DE69432399D1 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE69432399D1
DE69432399D1 DE69432399T DE69432399T DE69432399D1 DE 69432399 D1 DE69432399 D1 DE 69432399D1 DE 69432399 T DE69432399 T DE 69432399T DE 69432399 T DE69432399 T DE 69432399T DE 69432399 D1 DE69432399 D1 DE 69432399D1
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69432399T
Other languages
English (en)
Other versions
DE69432399T2 (de
Inventor
Mitsugu Sato
Yoichi Ose
Satoru Fukuhara
Hideo Todokoro
Makoto Ezumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE69432399D1 publication Critical patent/DE69432399D1/de
Application granted granted Critical
Publication of DE69432399T2 publication Critical patent/DE69432399T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/22—Treatment of data
    • H01J2237/221—Image processing
    • H01J2237/225—Displaying image using synthesised colours
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H01J2237/281—Bottom of trenches or holes
DE69432399T 1993-12-28 1994-12-15 Rasterelektronenmikroskop Expired - Lifetime DE69432399T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33489493A JP3291880B2 (ja) 1993-12-28 1993-12-28 走査形電子顕微鏡

Publications (2)

Publication Number Publication Date
DE69432399D1 true DE69432399D1 (de) 2003-05-08
DE69432399T2 DE69432399T2 (de) 2003-10-30

Family

ID=18282423

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69432399T Expired - Lifetime DE69432399T2 (de) 1993-12-28 1994-12-15 Rasterelektronenmikroskop
DE69433937T Expired - Lifetime DE69433937T2 (de) 1993-12-28 1994-12-15 Rasterelektronenmikroskop

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69433937T Expired - Lifetime DE69433937T2 (de) 1993-12-28 1994-12-15 Rasterelektronenmikroskop

Country Status (5)

Country Link
US (1) US5608218A (de)
EP (2) EP1244132B1 (de)
JP (1) JP3291880B2 (de)
KR (1) KR100382026B1 (de)
DE (2) DE69432399T2 (de)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5644132A (en) * 1994-06-20 1997-07-01 Opan Technologies Ltd. System for high resolution imaging and measurement of topographic and material features on a specimen
EP0721201B1 (de) * 1994-12-19 1998-08-26 Opal Technologies Ltd. System zur Hochauflösungsbildgebung und Messung von topographischen Characteristiken und Materialcharakteristiken einer Probe
US5894124A (en) * 1995-03-17 1999-04-13 Hitachi, Ltd. Scanning electron microscope and its analogous device
DE69638126D1 (de) * 1995-10-19 2010-04-01 Hitachi Ltd Rasterelektronenmikroskop
JP4179390B2 (ja) * 1995-10-19 2008-11-12 株式会社日立製作所 走査形電子顕微鏡
KR100711198B1 (ko) * 1995-10-19 2007-07-06 가부시끼가이샤 히다치 세이사꾸쇼 주사형전자현미경
JP3514070B2 (ja) * 1997-04-25 2004-03-31 株式会社日立製作所 走査電子顕微鏡
JPH1167139A (ja) * 1997-08-25 1999-03-09 Hitachi Ltd 走査電子顕微鏡
GB9719417D0 (en) * 1997-09-13 1997-11-12 Univ York Electron microscope
JP4176159B2 (ja) * 1997-12-08 2008-11-05 エフ イー アイ カンパニ 改善された２次電子検出のための磁界を用いた環境制御型ｓｅｍ
WO1999046798A1 (fr) * 1998-03-09 1999-09-16 Hitachi, Ltd. Microscope electronique a balayage
US6590210B1 (en) * 1998-03-10 2003-07-08 Erik Essers Scanning electron microscope
WO2000019482A1 (fr) * 1998-09-25 2000-04-06 Hitachi, Ltd. Microscope electronique a balayage
US6300629B1 (en) * 1998-09-30 2001-10-09 Applied Materials, Inc. Defect review SEM with automatically switchable detector
KR20000034962A (ko) * 1998-11-19 2000-06-26 하이든 마틴 하전입자의 이중-모드 검출 장치 및 방법
US6414308B1 (en) * 1999-03-12 2002-07-02 International Business Machines Corporation Method for determining opened/unopened semiconductor contacts using a scanning electron microscope
US6538249B1 (en) 1999-07-09 2003-03-25 Hitachi, Ltd. Image-formation apparatus using charged particle beams under various focus conditions
GB0005717D0 (en) * 2000-03-09 2000-05-03 Univ Cambridge Tech Scanning electron microscope
DE10012314A1 (de) 2000-03-14 2001-09-20 Leo Elektronenmikroskopie Gmbh Detektorsystem für ein Korpuskularstrahlgerät und Korpuskularstrahlgerät mit einem solchen Detektorsystem
US6847038B2 (en) * 2002-07-15 2005-01-25 Hitachi, Ltd. Scanning electron microscope
JP4069624B2 (ja) 2000-03-31 2008-04-02 株式会社日立製作所 走査電子顕微鏡
DE60038007T2 (de) * 2000-05-31 2008-05-29 Advantest Corporation Teilchenstrahlgerät
WO2002001597A1 (fr) * 2000-06-27 2002-01-03 Ebara Corporation Appareil d'inspection a faisceau de particules chargees et procede de fabrication d'un dispositif utilisant cet appareil d'inspection
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
DE10301579A1 (de) 2003-01-16 2004-07-29 Leo Elektronenmikroskopie Gmbh Elektronenstrahlgerät und Detektoranordnung
EP1463087B1 (de) * 2003-03-24 2010-06-02 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Ladungsträgerstrahlvorrichtung
US7227142B2 (en) * 2004-09-10 2007-06-05 Multibeam Systems, Inc. Dual detector optics for simultaneous collection of secondary and backscattered electrons
US7435956B2 (en) * 2004-09-10 2008-10-14 Multibeam Systems, Inc. Apparatus and method for inspection and testing of flat panel display substrates
US7928404B2 (en) * 2003-10-07 2011-04-19 Multibeam Corporation Variable-ratio double-deflection beam blanker
DE102004037781A1 (de) 2004-08-03 2006-02-23 Carl Zeiss Nts Gmbh Elektronenstrahlgerät
US7456402B2 (en) * 2004-09-10 2008-11-25 Multibeam Systems, Inc. Detector optics for multiple electron beam test system
JP4920385B2 (ja) 2006-11-29 2012-04-18 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置、走査型電子顕微鏡、及び試料観察方法
JP5054990B2 (ja) * 2007-01-30 2012-10-24 株式会社日立ハイテクノロジーズ 走査形電子顕微鏡
JP5274897B2 (ja) * 2008-06-04 2013-08-28 日本電子株式会社 断面観察用走査電子顕微鏡
KR101431950B1 (ko) * 2008-06-25 2014-08-19 가부시키가이샤 히다치 하이테크놀로지즈 반도체 검사 장치
JP4913854B2 (ja) * 2008-10-08 2012-04-11 アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー 荷電粒子検出装置及び検出方法
JP5492405B2 (ja) * 2008-12-02 2014-05-14 株式会社日立ハイテクノロジーズ 荷電粒子線装置
EP2365514B1 (de) * 2010-03-10 2015-08-26 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Doppelstrahlige Ladungsträgerstrahlsäule und Betriebsverfahren dafür
JP5198546B2 (ja) * 2010-12-03 2013-05-15 株式会社日立ハイテクノロジーズ 回路パターン検査方法、及び回路パターン検査システム
JP5826941B2 (ja) * 2011-09-27 2015-12-02 エスエヌユー プレシジョン カンパニー リミテッドＳｎｕ Ｐｒｅｃｉｓｉｏｎ Ｃｏ．， Ｌｔｄ． 反射電子検出機能を備えた走査電子顕微鏡
KR101293016B1 (ko) * 2011-10-27 2013-08-05 에스엔유 프리시젼 주식회사 주사전자현미경용 빈필터 제어방법 및 전자빔 정렬 기능을 구비한 주사전자현미경
JP5622779B2 (ja) * 2012-03-26 2014-11-12 株式会社東芝 試料分析装置および試料分析方法
JP5965819B2 (ja) 2012-10-26 2016-08-10 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び重ね合わせずれ量測定方法
JP2014238962A (ja) * 2013-06-07 2014-12-18 三星電子株式会社Ｓａｍｓｕｎｇ Ｅｌｅｃｔｒｏｎｉｃｓ Ｃｏ．，Ｌｔｄ． 電子線装置
KR102234659B1 (ko) 2013-10-29 2021-04-05 삼성전자주식회사 고에너지 전자 빔을 이용하여 인-셀 오버레이 오프셋을 측정할 수 있는 sem 장치와 그 방법
JP6516327B2 (ja) * 2015-06-11 2019-05-22 国立大学法人名古屋大学 反射電子を検出する走査電子顕微鏡
DE112017007498B4 (de) 2017-06-02 2020-11-19 Hitachi High-Tech Corporation Ladungsträgerstrahlvorrichtung
JP7008671B2 (ja) 2019-09-13 2022-01-25 日本電子株式会社 荷電粒子線装置および分析方法
CN114220725A (zh) * 2020-12-02 2022-03-22 聚束科技（北京）有限公司 一种电子显微镜

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4041311A (en) * 1976-07-12 1977-08-09 Iowa State University Research Foundation, Inc. Scanning electron microscope with color image display
DE2921151C2 (de) * 1979-05-25 1982-12-02 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Vorrichtung zum Nachweis von in einem Abtast-Elektronenstrahlmikroskop von einer Probe ausgehenden Rückstreuelektronen
JPS60146439A (ja) * 1984-01-11 1985-08-02 Hitachi Ltd 電位測定装置
JPS60212953A (ja) * 1984-04-06 1985-10-25 Hitachi Ltd 電子線装置
JPS61220259A (ja) * 1985-03-26 1986-09-30 Fujitsu Ltd 電子ビ−ム装置
US4772847A (en) * 1985-04-17 1988-09-20 Hitachi, Ltd. Stroboscopic type potential measurement device
EP0236807A3 (de) * 1986-03-07 1990-05-16 Siemens Aktiengesellschaft Spektrometerobjektiv für die Korpuskularstrahl-Messtechnik
GB8607222D0 (en) * 1986-03-24 1986-04-30 Welding Inst Charged particle collection
DE3638682A1 (de) * 1986-11-13 1988-05-19 Siemens Ag Spektrometerobjektiv fuer korpuskularstrahlmesstechnik
US4897545A (en) * 1987-05-21 1990-01-30 Electroscan Corporation Electron detector for use in a gaseous environment
US4933552A (en) * 1988-10-06 1990-06-12 International Business Machines Corporation Inspection system utilizing retarding field back scattered electron collection
US5097127A (en) * 1990-02-23 1992-03-17 Ibm Corporation Multiple detector system for specimen inspection using high energy backscatter electrons
GB2247345B (en) * 1990-07-05 1995-04-05 Haroon Ahmed Integrated circuit structure analysis
US5412210A (en) * 1990-10-12 1995-05-02 Hitachi, Ltd. Scanning electron microscope and method for production of semiconductor device by using the same
JP2754096B2 (ja) * 1991-03-05 1998-05-20 日本電子テクニクス株式会社 電子線による試料表面の状態測定装置
US5118941A (en) * 1991-04-23 1992-06-02 The Perkin-Elmer Corporation Apparatus and method for locating target area for electron microanalysis
JP3148353B2 (ja) * 1991-05-30 2001-03-19 ケーエルエー・インストルメンツ・コーポレーション 電子ビーム検査方法とそのシステム
US5212383A (en) * 1991-07-29 1993-05-18 David Scharf Color synthesizing scanning electron microscope
JP2919170B2 (ja) * 1992-03-19 1999-07-12 株式会社日立製作所 走査電子顕微鏡
JP3081393B2 (ja) * 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡

Also Published As

Publication number Publication date
EP0661727B1 (de) 2003-04-02
DE69433937D1 (de) 2004-09-09
KR950019807A (ko) 1995-07-24
DE69433937T2 (de) 2005-09-08
JP3291880B2 (ja) 2002-06-17
EP0661727A3 (de) 1998-02-25
US5608218A (en) 1997-03-04
EP0661727A2 (de) 1995-07-05
JPH07192679A (ja) 1995-07-28
DE69432399T2 (de) 2003-10-30
EP1244132B1 (de) 2004-08-04
KR100382026B1 (ko) 2003-06-18
EP1244132A1 (de) 2002-09-25

Similar Documents

Publication Publication Date Title
DE69432399D1 (de) Rasterelektronenmikroskop
DE69332995D1 (de) Raster-Elektronenmikroskop
DE69327355D1 (de) Rasterelektronenmikroskop
DE69332785D1 (de) Rasterelektronenmikroskop
DE69638126D1 (de) Rasterelektronenmikroskop
DE69611739D1 (de) Rasterelektronenmikroskop
DE69840533D1 (de) Rasterelektronenmikroskop
DE69422092T2 (de) Rastersondenmikroskop
DE69406739T2 (de) Elektronenstrahlgerät
DE69131593T2 (de) Rasterelektronenmikroskop
DE69624192D1 (de) Rasterelektronenmikroskop
DE69621540T2 (de) Elektronenmikroskop
DE69807151T2 (de) Rasterelektronenmikroskop
DE69628367D1 (de) Rasterelektronenmikroskop
GB2255253B (en) Scanning electron microscope
DE69623841D1 (de) Rasterelektronenmikroskop
US5731580B1 (en) Scanning electron microscope
DE59912305D1 (de) Rasterelektronenmikroskop
DE69634461D1 (de) Elektronenmikroskop
DE69117215D1 (de) Rastertunnelmikroskop
NL1007374A1 (nl) Aftastende omgevings-elektronenmicroscoop.
DE69433097D1 (de) Abtastvorrichtung
DE69123866T2 (de) Rastertunnelmikroskop
DE69123668T2 (de) Rasterelektronenmikroskop
DE9310659U1 (de) Elektronenmikroskop

Legal Events

Date Code Title Description
8364 No opposition during term of opposition