US5528118A
(en)
*
|
1994-04-01 |
1996-06-18 |
Nikon Precision, Inc. |
Guideless stage with isolated reaction stage
|
JPH10209039A
(ja)
*
|
1997-01-27 |
1998-08-07 |
Nikon Corp |
投影露光方法及び投影露光装置
|
US6262796B1
(en)
*
|
1997-03-10 |
2001-07-17 |
Asm Lithography B.V. |
Positioning device having two object holders
|
JPH10270535A
(ja)
*
|
1997-03-25 |
1998-10-09 |
Nikon Corp |
移動ステージ装置、及び該ステージ装置を用いた回路デバイス製造方法
|
KR100521704B1
(ko)
|
1997-09-19 |
2005-10-14 |
가부시키가이샤 니콘 |
스테이지장치, 주사형 노광장치 및 방법, 그리고 이것으로제조된 디바이스
|
TW448487B
(en)
|
1997-11-22 |
2001-08-01 |
Nippon Kogaku Kk |
Exposure apparatus, exposure method and manufacturing method of device
|
DE69933903T2
(de)
*
|
1998-04-14 |
2007-05-24 |
Asml Netherlands B.V. |
Lithograpischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
|
EP0957275A3
(de)
|
1998-05-14 |
2000-12-06 |
Asm Lithography B.V. |
Gaslager und solch ein Lager aufweisende lithographische Einrichtung
|
WO1999066542A1
(fr)
*
|
1998-06-17 |
1999-12-23 |
Nikon Corporation |
Procede et dispositif d'exposition
|
US7116401B2
(en)
*
|
1999-03-08 |
2006-10-03 |
Asml Netherlands B.V. |
Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method
|
TW490596B
(en)
*
|
1999-03-08 |
2002-06-11 |
Asm Lithography Bv |
Lithographic projection apparatus, method of manufacturing a device using the lithographic projection apparatus, device manufactured according to the method and method of calibrating the lithographic projection apparatus
|
US6924884B2
(en)
|
1999-03-08 |
2005-08-02 |
Asml Netherlands B.V. |
Off-axis leveling in lithographic projection apparatus
|
TWI242111B
(en)
|
1999-04-19 |
2005-10-21 |
Asml Netherlands Bv |
Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus
|
TW513617B
(en)
|
1999-04-21 |
2002-12-11 |
Asml Corp |
Lithographic projection apparatus and method of manufacturing a device using a lithographic projection apparatus
|
TW561279B
(en)
*
|
1999-07-02 |
2003-11-11 |
Asml Netherlands Bv |
Reflector for reflecting radiation in a desired wavelength range, lithographic projection apparatus containing the same and method for their preparation
|
TW587199B
(en)
|
1999-09-29 |
2004-05-11 |
Asml Netherlands Bv |
Lithographic method and apparatus
|
JP2001118773A
(ja)
*
|
1999-10-18 |
2001-04-27 |
Nikon Corp |
ステージ装置及び露光装置
|
JP2001160530A
(ja)
|
1999-12-01 |
2001-06-12 |
Nikon Corp |
ステージ装置及び露光装置
|
DE60032568T2
(de)
*
|
1999-12-01 |
2007-10-04 |
Asml Netherlands B.V. |
Positionierungsapparat und damit versehener lithographischer Apparat
|
EP1111470B1
(de)
*
|
1999-12-21 |
2007-03-07 |
ASML Netherlands B.V. |
Lithographischer Apparat mit einem ausbalancierten Positionierungssystem
|
TW546551B
(en)
|
1999-12-21 |
2003-08-11 |
Asml Netherlands Bv |
Balanced positioning system for use in lithographic apparatus
|
TW538256B
(en)
|
2000-01-14 |
2003-06-21 |
Zeiss Stiftung |
Microlithographic reduction projection catadioptric objective
|
TW588222B
(en)
*
|
2000-02-10 |
2004-05-21 |
Asml Netherlands Bv |
Cooling of voice coil motors in lithographic projection apparatus
|
TWI240849B
(en)
*
|
2000-02-10 |
2005-10-01 |
Asml Netherlands Bv |
Object positioning method for a lithographic projection apparatus
|
DE10006527A1
(de)
*
|
2000-02-15 |
2001-08-23 |
Infineon Technologies Ag |
Halbautomat zum halbautomatischen Abziehen von UV- Folie
|
US7301605B2
(en)
|
2000-03-03 |
2007-11-27 |
Nikon Corporation |
Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
|
JP2001257143A
(ja)
|
2000-03-09 |
2001-09-21 |
Nikon Corp |
ステージ装置及び露光装置、並びにデバイス製造方法
|
US6437463B1
(en)
*
|
2000-04-24 |
2002-08-20 |
Nikon Corporation |
Wafer positioner with planar motor and mag-lev fine stage
|
US7508487B2
(en)
*
|
2000-06-01 |
2009-03-24 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
JP4474020B2
(ja)
*
|
2000-06-23 |
2010-06-02 |
キヤノン株式会社 |
移動装置及び露光装置
|
US6630984B2
(en)
|
2000-08-03 |
2003-10-07 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
TW527526B
(en)
*
|
2000-08-24 |
2003-04-11 |
Asml Netherlands Bv |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
US7561270B2
(en)
*
|
2000-08-24 |
2009-07-14 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
TWI232356B
(en)
|
2000-09-04 |
2005-05-11 |
Asml Netherlands Bv |
Lithographic projection apparatus, device manufacturing method and device manufactured thereby
|
TW548524B
(en)
*
|
2000-09-04 |
2003-08-21 |
Asm Lithography Bv |
Lithographic projection apparatus, device manufacturing method and device manufactured thereby
|
EP1197803B1
(de)
|
2000-10-10 |
2012-02-01 |
ASML Netherlands B.V. |
Lithographischer Apparat
|
EP2081086B1
(de)
|
2000-11-07 |
2013-01-02 |
ASML Netherlands B.V. |
Lithografische Vorrichtung und Vorrichtungsherstellungsverfahren
|
US6757053B1
(en)
|
2000-11-16 |
2004-06-29 |
Nikon Corporation |
Stage assembly including a reaction mass assembly
|
US6958808B2
(en)
|
2000-11-16 |
2005-10-25 |
Nikon Corporation |
System and method for resetting a reaction mass assembly of a stage assembly
|
US6593997B1
(en)
|
2000-11-16 |
2003-07-15 |
Nikon Corporation |
Stage assembly including a reaction assembly
|
US6603531B1
(en)
*
|
2000-11-16 |
2003-08-05 |
Nikon Corporation |
Stage assembly including a reaction assembly that is connected by actuators
|
US6885430B2
(en)
|
2000-11-16 |
2005-04-26 |
Nikon Corporation |
System and method for resetting a reaction mass assembly of a stage assembly
|
TW591342B
(en)
*
|
2000-11-30 |
2004-06-11 |
Asml Netherlands Bv |
Lithographic projection apparatus and integrated circuit manufacturing method using a lithographic projection apparatus
|
US7113258B2
(en)
*
|
2001-01-15 |
2006-09-26 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US6987558B2
(en)
|
2001-01-16 |
2006-01-17 |
Nikon Corporation |
Reaction mass for a stage device
|
US20020117109A1
(en)
*
|
2001-02-27 |
2002-08-29 |
Hazelton Andrew J. |
Multiple stage, stage assembly having independent reaction force transfer
|
US6927838B2
(en)
|
2001-02-27 |
2005-08-09 |
Nikon Corporation |
Multiple stage, stage assembly having independent stage bases
|
US6792591B2
(en)
*
|
2001-02-28 |
2004-09-14 |
Asml Masktools B.V. |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
|
DE60219844T2
(de)
*
|
2001-03-01 |
2008-01-17 |
Asml Netherlands B.V. |
Verfahren zur Übernahme einer lithographischen Maske
|
DE60202230T2
(de)
|
2001-03-14 |
2005-12-15 |
Asml Masktools B.V. |
Naheffektkorrektur mittels nicht aufgelöster Hilfsstrukturen in Form von Leiterstäben
|
US7735052B2
(en)
*
|
2001-04-24 |
2010-06-08 |
Asml Masktools Netherlands B.V. |
Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs
|
JP4814438B2
(ja)
*
|
2001-05-02 |
2011-11-16 |
日本トムソン株式会社 |
リニアモータを内蔵したステージ装置
|
JP3970106B2
(ja)
|
2001-05-23 |
2007-09-05 |
エーエスエムエル ネザーランズ ビー.ブイ. |
実質的に透過性のプロセス層に整列マークを備える基板、上記マークを露出するためのマスク、およびデバイス製造方法
|
TWI266959B
(en)
*
|
2001-06-20 |
2006-11-21 |
Asml Netherlands Bv |
Device manufacturing method, device manufactured thereby and a mask for use in the method
|
US6788385B2
(en)
*
|
2001-06-21 |
2004-09-07 |
Nikon Corporation |
Stage device, exposure apparatus and method
|
US6903346B2
(en)
*
|
2001-07-11 |
2005-06-07 |
Nikon Corporation |
Stage assembly having a follower assembly
|
TW529172B
(en)
*
|
2001-07-24 |
2003-04-21 |
Asml Netherlands Bv |
Imaging apparatus
|
US6674512B2
(en)
|
2001-08-07 |
2004-01-06 |
Nikon Corporation |
Interferometer system for a semiconductor exposure system
|
US6785005B2
(en)
|
2001-09-21 |
2004-08-31 |
Nikon Corporation |
Switching type dual wafer stage
|
US7026081B2
(en)
*
|
2001-09-28 |
2006-04-11 |
Asml Masktools B.V. |
Optical proximity correction method utilizing phase-edges as sub-resolution assist features
|
JP3980469B2
(ja)
*
|
2001-10-19 |
2007-09-26 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィック装置及びデバイス製造方法
|
US6665054B2
(en)
|
2001-10-22 |
2003-12-16 |
Nikon Corporation |
Two stage method
|
KR100436213B1
(ko)
*
|
2001-12-17 |
2004-06-16 |
미래산업 주식회사 |
반도체 소자 테스트 핸들러용 소자 정렬장치
|
US6927505B2
(en)
|
2001-12-19 |
2005-08-09 |
Nikon Corporation |
Following stage planar motor
|
US7002668B2
(en)
*
|
2002-03-08 |
2006-02-21 |
Rivin Eugeny I |
Stage positioning unit for photo lithography tool and for the like
|
US7170587B2
(en)
*
|
2002-03-18 |
2007-01-30 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7333178B2
(en)
*
|
2002-03-18 |
2008-02-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7061577B2
(en)
|
2002-03-26 |
2006-06-13 |
Nikon Corporation |
Image adjustor including damping assembly
|
US6724466B2
(en)
|
2002-03-26 |
2004-04-20 |
Nikon Corporation |
Stage assembly including a damping assembly
|
EP1367446A1
(de)
|
2002-05-31 |
2003-12-03 |
ASML Netherlands B.V. |
Lithographischer Apparat
|
EP1383007A1
(de)
*
|
2002-07-16 |
2004-01-21 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
TWI242690B
(en)
*
|
2002-08-15 |
2005-11-01 |
Asml Netherlands Bv |
Reflector assembly, lithographic projection apparatus, radiation system with the reflector assembly, and method of manufacturing an integrated structure by a lithographic process
|
EP2204697A3
(de)
|
2002-09-20 |
2012-04-18 |
ASML Netherlands B.V. |
Markerstruktur, lithographische Projektionsvorrichtung, Verfahren zur Substratausrichtung mittels solch einer Struktur und Substrat mit solch einer Markerstruktur
|
TWI229243B
(en)
*
|
2002-09-20 |
2005-03-11 |
Asml Netherlands Bv |
Lithographic marker structure, lithographic projection apparatus comprising such a lithographic marker structure and method for substrate alignment using such a lithographic marker structure
|
TWI246114B
(en)
*
|
2002-09-24 |
2005-12-21 |
Asml Netherlands Bv |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
CN100421024C
(zh)
*
|
2002-09-30 |
2008-09-24 |
Asml荷兰有限公司 |
光刻装置及器件制造方法
|
CN100437355C
(zh)
*
|
2002-09-30 |
2008-11-26 |
Asml荷兰有限公司 |
光刻投射装置及器件制造方法
|
SG116510A1
(de)
*
|
2002-11-12 |
2005-11-28 |
|
|
US9482966B2
(en)
|
2002-11-12 |
2016-11-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US10503084B2
(en)
|
2002-11-12 |
2019-12-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG121822A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG121819A1
(en)
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US7110081B2
(en)
|
2002-11-12 |
2006-09-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG137657A1
(en)
*
|
2002-11-12 |
2007-12-28 |
Asml Masktools Bv |
Method and apparatus for performing model-based layout conversion for use with dipole illumination
|
EP1429188B1
(de)
|
2002-11-12 |
2013-06-19 |
ASML Netherlands B.V. |
Lithographischer Projektionsapparat
|
EP1420298B1
(de)
|
2002-11-12 |
2013-02-20 |
ASML Netherlands B.V. |
Lithographischer Apparat
|
EP1420302A1
(de)
|
2002-11-18 |
2004-05-19 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
SG111171A1
(en)
*
|
2002-11-27 |
2005-05-30 |
Asml Netherlands Bv |
Lithographic projection apparatus and device manufacturing method
|
SG115590A1
(en)
*
|
2002-11-27 |
2005-10-28 |
Asml Netherlands Bv |
Lithographic projection apparatus and device manufacturing method
|
TW200412617A
(en)
*
|
2002-12-03 |
2004-07-16 |
Nikon Corp |
Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
|
US7242455B2
(en)
*
|
2002-12-10 |
2007-07-10 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
SG171468A1
(en)
*
|
2002-12-10 |
2011-06-29 |
Nikon Corp |
Exposure apparatus and method for producing device
|
TW200421444A
(en)
|
2002-12-10 |
2004-10-16 |
Nippon Kogaku Kk |
Optical device and projecting exposure apparatus using such optical device
|
JP4525062B2
(ja)
*
|
2002-12-10 |
2010-08-18 |
株式会社ニコン |
露光装置及びデバイス製造方法、露光システム
|
DE60323927D1
(de)
*
|
2002-12-13 |
2008-11-20 |
Asml Netherlands Bv |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
KR100549781B1
(ko)
*
|
2002-12-19 |
2006-02-06 |
에이에스엠엘 네델란즈 비.브이. |
리소그래피투영마스크, 리소그래피투영마스크를 이용한디바이스제조방법 및 그 제조된 디바이스
|
DE10261775A1
(de)
|
2002-12-20 |
2004-07-01 |
Carl Zeiss Smt Ag |
Vorrichtung zur optischen Vermessung eines Abbildungssystems
|
EP1431825A1
(de)
*
|
2002-12-20 |
2004-06-23 |
ASML Netherlands B.V. |
Lithographischer Apparat, Verfahren zur Herstellung einer Vorrichtung und Substrathalter
|
EP1434092A1
(de)
|
2002-12-23 |
2004-06-30 |
ASML Netherlands B.V. |
Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel
|
CN100476585C
(zh)
*
|
2002-12-23 |
2009-04-08 |
Asml荷兰有限公司 |
具有可扩展薄片的杂质屏蔽
|
TWI286674B
(en)
*
|
2002-12-27 |
2007-09-11 |
Asml Netherlands Bv |
Container for a mask, method of transferring lithographic masks therein and method of scanning a mask in a container
|
SG125101A1
(en)
*
|
2003-01-14 |
2006-09-29 |
Asml Netherlands Bv |
Level sensor for lithographic apparatus
|
CN1573554A
(zh)
*
|
2003-01-14 |
2005-02-02 |
Asml蒙片工具有限公司 |
用于接触孔掩模的光学逼近校正设计的方法
|
TWI304158B
(en)
*
|
2003-01-15 |
2008-12-11 |
Asml Netherlands Bv |
Detection assembly and lithographic projection apparatus provided with such a detection assembly
|
US6963821B2
(en)
*
|
2003-02-11 |
2005-11-08 |
Nikon Corporation |
Stage counter mass system
|
JP4615877B2
(ja)
*
|
2003-02-20 |
2011-01-19 |
アプライド マテリアルズ インコーポレイテッド |
支持ステージに対して基板を位置決めする装置及びコンピュータプログラム
|
US7151981B2
(en)
*
|
2003-02-20 |
2006-12-19 |
Applied Materials, Inc. |
Methods and apparatus for positioning a substrate relative to a support stage
|
US7499767B2
(en)
*
|
2003-02-20 |
2009-03-03 |
Applied Materials, Inc. |
Methods and apparatus for positioning a substrate relative to a support stage
|
EP3301511A1
(de)
|
2003-02-26 |
2018-04-04 |
Nikon Corporation |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung der vorrichtung
|
US7206059B2
(en)
*
|
2003-02-27 |
2007-04-17 |
Asml Netherlands B.V. |
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
|
US6943941B2
(en)
*
|
2003-02-27 |
2005-09-13 |
Asml Netherlands B.V. |
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
|
SG115641A1
(en)
*
|
2003-03-06 |
2005-10-28 |
Asml Netherlands Bv |
Device and method for manipulation and routing of a metrology beam
|
TWI264620B
(en)
*
|
2003-03-07 |
2006-10-21 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG123601A1
(en)
|
2003-03-10 |
2006-07-26 |
Asml Netherlands Bv |
Focus spot monitoring in a lithographic projectionapparatus
|
TWI234692B
(en)
*
|
2003-03-11 |
2005-06-21 |
Asml Netherlands Bv |
Lithographic projection assembly, handling apparatus for handling substrates and method of handling a substrate
|
EP1457825A1
(de)
*
|
2003-03-11 |
2004-09-15 |
ASML Netherlands B.V. |
Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel
|
SG125108A1
(en)
*
|
2003-03-11 |
2006-09-29 |
Asml Netherlands Bv |
Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus
|
EP1457827A1
(de)
*
|
2003-03-11 |
2004-09-15 |
ASML Netherlands B.V. |
Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel
|
EP1457833B1
(de)
|
2003-03-11 |
2012-05-30 |
ASML Netherlands B.V. |
Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit erzeugter Artikel
|
SG115629A1
(en)
*
|
2003-03-11 |
2005-10-28 |
Asml Netherlands Bv |
Method and apparatus for maintaining a machine part
|
SG115631A1
(en)
*
|
2003-03-11 |
2005-10-28 |
Asml Netherlands Bv |
Lithographic projection assembly, load lock and method for transferring objects
|
EP1457826A1
(de)
*
|
2003-03-11 |
2004-09-15 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
SG115630A1
(en)
*
|
2003-03-11 |
2005-10-28 |
Asml Netherlands Bv |
Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock
|
KR20050110033A
(ko)
|
2003-03-25 |
2005-11-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
CN101840163B
(zh)
*
|
2003-03-31 |
2012-06-06 |
Asml蒙片工具有限公司 |
照明源和掩模优化
|
US7397539B2
(en)
*
|
2003-03-31 |
2008-07-08 |
Asml Netherlands, B.V. |
Transfer apparatus for transferring an object, lithographic apparatus employing such a transfer apparatus, and method of use thereof
|
SG125948A1
(en)
*
|
2003-03-31 |
2006-10-30 |
Asml Netherlands Bv |
Supporting structure for use in a lithographic apparatus
|
US7126671B2
(en)
*
|
2003-04-04 |
2006-10-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
KR101176817B1
(ko)
|
2003-04-07 |
2012-08-24 |
가부시키가이샤 니콘 |
노광장치 및 디바이스 제조방법
|
JP4394500B2
(ja)
*
|
2003-04-09 |
2010-01-06 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置、デバイス製造方法、及びコンピュータ・プログラム
|
EP2270597B1
(de)
|
2003-04-09 |
2017-11-01 |
Nikon Corporation |
Belichtungsmethode und -apparat sowie Methode zur Herstellung einer Vorrichtung
|
SG2012050829A
(en)
|
2003-04-10 |
2015-07-30 |
Nippon Kogaku Kk |
Environmental system including vacuum scavange for an immersion lithography apparatus
|
EP3062152B1
(de)
|
2003-04-10 |
2017-12-20 |
Nikon Corporation |
Umgebungssystem mit einer transportregion für eine immersionslithografievorrichtung
|
KR101697896B1
(ko)
|
2003-04-11 |
2017-01-18 |
가부시키가이샤 니콘 |
액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
|
KR101324818B1
(ko)
|
2003-04-11 |
2013-11-01 |
가부시키가이샤 니콘 |
액침 리소그래피에 의한 광학기기의 세정방법
|
JP4071733B2
(ja)
|
2003-04-17 |
2008-04-02 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置、デバイス製造方法、およびコンピュータ・プログラム
|
JP4315420B2
(ja)
|
2003-04-18 |
2009-08-19 |
キヤノン株式会社 |
露光装置及び露光方法
|
SG115678A1
(en)
|
2003-04-22 |
2005-10-28 |
Asml Netherlands Bv |
Substrate carrier and method for making a substrate carrier
|
TWI237307B
(en)
*
|
2003-05-01 |
2005-08-01 |
Nikon Corp |
Optical projection system, light exposing apparatus and light exposing method
|
EP1475666A1
(de)
|
2003-05-06 |
2004-11-10 |
ASML Netherlands B.V. |
Substrathalter für einen lithographischen Apparat
|
US7348575B2
(en)
|
2003-05-06 |
2008-03-25 |
Nikon Corporation |
Projection optical system, exposure apparatus, and exposure method
|
KR101790914B1
(ko)
|
2003-05-06 |
2017-10-26 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치 및 노광 방법
|
EP1475667A1
(de)
*
|
2003-05-09 |
2004-11-10 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
US20040263816A1
(en)
*
|
2003-05-12 |
2004-12-30 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1477861A1
(de)
*
|
2003-05-16 |
2004-11-17 |
ASML Netherlands B.V. |
Verfahren zur Eichung eines lithographischen Geräts, Ausrichtverfahren, Komputerprogramm, lithographisches Gerät und Verfahren zur Herstellung einer Vorrichtung
|
SG141228A1
(en)
*
|
2003-05-19 |
2008-04-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
TWI463533B
(zh)
|
2003-05-23 |
2014-12-01 |
尼康股份有限公司 |
An exposure method, an exposure apparatus, and an element manufacturing method
|
TW201806001A
(zh)
|
2003-05-23 |
2018-02-16 |
尼康股份有限公司 |
曝光裝置及元件製造方法
|
KR20150036794A
(ko)
*
|
2003-05-28 |
2015-04-07 |
가부시키가이샤 니콘 |
노광 방법, 노광 장치, 및 디바이스 제조 방법
|
TWI347741B
(en)
*
|
2003-05-30 |
2011-08-21 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP1486828B1
(de)
|
2003-06-09 |
2013-10-09 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
US7213963B2
(en)
|
2003-06-09 |
2007-05-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP2261741A3
(de)
|
2003-06-11 |
2011-05-25 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
EP1486824A1
(de)
*
|
2003-06-11 |
2004-12-15 |
ASML Netherlands B.V. |
Bewegliches Trägersystem für einen lithographischen Belichtungsapparat, lithographischer Belichtungssapparat und Verfahren zur Herstellung einer Vorrichtung
|
US7317504B2
(en)
*
|
2004-04-08 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20040252287A1
(en)
*
|
2003-06-11 |
2004-12-16 |
Michael Binnard |
Reaction frame assembly that functions as a reaction mass
|
TW200511388A
(en)
|
2003-06-13 |
2005-03-16 |
Nikon Corp |
Exposure method, substrate stage, exposure apparatus and method for manufacturing device
|
KR101475634B1
(ko)
|
2003-06-19 |
2014-12-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조방법
|
TWI251129B
(en)
*
|
2003-06-27 |
2006-03-11 |
Asml Netherlands Bv |
Lithographic apparatus and integrated circuit manufacturing method
|
EP1491967A1
(de)
*
|
2003-06-27 |
2004-12-29 |
ASML Netherlands B.V. |
Verfahren und Vorrichtung zur Positionierung eines Substrats auf einem Substrattisch
|
SG144723A1
(en)
|
2003-06-30 |
2008-08-28 |
Asml Masktools Bv |
A method, program product and apparatus for generating assist features utilizing an image field map
|
CN100480860C
(zh)
*
|
2003-06-30 |
2009-04-22 |
Asml蒙片工具有限公司 |
用于次半波长光刻构图的改善的散射条opc应用方法
|
DE60321779D1
(de)
|
2003-06-30 |
2008-08-07 |
Asml Netherlands Bv |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
US7355673B2
(en)
*
|
2003-06-30 |
2008-04-08 |
Asml Masktools B.V. |
Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout
|
TWI284253B
(en)
*
|
2003-07-01 |
2007-07-21 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US7248339B2
(en)
*
|
2003-07-04 |
2007-07-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
WO2005006418A1
(ja)
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
ATE489724T1
(de)
*
|
2003-07-09 |
2010-12-15 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementherstellung
|
KR101209539B1
(ko)
|
2003-07-09 |
2012-12-07 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
ATE513309T1
(de)
*
|
2003-07-09 |
2011-07-15 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementeherstellung
|
EP1496397A1
(de)
*
|
2003-07-11 |
2005-01-12 |
ASML Netherlands B.V. |
Methode und System zur vorwärts gerichteten Overlay-Korrektur musterinduzierter Bildverzerrung- und verschiebung, und lithographisches Projektionsgerät zur Benutzung derselben
|
EP1500987A1
(de)
*
|
2003-07-21 |
2005-01-26 |
ASML Netherlands B.V. |
Lithographischer Apparat, Verfahren zur Herstellung eines Artikels und damit hergestellter Artikel
|
EP1500979A1
(de)
*
|
2003-07-21 |
2005-01-26 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
US7384149B2
(en)
|
2003-07-21 |
2008-06-10 |
Asml Netherlands B.V. |
Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system
|
EP1500980A1
(de)
*
|
2003-07-22 |
2005-01-26 |
ASML Netherlands B.V. |
Lithographischer Projektionsapparat, Verfahren zur Herstellung eines Artikels und dabei erzeugter Artikel
|
TWI245170B
(en)
|
2003-07-22 |
2005-12-11 |
Asml Netherlands Bv |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
TWI254188B
(en)
*
|
2003-07-23 |
2006-05-01 |
Asml Netherlands Bv |
Lithographic projection apparatus and article holder therefor
|
US7456932B2
(en)
*
|
2003-07-25 |
2008-11-25 |
Asml Netherlands B.V. |
Filter window, lithographic projection apparatus, filter window manufacturing method, device manufacturing method and device manufactured thereby
|
EP1503244A1
(de)
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
|
CN102043350B
(zh)
|
2003-07-28 |
2014-01-29 |
株式会社尼康 |
曝光装置、器件制造方法、及曝光装置的控制方法
|
US7145643B2
(en)
*
|
2003-08-07 |
2006-12-05 |
Asml Netherlands B.V. |
Interface unit, lithographic projection apparatus comprising such an interface unit and a device manufacturing method
|
KR101288632B1
(ko)
|
2003-08-21 |
2013-07-22 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
KR101094114B1
(ko)
|
2003-08-26 |
2011-12-15 |
가부시키가이샤 니콘 |
광학소자 및 노광장치
|
US8149381B2
(en)
|
2003-08-26 |
2012-04-03 |
Nikon Corporation |
Optical element and exposure apparatus
|
US7265817B2
(en)
*
|
2003-08-27 |
2007-09-04 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method, and slide assembly
|
TWI245163B
(en)
|
2003-08-29 |
2005-12-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
WO2005022616A1
(ja)
|
2003-08-29 |
2005-03-10 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
KR101477850B1
(ko)
|
2003-08-29 |
2014-12-30 |
가부시키가이샤 니콘 |
액체회수장치, 노광장치, 노광방법 및 디바이스 제조방법
|
US6954256B2
(en)
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
Gradient immersion lithography
|
US6873938B1
(en)
|
2003-09-17 |
2005-03-29 |
Asml Netherlands B.V. |
Adaptive lithographic critical dimension enhancement
|
WO2005029559A1
(ja)
*
|
2003-09-19 |
2005-03-31 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
US8064730B2
(en)
*
|
2003-09-22 |
2011-11-22 |
Asml Netherlands B.V. |
Device manufacturing method, orientation determination method and lithographic apparatus
|
US8208198B2
(en)
|
2004-01-14 |
2012-06-26 |
Carl Zeiss Smt Gmbh |
Catadioptric projection objective
|
JP4438747B2
(ja)
|
2003-09-26 |
2010-03-24 |
株式会社ニコン |
投影露光装置及び投影露光装置の洗浄方法、メンテナンス方法並びにデバイスの製造方法
|
KR101441840B1
(ko)
|
2003-09-29 |
2014-11-04 |
가부시키가이샤 니콘 |
노광장치, 노광방법 및 디바이스 제조방법
|
TW200513809A
(en)
*
|
2003-09-29 |
2005-04-16 |
Nippon Kogaku Kk |
Liquid-soaked lens system and projecting exposure apparatus as well as component manufacturing method
|
EP1670040B1
(de)
*
|
2003-09-29 |
2012-08-08 |
Nikon Corporation |
Projektions-belichtungseinrichtung, projektions-belichtungsverfahren und bauelement-herstellungsverfahren
|
JP4319188B2
(ja)
*
|
2003-10-08 |
2009-08-26 |
株式会社蔵王ニコン |
基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造装置及びデバイス製造方法
|
TW201738932A
(zh)
|
2003-10-09 |
2017-11-01 |
Nippon Kogaku Kk |
曝光裝置及曝光方法、元件製造方法
|
WO2005038888A1
(ja)
|
2003-10-22 |
2005-04-28 |
Nikon Corporation |
露光装置、露光方法、デバイスの製造方法
|
TWI569308B
(zh)
|
2003-10-28 |
2017-02-01 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
|
WO2005041276A1
(ja)
|
2003-10-28 |
2005-05-06 |
Nikon Corporation |
露光装置、露光方法、デバイスの製造方法
|
CN100461336C
(zh)
|
2003-10-31 |
2009-02-11 |
株式会社尼康 |
曝光装置以及器件制造方法
|
US7665946B2
(en)
*
|
2003-11-04 |
2010-02-23 |
Advanced Display Process Engineering Co., Ltd. |
Transfer chamber for flat display device manufacturing apparatus
|
WO2005048325A1
(ja)
*
|
2003-11-17 |
2005-05-26 |
Nikon Corporation |
ステージ駆動方法及びステージ装置並びに露光装置
|
TWI385414B
(zh)
|
2003-11-20 |
2013-02-11 |
尼康股份有限公司 |
光學照明裝置、照明方法、曝光裝置、曝光方法以及元件製造方法
|
US7414759B2
(en)
*
|
2003-11-26 |
2008-08-19 |
Samsung Electronics Co., Ltd. |
Scanner linearity tester
|
US7253077B2
(en)
*
|
2003-12-01 |
2007-08-07 |
Asml Netherlands B.V. |
Substrate, method of preparing a substrate, method of measurement, lithographic apparatus, device manufacturing method and device manufactured thereby, and machine-readable storage medium
|
TWI605315B
(zh)
|
2003-12-03 |
2017-11-11 |
Nippon Kogaku Kk |
Exposure device, exposure method, and device manufacturing method
|
US7565219B2
(en)
|
2003-12-09 |
2009-07-21 |
Asml Netherlands B.V. |
Lithographic apparatus, method of determining a model parameter, device manufacturing method, and device manufactured thereby
|
JP4720506B2
(ja)
|
2003-12-15 |
2011-07-13 |
株式会社ニコン |
ステージ装置、露光装置、及び露光方法
|
US7466489B2
(en)
|
2003-12-15 |
2008-12-16 |
Susanne Beder |
Projection objective having a high aperture and a planar end surface
|
US7288779B2
(en)
*
|
2003-12-17 |
2007-10-30 |
Asml Netherlands B.V. |
Method for position determination, method for overlay optimization, and lithographic projection apparatus
|
US20050134865A1
(en)
*
|
2003-12-17 |
2005-06-23 |
Asml Netherlands B.V. |
Method for determining a map, device manufacturing method, and lithographic apparatus
|
US7113255B2
(en)
|
2003-12-19 |
2006-09-26 |
Asml Holding N.V. |
Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby
|
US7292315B2
(en)
|
2003-12-19 |
2007-11-06 |
Asml Masktools B.V. |
Optimized polarization illumination
|
WO2005059645A2
(en)
|
2003-12-19 |
2005-06-30 |
Carl Zeiss Smt Ag |
Microlithography projection objective with crystal elements
|
US6955074B2
(en)
*
|
2003-12-29 |
2005-10-18 |
Asml Netherlands, B.V. |
Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
|
US7349101B2
(en)
*
|
2003-12-30 |
2008-03-25 |
Asml Netherlands B.V. |
Lithographic apparatus, overlay detector, device manufacturing method, and device manufactured thereby
|
US7145641B2
(en)
*
|
2003-12-31 |
2006-12-05 |
Asml Netherlands, B.V. |
Lithographic apparatus, device manufacturing method, and device manufactured thereby
|
WO2005067013A1
(ja)
|
2004-01-05 |
2005-07-21 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法
|
CN1902733A
(zh)
*
|
2004-01-06 |
2007-01-24 |
株式会社尼康 |
曝光方法和装置以及器件制造方法
|
US20080151365A1
(en)
|
2004-01-14 |
2008-06-26 |
Carl Zeiss Smt Ag |
Catadioptric projection objective
|
US20070164234A1
(en)
|
2004-01-15 |
2007-07-19 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
ATE459898T1
(de)
|
2004-01-20 |
2010-03-15 |
Zeiss Carl Smt Ag |
Belichtungsvorrichtung und messeinrichtung für eine projektionslinse
|
JP4319189B2
(ja)
|
2004-01-26 |
2009-08-26 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
TWI395068B
(zh)
*
|
2004-01-27 |
2013-05-01 |
尼康股份有限公司 |
光學系統、曝光裝置以及曝光方法
|
US7256873B2
(en)
*
|
2004-01-28 |
2007-08-14 |
Asml Netherlands B.V. |
Enhanced lithographic resolution through double exposure
|
US7221433B2
(en)
|
2004-01-28 |
2007-05-22 |
Nikon Corporation |
Stage assembly including a reaction assembly having a connector assembly
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
KR101377815B1
(ko)
*
|
2004-02-03 |
2014-03-26 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
KR101579361B1
(ko)
|
2004-02-04 |
2015-12-21 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
TWI609410B
(zh)
|
2004-02-06 |
2017-12-21 |
尼康股份有限公司 |
光學照明裝置、曝光裝置、曝光方法以及元件製造方法
|
KR101166007B1
(ko)
|
2004-02-10 |
2012-07-17 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법, 메인터넌스 방법 및노광 방법
|
US7113256B2
(en)
*
|
2004-02-18 |
2006-09-26 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method with feed-forward focus control
|
US7352472B2
(en)
*
|
2004-02-18 |
2008-04-01 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method, and method for determining z-displacement
|
US20080151200A1
(en)
*
|
2004-02-19 |
2008-06-26 |
Nikon Corporation |
Exposure Apparatus and Device Manufacturing Method
|
US20070030467A1
(en)
*
|
2004-02-19 |
2007-02-08 |
Nikon Corporation |
Exposure apparatus, exposure method, and device fabricating method
|
JP4974049B2
(ja)
*
|
2004-02-20 |
2012-07-11 |
株式会社ニコン |
露光方法、露光装置、並びにデバイス製造方法
|
KR101106497B1
(ko)
|
2004-02-20 |
2012-01-20 |
가부시키가이샤 니콘 |
노광 장치, 공급 방법 및 회수 방법, 노광 방법, 및디바이스 제조 방법
|
US7625675B2
(en)
*
|
2004-02-25 |
2009-12-01 |
Oerlikon Trading Ag, Trubbach |
Method for producing masks for photolithography and the use of such masks
|
JP2005243928A
(ja)
*
|
2004-02-26 |
2005-09-08 |
Fujitsu Ltd |
トレンチアイソレーションで分離されたトランジスタ対を有する半導体装置
|
DE102004013886A1
(de)
|
2004-03-16 |
2005-10-06 |
Carl Zeiss Smt Ag |
Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem
|
US7184123B2
(en)
*
|
2004-03-24 |
2007-02-27 |
Asml Netherlands B.V. |
Lithographic optical system
|
TW201816844A
(zh)
|
2004-03-25 |
2018-05-01 |
日商尼康股份有限公司 |
曝光裝置、曝光方法、及元件製造方法
|
JP4671051B2
(ja)
*
|
2004-03-25 |
2011-04-13 |
株式会社ニコン |
露光装置及び露光方法、並びにデバイス製造方法
|
US7856606B2
(en)
*
|
2004-03-31 |
2010-12-21 |
Asml Masktools B.V. |
Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
|
US7034917B2
(en)
*
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
TWI327685B
(en)
*
|
2004-04-09 |
2010-07-21 |
Asml Masktools Bv |
Optical proximity correction using chamfers and rounding at corners
|
WO2005104195A1
(ja)
|
2004-04-19 |
2005-11-03 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
KR101639964B1
(ko)
|
2004-05-17 |
2016-07-14 |
칼 짜이스 에스엠티 게엠베하 |
중간이미지를 갖는 카타디옵트릭 투사 대물렌즈를 포함하는 투사 노광 시스템
|
US7486381B2
(en)
*
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7289858B2
(en)
*
|
2004-05-25 |
2007-10-30 |
Asml Netherlands B.V. |
Lithographic motion control system and method
|
US7385671B2
(en)
*
|
2004-05-28 |
2008-06-10 |
Azores Corporation |
High speed lithography machine and method
|
EP1768169B9
(de)
*
|
2004-06-04 |
2013-03-06 |
Nikon Corporation |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung eines bauelementes
|
US7796274B2
(en)
|
2004-06-04 |
2010-09-14 |
Carl Zeiss Smt Ag |
System for measuring the image quality of an optical imaging system
|
KR101421915B1
(ko)
|
2004-06-09 |
2014-07-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
CN102290365B
(zh)
|
2004-06-09 |
2015-01-21 |
尼康股份有限公司 |
基板保持装置、具备其之曝光装置及方法、元件制造方法
|
US8373843B2
(en)
|
2004-06-10 |
2013-02-12 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
KR101505756B1
(ko)
*
|
2004-06-10 |
2015-03-26 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법, 및 디바이스 제조 방법
|
US8508713B2
(en)
|
2004-06-10 |
2013-08-13 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US8717533B2
(en)
|
2004-06-10 |
2014-05-06 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
KR101556454B1
(ko)
*
|
2004-06-10 |
2015-10-13 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
US20080266037A1
(en)
*
|
2004-06-17 |
2008-10-30 |
Mark Williams |
Magnetic Levitation Lithography Apparatus and Method
|
KR101378688B1
(ko)
|
2004-06-21 |
2014-03-27 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US8698998B2
(en)
|
2004-06-21 |
2014-04-15 |
Nikon Corporation |
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
|
EP3462241A1
(de)
|
2004-06-21 |
2019-04-03 |
Nikon Corporation |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
|
JPWO2006001282A1
(ja)
*
|
2004-06-25 |
2008-04-17 |
株式会社ニコン |
位置決め装置、位置決め方法、露光装置、露光方法、及びデバイスの製造方法
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7403264B2
(en)
|
2004-07-08 |
2008-07-22 |
Asml Netherlands B.V. |
Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
|
KR101433491B1
(ko)
|
2004-07-12 |
2014-08-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US20080012511A1
(en)
*
|
2004-07-15 |
2008-01-17 |
Nikon Corporation |
Planar Motor Device, Stage Device, Exposure Device and Device Manufacturing Method
|
KR101202231B1
(ko)
|
2004-07-21 |
2012-11-16 |
가부시키가이샤 니콘 |
노광 방법 및 디바이스 제조 방법
|
JPWO2006009254A1
(ja)
*
|
2004-07-23 |
2008-05-01 |
株式会社ニコン |
支持装置、ステージ装置、露光装置、及びデバイスの製造方法
|
JP2006113533A
(ja)
|
2004-08-03 |
2006-04-27 |
Nikon Corp |
投影光学系、露光装置、および露光方法
|
ATE470235T1
(de)
|
2004-08-03 |
2010-06-15 |
Nikon Corp |
Belichtungsgeräte, belichtungsverfahren und bauelemente-herstellungsverfahren
|
TW200615716A
(en)
*
|
2004-08-05 |
2006-05-16 |
Nikon Corp |
Stage device and exposure device
|
JP4983257B2
(ja)
*
|
2004-08-18 |
2012-07-25 |
株式会社ニコン |
露光装置、デバイス製造方法、計測部材、及び計測方法
|
US7620930B2
(en)
|
2004-08-24 |
2009-11-17 |
Asml Masktools B.V. |
Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithography
|
EP1796143B1
(de)
|
2004-09-01 |
2011-11-23 |
Nikon Corporation |
Substrathalter, bühnenvorrichtung und belichtungsvorrichtung
|
US7706074B2
(en)
|
2004-09-13 |
2010-04-27 |
Nikon Corporation |
Projection optical system, method of manufacturing projection optical system, exposure apparatus, and exposure method
|
JP4455469B2
(ja)
|
2004-09-14 |
2010-04-21 |
エーエスエムエル マスクツールズ ビー.ブイ. |
フルチップ製造信頼性チェックおよび補正を行うための方法
|
EP1804279A4
(de)
*
|
2004-09-17 |
2008-04-09 |
Nikon Corp |
Substrat zur belichtung, belichtungsverfahren und bauelementeherstellungsverfahren
|
KR101618493B1
(ko)
|
2004-09-17 |
2016-05-04 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
SG10201801998TA
(en)
|
2004-09-17 |
2018-04-27 |
Nikon Corp |
Substrate holding device, exposure apparatus, and device manufacturing method
|
CN101032068B
(zh)
|
2004-10-01 |
2010-12-22 |
株式会社尼康 |
线性电机、载台装置和曝光装置
|
JP4613910B2
(ja)
*
|
2004-10-08 |
2011-01-19 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
WO2006041083A1
(ja)
*
|
2004-10-13 |
2006-04-20 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法
|
TW200628995A
(en)
*
|
2004-10-13 |
2006-08-16 |
Nikon Corp |
Exposure device, exposure method, and device manufacturing method
|
US7456929B2
(en)
|
2004-10-15 |
2008-11-25 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
US20080151213A1
(en)
*
|
2004-10-18 |
2008-06-26 |
Dai Arai |
Bearing Device, Stage Device, and Exposure Apparatus
|
CN101044594B
(zh)
|
2004-10-26 |
2010-05-12 |
株式会社尼康 |
衬底处理方法、曝光装置及器件制造方法
|
WO2006049134A1
(ja)
|
2004-11-01 |
2006-05-11 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
US7417714B2
(en)
*
|
2004-11-02 |
2008-08-26 |
Nikon Corporation |
Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
|
US7869000B2
(en)
*
|
2004-11-02 |
2011-01-11 |
Nikon Corporation |
Stage assembly with lightweight fine stage and low transmissibility
|
KR20070085214A
(ko)
|
2004-11-11 |
2007-08-27 |
가부시키가이샤 니콘 |
노광 방법, 디바이스 제조 방법, 및 기판
|
WO2006054719A1
(ja)
*
|
2004-11-19 |
2006-05-26 |
Nikon Corporation |
メンテナンス方法、露光方法、露光装置及びデバイス製造方法
|
US7262831B2
(en)
*
|
2004-12-01 |
2007-08-28 |
Asml Netherlands B.V. |
Lithographic projection apparatus and device manufacturing method using such lithographic projection apparatus
|
WO2006059634A1
(ja)
|
2004-12-01 |
2006-06-08 |
Nikon Corporation |
ステージ装置及び露光装置
|
WO2006059636A1
(ja)
*
|
2004-12-02 |
2006-06-08 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
WO2006059720A1
(ja)
*
|
2004-12-02 |
2006-06-08 |
Nikon Corporation |
露光装置、露光方法、及びデバイス製造方法
|
TW200625026A
(en)
*
|
2004-12-06 |
2006-07-16 |
Nikon Corp |
Substrate processing method, method of exposure, exposure device and device manufacturing method
|
JP4784513B2
(ja)
|
2004-12-06 |
2011-10-05 |
株式会社ニコン |
メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
|
WO2006062096A1
(ja)
*
|
2004-12-07 |
2006-06-15 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
US7397533B2
(en)
*
|
2004-12-07 |
2008-07-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060119811A1
(en)
*
|
2004-12-07 |
2006-06-08 |
Asml Netherlands B.V. |
Radiation exposure apparatus comprising a gas flushing system
|
US7453063B2
(en)
*
|
2004-12-08 |
2008-11-18 |
Asml Netherlands B.V. |
Calibration substrate and method for calibrating a lithographic apparatus
|
JP4752473B2
(ja)
|
2004-12-09 |
2011-08-17 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
EP2995997B1
(de)
|
2004-12-15 |
2017-08-30 |
Nikon Corporation |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
|
US7528931B2
(en)
*
|
2004-12-20 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP1830456A1
(de)
*
|
2004-12-24 |
2007-09-05 |
Nikon Corporation |
Magnetische führungsvorrichtung, bühnenvorrichtung, belichtungsvorrichtung und bauelementeherstellungsverfahren
|
US7355675B2
(en)
*
|
2004-12-29 |
2008-04-08 |
Asml Netherlands B.V. |
Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
|
US7193683B2
(en)
|
2005-01-06 |
2007-03-20 |
Nikon Corporation |
Stage design for reflective optics
|
US7450217B2
(en)
|
2005-01-12 |
2008-11-11 |
Asml Netherlands B.V. |
Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
|
JPWO2006077859A1
(ja)
*
|
2005-01-18 |
2008-06-19 |
株式会社ニコン |
液体除去装置、露光装置、及びデバイス製造方法
|
US8692973B2
(en)
|
2005-01-31 |
2014-04-08 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
KR101427056B1
(ko)
|
2005-01-31 |
2014-08-05 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US20070258068A1
(en)
*
|
2005-02-17 |
2007-11-08 |
Hiroto Horikawa |
Exposure Apparatus, Exposure Method, and Device Fabricating Method
|
SG125232A1
(en)
|
2005-02-23 |
2006-09-29 |
Asml Masktools Bv |
Method, program product and apparatus for optimizing illumination for full-chip layer
|
JP4844186B2
(ja)
|
2005-03-18 |
2011-12-28 |
株式会社ニコン |
プレート部材、基板保持装置、露光装置及び露光方法、並びにデバイス製造方法
|
JP4946109B2
(ja)
|
2005-03-18 |
2012-06-06 |
株式会社ニコン |
露光方法、露光装置、及びデバイス製造方法
|
CN100459039C
(zh)
|
2005-03-25 |
2009-02-04 |
尼康股份有限公司 |
照射形状的测量方法、掩模
|
JP4922638B2
(ja)
|
2005-03-29 |
2012-04-25 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置、シール、デバイス製造方法、コンピュータプログラム、およびデータ記録媒体
|
US7317506B2
(en)
*
|
2005-03-29 |
2008-01-08 |
Asml Netherlands B.V. |
Variable illumination source
|
US7548302B2
(en)
*
|
2005-03-29 |
2009-06-16 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4544303B2
(ja)
*
|
2005-03-30 |
2010-09-15 |
株式会社ニコン |
露光装置及び露光方法、並びにデバイス製造方法
|
JP4605219B2
(ja)
|
2005-03-30 |
2011-01-05 |
株式会社ニコン |
露光条件の決定方法、露光方法及び露光装置、並びにデバイス製造方法
|
TW200644079A
(en)
*
|
2005-03-31 |
2006-12-16 |
Nikon Corp |
Exposure apparatus, exposure method, and device production method
|
US20090047607A1
(en)
*
|
2005-03-31 |
2009-02-19 |
Hiroyuki Nagasaka |
Exposure method, exposure apparatus and device fabricating methods
|
US20070132976A1
(en)
*
|
2005-03-31 |
2007-06-14 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US7515281B2
(en)
*
|
2005-04-08 |
2009-04-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7161659B2
(en)
*
|
2005-04-08 |
2007-01-09 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
USRE43576E1
(en)
|
2005-04-08 |
2012-08-14 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
US8089608B2
(en)
*
|
2005-04-18 |
2012-01-03 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
KR101466533B1
(ko)
|
2005-04-25 |
2014-11-27 |
가부시키가이샤 니콘 |
노광 방법, 노광 장치 및 액체 공급 방법
|
CN101156226B
(zh)
*
|
2005-04-27 |
2012-03-14 |
株式会社尼康 |
曝光方法、曝光装置、组件制造方法、以及膜的评估方法
|
EP1876636A1
(de)
*
|
2005-04-28 |
2008-01-09 |
Nikon Corporation |
Belichtungsverfahren, belichtungsvorrichtung und verfahren zur herstellung von bauelementen
|
US8236467B2
(en)
|
2005-04-28 |
2012-08-07 |
Nikon Corporation |
Exposure method, exposure apparatus, and device manufacturing method
|
US7738075B2
(en)
*
|
2005-05-23 |
2010-06-15 |
Asml Netherlands B.V. |
Lithographic attribute enhancement
|
JP4596191B2
(ja)
|
2005-05-24 |
2010-12-08 |
株式会社ニコン |
露光方法及び露光装置、並びにデバイス製造方法
|
US20070085989A1
(en)
*
|
2005-06-21 |
2007-04-19 |
Nikon Corporation |
Exposure apparatus and exposure method, maintenance method, and device manufacturing method
|
EP1895571A4
(de)
|
2005-06-21 |
2011-04-27 |
Nikon Corp |
Belichtungsvorrichtung, belichtungsverfahren, wartungsverfahren und bauelemente-herstellungsverfahren
|
US7924416B2
(en)
|
2005-06-22 |
2011-04-12 |
Nikon Corporation |
Measurement apparatus, exposure apparatus, and device manufacturing method
|
US8693006B2
(en)
|
2005-06-28 |
2014-04-08 |
Nikon Corporation |
Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
|
JPWO2007000995A1
(ja)
*
|
2005-06-28 |
2009-01-22 |
株式会社ニコン |
露光装置及び方法、並びにデバイス製造方法
|
TW200707124A
(en)
*
|
2005-06-29 |
2007-02-16 |
Nikon Corp |
Exposure apparatus, substrate processing method, and device producing method
|
KR20080026082A
(ko)
|
2005-06-30 |
2008-03-24 |
가부시키가이샤 니콘 |
노광장치 및 방법, 노광장치의 메인터넌스 방법 및디바이스 제조방법
|
EP1909310A4
(de)
*
|
2005-07-11 |
2010-10-06 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementeherstellung
|
WO2007018127A1
(ja)
*
|
2005-08-05 |
2007-02-15 |
Nikon Corporation |
ステージ装置及び露光装置
|
WO2007023813A1
(ja)
|
2005-08-23 |
2007-03-01 |
Nikon Corporation |
露光装置及び露光方法、並びにデバイス製造方法
|
US20070064384A1
(en)
*
|
2005-08-25 |
2007-03-22 |
Molecular Imprints, Inc. |
Method to transfer a template transfer body between a motion stage and a docking plate
|
US7665981B2
(en)
*
|
2005-08-25 |
2010-02-23 |
Molecular Imprints, Inc. |
System to transfer a template transfer body between a motion stage and a docking plate
|
US20070074635A1
(en)
*
|
2005-08-25 |
2007-04-05 |
Molecular Imprints, Inc. |
System to couple a body and a docking plate
|
JP4781049B2
(ja)
*
|
2005-08-30 |
2011-09-28 |
キヤノン株式会社 |
露光装置およびデバイス製造方法
|
TWI450044B
(zh)
|
2005-08-31 |
2014-08-21 |
尼康股份有限公司 |
An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element
|
US8111374B2
(en)
|
2005-09-09 |
2012-02-07 |
Nikon Corporation |
Analysis method, exposure method, and device manufacturing method
|
WO2007029829A1
(ja)
|
2005-09-09 |
2007-03-15 |
Nikon Corporation |
露光装置及び露光方法、並びにデバイス製造方法
|
JPWO2007034838A1
(ja)
|
2005-09-21 |
2009-03-26 |
株式会社ニコン |
露光装置及び露光方法、並びにデバイス製造方法
|
US20070070323A1
(en)
*
|
2005-09-21 |
2007-03-29 |
Nikon Corporation |
Exposure apparatus, exposure method, and device fabricating method
|
US7239371B2
(en)
*
|
2005-10-18 |
2007-07-03 |
International Business Machines Corporation |
Density-aware dynamic leveling in scanning exposure systems
|
US20070095739A1
(en)
*
|
2005-10-24 |
2007-05-03 |
Nikon Corporation |
Utility transfer apparatus, stage apparatus, exposure apparatus, and device manufacturing method
|
US8681314B2
(en)
|
2005-10-24 |
2014-03-25 |
Nikon Corporation |
Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
|
US20070127135A1
(en)
*
|
2005-11-01 |
2007-06-07 |
Nikon Corporation |
Exposure apparatus, exposure method and device manufacturing method
|
EP1950795A4
(de)
|
2005-11-01 |
2010-06-02 |
Nikon Corp |
Belichtungsvorrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren
|
WO2007055199A1
(ja)
|
2005-11-09 |
2007-05-18 |
Nikon Corporation |
露光装置及び方法、並びにデバイス製造方法
|
US20070127002A1
(en)
*
|
2005-11-09 |
2007-06-07 |
Nikon Corporation |
Exposure apparatus and method, and device manufacturing method
|
JPWO2007055237A1
(ja)
*
|
2005-11-09 |
2009-04-30 |
株式会社ニコン |
露光装置及び露光方法、並びにデバイス製造方法
|
JPWO2007055373A1
(ja)
|
2005-11-14 |
2009-04-30 |
株式会社ニコン |
液体回収部材、露光装置、露光方法、及びデバイス製造方法
|
KR20080068006A
(ko)
|
2005-11-15 |
2008-07-22 |
가부시키가이샤 니콘 |
노광 장치와, 노광 방법 및 디바이스 제조 방법
|
JP4968589B2
(ja)
|
2005-11-16 |
2012-07-04 |
株式会社ニコン |
基板処理方法、フォトマスクの製造方法及びフォトマスク、並びにデバイス製造方法
|
US7803516B2
(en)
|
2005-11-21 |
2010-09-28 |
Nikon Corporation |
Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
|
JP2007165869A
(ja)
|
2005-11-21 |
2007-06-28 |
Nikon Corp |
露光方法及びそれを用いたデバイス製造方法、露光装置、並びに基板処理方法及び装置
|
US8125610B2
(en)
|
2005-12-02 |
2012-02-28 |
ASML Metherlands B.V. |
Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
|
EP1965414A4
(de)
|
2005-12-06 |
2010-08-25 |
Nikon Corp |
Belichtungsverfahren, belichtungsvorrichtung und verfahren zur bauelementeherstellung
|
KR20080071555A
(ko)
|
2005-12-06 |
2008-08-04 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법, 투영 광학계 및 디바이스 제조방법
|
US7782442B2
(en)
|
2005-12-06 |
2010-08-24 |
Nikon Corporation |
Exposure apparatus, exposure method, projection optical system and device producing method
|
KR101704310B1
(ko)
|
2005-12-08 |
2017-02-07 |
가부시키가이샤 니콘 |
기판 보지 장치, 노광 장치, 노광 방법 및 디바이스 제조 방법
|
US7626181B2
(en)
*
|
2005-12-09 |
2009-12-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8411271B2
(en)
|
2005-12-28 |
2013-04-02 |
Nikon Corporation |
Pattern forming method, pattern forming apparatus, and device manufacturing method
|
JP5182558B2
(ja)
|
2005-12-28 |
2013-04-17 |
株式会社ニコン |
パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
|
US8953148B2
(en)
*
|
2005-12-28 |
2015-02-10 |
Nikon Corporation |
Exposure apparatus and making method thereof
|
CN102681368B
(zh)
|
2005-12-28 |
2015-09-30 |
株式会社尼康 |
图案形成方法及图案形成装置、以及元件制造方法
|
WO2007077875A1
(ja)
|
2005-12-28 |
2007-07-12 |
Nikon Corporation |
露光装置及び露光方法、並びにデバイス製造方法
|
US7493589B2
(en)
|
2005-12-29 |
2009-02-17 |
Asml Masktools B.V. |
Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
|
US7649611B2
(en)
|
2005-12-30 |
2010-01-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7804646B2
(en)
*
|
2006-01-31 |
2010-09-28 |
Asml Masktools B.V. |
Method for decomposition of a customized DOE for use with a single exposure into a set of multiple exposures using standard DOEs with optimized exposure settings
|
EP1986223A4
(de)
|
2006-02-16 |
2010-08-25 |
Nikon Corp |
Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
|
EP1986222A4
(de)
|
2006-02-16 |
2010-09-01 |
Nikon Corp |
Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren
|
WO2007094431A1
(ja)
|
2006-02-16 |
2007-08-23 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法
|
JPWO2007094470A1
(ja)
*
|
2006-02-16 |
2009-07-09 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
US8134681B2
(en)
|
2006-02-17 |
2012-03-13 |
Nikon Corporation |
Adjustment method, substrate processing method, substrate processing apparatus, exposure apparatus, inspection apparatus, measurement and/or inspection system, processing apparatus, computer system, program and information recording medium
|
SG178791A1
(en)
|
2006-02-21 |
2012-03-29 |
Nikon Corp |
Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method
|
EP3267259A1
(de)
|
2006-02-21 |
2018-01-10 |
Nikon Corporation |
Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung
|
US8908145B2
(en)
|
2006-02-21 |
2014-12-09 |
Nikon Corporation |
Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method
|
EP1993120A1
(de)
|
2006-03-03 |
2008-11-19 |
Nikon Corporation |
Belichtungsverfahren und -vorrichtung sowie herstellungsverfahren für die vorrichtung
|
US20070212649A1
(en)
*
|
2006-03-07 |
2007-09-13 |
Asml Netherlands B.V. |
Method and system for enhanced lithographic patterning
|
WO2007102484A1
(ja)
|
2006-03-07 |
2007-09-13 |
Nikon Corporation |
デバイス製造方法、デバイス製造システム及び測定検査装置
|
US7598024B2
(en)
|
2006-03-08 |
2009-10-06 |
Asml Netherlands B.V. |
Method and system for enhanced lithographic alignment
|
KR20080114691A
(ko)
|
2006-03-13 |
2008-12-31 |
가부시키가이샤 니콘 |
노광 장치, 메인터넌스 방법, 노광 방법 및 디바이스 제조 방법
|
US20070242254A1
(en)
|
2006-03-17 |
2007-10-18 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
US8982322B2
(en)
|
2006-03-17 |
2015-03-17 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
US20080013062A1
(en)
|
2006-03-23 |
2008-01-17 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
CN100590173C
(zh)
*
|
2006-03-24 |
2010-02-17 |
北京有色金属研究总院 |
一种荧光粉及其制造方法和所制成的电光源
|
EP2006899A4
(de)
|
2006-04-05 |
2011-12-28 |
Nikon Corp |
Bühnenvorrichtung, belichtungsvorrichtung, bühnensteuerverfahren, belichtungsverfahren und bauelementeherstellungsverfahren
|
EP2267530A1
(de)
|
2006-04-06 |
2010-12-29 |
ASML MaskTools B.V. |
Verfahren und Vorrichtung zur Durchführung von Dunkelfeld-Doppeldipollithografie
|
WO2007119821A1
(ja)
*
|
2006-04-14 |
2007-10-25 |
Nikon Corporation |
露光方法及び露光装置、並びにデバイス製造方法
|
US7818151B2
(en)
*
|
2006-05-02 |
2010-10-19 |
Asml Masktools B.V. |
Method, program product and apparatus for obtaining short-range flare model parameters for lithography simulation tool
|
US7583359B2
(en)
*
|
2006-05-05 |
2009-09-01 |
Asml Netherlands B.V. |
Reduction of fit error due to non-uniform sample distribution
|
US7483120B2
(en)
*
|
2006-05-09 |
2009-01-27 |
Asml Netherlands B.V. |
Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
|
DE102006021797A1
(de)
|
2006-05-09 |
2007-11-15 |
Carl Zeiss Smt Ag |
Optische Abbildungseinrichtung mit thermischer Dämpfung
|
KR101486086B1
(ko)
|
2006-05-10 |
2015-01-23 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US7728462B2
(en)
|
2006-05-18 |
2010-06-01 |
Nikon Corporation |
Monolithic stage devices providing motion in six degrees of freedom
|
US20080024749A1
(en)
*
|
2006-05-18 |
2008-01-31 |
Nikon Corporation |
Low mass six degree of freedom stage for lithography tools
|
WO2007135990A1
(ja)
|
2006-05-18 |
2007-11-29 |
Nikon Corporation |
露光方法及び装置、メンテナンス方法、並びにデバイス製造方法
|
US20070267995A1
(en)
*
|
2006-05-18 |
2007-11-22 |
Nikon Corporation |
Six Degree-of-Freedom Stage Apparatus
|
SG172607A1
(en)
|
2006-05-22 |
2011-07-28 |
Nikon Corp |
Exposure method and apparatus, maintenance method, and device manufacturing method
|
EP2034515A4
(de)
|
2006-05-23 |
2012-01-18 |
Nikon Corp |
Wartungsverfahren, belichtungsverfahren und vorrichtung und bauelementeherstellungsverfahren
|
WO2007139017A1
(ja)
*
|
2006-05-29 |
2007-12-06 |
Nikon Corporation |
液体回収部材、基板保持部材、露光装置、及びデバイス製造方法
|
US7502103B2
(en)
|
2006-05-31 |
2009-03-10 |
Asml Netherlands B.V. |
Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
|
EP2023379A4
(de)
|
2006-05-31 |
2009-07-08 |
Nikon Corp |
Belichtungsvorrichtung und belichtungsverfahren
|
JPWO2007142350A1
(ja)
|
2006-06-09 |
2009-10-29 |
株式会社ニコン |
パターン形成方法及びパターン形成装置、露光方法及び露光装置、並びにデバイス製造方法
|
US7697115B2
(en)
*
|
2006-06-23 |
2010-04-13 |
Asml Holding N.V. |
Resonant scanning mirror
|
EP2043134A4
(de)
|
2006-06-30 |
2012-01-25 |
Nikon Corp |
Wartungsverfahren, belichtungsverfahren und vorrichtung und bauelementeherstellungsverfahren
|
US20080073563A1
(en)
|
2006-07-01 |
2008-03-27 |
Nikon Corporation |
Exposure apparatus that includes a phase change circulation system for movers
|
JP4607151B2
(ja)
*
|
2006-07-06 |
2011-01-05 |
エーエスエムエル マスクツールズ ビー.ブイ. |
改良型cplマスクおよびそれを生成する方法およびプログラム製品
|
JP5339056B2
(ja)
|
2006-07-14 |
2013-11-13 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
US8570484B2
(en)
|
2006-08-30 |
2013-10-29 |
Nikon Corporation |
Immersion exposure apparatus, device manufacturing method, cleaning method, and cleaning member to remove foreign substance using liquid
|
WO2008029884A1
(fr)
|
2006-09-08 |
2008-03-13 |
Nikon Corporation |
Dispositif et procédé de nettoyage, et procédé de fabrication du dispositif
|
JP4905455B2
(ja)
|
2006-09-08 |
2012-03-28 |
株式会社ニコン |
マスク、露光装置、及びデバイス製造方法
|
US7592760B2
(en)
*
|
2006-09-11 |
2009-09-22 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4922112B2
(ja)
|
2006-09-13 |
2012-04-25 |
エーエスエムエル マスクツールズ ビー.ブイ. |
パターン分解フィーチャのためのモデルベースopcを行うための方法および装置
|
CN101271483B
(zh)
*
|
2006-09-13 |
2012-02-22 |
Asml蒙片工具有限公司 |
分解图案的方法、器件制造方法及产生掩模的方法
|
US7872730B2
(en)
|
2006-09-15 |
2011-01-18 |
Nikon Corporation |
Immersion exposure apparatus and immersion exposure method, and device manufacturing method
|
KR101419196B1
(ko)
|
2006-09-29 |
2014-07-15 |
가부시키가이샤 니콘 |
노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
|
KR101391025B1
(ko)
*
|
2006-09-29 |
2014-04-30 |
가부시키가이샤 니콘 |
이동체 시스템, 패턴 형성 장치, 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
|
US20080100909A1
(en)
*
|
2006-10-30 |
2008-05-01 |
Nikon Corporation |
Optical element, liquid immersion exposure apparatus, liquid immersion exposure method, and method for producing microdevice
|
WO2008053918A1
(fr)
*
|
2006-10-31 |
2008-05-08 |
Nikon Corporation |
Appareil de maintien de liquide, procédé de maintien de liquide, appareil d'exposition, procédé d'exposition et procédé de fabrication du dispositif
|
JP4700672B2
(ja)
*
|
2006-11-08 |
2011-06-15 |
エーエスエムエル マスクツールズ ビー.ブイ. |
ライン幅粗さおよびレジストパターン不良を予測する方法、プログラム、および装置、ならびにそのリソグラフィシミュレーションプロセスでの使用
|
JP4707701B2
(ja)
*
|
2006-11-08 |
2011-06-22 |
エーエスエムエル マスクツールズ ビー.ブイ. |
瞳を有する光学結像システムの結像性能をシミュレーションするモデルを生成する方法およびコンピュータプログラム
|
WO2008056735A1
(fr)
|
2006-11-09 |
2008-05-15 |
Nikon Corporation |
Unité de support, système de détection de position et système d'exposition, procédé de déplacement, procédé de détection de position, procédé d'exposition, procédé d'ajustement du système de détection, et procédé de prod
|
JP5032948B2
(ja)
|
2006-11-14 |
2012-09-26 |
エーエスエムエル マスクツールズ ビー.ブイ. |
Dptプロセスで用いられるパターン分解を行うための方法、プログラムおよび装置
|
US20080158531A1
(en)
|
2006-11-15 |
2008-07-03 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
JP5055971B2
(ja)
|
2006-11-16 |
2012-10-24 |
株式会社ニコン |
表面処理方法及び表面処理装置、露光方法及び露光装置、並びにデバイス製造方法
|
US20080156356A1
(en)
|
2006-12-05 |
2008-07-03 |
Nikon Corporation |
Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
|
US20080212047A1
(en)
*
|
2006-12-28 |
2008-09-04 |
Nikon Corporation |
Exposure apparatus, exposing method, and device fabricating method
|
US8004651B2
(en)
|
2007-01-23 |
2011-08-23 |
Nikon Corporation |
Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
|
WO2008090975A1
(ja)
*
|
2007-01-26 |
2008-07-31 |
Nikon Corporation |
支持構造体及び露光装置
|
KR101531426B1
(ko)
|
2007-03-01 |
2015-06-24 |
가부시키가이샤 니콘 |
펠리클 프레임 장치, 마스크, 노광 방법, 노광 장치, 및 디바이스의 제조 방법
|
US20080225261A1
(en)
*
|
2007-03-13 |
2008-09-18 |
Noriyuki Hirayanagi |
Exposure apparatus and device manufacturing method
|
US8134685B2
(en)
|
2007-03-23 |
2012-03-13 |
Nikon Corporation |
Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
|
EP1990110A1
(de)
*
|
2007-05-08 |
2008-11-12 |
Güdel Group Ag |
Zentriervorrichtung für flächige Werkstücke in einer Presse und Verfahren zum Einrichten einer solchen Zentriervorrichtung
|
US8300207B2
(en)
|
2007-05-17 |
2012-10-30 |
Nikon Corporation |
Exposure apparatus, immersion system, exposing method, and device fabricating method
|
US20080285004A1
(en)
*
|
2007-05-18 |
2008-11-20 |
Nikon Corporation |
Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus
|
US8164736B2
(en)
*
|
2007-05-29 |
2012-04-24 |
Nikon Corporation |
Exposure method, exposure apparatus, and method for producing device
|
US8098362B2
(en)
|
2007-05-30 |
2012-01-17 |
Nikon Corporation |
Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
|
WO2008151185A1
(en)
|
2007-06-04 |
2008-12-11 |
Brion Technologies, Inc. |
Methods for performing model-based lithography guided layout design
|
US8243257B2
(en)
|
2007-07-24 |
2012-08-14 |
Nikon Corporation |
Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method
|
TWI526794B
(zh)
|
2007-07-24 |
2016-03-21 |
尼康股份有限公司 |
Exposure method and apparatus, and component manufacturing method
|
US8194232B2
(en)
|
2007-07-24 |
2012-06-05 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
|
US8547527B2
(en)
|
2007-07-24 |
2013-10-01 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
|
US7999920B2
(en)
|
2007-08-22 |
2011-08-16 |
Asml Netherlands B.V. |
Method of performing model-based scanner tuning
|
US8237919B2
(en)
|
2007-08-24 |
2012-08-07 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
|
US20090051895A1
(en)
*
|
2007-08-24 |
2009-02-26 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
|
US8867022B2
(en)
|
2007-08-24 |
2014-10-21 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
|
US8023106B2
(en)
|
2007-08-24 |
2011-09-20 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
|
US9304412B2
(en)
|
2007-08-24 |
2016-04-05 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
|
US8218129B2
(en)
|
2007-08-24 |
2012-07-10 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
|
US9779186B2
(en)
|
2007-08-28 |
2017-10-03 |
Asml Netherlands B.V. |
Methods for performing model-based lithography guided layout design
|
TW200912560A
(en)
*
|
2007-09-07 |
2009-03-16 |
Nikon Corp |
Suspending apparatus and exposure apparatus
|
US8421994B2
(en)
|
2007-09-27 |
2013-04-16 |
Nikon Corporation |
Exposure apparatus
|
JP2009094255A
(ja)
*
|
2007-10-05 |
2009-04-30 |
Canon Inc |
液浸露光装置およびデバイス製造方法
|
US20090201484A1
(en)
*
|
2007-10-29 |
2009-08-13 |
Nikon Corporation |
Utilities supply member connection apparatus, stage apparatus, projection optical system support apparatus and exposure apparatus
|
US9013681B2
(en)
*
|
2007-11-06 |
2015-04-21 |
Nikon Corporation |
Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
|
US9256140B2
(en)
*
|
2007-11-07 |
2016-02-09 |
Nikon Corporation |
Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
|
US8665455B2
(en)
*
|
2007-11-08 |
2014-03-04 |
Nikon Corporation |
Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
|
US8422015B2
(en)
|
2007-11-09 |
2013-04-16 |
Nikon Corporation |
Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
|
JP4779003B2
(ja)
*
|
2007-11-13 |
2011-09-21 |
エーエスエムエル ネザーランズ ビー.ブイ. |
フルチップ設計のパターン分解を行うための方法
|
NL1036189A1
(nl)
*
|
2007-12-05 |
2009-06-08 |
Brion Tech Inc |
Methods and System for Lithography Process Window Simulation.
|
SG185261A1
(en)
*
|
2007-12-11 |
2012-11-29 |
Nikon Corp |
Movable body apparatus, exposure apparatus and pattern formation apparatus, and device manufacturing method
|
US20090147228A1
(en)
*
|
2007-12-11 |
2009-06-11 |
Nikon Corporation |
Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus
|
US20090153824A1
(en)
*
|
2007-12-17 |
2009-06-18 |
Kla-Tencor Corporation |
Multiple chuck scanning stage
|
TWI640840B
(zh)
|
2007-12-28 |
2018-11-11 |
日商尼康股份有限公司 |
Exposure apparatus, exposure method, and component manufacturing method
|
US8269945B2
(en)
*
|
2007-12-28 |
2012-09-18 |
Nikon Corporation |
Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
|
JP5344180B2
(ja)
*
|
2008-02-08 |
2013-11-20 |
株式会社ニコン |
位置計測システム及び位置計測方法、移動体装置、移動体駆動方法、露光装置及び露光方法、パターン形成装置、並びにデバイス製造方法
|
NL1036557A1
(nl)
|
2008-03-11 |
2009-09-14 |
Asml Netherlands Bv |
Method and lithographic apparatus for measuring and acquiring height data relating to a substrate surface.
|
NL1036750A1
(nl)
*
|
2008-04-14 |
2009-10-15 |
Brion Tech Inc |
A Method Of Performing Mask-Writer Tuning and Optimization.
|
NL1036647A1
(nl)
*
|
2008-04-16 |
2009-10-19 |
Asml Netherlands Bv |
A method of measuring a lithographic projection apparatus.
|
NL1036891A1
(nl)
*
|
2008-05-02 |
2009-11-03 |
Asml Netherlands Bv |
Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor.
|
US8786829B2
(en)
*
|
2008-05-13 |
2014-07-22 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8228482B2
(en)
*
|
2008-05-13 |
2012-07-24 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8817236B2
(en)
|
2008-05-13 |
2014-08-26 |
Nikon Corporation |
Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
|
JP5097166B2
(ja)
|
2008-05-28 |
2012-12-12 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置及び装置の動作方法
|
KR101928938B1
(ko)
|
2008-06-03 |
2018-12-13 |
에이에스엠엘 네델란즈 비.브이. |
모델-기반 공정 시뮬레이션 시스템들 및 방법들
|
JP5225463B2
(ja)
|
2008-06-03 |
2013-07-03 |
エーエスエムエル ネザーランズ ビー.ブイ. |
レンズ加熱補償方法
|
NL2002935A1
(nl)
|
2008-06-27 |
2009-12-29 |
Asml Netherlands Bv |
Object support positioning device and lithographic apparatus.
|
US8542340B2
(en)
*
|
2008-07-07 |
2013-09-24 |
Asml Netherlands B.V. |
Illumination optimization
|
US8340394B2
(en)
*
|
2008-07-28 |
2012-12-25 |
Asml Netherlands B.V. |
Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure process
|
US8224061B2
(en)
*
|
2008-07-28 |
2012-07-17 |
Asml Netherlands B.V. |
Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process
|
NL2003363A
(en)
|
2008-09-10 |
2010-03-15 |
Asml Netherlands Bv |
Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
|
US8435723B2
(en)
*
|
2008-09-11 |
2013-05-07 |
Nikon Corporation |
Pattern forming method and device production method
|
US8384875B2
(en)
|
2008-09-29 |
2013-02-26 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
NL2003654A
(en)
|
2008-11-06 |
2010-05-10 |
Brion Tech Inc |
Methods and system for lithography calibration.
|
NL2003696A
(en)
*
|
2008-11-10 |
2010-05-11 |
Brion Tech Inc |
Scanner model representation with transmission cross coefficients.
|
US8092122B2
(en)
|
2008-11-10 |
2012-01-10 |
Reynolds Consumer Products, Inc. |
Connection device for fastening expanded cell confinement structures and methods for doing the same
|
NL2003702A
(en)
|
2008-11-10 |
2010-05-11 |
Brion Tech Inc |
Pattern selection for lithographic model calibration.
|
US20100302526A1
(en)
*
|
2008-11-13 |
2010-12-02 |
Nikon Corporation |
Drive control method for moving body, exposure method, robot control method, drive control apparatus, exposure apparatus and robot apparatus
|
CN102224459B
(zh)
|
2008-11-21 |
2013-06-19 |
Asml荷兰有限公司 |
用于优化光刻过程的方法及设备
|
NL1036299C2
(nl)
*
|
2008-12-10 |
2010-06-11 |
Janssen Prec Engineering B V |
Een systeem om tegels met micrometernauwkeurigheid ten opzichte van elkaar te positioneren en te fixeren.
|
NL2003699A
(en)
|
2008-12-18 |
2010-06-21 |
Brion Tech Inc |
Method and system for lithography process-window-maximixing optical proximity correction.
|
US8599359B2
(en)
|
2008-12-19 |
2013-12-03 |
Nikon Corporation |
Exposure apparatus, exposure method, device manufacturing method, and carrier method
|
US8760629B2
(en)
|
2008-12-19 |
2014-06-24 |
Nikon Corporation |
Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
|
US8773635B2
(en)
*
|
2008-12-19 |
2014-07-08 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8902402B2
(en)
*
|
2008-12-19 |
2014-12-02 |
Nikon Corporation |
Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
|
CN101551599B
(zh)
*
|
2009-04-03 |
2011-07-20 |
清华大学 |
一种光刻机硅片台双台交换系统
|
NL2004242A
(en)
|
2009-04-13 |
2010-10-14 |
Asml Netherlands Bv |
Detector module, cooling arrangement and lithographic apparatus comprising a detector module.
|
NL2004322A
(en)
*
|
2009-04-13 |
2010-10-14 |
Asml Netherlands Bv |
Cooling device, cooling arrangement and lithographic apparatus comprising a cooling arrangement.
|
US20100296074A1
(en)
*
|
2009-04-30 |
2010-11-25 |
Nikon Corporation |
Exposure method, and device manufacturing method
|
JPWO2010131490A1
(ja)
*
|
2009-05-15 |
2012-11-01 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
US8792084B2
(en)
|
2009-05-20 |
2014-07-29 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8970820B2
(en)
|
2009-05-20 |
2015-03-03 |
Nikon Corporation |
Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
|
US9312159B2
(en)
|
2009-06-09 |
2016-04-12 |
Nikon Corporation |
Transport apparatus and exposure apparatus
|
NL2004847A
(en)
*
|
2009-06-30 |
2011-01-04 |
Asml Holding Nv |
Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus.
|
IT1399285B1
(it)
*
|
2009-07-03 |
2013-04-11 |
Applied Materials Inc |
Sistema di lavorazione substrato
|
US8285418B2
(en)
*
|
2009-07-23 |
2012-10-09 |
Kla-Tencor Corporation |
Dual scanning stage
|
WO2011016255A1
(ja)
*
|
2009-08-07 |
2011-02-10 |
株式会社ニコン |
露光装置及び露光方法、並びにデバイス製造方法
|
TWI579659B
(zh)
*
|
2009-08-07 |
2017-04-21 |
尼康股份有限公司 |
An exposure apparatus, and an element manufacturing method
|
US8488109B2
(en)
|
2009-08-25 |
2013-07-16 |
Nikon Corporation |
Exposure method, exposure apparatus, and device manufacturing method
|
US8493547B2
(en)
|
2009-08-25 |
2013-07-23 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8514395B2
(en)
|
2009-08-25 |
2013-08-20 |
Nikon Corporation |
Exposure method, exposure apparatus, and device manufacturing method
|
US20110096306A1
(en)
*
|
2009-09-28 |
2011-04-28 |
Nikon Corporation |
Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
|
NL2005522A
(en)
|
2009-10-28 |
2011-05-02 |
Asml Netherlands Bv |
Pattern selection for full-chip source and mask optimization.
|
KR20120100959A
(ko)
|
2009-10-30 |
2012-09-12 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
JP5783376B2
(ja)
*
|
2009-11-05 |
2015-09-24 |
株式会社ニコン |
フォーカステストマスク、フォーカス計測方法、露光装置、及び露光方法
|
US20110134400A1
(en)
|
2009-12-04 |
2011-06-09 |
Nikon Corporation |
Exposure apparatus, liquid immersion member, and device manufacturing method
|
CN101718959B
(zh)
*
|
2009-12-15 |
2011-05-11 |
清华大学 |
一种光刻机硅片台双台交换方法及系统
|
US8488106B2
(en)
|
2009-12-28 |
2013-07-16 |
Nikon Corporation |
Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
|
NL1037639C2
(en)
|
2010-01-21 |
2011-07-25 |
Mapper Lithography Ip Bv |
Lithography system with lens rotation.
|
US8841065B2
(en)
|
2010-02-12 |
2014-09-23 |
Nikon Corporation |
Manufacturing method of exposure apparatus and device manufacturing method
|
WO2011102109A1
(ja)
|
2010-02-20 |
2011-08-25 |
株式会社ニコン |
光源最適化方法、露光方法、デバイス製造方法、プログラム、露光装置、リソグラフィシステム、及び光源評価方法、並びに光源変調方法
|
JP4838372B2
(ja)
*
|
2010-04-23 |
2011-12-14 |
Thk株式会社 |
アクチュエータユニット
|
NL2007579A
(en)
|
2010-11-10 |
2012-05-14 |
Asml Netherlands Bv |
Pattern-dependent proximity matching/tuning including light manipulation by projection optics.
|
NL2007577A
(en)
|
2010-11-10 |
2012-05-14 |
Asml Netherlands Bv |
Optimization of source, mask and projection optics.
|
NL2007642A
(en)
|
2010-11-10 |
2012-05-14 |
Asml Netherlands Bv |
Optimization flows of source, mask and projection optics.
|
NL2007578A
(en)
|
2010-11-17 |
2012-05-22 |
Asml Netherlands Bv |
Pattern-independent and hybrid matching/tuning including light manipulation by projection optics.
|
NL2008157A
(en)
*
|
2011-02-22 |
2012-08-24 |
Asml Netherlands Bv |
Lithographic apparatus and lithographic projection method.
|
US9746787B2
(en)
|
2011-02-22 |
2017-08-29 |
Nikon Corporation |
Holding apparatus, exposure apparatus and manufacturing method of device
|
CN102141739B
(zh)
*
|
2011-04-01 |
2013-01-16 |
清华大学 |
光刻机硅片台双台交换系统
|
DE102011077223B4
(de)
|
2011-06-08 |
2013-08-14 |
Carl Zeiss Smt Gmbh |
Messsystem
|
CN102236270B
(zh)
|
2011-07-29 |
2012-12-19 |
中国科学院光电技术研究所 |
一种适用于双工件台投影光刻机的检焦装置
|
JP6071068B2
(ja)
*
|
2011-08-30 |
2017-02-01 |
株式会社ニコン |
露光方法及び露光装置、並びにデバイス製造方法及びフラットパネルディスプレイの製造方法
|
WO2013036615A1
(en)
*
|
2011-09-06 |
2013-03-14 |
Kla-Tencor Corporation |
Linear stage for reflective electron beam lithography
|
US8724115B2
(en)
|
2011-09-06 |
2014-05-13 |
Kla-Tencor Corporation |
Linear stage and metrology architecture for reflective electron beam lithography
|
CN102393613B
(zh)
*
|
2011-11-12 |
2014-02-05 |
哈尔滨工业大学 |
一种基于同步齿轮调向的双工件台回转交换装置
|
CN102495528B
(zh)
*
|
2011-11-12 |
2014-02-05 |
哈尔滨工业大学 |
基于随动防转机构双工件台同相位回转交换方法与装置
|
NL2009982A
(en)
|
2012-01-10 |
2013-07-15 |
Asml Netherlands Bv |
Source mask optimization to reduce stochastic effects.
|
CN103246170B
(zh)
*
|
2012-02-09 |
2015-07-08 |
中芯国际集成电路制造(上海)有限公司 |
曝光装置及曝光方法
|
NL2010196A
(en)
|
2012-02-09 |
2013-08-13 |
Asml Netherlands Bv |
Lens heating aware source mask optimization for advanced lithography.
|
WO2013178459A1
(en)
|
2012-05-31 |
2013-12-05 |
Asml Netherlands B.V. |
Gradient-based pattern and evaluation point selection
|
NL2011592A
(en)
|
2012-10-31 |
2014-05-06 |
Asml Netherlands Bv |
Compensation for patterning device deformation.
|
CN104956465B
(zh)
|
2012-11-30 |
2018-05-29 |
株式会社尼康 |
搬送系统、曝光装置、搬送方法、曝光方法及器件制造方法、以及吸引装置
|
EP3866184A1
(de)
|
2012-11-30 |
2021-08-18 |
Nikon Corporation |
Trägersystem, belichtungsvorrichtung und zuführungsverfahren
|
JP6140844B2
(ja)
|
2013-02-22 |
2017-05-31 |
エーエスエムエル ネザーランズ ビー.ブイ. |
三次元パターニングデバイス用リソグラフィモデル
|
JP6096936B2
(ja)
|
2013-02-25 |
2017-03-15 |
エーエスエムエル ネザーランズ ビー.ブイ. |
離散的な光源マスクの最適化
|
CN104035285B
(zh)
*
|
2013-03-05 |
2016-06-29 |
中芯国际集成电路制造(上海)有限公司 |
曝光装置及其曝光方法
|
CN104035286B
(zh)
*
|
2013-03-05 |
2015-12-23 |
中芯国际集成电路制造(上海)有限公司 |
圆筒形掩模板系统、曝光装置和曝光方法
|
CN105745579B
(zh)
*
|
2013-09-25 |
2019-02-22 |
Asml荷兰有限公司 |
束传输设备和方法
|
KR102411747B1
(ko)
|
2013-10-30 |
2022-06-22 |
가부시키가이샤 니콘 |
기판 유지 장치, 노광 장치 및 디바이스 제조 방법
|
WO2015090774A1
(en)
|
2013-12-17 |
2015-06-25 |
Asml Netherlands B.V. |
Yield estimation and control
|
KR101963012B1
(ko)
|
2014-01-16 |
2019-03-27 |
가부시키가이샤 니콘 |
노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
|
SG11201606179QA
(en)
|
2014-02-11 |
2016-08-30 |
Asml Netherlands Bv |
Model for calculating a stochastic variation in an arbitrary pattern
|
KR20160131110A
(ko)
|
2014-03-18 |
2016-11-15 |
에이에스엠엘 네델란즈 비.브이. |
패턴 배치 에러 인식의 최적화
|
WO2015158444A1
(en)
|
2014-04-14 |
2015-10-22 |
Asml Netherlands B.V. |
Flows of optimization for lithographic processes
|
US10191366B2
(en)
|
2014-06-25 |
2019-01-29 |
Asml Netherlands B.V. |
Etch variation tolerant optimization
|
WO2016008711A1
(en)
|
2014-07-14 |
2016-01-21 |
Asml Netherlands B.V. |
Optimization of assist features and source
|
KR102084048B1
(ko)
|
2014-10-02 |
2020-03-03 |
에이에스엠엘 네델란즈 비.브이. |
어시스트 피처들의 규칙-기반 배치
|
US10409165B2
(en)
|
2014-12-15 |
2019-09-10 |
Asml Netherlands B.V. |
Optimization based on machine learning
|
WO2016096668A1
(en)
|
2014-12-17 |
2016-06-23 |
Asml Netherlands B.V. |
Hotspot aware dose correction
|
WO2016096333A1
(en)
|
2014-12-18 |
2016-06-23 |
Asml Netherlands B.V. |
A lithography model for 3d features
|
TWI620980B
(zh)
|
2015-02-13 |
2018-04-11 |
Asml荷蘭公司 |
影像對數斜率(ils)最佳化
|
WO2016128189A1
(en)
|
2015-02-13 |
2016-08-18 |
Asml Netherlands B.V. |
Process variability aware adaptive inspection and metrology
|
EP3264179B1
(de)
|
2015-02-23 |
2023-12-27 |
Nikon Corporation |
Messvorrichtung, lithografiesystem, belichtungsapparat, verfahren zur herstellung einer vorrichtung, steuerungsverfahren sowie überlagerungsmessverfahren
|
CN112068406A
(zh)
|
2015-02-23 |
2020-12-11 |
株式会社尼康 |
测量装置、光刻系统、以及组件制造方法
|
KR20240010551A
(ko)
|
2015-02-23 |
2024-01-23 |
가부시키가이샤 니콘 |
기판 처리 시스템 및 기판 처리 방법, 그리고 디바이스 제조 방법
|
EP3271783B1
(de)
|
2015-03-16 |
2021-04-07 |
ASML Netherlands B.V. |
Verfahren zur bestimmung einer resistdeformation und verfahren zur verbesserung eines lithographischen prozesses
|
TWI703402B
(zh)
|
2015-03-25 |
2020-09-01 |
日商尼康股份有限公司 |
布局方法、標記檢測方法、曝光方法、測量裝置、曝光裝置、以及元件製造方法
|
CN104952773B
(zh)
*
|
2015-05-27 |
2018-01-12 |
沈阳拓荆科技有限公司 |
一种半导体沉积设备腔体对接方法
|
CN104900565A
(zh)
*
|
2015-05-27 |
2015-09-09 |
沈阳拓荆科技有限公司 |
一种半导体沉积设备腔体对接装置
|
KR102063229B1
(ko)
|
2015-05-29 |
2020-01-07 |
에이에스엠엘 네델란즈 비.브이. |
소스 방사선의 각도 분포의 다중-샘플링을 사용하는 리소그래피의 시뮬레이션
|
EP3311224B1
(de)
|
2015-06-17 |
2022-11-16 |
ASML Netherlands B.V. |
Rezeptauswahl auf basis der konsistenz zwischen rezepten
|
US10247940B2
(en)
|
2015-12-07 |
2019-04-02 |
Asml Holding N.V. |
Objective lens system
|
WO2017102321A1
(en)
|
2015-12-14 |
2017-06-22 |
Cymer, Llc |
Optimization of source and bandwidth for new and existing patterning devices
|
WO2017102264A1
(en)
|
2015-12-17 |
2017-06-22 |
Asml Netherlands B.V. |
Source separation from metrology data
|
US10656531B2
(en)
|
2015-12-22 |
2020-05-19 |
Asml Netherlands B.V. |
Apparatus and method for process-window characterization
|
CN108700802A
(zh)
|
2015-12-31 |
2018-10-23 |
Asml荷兰有限公司 |
蚀刻辅助特征
|
KR102190292B1
(ko)
|
2015-12-31 |
2020-12-14 |
에이에스엠엘 네델란즈 비.브이. |
패터닝 공정들을 위한 측정 위치들의 선택
|
US10437158B2
(en)
|
2015-12-31 |
2019-10-08 |
Asml Netherlands B.V. |
Metrology by reconstruction
|
NL2018348A
(en)
*
|
2016-02-24 |
2017-09-06 |
Asml Netherlands Bv |
Substrate handling system and lithographic apparatus
|
WO2017162471A1
(en)
|
2016-03-24 |
2017-09-28 |
Asml Netherlands B.V. |
Optimization of a lithographic projection apparatus accounting for an interlayer characteristic
|
WO2017178276A1
(en)
|
2016-04-14 |
2017-10-19 |
Asml Netherlands B.V. |
Mapping of patterns between design layout and patterning device
|
WO2017194285A1
(en)
|
2016-05-12 |
2017-11-16 |
Asml Netherlands B.V. |
Displacement based overlay or alignment
|
US10394132B2
(en)
|
2016-05-17 |
2019-08-27 |
Asml Netherlands B.V. |
Metrology robustness based on through-wavelength similarity
|
WO2017202602A1
(en)
|
2016-05-23 |
2017-11-30 |
Asml Netherlands B.V. |
Selection of substrate measurement recipes
|
US10896282B2
(en)
|
2016-07-12 |
2021-01-19 |
Asml Netherlands B.V. |
Visualization performance metrics of computational analyses of design layouts
|
WO2018033363A1
(en)
|
2016-08-19 |
2018-02-22 |
Asml Netherlands B.V. |
Modeling post-exposure processes
|
WO2018038071A1
(ja)
|
2016-08-24 |
2018-03-01 |
株式会社ニコン |
計測システム及び基板処理システム、並びにデバイス製造方法
|
WO2018041550A1
(en)
|
2016-09-01 |
2018-03-08 |
Asml Netherlands B.V. |
Automatic selection of metrology target measurement recipes
|
US11029594B2
(en)
|
2016-09-13 |
2021-06-08 |
Asml Netherlands B.V. |
Optimization of a lithography apparatus or patterning process based on selected aberration
|
JP7081490B2
(ja)
|
2016-09-27 |
2022-06-07 |
株式会社ニコン |
レイアウト情報提供方法、レイアウト情報、決定方法、プログラム、並びに情報記録媒体
|
KR102239782B1
(ko)
|
2016-09-30 |
2021-04-13 |
가부시키가이샤 니콘 |
계측 시스템 및 기판 처리 시스템, 그리고 디바이스 제조 방법
|
CN117406544A
(zh)
|
2016-10-24 |
2024-01-16 |
Asml荷兰有限公司 |
用于优化图案化装置图案的方法
|
WO2018095705A1
(en)
|
2016-11-23 |
2018-05-31 |
Asml Netherlands B.V. |
Metrology using a plurality of metrology target measurement recipes
|
CN110023839B
(zh)
|
2016-12-01 |
2022-02-22 |
Asml荷兰有限公司 |
用于图案化配置的方法和系统
|
KR102262427B1
(ko)
|
2016-12-02 |
2021-06-09 |
에이에스엠엘 네델란즈 비.브이. |
확률적 변동을 추산하는 모델
|
WO2018104073A1
(en)
|
2016-12-09 |
2018-06-14 |
Asml Netherlands B.V. |
Method and apparatus for controlling a computing process
|
WO2018114246A2
(en)
|
2016-12-23 |
2018-06-28 |
Asml Netherlands B.V. |
Method and apparatus for pattern fidelity control
|
JP6903133B2
(ja)
|
2016-12-28 |
2021-07-14 |
エーエスエムエル ホールディング エヌ.ブイ. |
複数イメージ粒子検出のシステム及び方法
|
WO2018121987A1
(en)
|
2016-12-28 |
2018-07-05 |
Asml Holding N.V. |
Metrology tool and method of using the same
|
WO2018172039A1
(en)
|
2017-03-21 |
2018-09-27 |
Asml Netherlands B.V. |
Object identification and comparison
|
WO2018206275A1
(en)
|
2017-05-12 |
2018-11-15 |
Asml Netherlands B.V. |
Methods for evaluating resist development
|
US11016401B2
(en)
|
2017-05-25 |
2021-05-25 |
Asml Holding N.V. |
Substrates and methods of using those substrates
|
KR102597444B1
(ko)
|
2017-07-12 |
2023-11-03 |
에이에스엠엘 네델란즈 비.브이. |
결함 예측
|
KR102473979B1
(ko)
|
2017-09-27 |
2022-12-06 |
에이에스엠엘 네델란즈 비.브이. |
디바이스 제조 공정의 제어 파라미터들을 결정하는 방법
|
EP3462240A1
(de)
|
2017-09-27 |
2019-04-03 |
ASML Netherlands B.V. |
Verfahren zur bestimmung von kontrollparametern eines herstellungsverfahrens für bauelemente
|
CN109581823B
(zh)
|
2017-09-29 |
2022-11-08 |
鲁道夫科技股份有限公司 |
用于最佳化微影曝光制程的系统和方法
|
US11354484B2
(en)
|
2018-11-08 |
2022-06-07 |
Asml Netherlands B.V. |
Failure model for predicting failure due to resist layer
|
EP3650940A1
(de)
|
2018-11-09 |
2020-05-13 |
ASML Netherlands B.V. |
Verfahren im herstellungsverfahren einer vorrichtung, übergangsloses computerlesbares medium und zur ausführung des verfahrens konfiguriertes system
|
DE102018132001A1
(de)
|
2018-12-12 |
2020-06-18 |
Laser Imaging Systems Gmbh |
Vorrichtung zum Belichten von plattenförmigen Werkstücken mit hohem Durchsatz
|
WO2020169355A1
(en)
|
2019-02-20 |
2020-08-27 |
Asml Netherlands B.V. |
A method for characterizing a manufacturing process of semiconductor devices
|
WO2020169303A1
(en)
|
2019-02-21 |
2020-08-27 |
Asml Netherlands B.V. |
Method for training machine learning model to determine optical proximity correction for mask
|
US11567413B2
(en)
|
2019-02-25 |
2023-01-31 |
Asml Netherlands B.V. |
Method for determining stochastic variation of printed patterns
|
JP7256287B2
(ja)
|
2019-03-25 |
2023-04-11 |
エーエスエムエル ネザーランズ ビー.ブイ. |
パターニングプロセスにおいてパターンを決定するための方法
|
US20220187713A1
(en)
|
2019-04-04 |
2022-06-16 |
Asml Netherlands B.V. |
Method and apparatus for predicting substrate image
|
WO2020212107A1
(en)
|
2019-04-15 |
2020-10-22 |
Asml Netherlands B.V. |
Method for determining corrections to features of a mask
|
CN113728276A
(zh)
|
2019-04-25 |
2021-11-30 |
Asml荷兰有限公司 |
用于基于缺陷来确定图案化过程的特性以减少热点的方法
|
KR20210150574A
(ko)
|
2019-05-21 |
2021-12-10 |
에이에스엠엘 네델란즈 비.브이. |
원하는 패턴과 관련된 확률적 변화를 결정하기 위한 방법
|
EP3822703A1
(de)
|
2019-11-18 |
2021-05-19 |
ASML Netherlands B.V. |
Verfahren zur bestimmung einer sichtfeldeinstellung
|
WO2021069153A1
(en)
|
2019-10-08 |
2021-04-15 |
Asml Netherlands B.V. |
Method for determining a field-of-view setting
|
CN114600047A
(zh)
|
2019-10-24 |
2022-06-07 |
Asml荷兰有限公司 |
用于目标图案的基于规则的重靶向的方法
|
WO2021089329A1
(en)
|
2019-11-07 |
2021-05-14 |
Asml Holding N.V. |
Optical component and clamp used in lithographic apparatus
|
WO2021160522A1
(en)
|
2020-02-12 |
2021-08-19 |
Asml Netherlands B.V. |
Method for determining a mask pattern comprising optical proximity corrections using a trained machine learning model
|
KR20220143743A
(ko)
|
2020-02-21 |
2022-10-25 |
온투 이노베이션 아이엔씨. |
리소그래피 공정에서 오버레이 오류를 보정하기 위한 시스템 및 방법
|
CN115335774A
(zh)
|
2020-03-27 |
2022-11-11 |
Asml控股股份有限公司 |
光学设备和使用所述光学设备的光刻设备
|
KR20230004633A
(ko)
|
2020-05-14 |
2023-01-06 |
에이에스엠엘 네델란즈 비.브이. |
확률적 기여자를 예측하는 방법
|
EP3910418A1
(de)
|
2020-05-14 |
2021-11-17 |
ASML Netherlands B.V. |
Verfahren zur direkten zersetzung von stochastischen mitwirkenden
|
EP4162324A1
(de)
|
2020-06-08 |
2023-04-12 |
ASML Netherlands B.V. |
Substrathalter zur verwendung in einem lithographischen gerät und verfahren zur herstellung eines substrathalters
|
CN115836252A
(zh)
|
2020-06-24 |
2023-03-21 |
Asml荷兰有限公司 |
用于确定辅助特征的印制概率的系统、方法和产品及其应用
|
JP7433181B2
(ja)
*
|
2020-09-23 |
2024-02-19 |
株式会社Screenホールディングス |
描画装置
|
CN116648672A
(zh)
|
2020-12-18 |
2023-08-25 |
Asml荷兰有限公司 |
用于确定掩模图案和训练机器学习模型的方法
|
JP2024500075A
(ja)
|
2020-12-23 |
2024-01-04 |
エーエスエムエル ネザーランズ ビー.ブイ. |
帯域幅及びスペックルに基づくリソグラフィプロセスの最適化
|
WO2022184578A1
(en)
|
2021-03-03 |
2022-09-09 |
Asml Netherlands B.V. |
Configuration of patterning process
|
KR20240011719A
(ko)
|
2021-05-25 |
2024-01-26 |
에이에스엠엘 네델란즈 비.브이. |
마스크 규칙 체크 위반 및 마스크 디자인 결정
|
WO2022258398A1
(en)
|
2021-06-07 |
2022-12-15 |
Asml Netherlands B.V. |
Determining rounded contours for lithography related patterns
|
WO2023041488A1
(en)
|
2021-09-15 |
2023-03-23 |
Asml Netherlands B.V. |
Source separation from metrology data
|
EP4194950A1
(de)
|
2021-12-08 |
2023-06-14 |
ASML Netherlands B.V. |
Systeme und verfahren zur reduzierung der musterverschiebung in einer lithografievorrichtung
|
WO2023110347A1
(en)
|
2021-12-16 |
2023-06-22 |
Asml Netherlands B.V. |
Systems and methods for optimizing lithographic design variables using image-based failure rate model
|
WO2024012800A1
(en)
|
2022-07-11 |
2024-01-18 |
Asml Netherlands B.V. |
Systems and methods for predicting post-etch stochastic variation
|
WO2024013273A1
(en)
|
2022-07-14 |
2024-01-18 |
Asml Netherlands B.V. |
Determining mask rule check violations and mask design based on local feature dimension
|
WO2024022729A1
(en)
|
2022-07-27 |
2024-02-01 |
Asml Netherlands B.V. |
Method and apparatus for particle removal
|
WO2024022854A1
(en)
|
2022-07-28 |
2024-02-01 |
Asml Netherlands B.V. |
Training a machine learning model to generate mrc and process aware mask pattern
|
EP4325229A1
(de)
|
2022-08-17 |
2024-02-21 |
ASML Netherlands B.V. |
Verfahren und vorrichtung zur berührungslosen inspektion eines substrats
|
EP4343827A1
(de)
|
2022-09-21 |
2024-03-27 |
ASML Netherlands B.V. |
Verfahren und vorrichtung zum bonden von substraten
|