DE69418131D1 - Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparat - Google Patents
Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparatInfo
- Publication number
- DE69418131D1 DE69418131D1 DE69418131T DE69418131T DE69418131D1 DE 69418131 D1 DE69418131 D1 DE 69418131D1 DE 69418131 T DE69418131 T DE 69418131T DE 69418131 T DE69418131 T DE 69418131T DE 69418131 D1 DE69418131 D1 DE 69418131D1
- Authority
- DE
- Germany
- Prior art keywords
- generating
- projection apparatus
- adjustable ring
- shaped lighting
- photolithographic projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US2465193A | 1993-03-01 | 1993-03-01 | |
PCT/US1994/001970 WO1994020883A1 (en) | 1993-03-01 | 1994-02-25 | Variable annular illuminator for photolithographic projection imager |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69418131D1 true DE69418131D1 (de) | 1999-06-02 |
Family
ID=21821698
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69418131T Expired - Lifetime DE69418131D1 (de) | 1993-03-01 | 1994-02-25 | Vorrichtung zur erzeugung einer einstellbaren ringförmigen beleuchtung für einen photolithograpischen projektionsapparat |
Country Status (4)
Country | Link |
---|---|
US (2) | US5452054A (de) |
EP (1) | EP0648348B1 (de) |
DE (1) | DE69418131D1 (de) |
WO (1) | WO1994020883A1 (de) |
Families Citing this family (59)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USRE39662E1 (en) * | 1991-12-25 | 2007-05-29 | Nikon Corporation | Projection exposure apparatus |
US5815248A (en) * | 1993-04-22 | 1998-09-29 | Nikon Corporation | Illumination optical apparatus and method having a wavefront splitter and an optical integrator |
US5729331A (en) | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
EP0687956B2 (de) * | 1994-06-17 | 2005-11-23 | Carl Zeiss SMT AG | Beleuchtungseinrichtung |
KR100377206B1 (ko) * | 1994-08-26 | 2003-06-09 | 소니 가부시끼 가이샤 | 패턴형성방법및이방법을이용한반도체디바이스제조방법 |
JP3458549B2 (ja) | 1994-08-26 | 2003-10-20 | ソニー株式会社 | パターン形成方法および該方法を用いた半導体デバイス製造方法と装置 |
US5674414A (en) * | 1994-11-11 | 1997-10-07 | Carl-Zeiss Stiftung | Method and apparatus of irradiating a surface of a workpiece with a plurality of beams |
US5891605A (en) * | 1996-01-16 | 1999-04-06 | Lucent Technologies Inc. | Reduction in damage to optical elements used in optical lithography for device fabrication |
US5973767A (en) * | 1996-08-14 | 1999-10-26 | Lsi Logic Corporation | Off-axis illuminator lens mask for photolithographic projection system |
CA2279574C (en) | 1997-01-31 | 2007-07-24 | The Horticulture & Food Research Institute Of New Zealand Ltd. | Optical apparatus |
JP3264224B2 (ja) * | 1997-08-04 | 2002-03-11 | キヤノン株式会社 | 照明装置及びそれを用いた投影露光装置 |
AU9762398A (en) * | 1997-11-10 | 1999-05-31 | Nikon Corporation | Exposure apparatus |
US6149867A (en) | 1997-12-31 | 2000-11-21 | Xy, Inc. | Sheath fluids and collection systems for sex-specific cytometer sorting of sperm |
US6015644A (en) * | 1998-02-20 | 2000-01-18 | Lucent Technologies Inc. | Process for device fabrication using a variable transmission aperture |
US6248590B1 (en) | 1998-02-27 | 2001-06-19 | Cytomation, Inc. | Method and apparatus for flow cytometry |
JPH11271619A (ja) * | 1998-03-19 | 1999-10-08 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
DE69931690T2 (de) * | 1998-04-08 | 2007-06-14 | Asml Netherlands B.V. | Lithographischer Apparat |
NZ509434A (en) | 1998-07-30 | 2004-03-26 | Univ Colorado State Res Found | Equine system for non-surgical artificial insemination |
US6563567B1 (en) * | 1998-12-17 | 2003-05-13 | Nikon Corporation | Method and apparatus for illuminating a surface using a projection imaging apparatus |
EP1014196A3 (de) * | 1998-12-17 | 2002-05-29 | Nikon Corporation | Beleuchtungsverfahren und -System für einen optischen Projektionsapparat |
KR100596490B1 (ko) * | 1999-06-16 | 2006-07-03 | 삼성전자주식회사 | 투영 노광 장치 |
US7024316B1 (en) | 1999-10-21 | 2006-04-04 | Dakocytomation Colorado, Inc. | Transiently dynamic flow cytometer analysis system |
US7208265B1 (en) | 1999-11-24 | 2007-04-24 | Xy, Inc. | Method of cryopreserving selected sperm cells |
CA2408939C (en) | 2000-05-09 | 2011-11-08 | Xy, Inc. | High purity x-chromosome bearing and y-chromosome bearing populations of spermatozoa |
TW498408B (en) * | 2000-07-05 | 2002-08-11 | Asm Lithography Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
WO2002043486A1 (en) | 2000-11-29 | 2002-06-06 | Xy, Inc. | System for in-vitro fertilization with spermatozoa separated into x-chromosome and y-chromosome bearing populations |
JP2002231619A (ja) * | 2000-11-29 | 2002-08-16 | Nikon Corp | 照明光学装置および該照明光学装置を備えた露光装置 |
US7713687B2 (en) | 2000-11-29 | 2010-05-11 | Xy, Inc. | System to separate frozen-thawed spermatozoa into x-chromosome bearing and y-chromosome bearing populations |
KR100408742B1 (ko) * | 2001-05-10 | 2003-12-11 | 삼성전자주식회사 | 집적회로소자의 캐패시터 및 그 제조방법 |
WO2002092247A1 (en) | 2001-05-17 | 2002-11-21 | Cytomation, Inc. | Flow cytometer with active automated optical alignment system |
US20030211009A1 (en) * | 2001-05-18 | 2003-11-13 | Buchanan Kris S. | Rapid multi-material sample input system |
GB0118306D0 (en) * | 2001-07-27 | 2001-09-19 | Isis Innovation | Method of,and apparatus for,generating a focussed light beam |
KR100431883B1 (ko) * | 2001-11-05 | 2004-05-17 | 삼성전자주식회사 | 노광방법 및 투영 노광 장치 |
US6897941B2 (en) * | 2001-11-07 | 2005-05-24 | Applied Materials, Inc. | Optical spot grid array printer |
KR20050044369A (ko) | 2001-11-07 | 2005-05-12 | 어플라이드 머티어리얼스, 인코포레이티드 | 마스크없는 광자-전자 스팟-그리드 어레이 프린터 |
JP3950731B2 (ja) * | 2002-04-23 | 2007-08-01 | キヤノン株式会社 | 照明光学系、当該照明光学系を有する露光装置及びデバイス製造方法 |
JP3950732B2 (ja) * | 2002-04-23 | 2007-08-01 | キヤノン株式会社 | 照明光学系、照明方法及び露光装置 |
MXPA05001100A (es) | 2002-08-01 | 2005-04-28 | Xy Inc | Sistema de separacion de baja presion para celulas de esperma. |
US8486618B2 (en) | 2002-08-01 | 2013-07-16 | Xy, Llc | Heterogeneous inseminate system |
MXPA05001654A (es) | 2002-08-15 | 2005-10-18 | Xy Inc | Citometro de flujo de alta resolucion. |
US7169548B2 (en) | 2002-09-13 | 2007-01-30 | Xy, Inc. | Sperm cell processing and preservation systems |
MX347048B (es) | 2003-03-28 | 2017-04-07 | Inguran Llc * | Aparato de muestreo digital y métodos para separar partículas. |
ES2541121T3 (es) | 2003-05-15 | 2015-07-16 | Xy, Llc | Clasificación eficiente de células haploides por sistemas de citometría de flujo |
US7542217B2 (en) * | 2003-12-19 | 2009-06-02 | Carl Zeiss Smt Ag | Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus |
CA2561661C (en) | 2004-03-29 | 2015-11-24 | Monsanto Technology Llc | Sperm suspensions for sorting into x or y chromosome-bearing enriched populations |
ATE479124T1 (de) * | 2004-04-16 | 2010-09-15 | Univ Auburn | Mikroskopbeleuchtungsvorrichtung und adapter dafür |
AR049732A1 (es) | 2004-07-22 | 2006-08-30 | Monsanto Co | Proceso para enriquecer una poblacion de celulas de esperma |
PT1771729E (pt) | 2004-07-27 | 2015-12-31 | Beckman Coulter Inc | Acentuação da discriminação da citometria de fluxo com transformação geométrica |
WO2006021419A2 (en) * | 2004-08-23 | 2006-03-02 | Carl Zeiss Smt Ag | Illumination system of a microlithographic exposure apparatus |
WO2007064959A2 (en) * | 2005-12-01 | 2007-06-07 | Auburn University | High resolution optical microscope |
WO2007070382A2 (en) * | 2005-12-09 | 2007-06-21 | Auburn University | Simultaneous observation of darkfield images and fluorescence using filter and diaphragm |
US20070242336A1 (en) * | 2006-02-20 | 2007-10-18 | Vitaly Vodyanoy | Applications for mixing and combining light utilizing a transmission filter, iris, aperture apparatus |
US8071136B2 (en) | 2006-04-21 | 2011-12-06 | Bioactives, Inc. | Water-soluble pharmaceutical compositions of hops resins |
US8054449B2 (en) * | 2006-11-22 | 2011-11-08 | Asml Holding N.V. | Enhancing the image contrast of a high resolution exposure tool |
US10029331B2 (en) * | 2009-09-14 | 2018-07-24 | Preco, Inc. | Multiple laser beam focusing head |
CN102736427B (zh) * | 2011-04-07 | 2014-11-12 | 上海微电子装备有限公司 | 一种曝光装置及其方法 |
DE102011078928A1 (de) * | 2011-07-11 | 2013-01-17 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Projektionslithografie |
FR2978255B1 (fr) * | 2011-07-22 | 2014-02-21 | Horiba Jobin Yvon Sas | Dispositif optique d'eclairage conoscopique a cone creux pour microscope optique et procede de microscopie optique en conoscopie |
US11287635B2 (en) * | 2018-06-27 | 2022-03-29 | The Charles Stark Draper Laboratory, Inc. | Multi-channel folded optical system |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4492439A (en) * | 1982-03-15 | 1985-01-08 | Clegg John E | Monochromatic beam concentrator |
JPH0782981B2 (ja) * | 1986-02-07 | 1995-09-06 | 株式会社ニコン | 投影露光方法及び装置 |
US5173799A (en) * | 1988-10-12 | 1992-12-22 | Fuji Electric Co., Ltd. | Wavelength conversion device |
DE69132120T2 (de) * | 1990-11-15 | 2000-09-21 | Nikon Corp | Verfahren und Vorrichtung zur Projektionsbelichtung |
US5113244A (en) * | 1991-02-06 | 1992-05-12 | General Dynamics Corporation, Electronics Division | Fiber optic combiner/splitter |
US5305054A (en) * | 1991-02-22 | 1994-04-19 | Canon Kabushiki Kaisha | Imaging method for manufacture of microdevices |
JPH04369209A (ja) * | 1991-06-17 | 1992-12-22 | Nikon Corp | 露光用照明装置 |
JP2803934B2 (ja) * | 1991-12-10 | 1998-09-24 | 三菱電機株式会社 | 投影露光装置及び露光方法 |
US5309198A (en) * | 1992-02-25 | 1994-05-03 | Nikon Corporation | Light exposure system |
US5333035A (en) * | 1992-05-15 | 1994-07-26 | Nikon Corporation | Exposing method |
JP2946950B2 (ja) * | 1992-06-25 | 1999-09-13 | キヤノン株式会社 | 照明装置及びそれを用いた露光装置 |
US5329336A (en) * | 1992-07-06 | 1994-07-12 | Nikon Corporation | Exposure method and apparatus |
JP3358109B2 (ja) * | 1992-07-06 | 2002-12-16 | 株式会社ニコン | 投影露光方法及び装置、並びにデバイス製造方法 |
US5383000A (en) * | 1992-11-24 | 1995-01-17 | General Signal Corporation | Partial coherence varier for microlithographic system |
-
1994
- 1994-02-25 WO PCT/US1994/001970 patent/WO1994020883A1/en active IP Right Grant
- 1994-02-25 DE DE69418131T patent/DE69418131D1/de not_active Expired - Lifetime
- 1994-02-25 EP EP94910743A patent/EP0648348B1/de not_active Expired - Lifetime
- 1994-11-21 US US08/342,787 patent/US5452054A/en not_active Expired - Lifetime
-
1995
- 1995-08-17 US US08/516,521 patent/US5757470A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0648348B1 (de) | 1999-04-28 |
EP0648348A1 (de) | 1995-04-19 |
WO1994020883A1 (en) | 1994-09-15 |
EP0648348A4 (de) | 1995-07-05 |
US5452054A (en) | 1995-09-19 |
US5757470A (en) | 1998-05-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de |