DE69736205D1 - Aluminumnitridsinterkörper, Gegenstand mit eingebettetem Metall, elektronisch funktionalem Material und elektrostatische Einspannvorrichtung - Google Patents

Aluminumnitridsinterkörper, Gegenstand mit eingebettetem Metall, elektronisch funktionalem Material und elektrostatische Einspannvorrichtung

Info

Publication number
DE69736205D1
DE69736205D1 DE69736205T DE69736205T DE69736205D1 DE 69736205 D1 DE69736205 D1 DE 69736205D1 DE 69736205 T DE69736205 T DE 69736205T DE 69736205 T DE69736205 T DE 69736205T DE 69736205 D1 DE69736205 D1 DE 69736205D1
Authority
DE
Germany
Prior art keywords
sintered body
aluminum nitride
electrostatic chuck
functional material
nitride sintered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69736205T
Other languages
English (en)
Other versions
DE69736205T2 (de
Inventor
Yuji Katsuda
Yukimasa Mori
Michio Takahashi
Yuki Bessho
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd filed Critical NGK Insulators Ltd
Publication of DE69736205D1 publication Critical patent/DE69736205D1/de
Application granted granted Critical
Publication of DE69736205T2 publication Critical patent/DE69736205T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/581Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on aluminium nitride
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q3/00Devices holding, supporting, or positioning work or tools, of a kind normally removable from the machine
    • B23Q3/15Devices for holding work using magnetic or electric force acting directly on the work
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833Details of electrostatic chucks
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00Chucks or sockets
    • Y10T279/23Chucks or sockets with magnetic or electrostatic means
DE69736205T 1996-03-29 1997-03-26 Aluminumnitridsinterkörper, Gegenstand mit eingebettetem Metall, elektronisch funktionalem Material und elektrostatische Einspannvorrichtung Expired - Lifetime DE69736205T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP9955796 1996-03-29
JP9955796 1996-03-29
JP7279997 1997-03-11
JP07279997A JP3457495B2 (ja) 1996-03-29 1997-03-11 窒化アルミニウム焼結体、金属埋設品、電子機能材料および静電チャック

Publications (2)

Publication Number Publication Date
DE69736205D1 true DE69736205D1 (de) 2006-08-03
DE69736205T2 DE69736205T2 (de) 2007-05-16

Family

ID=26413933

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69736205T Expired - Lifetime DE69736205T2 (de) 1996-03-29 1997-03-26 Aluminumnitridsinterkörper, Gegenstand mit eingebettetem Metall, elektronisch funktionalem Material und elektrostatische Einspannvorrichtung
DE69706734T Expired - Lifetime DE69706734T2 (de) 1996-03-29 1997-03-26 Aluminiumnitrid-Sinterkörper, eingebetteter Metallgegenstand, Elektronikfunktionsmaterial und elektrostatische Einspannvorrichtung

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE69706734T Expired - Lifetime DE69706734T2 (de) 1996-03-29 1997-03-26 Aluminiumnitrid-Sinterkörper, eingebetteter Metallgegenstand, Elektronikfunktionsmaterial und elektrostatische Einspannvorrichtung

Country Status (6)

Country Link
US (1) US6001760A (de)
EP (2) EP0798278B1 (de)
JP (1) JP3457495B2 (de)
KR (1) KR100268481B1 (de)
DE (2) DE69736205T2 (de)
TW (1) TW561138B (de)

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JP3670416B2 (ja) 1995-11-01 2005-07-13 日本碍子株式会社 金属包含材および静電チャック
US5914613A (en) 1996-08-08 1999-06-22 Cascade Microtech, Inc. Membrane probing system with local contact scrub
JP4236292B2 (ja) 1997-03-06 2009-03-11 日本碍子株式会社 ウエハー吸着装置およびその製造方法
JPH10275524A (ja) * 1997-03-31 1998-10-13 Kyocera Corp 耐プラズマ部材
JP3670444B2 (ja) * 1997-06-06 2005-07-13 日本碍子株式会社 窒化アルミニウム基複合体、電子機能材料、静電チャックおよび窒化アルミニウム基複合体の製造方法
JP3318514B2 (ja) * 1997-08-06 2002-08-26 日本碍子株式会社 半導体支持装置
JP3433063B2 (ja) * 1997-09-29 2003-08-04 日本碍子株式会社 窒化アルミニウム焼結体、電子機能材料および静電チャック
CA2252113A1 (en) * 1997-10-29 1999-04-29 Yoshihiko Numata Substrate and process for producing the same
US5909355A (en) * 1997-12-02 1999-06-01 Applied Materials, Inc. Ceramic electrostatic chuck and method of fabricating same
JPH11214491A (ja) * 1998-01-22 1999-08-06 Toshiba Ceramics Co Ltd ウエハ保持装置及びその製造方法
JPH11209182A (ja) * 1998-01-22 1999-08-03 Sumitomo Metal Ind Ltd プラズマ耐食部材
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Also Published As

Publication number Publication date
US6001760A (en) 1999-12-14
DE69706734T2 (de) 2002-07-04
EP0798278A3 (de) 1998-03-04
JP3457495B2 (ja) 2003-10-20
JPH09315867A (ja) 1997-12-09
DE69706734D1 (de) 2001-10-25
KR19980023985A (ko) 1998-07-06
DE69736205T2 (de) 2007-05-16
EP1128425A1 (de) 2001-08-29
TW561138B (en) 2003-11-11
EP0798278B1 (de) 2001-09-19
KR100268481B1 (ko) 2000-10-16
EP0798278A2 (de) 1997-10-01
EP1128425B1 (de) 2006-06-21

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