DE69515626T2 - Plasmabehandlungsverfahren und -vorrichtung - Google Patents
Plasmabehandlungsverfahren und -vorrichtungInfo
- Publication number
- DE69515626T2 DE69515626T2 DE69515626T DE69515626T DE69515626T2 DE 69515626 T2 DE69515626 T2 DE 69515626T2 DE 69515626 T DE69515626 T DE 69515626T DE 69515626 T DE69515626 T DE 69515626T DE 69515626 T2 DE69515626 T2 DE 69515626T2
- Authority
- DE
- Germany
- Prior art keywords
- treatment method
- plasma treatment
- plasma
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32422—Arrangement for selecting ions or species in the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP32871394 | 1994-12-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69515626D1 DE69515626D1 (de) | 2000-04-20 |
DE69515626T2 true DE69515626T2 (de) | 2000-08-31 |
Family
ID=18213358
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69515626T Expired - Lifetime DE69515626T2 (de) | 1994-12-28 | 1995-12-28 | Plasmabehandlungsverfahren und -vorrichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US5677012A (de) |
EP (1) | EP0720206B1 (de) |
CN (1) | CN1165635C (de) |
DE (1) | DE69515626T2 (de) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5852434A (en) * | 1992-04-03 | 1998-12-22 | Sekendur; Oral F. | Absolute optical position determination |
JPH10176263A (ja) * | 1996-12-17 | 1998-06-30 | Sumitomo Heavy Ind Ltd | イオンプレーティング装置の運転方法 |
JP3275166B2 (ja) * | 1997-02-28 | 2002-04-15 | 住友重機械工業株式会社 | プラズマビームの偏り修正機構を備えた真空成膜装置 |
JP4287936B2 (ja) * | 1999-02-01 | 2009-07-01 | 中外炉工業株式会社 | 真空成膜装置 |
JP3944317B2 (ja) * | 1998-06-09 | 2007-07-11 | 住友重機械工業株式会社 | Cu成膜方法 |
JP4405973B2 (ja) * | 2006-01-17 | 2010-01-27 | キヤノンアネルバ株式会社 | 薄膜作製装置 |
CN1845292B (zh) * | 2006-04-30 | 2011-07-20 | 哈尔滨工业大学 | 磁场辅助的自辉光等离子体离子注入装置 |
US7498587B2 (en) * | 2006-05-01 | 2009-03-03 | Vapor Technologies, Inc. | Bi-directional filtered arc plasma source |
JP5968666B2 (ja) * | 2012-04-09 | 2016-08-10 | 中外炉工業株式会社 | プラズマ発生装置および蒸着装置 |
CN103732788B (zh) * | 2012-08-15 | 2016-06-29 | 中外炉工业株式会社 | 等离子体处理装置 |
JP5421438B1 (ja) | 2012-08-15 | 2014-02-19 | 中外炉工業株式会社 | プラズマ処理装置 |
JP6054249B2 (ja) * | 2013-05-27 | 2016-12-27 | 住友重機械工業株式会社 | 成膜装置 |
JP6013274B2 (ja) * | 2013-05-28 | 2016-10-25 | 住友重機械工業株式会社 | 成膜装置 |
JP5989601B2 (ja) * | 2013-05-29 | 2016-09-07 | 住友重機械工業株式会社 | プラズマ蒸発装置 |
JP6013279B2 (ja) * | 2013-06-13 | 2016-10-25 | 住友重機械工業株式会社 | 成膜装置 |
US9460925B2 (en) | 2014-11-05 | 2016-10-04 | Solarcity Corporation | System and apparatus for efficient deposition of transparent conductive oxide |
US11056324B2 (en) * | 2018-08-13 | 2021-07-06 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for particle control in MRAM processing |
DE102020124270A1 (de) | 2020-09-17 | 2022-03-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Verfahren und Vorrichtung zur anodischen Bogenverdampfung |
FR3118280B1 (fr) | 2020-12-18 | 2022-12-02 | Commissariat Energie Atomique | Dispositif pour le depot de films minces assisté par plasma micro-onde |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3956093A (en) * | 1974-12-16 | 1976-05-11 | Airco, Inc. | Planar magnetron sputtering method and apparatus |
EP0284436B1 (de) * | 1987-03-27 | 1993-07-21 | Canon Kabushiki Kaisha | Gerät zur Bearbeitung von Substraten |
US4885070A (en) * | 1988-02-12 | 1989-12-05 | Leybold Aktiengesellschaft | Method and apparatus for the application of materials |
EP0385475A3 (de) * | 1989-03-02 | 1991-04-03 | Asahi Glass Company Ltd. | Verfahren zur Herstellung eines durchsichtigen leitenden Films |
JP2501948B2 (ja) * | 1990-10-26 | 1996-05-29 | 三菱電機株式会社 | プラズマ処理方法及びプラズマ処理装置 |
JPH04254583A (ja) * | 1990-12-28 | 1992-09-09 | Sumitomo Heavy Ind Ltd | イオンプレーティング装置における膜質制御装置 |
JPH04365854A (ja) * | 1991-06-11 | 1992-12-17 | Ulvac Japan Ltd | イオンプレーティング装置 |
JPH0688216A (ja) * | 1992-09-07 | 1994-03-29 | Nippon Sheet Glass Co Ltd | 真空成膜方法 |
JP2946387B2 (ja) * | 1993-11-17 | 1999-09-06 | 住友重機械工業株式会社 | イオンプレーティング装置 |
-
1995
- 1995-12-27 US US08/579,158 patent/US5677012A/en not_active Expired - Lifetime
- 1995-12-28 DE DE69515626T patent/DE69515626T2/de not_active Expired - Lifetime
- 1995-12-28 CN CNB95121151XA patent/CN1165635C/zh not_active Expired - Lifetime
- 1995-12-28 EP EP95120678A patent/EP0720206B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
CN1165635C (zh) | 2004-09-08 |
EP0720206B1 (de) | 2000-03-15 |
CN1135538A (zh) | 1996-11-13 |
US5677012A (en) | 1997-10-14 |
EP0720206A1 (de) | 1996-07-03 |
DE69515626D1 (de) | 2000-04-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |