DE69432399T2 - Rasterelektronenmikroskop - Google Patents
RasterelektronenmikroskopInfo
- Publication number
- DE69432399T2 DE69432399T2 DE69432399T DE69432399T DE69432399T2 DE 69432399 T2 DE69432399 T2 DE 69432399T2 DE 69432399 T DE69432399 T DE 69432399T DE 69432399 T DE69432399 T DE 69432399T DE 69432399 T2 DE69432399 T2 DE 69432399T2
- Authority
- DE
- Germany
- Prior art keywords
- electron microscope
- scanning electron
- scanning
- microscope
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/221—Image processing
- H01J2237/225—Displaying image using synthesised colours
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24495—Signal processing, e.g. mixing of two or more signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/28—Scanning microscopes
- H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
- H01J2237/281—Bottom of trenches or holes
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33489493A JP3291880B2 (ja) | 1993-12-28 | 1993-12-28 | 走査形電子顕微鏡 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69432399D1 DE69432399D1 (de) | 2003-05-08 |
DE69432399T2 true DE69432399T2 (de) | 2003-10-30 |
Family
ID=18282423
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69432399T Expired - Lifetime DE69432399T2 (de) | 1993-12-28 | 1994-12-15 | Rasterelektronenmikroskop |
DE69433937T Expired - Lifetime DE69433937T2 (de) | 1993-12-28 | 1994-12-15 | Rasterelektronenmikroskop |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69433937T Expired - Lifetime DE69433937T2 (de) | 1993-12-28 | 1994-12-15 | Rasterelektronenmikroskop |
Country Status (5)
Country | Link |
---|---|
US (1) | US5608218A (de) |
EP (2) | EP1244132B1 (de) |
JP (1) | JP3291880B2 (de) |
KR (1) | KR100382026B1 (de) |
DE (2) | DE69432399T2 (de) |
Families Citing this family (49)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5644132A (en) * | 1994-06-20 | 1997-07-01 | Opan Technologies Ltd. | System for high resolution imaging and measurement of topographic and material features on a specimen |
EP0721201B1 (de) * | 1994-12-19 | 1998-08-26 | Opal Technologies Ltd. | System zur Hochauflösungsbildgebung und Messung von topographischen Characteristiken und Materialcharakteristiken einer Probe |
US5894124A (en) * | 1995-03-17 | 1999-04-13 | Hitachi, Ltd. | Scanning electron microscope and its analogous device |
DE69638126D1 (de) * | 1995-10-19 | 2010-04-01 | Hitachi Ltd | Rasterelektronenmikroskop |
JP4179390B2 (ja) * | 1995-10-19 | 2008-11-12 | 株式会社日立製作所 | 走査形電子顕微鏡 |
KR100711198B1 (ko) * | 1995-10-19 | 2007-07-06 | 가부시끼가이샤 히다치 세이사꾸쇼 | 주사형전자현미경 |
JP3514070B2 (ja) * | 1997-04-25 | 2004-03-31 | 株式会社日立製作所 | 走査電子顕微鏡 |
JPH1167139A (ja) * | 1997-08-25 | 1999-03-09 | Hitachi Ltd | 走査電子顕微鏡 |
GB9719417D0 (en) * | 1997-09-13 | 1997-11-12 | Univ York | Electron microscope |
JP4176159B2 (ja) * | 1997-12-08 | 2008-11-05 | エフ イー アイ カンパニ | 改善された2次電子検出のための磁界を用いた環境制御型sem |
WO1999046798A1 (fr) * | 1998-03-09 | 1999-09-16 | Hitachi, Ltd. | Microscope electronique a balayage |
US6590210B1 (en) * | 1998-03-10 | 2003-07-08 | Erik Essers | Scanning electron microscope |
WO2000019482A1 (fr) * | 1998-09-25 | 2000-04-06 | Hitachi, Ltd. | Microscope electronique a balayage |
US6300629B1 (en) * | 1998-09-30 | 2001-10-09 | Applied Materials, Inc. | Defect review SEM with automatically switchable detector |
KR20000034962A (ko) * | 1998-11-19 | 2000-06-26 | 하이든 마틴 | 하전입자의 이중-모드 검출 장치 및 방법 |
US6414308B1 (en) * | 1999-03-12 | 2002-07-02 | International Business Machines Corporation | Method for determining opened/unopened semiconductor contacts using a scanning electron microscope |
US6538249B1 (en) | 1999-07-09 | 2003-03-25 | Hitachi, Ltd. | Image-formation apparatus using charged particle beams under various focus conditions |
GB0005717D0 (en) * | 2000-03-09 | 2000-05-03 | Univ Cambridge Tech | Scanning electron microscope |
DE10012314A1 (de) | 2000-03-14 | 2001-09-20 | Leo Elektronenmikroskopie Gmbh | Detektorsystem für ein Korpuskularstrahlgerät und Korpuskularstrahlgerät mit einem solchen Detektorsystem |
US6847038B2 (en) * | 2002-07-15 | 2005-01-25 | Hitachi, Ltd. | Scanning electron microscope |
JP4069624B2 (ja) | 2000-03-31 | 2008-04-02 | 株式会社日立製作所 | 走査電子顕微鏡 |
DE60038007T2 (de) * | 2000-05-31 | 2008-05-29 | Advantest Corporation | Teilchenstrahlgerät |
WO2002001597A1 (fr) * | 2000-06-27 | 2002-01-03 | Ebara Corporation | Appareil d'inspection a faisceau de particules chargees et procede de fabrication d'un dispositif utilisant cet appareil d'inspection |
JP2003331770A (ja) * | 2002-05-15 | 2003-11-21 | Seiko Instruments Inc | 電子線装置 |
DE10301579A1 (de) | 2003-01-16 | 2004-07-29 | Leo Elektronenmikroskopie Gmbh | Elektronenstrahlgerät und Detektoranordnung |
EP1463087B1 (de) * | 2003-03-24 | 2010-06-02 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh | Ladungsträgerstrahlvorrichtung |
US7227142B2 (en) * | 2004-09-10 | 2007-06-05 | Multibeam Systems, Inc. | Dual detector optics for simultaneous collection of secondary and backscattered electrons |
US7435956B2 (en) * | 2004-09-10 | 2008-10-14 | Multibeam Systems, Inc. | Apparatus and method for inspection and testing of flat panel display substrates |
US7928404B2 (en) * | 2003-10-07 | 2011-04-19 | Multibeam Corporation | Variable-ratio double-deflection beam blanker |
DE102004037781A1 (de) | 2004-08-03 | 2006-02-23 | Carl Zeiss Nts Gmbh | Elektronenstrahlgerät |
US7456402B2 (en) * | 2004-09-10 | 2008-11-25 | Multibeam Systems, Inc. | Detector optics for multiple electron beam test system |
JP4920385B2 (ja) | 2006-11-29 | 2012-04-18 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム装置、走査型電子顕微鏡、及び試料観察方法 |
JP5054990B2 (ja) * | 2007-01-30 | 2012-10-24 | 株式会社日立ハイテクノロジーズ | 走査形電子顕微鏡 |
JP5274897B2 (ja) * | 2008-06-04 | 2013-08-28 | 日本電子株式会社 | 断面観察用走査電子顕微鏡 |
KR101431950B1 (ko) * | 2008-06-25 | 2014-08-19 | 가부시키가이샤 히다치 하이테크놀로지즈 | 반도체 검사 장치 |
JP4913854B2 (ja) * | 2008-10-08 | 2012-04-11 | アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー | 荷電粒子検出装置及び検出方法 |
JP5492405B2 (ja) * | 2008-12-02 | 2014-05-14 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
EP2365514B1 (de) * | 2010-03-10 | 2015-08-26 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Doppelstrahlige Ladungsträgerstrahlsäule und Betriebsverfahren dafür |
JP5198546B2 (ja) * | 2010-12-03 | 2013-05-15 | 株式会社日立ハイテクノロジーズ | 回路パターン検査方法、及び回路パターン検査システム |
JP5826941B2 (ja) * | 2011-09-27 | 2015-12-02 | エスエヌユー プレシジョン カンパニー リミテッドSnu Precision Co., Ltd. | 反射電子検出機能を備えた走査電子顕微鏡 |
KR101293016B1 (ko) * | 2011-10-27 | 2013-08-05 | 에스엔유 프리시젼 주식회사 | 주사전자현미경용 빈필터 제어방법 및 전자빔 정렬 기능을 구비한 주사전자현미경 |
JP5622779B2 (ja) * | 2012-03-26 | 2014-11-12 | 株式会社東芝 | 試料分析装置および試料分析方法 |
JP5965819B2 (ja) | 2012-10-26 | 2016-08-10 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置及び重ね合わせずれ量測定方法 |
JP2014238962A (ja) * | 2013-06-07 | 2014-12-18 | 三星電子株式会社Samsung Electronics Co.,Ltd. | 電子線装置 |
KR102234659B1 (ko) | 2013-10-29 | 2021-04-05 | 삼성전자주식회사 | 고에너지 전자 빔을 이용하여 인-셀 오버레이 오프셋을 측정할 수 있는 sem 장치와 그 방법 |
JP6516327B2 (ja) * | 2015-06-11 | 2019-05-22 | 国立大学法人名古屋大学 | 反射電子を検出する走査電子顕微鏡 |
DE112017007498B4 (de) | 2017-06-02 | 2020-11-19 | Hitachi High-Tech Corporation | Ladungsträgerstrahlvorrichtung |
JP7008671B2 (ja) | 2019-09-13 | 2022-01-25 | 日本電子株式会社 | 荷電粒子線装置および分析方法 |
CN114220725A (zh) * | 2020-12-02 | 2022-03-22 | 聚束科技(北京)有限公司 | 一种电子显微镜 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4041311A (en) * | 1976-07-12 | 1977-08-09 | Iowa State University Research Foundation, Inc. | Scanning electron microscope with color image display |
DE2921151C2 (de) * | 1979-05-25 | 1982-12-02 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Vorrichtung zum Nachweis von in einem Abtast-Elektronenstrahlmikroskop von einer Probe ausgehenden Rückstreuelektronen |
JPS60146439A (ja) * | 1984-01-11 | 1985-08-02 | Hitachi Ltd | 電位測定装置 |
JPS60212953A (ja) * | 1984-04-06 | 1985-10-25 | Hitachi Ltd | 電子線装置 |
JPS61220259A (ja) * | 1985-03-26 | 1986-09-30 | Fujitsu Ltd | 電子ビ−ム装置 |
US4772847A (en) * | 1985-04-17 | 1988-09-20 | Hitachi, Ltd. | Stroboscopic type potential measurement device |
EP0236807A3 (de) * | 1986-03-07 | 1990-05-16 | Siemens Aktiengesellschaft | Spektrometerobjektiv für die Korpuskularstrahl-Messtechnik |
GB8607222D0 (en) * | 1986-03-24 | 1986-04-30 | Welding Inst | Charged particle collection |
DE3638682A1 (de) * | 1986-11-13 | 1988-05-19 | Siemens Ag | Spektrometerobjektiv fuer korpuskularstrahlmesstechnik |
US4897545A (en) * | 1987-05-21 | 1990-01-30 | Electroscan Corporation | Electron detector for use in a gaseous environment |
US4933552A (en) * | 1988-10-06 | 1990-06-12 | International Business Machines Corporation | Inspection system utilizing retarding field back scattered electron collection |
US5097127A (en) * | 1990-02-23 | 1992-03-17 | Ibm Corporation | Multiple detector system for specimen inspection using high energy backscatter electrons |
GB2247345B (en) * | 1990-07-05 | 1995-04-05 | Haroon Ahmed | Integrated circuit structure analysis |
US5412210A (en) * | 1990-10-12 | 1995-05-02 | Hitachi, Ltd. | Scanning electron microscope and method for production of semiconductor device by using the same |
JP2754096B2 (ja) * | 1991-03-05 | 1998-05-20 | 日本電子テクニクス株式会社 | 電子線による試料表面の状態測定装置 |
US5118941A (en) * | 1991-04-23 | 1992-06-02 | The Perkin-Elmer Corporation | Apparatus and method for locating target area for electron microanalysis |
JP3148353B2 (ja) * | 1991-05-30 | 2001-03-19 | ケーエルエー・インストルメンツ・コーポレーション | 電子ビーム検査方法とそのシステム |
US5212383A (en) * | 1991-07-29 | 1993-05-18 | David Scharf | Color synthesizing scanning electron microscope |
JP2919170B2 (ja) * | 1992-03-19 | 1999-07-12 | 株式会社日立製作所 | 走査電子顕微鏡 |
JP3081393B2 (ja) * | 1992-10-15 | 2000-08-28 | 株式会社日立製作所 | 走査電子顕微鏡 |
-
1993
- 1993-12-28 JP JP33489493A patent/JP3291880B2/ja not_active Expired - Lifetime
-
1994
- 1994-10-21 KR KR1019940026924A patent/KR100382026B1/ko not_active IP Right Cessation
- 1994-12-15 EP EP02006070A patent/EP1244132B1/de not_active Expired - Lifetime
- 1994-12-15 DE DE69432399T patent/DE69432399T2/de not_active Expired - Lifetime
- 1994-12-15 EP EP94309387A patent/EP0661727B1/de not_active Expired - Lifetime
- 1994-12-15 DE DE69433937T patent/DE69433937T2/de not_active Expired - Lifetime
- 1994-12-20 US US08/359,761 patent/US5608218A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0661727B1 (de) | 2003-04-02 |
DE69433937D1 (de) | 2004-09-09 |
KR950019807A (ko) | 1995-07-24 |
DE69433937T2 (de) | 2005-09-08 |
JP3291880B2 (ja) | 2002-06-17 |
EP0661727A3 (de) | 1998-02-25 |
US5608218A (en) | 1997-03-04 |
EP0661727A2 (de) | 1995-07-05 |
DE69432399D1 (de) | 2003-05-08 |
JPH07192679A (ja) | 1995-07-28 |
EP1244132B1 (de) | 2004-08-04 |
KR100382026B1 (ko) | 2003-06-18 |
EP1244132A1 (de) | 2002-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |