ferroelectric memory device useful for preventing hydrogen line degradation |
JP2000150810A (ja) * | 1998-11-17 | 2000-05-30 | Toshiba Microelectronics Corp | 半導体装置及びその製造方法 |
JP3114710B2 (ja) * | 1998-11-30 | 2000-12-04 | 日本電気株式会社 | 強誘電体メモリ及びその製造方法 |
US6255157B1 (en) | 1999-01-27 | 2001-07-03 | International Business Machines Corporation | Method for forming a ferroelectric capacitor under the bit line |
US6121648A (en) * | 1999-03-31 | 2000-09-19 | Radiant Technologies, Inc | Ferroelectric based memory devices utilizing hydrogen getters and recovery annealing |
US6242299B1 (en) | 1999-04-01 | 2001-06-05 | Ramtron International Corporation | Barrier layer to protect a ferroelectric capacitor after contact has been made to the capacitor electrode |
JP2000294771A (ja) * | 1999-04-02 | 2000-10-20 | Fuji Electric Co Ltd | プレーナ型半導体装置 |
KR100329781B1 (ko) * | 1999-06-28 | 2002-03-25 | 박종섭 | 수소확산을 방지할 수 있는 강유전체 메모리 소자 제조 방법 |
TW425696B (en) * | 1999-09-10 | 2001-03-11 | Samsung Electronics Co Ltd | Semiconductor memory device having capacitor encapsulated with multiple layers and method of manfacturing the same |
IT1314025B1 (it) | 1999-11-10 | 2002-12-03 | St Microelectronics Srl | Processo per sigillare selettivamente elementi capacitoriferroelettrici compresi in celle di memorie non volatili integrate su |
US20050009209A1 (en) * | 1999-11-10 | 2005-01-13 | Stmicroelectronics S.R.L. | Process for selectively sealing ferroelectric capactive elements incorporated in semiconductor integrated non-volatile memory cells |
KR100362189B1 (ko) * | 1999-12-30 | 2002-11-23 | 주식회사 하이닉스반도체 | 수소 확산을 방지할 수 있는 산화막 및 티타늄막 이중층을구비하는 반도체 메모리 소자 및 그 제조 방법 |
KR100358137B1 (ko) * | 1999-12-30 | 2002-10-25 | 주식회사 하이닉스반도체 | 기저 층간절연막으로서 수소확산 방지를 위한 티타늄산화막을 구비하는 강유전체 메모리 소자의 제조 방법 |
KR20020004539A (ko) * | 2000-07-06 | 2002-01-16 | 박종섭 | 수소확산을 방지할 수 있는 강유전체 메모리 소자 제조 방법 |
JP3839239B2 (ja) | 2000-10-05 | 2006-11-01 | 株式会社ルネサステクノロジ | 半導体集積回路装置 |
EP1207558A1 (de) | 2000-11-17 | 2002-05-22 | STMicroelectronics S.r.l. | Kontaktstruktur für ein ferroelektrisches Speicherbauelement |
US6630702B2 (en) * | 2001-03-27 | 2003-10-07 | Sharp Laboratories Of America, Inc. | Method of using titanium doped aluminum oxide for passivation of ferroelectric materials and devices including the same |
JP2004522303A (ja) * | 2001-04-19 | 2004-07-22 | エスティーマイクロエレクトロニクス ソチエタ レスポンサビリタ リミテ | 集積された半導体デバイスのためのコンタクト構造 |
US6858862B2 (en) * | 2001-06-29 | 2005-02-22 | Intel Corporation | Discrete polymer memory array and method of making same |
US6756620B2 (en) * | 2001-06-29 | 2004-06-29 | Intel Corporation | Low-voltage and interface damage-free polymer memory device |
US6624457B2 (en) | 2001-07-20 | 2003-09-23 | Intel Corporation | Stepped structure for a multi-rank, stacked polymer memory device and method of making same |
US6960479B2 (en) * | 2001-07-20 | 2005-11-01 | Intel Corporation | Stacked ferroelectric memory device and method of making same |
JP2003273325A (ja) * | 2002-03-15 | 2003-09-26 | Oki Electric Ind Co Ltd | 半導体装置およびその製造方法 |
WO2004007098A1 (en) * | 2002-07-15 | 2004-01-22 | Eagle Ultrasound As | High frequency and multi frequency band ultrasound transducers based on ceramic films |
US6812110B1 (en) | 2003-05-09 | 2004-11-02 | Micron Technology, Inc. | Methods of forming capacitor constructions, and methods of forming constructions comprising dielectric materials |
JP4049119B2 (ja) * | 2004-03-26 | 2008-02-20 | セイコーエプソン株式会社 | 強誘電体メモリ素子の製造方法 |
CN1926686B (zh) * | 2004-05-28 | 2010-08-18 | 富士通微电子株式会社 | 半导体装置及其制造方法 |
US8598044B2 (en) * | 2005-03-25 | 2013-12-03 | Renesas Electronics Corporation | Method of fabricating a semiconductor device |
KR100989083B1 (ko) * | 2005-07-04 | 2010-10-25 | 후지쯔 세미컨덕터 가부시키가이샤 | 반도체 장치 및 그 제조 방법 |
WO2007004295A1 (ja) * | 2005-07-05 | 2007-01-11 | Fujitsu Limited | 半導体装置及びその製造方法 |
WO2007074529A1 (ja) * | 2005-12-27 | 2007-07-05 | Fujitsu Limited | 半導体装置 |
WO2007116436A1 (ja) * | 2006-03-30 | 2007-10-18 | Fujitsu Limited | 半導体装置及びその製造方法 |
WO2007116501A1 (ja) * | 2006-03-31 | 2007-10-18 | Fujitsu Limited | 半導体装置及びその製造方法 |
US20080001292A1 (en) * | 2006-06-28 | 2008-01-03 | Marina Zelner | Hermetic Passivation Layer Structure for Capacitors with Perovskite or Pyrochlore Phase Dielectrics |
US8361811B2 (en) | 2006-06-28 | 2013-01-29 | Research In Motion Rf, Inc. | Electronic component with reactive barrier and hermetic passivation layer |
US9092582B2 (en) | 2010-07-09 | 2015-07-28 | Cypress Semiconductor Corporation | Low power, low pin count interface for an RFID transponder |
US9846664B2 (en) | 2010-07-09 | 2017-12-19 | Cypress Semiconductor Corporation | RFID interface and interrupt |
US8723654B2 (en) | 2010-07-09 | 2014-05-13 | Cypress Semiconductor Corporation | Interrupt generation and acknowledgment for RFID |
JP5720647B2 (ja) * | 2012-09-03 | 2015-05-20 | トヨタ自動車株式会社 | 半導体装置及びその製造方法 |
JP6174893B2 (ja) * | 2013-04-16 | 2017-08-02 | ローム株式会社 | 半導体装置および半導体装置の製造方法 |
JP5812234B1 (ja) | 2014-04-03 | 2015-11-11 | 株式会社村田製作所 | 可変容量デバイス |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3733685A (en) * | 1968-11-25 | 1973-05-22 | Gen Motors Corp | Method of making a passivated wire bonded semiconductor device |
US5024964A (en) * | 1970-09-28 | 1991-06-18 | Ramtron Corporation | Method of making ferroelectric memory devices |
US4040874A (en) * | 1975-08-04 | 1977-08-09 | General Electric Company | Semiconductor element having a polymeric protective coating and glass coating overlay |
US4149301A (en) * | 1977-07-25 | 1979-04-17 | Ferrosil Corporation | Monolithic semiconductor integrated circuit-ferroelectric memory drive |
JPS59105364A (ja) * | 1982-12-08 | 1984-06-18 | Hitachi Ltd | 半導体装置 |
US4675715A (en) * | 1982-12-09 | 1987-06-23 | American Telephone And Telegraph Company, At&T Bell Laboratories | Semiconductor integrated circuit vertical geometry impedance element |
JPS59119733A (ja) * | 1982-12-24 | 1984-07-11 | Toshiba Corp | 半導体装置 |
JPS60100464A (ja) * | 1983-11-07 | 1985-06-04 | Hitachi Ltd | 半導体装置 |
US4811078A (en) * | 1985-05-01 | 1989-03-07 | Texas Instruments Incorporated | Integrated circuit device and process with tin capacitors |
JPS6223149A (ja) * | 1985-07-24 | 1987-01-31 | Hitachi Ltd | 半導体記憶装置 |
JP2615390B2 (ja) * | 1985-10-07 | 1997-05-28 | 工業技術院長 | 炭化シリコン電界効果トランジスタの製造方法 |
DE3602887A1 (de) * | 1986-01-31 | 1987-08-06 | Bayer Ag | Nichtfluechtiger elektronischer speicher |
JPS6323069A (ja) * | 1986-03-26 | 1988-01-30 | Mitsubishi Heavy Ind Ltd | シ−ル材 |
US4753856A (en) * | 1987-01-02 | 1988-06-28 | Dow Corning Corporation | Multilayer ceramic coatings from silicate esters and metal oxides |
US4759823A (en) * | 1987-06-02 | 1988-07-26 | Krysalis Corporation | Method for patterning PLZT thin films |
JP2681982B2 (ja) * | 1988-03-23 | 1997-11-26 | ソニー株式会社 | 半導体装置 |
JPH01253257A (ja) * | 1988-04-01 | 1989-10-09 | Fuji Electric Co Ltd | 半導体集積デバイス |
JPH01265524A (ja) * | 1988-04-15 | 1989-10-23 | Sony Corp | 半導体装置 |
JPH02183566A (ja) * | 1989-01-10 | 1990-07-18 | Sharp Corp | トライアック |
JPH02184079A (ja) * | 1989-01-11 | 1990-07-18 | Seiko Epson Corp | 強誘電体記憶装置の形成法 |
KR940006708B1 (ko) * | 1989-01-26 | 1994-07-25 | 세이꼬 엡슨 가부시끼가이샤 | 반도체 장치의 제조 방법 |
DE69017802T2 (de) * | 1989-08-30 | 1995-09-07 | Nec Corp | Dünnfilmkondensator und dessen Herstellungsverfahren. |
US5122923A (en) * | 1989-08-30 | 1992-06-16 | Nec Corporation | Thin-film capacitors and process for manufacturing the same |
JPH0740569B2 (ja) * | 1990-02-27 | 1995-05-01 | エイ・ティ・アンド・ティ・コーポレーション | Ecrプラズマ堆積方法 |
US5369296A (en) * | 1990-07-24 | 1994-11-29 | Ramtron International Corporation | Semiconductor device having a ferroelectric film in a through-hole |
JP3131982B2 (ja) * | 1990-08-21 | 2001-02-05 | セイコーエプソン株式会社 | 半導体装置、半導体メモリ及び半導体装置の製造方法 |
US5040046A (en) * | 1990-10-09 | 1991-08-13 | Micron Technology, Inc. | Process for forming highly conformal dielectric coatings in the manufacture of integrated circuits and product produced thereby |
US5119154A (en) * | 1990-12-03 | 1992-06-02 | Micron Technology, Inc. | Ferroelectric capacitor and method for forming local interconnect |
US5081559A (en) * | 1991-02-28 | 1992-01-14 | Micron Technology, Inc. | Enclosed ferroelectric stacked capacitor |
US5266355A (en) * | 1992-06-18 | 1993-11-30 | Eastman Kodak Company | Chemical vapor deposition of metal oxide films |
EP0586149A1 (de) * | 1992-08-31 | 1994-03-09 | Dow Corning Corporation | Hermetischer Schutz, auf einer Keramikschicht basierend, für integrierte Schaltungen |
-
1994
- 1994-03-11 US US08/212,495 patent/US5438023A/en not_active Expired - Lifetime
- 1994-12-09 EP EP94309207A patent/EP0671765B1/de not_active Expired - Lifetime
- 1994-12-09 DE DE69413665T patent/DE69413665T2/de not_active Expired - Fee Related
-
1995
- 1995-02-27 US US08/394,467 patent/US5578867A/en not_active Expired - Lifetime
- 1995-03-13 JP JP7052145A patent/JP2921556B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0671765A1 (de) | 1995-09-13 |
EP0671765B1 (de) | 1998-09-30 |
US5578867A (en) | 1996-11-26 |
US5438023A (en) | 1995-08-01 |
JP2921556B2 (ja) | 1999-07-19 |
JPH0855850A (ja) | 1996-02-27 |
DE69413665D1 (de) | 1998-11-05 |
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Legal Events
Date | Code | Title | Description |
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8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |