DE69535054D1 - Verfahren zur Ozonerzeugung und Methoden zur Benutzung der Vorrichtung - Google Patents

Verfahren zur Ozonerzeugung und Methoden zur Benutzung der Vorrichtung

Info

Publication number
DE69535054D1
DE69535054D1 DE69535054T DE69535054T DE69535054D1 DE 69535054 D1 DE69535054 D1 DE 69535054D1 DE 69535054 T DE69535054 T DE 69535054T DE 69535054 T DE69535054 T DE 69535054T DE 69535054 D1 DE69535054 D1 DE 69535054D1
Authority
DE
Germany
Prior art keywords
methods
generation method
ozone generation
ozone
generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69535054T
Other languages
English (en)
Other versions
DE69535054T2 (de
Inventor
Minoru Harada
Ryoichi Shinjo
Manabu Tsujimura
Rempei Nakata
Kunihiro Miyazaki
Naruhiko Kaji
Yutaka Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Toshiba Corp
Original Assignee
Ebara Corp
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP6224151A external-priority patent/JPH0859214A/ja
Priority claimed from JP6299092A external-priority patent/JPH08133707A/ja
Application filed by Ebara Corp, Toshiba Corp filed Critical Ebara Corp
Publication of DE69535054D1 publication Critical patent/DE69535054D1/de
Application granted granted Critical
Publication of DE69535054T2 publication Critical patent/DE69535054T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C01B13/11—Preparation of ozone by electric discharge
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
    • C01B13/10—Preparation of ozone
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402—Reduction of impurities in the source gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising
    • C23C8/12—Oxidising using elemental oxygen or ozone
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/60—Feed streams for electrical dischargers
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2201/00—Preparation of ozone by electrical discharge
    • C01B2201/60—Feed streams for electrical dischargers
    • C01B2201/66—Pretreatment of the feed
DE69535054T 1994-08-24 1995-08-23 Verfahren zur Ozonerzeugung und Methoden zur Benutzung der Vorrichtung Expired - Fee Related DE69535054T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP6224151A JPH0859214A (ja) 1994-08-24 1994-08-24 オゾン発生装置
JP22415194 1994-08-24
JP29909294 1994-11-09
JP6299092A JPH08133707A (ja) 1994-11-09 1994-11-09 オゾン発生方法と装置及びその使用方法

Publications (2)

Publication Number Publication Date
DE69535054D1 true DE69535054D1 (de) 2006-07-27
DE69535054T2 DE69535054T2 (de) 2007-01-04

Family

ID=26525876

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69535054T Expired - Fee Related DE69535054T2 (de) 1994-08-24 1995-08-23 Verfahren zur Ozonerzeugung und Methoden zur Benutzung der Vorrichtung

Country Status (5)

Country Link
US (2) US5632868A (de)
EP (1) EP0703187B1 (de)
KR (1) KR960007449A (de)
DE (1) DE69535054T2 (de)
TW (1) TW350832B (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19648514A1 (de) * 1995-11-27 1997-05-28 Sumitomo Precision Prod Co Verfahren zum verringern metallischer Verunreinigungen in einer Ozongasleitung
FR2746385B1 (fr) * 1996-03-19 1998-05-15 Ozonia Int Sa Procede et dispositif pour eviter la corrosion dans les equipements de compression d'un gaz contenant de l'ozone
US6004397A (en) * 1996-05-16 1999-12-21 Lg Semicon Co., Ltd. TEOS-O3 oxidizing film depositing system and process for supplying ozone (O3) thereto
KR100205316B1 (ko) * 1996-05-16 1999-07-01 구본준 티이오에스 오존 산화막 증착장치 및 그 장치에 오존을 공급하는 방법
US6143081A (en) * 1996-07-12 2000-11-07 Tokyo Electron Limited Film forming apparatus and method, and film modifying apparatus and method
US7264680B2 (en) * 1997-05-09 2007-09-04 Semitool, Inc. Process and apparatus for treating a workpiece using ozone
JPH1145779A (ja) * 1997-07-25 1999-02-16 Tdk Corp 有機ｅｌ素子の製造方法および装置
US6517787B2 (en) * 1998-12-30 2003-02-11 Ind Tech Res Inst Ozone generator with reduced NOx and method thereof
US6740597B1 (en) * 2000-08-31 2004-05-25 Micron Technology, Inc. Methods of removing at least some of a material from a semiconductor substrate
EP1243918A3 (de) 2001-03-23 2004-10-06 Instrumentarium Corporation Verbesserter Chemilumineszenz-Gasanalysator
JP4071968B2 (ja) * 2002-01-17 2008-04-02 東芝三菱電機産業システム株式会社 ガス供給システム及びガス供給方法
US7365403B1 (en) 2002-02-13 2008-04-29 Cypress Semiconductor Corp. Semiconductor topography including a thin oxide-nitride stack and method for making the same
JP3999059B2 (ja) * 2002-06-26 2007-10-31 東京エレクトロン株式会社 基板処理システム及び基板処理方法
US20040185396A1 (en) * 2003-03-21 2004-09-23 The Regents Of The University Of California Combustion enhancement with silent discharge plasma
KR100505064B1 (ko) * 2003-05-06 2005-07-29 삼성전자주식회사 반도체 소자의 산화방법 및 이를 이용한 산화막 형성방법
JP3642572B2 (ja) * 2003-05-09 2005-04-27 東芝三菱電機産業システム株式会社 オゾン発生装置およびオゾン発生方法
EP1630133A1 (de) * 2004-08-27 2006-03-01 Innovative Ozone Services Inc. Verfahren und Anordnung zur Herstellung von Stickstoffoxiden
JP2006261434A (ja) * 2005-03-17 2006-09-28 L'air Liquide Sa Pour L'etude & L'exploitation Des Procede S Georges Claude シリコン酸化膜の形成方法
US20060251551A1 (en) * 2005-05-09 2006-11-09 Brian Johnson Apparatus and method for ozone gas distribution
US7588750B2 (en) * 2007-07-03 2009-09-15 Amarante Technologies, Inc. Systems and methods for generating and storing ozone
EP2140833A1 (de) * 2008-07-03 2010-01-06 Curozone USA Inc. Zahnbehandlungsgerät
JP5453490B2 (ja) 2011-12-21 2014-03-26 財團法人工業技術研究院 除湿と離脱装置及びシステム
WO2013150819A1 (ja) 2012-04-05 2013-10-10 三菱電機株式会社 オゾン発生システムおよびオゾン発生方法
CN106687409B (zh) * 2014-09-22 2019-05-14 三菱电机株式会社 臭氧发生系统及其运转方法
CN109081423A (zh) * 2018-10-31 2018-12-25 首创爱华(天津)市政环境工程有限公司 一种集装箱式氧化系统和方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2700648A (en) * 1951-01-19 1955-01-25 Air Reduction Ozone stabilization
US2857323A (en) * 1955-10-20 1958-10-21 Welsbach Corp Method for ozone generation
BE562398A (de) * 1956-11-22
JPS583963B2 (ja) * 1977-01-31 1983-01-24 三菱電機株式会社 オゾン発生機
JPS55121903A (en) * 1979-03-15 1980-09-19 Mitsubishi Electric Corp Ozone generator
JPS5795808A (en) * 1980-12-02 1982-06-14 Mitsubishi Electric Corp Generating apparatus for ozone
JPS57183304A (en) * 1981-04-30 1982-11-11 Mitsubishi Electric Corp Ozonizer
JPH0616813B2 (ja) * 1987-12-10 1994-03-09 国立公害研究所長 道路トンネルにおける換気ガスの浄化方法
JPH0621010B2 (ja) * 1988-05-06 1994-03-23 住友精密工業株式会社 高純度、高濃度オゾンをほとんど経時変化なく発生させる方法
JPH02208204A (ja) * 1989-02-08 1990-08-17 Ishikawajima Harima Heavy Ind Co Ltd ＮＯｘ含有量の少ないオゾン製造方法及び装置
US5370846A (en) * 1990-10-26 1994-12-06 Sumitomo Precision Products Co., Ltd. Apparatus and method for generating high concentration ozone
US6126781A (en) * 1991-08-01 2000-10-03 Union Camp Patent Holding, Inc. Process for conditioning ozone gas recycle stream in ozone pulp bleaching
JPH0621010A (ja) * 1992-06-30 1994-01-28 Tokyo Electron Ltd プラズマ処理装置
EP0579060B1 (de) * 1992-07-03 1998-10-07 Ebara Corporation Verfahren zur Ozonherstellung
US5294571A (en) * 1992-07-22 1994-03-15 Vlsi Technology, Inc. Rapid thermal oxidation of silicon in an ozone ambient
JP2809018B2 (ja) * 1992-11-26 1998-10-08 日本電気株式会社 半導体装置およびその製造方法

Also Published As

Publication number Publication date
EP0703187A2 (de) 1996-03-27
TW350832B (en) 1999-01-21
EP0703187B1 (de) 2006-06-14
KR960007449A (ko) 1996-03-22
DE69535054T2 (de) 2007-01-04
EP0703187A3 (de) 1999-11-10
US5632868A (en) 1997-05-27
US5792326A (en) 1998-08-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee