DE69736563D1 - Quartz mit niedriger kompaktierung unter hochenergiebestrahlung - Google Patents
Quartz mit niedriger kompaktierung unter hochenergiebestrahlungInfo
- Publication number
- DE69736563D1 DE69736563D1 DE69736563T DE69736563T DE69736563D1 DE 69736563 D1 DE69736563 D1 DE 69736563D1 DE 69736563 T DE69736563 T DE 69736563T DE 69736563 T DE69736563 T DE 69736563T DE 69736563 D1 DE69736563 D1 DE 69736563D1
- Authority
- DE
- Germany
- Prior art keywords
- quartz
- under high
- energy radiation
- compacting under
- low compacting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
- C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
- C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0005—Other surface treatment of glass not in the form of fibres or filaments by irradiation
- C03C23/0025—Other surface treatment of glass not in the form of fibres or filaments by irradiation by a laser beam
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/02—Pure silica glass, e.g. pure fused quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/13—Computer control
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US2499596P | 1996-08-29 | 1996-08-29 | |
US24995P | 1996-08-29 | ||
PCT/US1997/015233 WO1998008775A1 (en) | 1996-08-29 | 1997-08-27 | Silica with low compaction under high energy irradiation |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69736563D1 true DE69736563D1 (de) | 2006-10-05 |
DE69736563T2 DE69736563T2 (de) | 2008-01-03 |
Family
ID=21823466
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69736563T Revoked DE69736563T2 (de) | 1996-08-29 | 1997-08-27 | Quartz mit niedriger kompaktierung unter hochenergiebestrahlung |
DE69734675T Expired - Lifetime DE69734675T2 (de) | 1996-08-29 | 1997-08-27 | Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69734675T Expired - Lifetime DE69734675T2 (de) | 1996-08-29 | 1997-08-27 | Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz |
Country Status (7)
Country | Link |
---|---|
US (2) | US6295841B1 (de) |
EP (2) | EP0960074B1 (de) |
JP (2) | JP2001500631A (de) |
KR (2) | KR20000035913A (de) |
DE (2) | DE69736563T2 (de) |
RU (1) | RU2175647C2 (de) |
WO (2) | WO1998008776A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0960074B1 (de) | 1996-08-29 | 2005-11-16 | Corning Incorporated | Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz |
DE19840525A1 (de) * | 1998-09-06 | 2000-03-09 | Inst Neue Mat Gemein Gmbh | Verfahren zur Herstellung optischer Schichten von gleichmäßiger Schichtdicke |
KR100824985B1 (ko) * | 2001-09-11 | 2008-04-28 | 재단법인 포항산업과학연구원 | 투명 실리카 글래스 제조용 조성물 및 이를 이용한 실리카글래스의 제조 방법 |
EP1552281B8 (de) * | 2002-09-16 | 2016-10-19 | Hellma Materials GmbH | Bestimmung der eignung eines optischen materials zur herstellung von optischen elementen, eine vorrichtung hierzu und die verwendung des materials |
JP4370581B2 (ja) | 2003-02-17 | 2009-11-25 | 株式会社ニコン | 露光装置及び露光装置用光学部材 |
DE10308466A1 (de) * | 2003-02-21 | 2004-09-02 | Carl Zeiss Smt Ag | Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und Quarzglasmaterial |
US6992753B2 (en) * | 2003-12-24 | 2006-01-31 | Carl Zeiss Smt Ag | Projection optical system |
JP2013075827A (ja) * | 2005-11-07 | 2013-04-25 | Corning Inc | デューテロキシルドープ石英ガラス、このガラスを有する光学部材及びリソグラフィシステム並びにこのガラスの作成方法 |
US7934390B2 (en) * | 2006-05-17 | 2011-05-03 | Carl Zeiss Smt Gmbh | Method for manufacturing a lens of synthetic quartz glass with increased H2 content |
JP5432378B2 (ja) * | 2009-08-18 | 2014-03-05 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Euvマイクロリソグラフィー用基板及びミラーとその製造方法 |
DE102010052685A1 (de) | 2010-11-26 | 2012-05-31 | J-Fiber Gmbh | Verfahren zur Herstellung von strahlungsresistentem Quarzglasmaterial und danach hergestellte Quarzglaskörper |
RU2731764C1 (ru) * | 2019-12-30 | 2020-09-08 | Акционерное общество "Научно-производственное предприятие "Медикон" (АО "НПП "Медикон") | Способ выплавки кварцевого стекла |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3933454A (en) * | 1974-04-22 | 1976-01-20 | Corning Glass Works | Method of making optical waveguides |
NL8403380A (nl) | 1984-11-07 | 1986-06-02 | Philips Nv | Werkwijze en inrichting voor het verdichten van een voorgevormd poreus lichaam uit materiaal, waarvan het hoofdbestanddeel uit sio2 bestaat. |
US4961767A (en) | 1987-05-20 | 1990-10-09 | Corning Incorporated | Method for producing ultra-high purity, optical quality, glass articles |
US4789389A (en) * | 1987-05-20 | 1988-12-06 | Corning Glass Works | Method for producing ultra-high purity, optical quality, glass articles |
US5161059A (en) * | 1987-09-21 | 1992-11-03 | Massachusetts Institute Of Technology | High-efficiency, multilevel, diffractive optical elements |
US4895790A (en) * | 1987-09-21 | 1990-01-23 | Massachusetts Institute Of Technology | High-efficiency, multilevel, diffractive optical elements |
US5325230A (en) * | 1989-06-09 | 1994-06-28 | Shin-Etsu Quartz Products Co., Ltd. | Optical members and blanks of synthetic silica glass and method for their production |
EP0401845B2 (de) * | 1989-06-09 | 2001-04-11 | Heraeus Quarzglas GmbH & Co. KG | Optische Teile und Rohlinge aus synthetischem Siliziumdioxidglas und Verfahren zu ihrer Herstellung |
US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
US5410428A (en) | 1990-10-30 | 1995-04-25 | Shin-Etsu Quartz Products Co. Ltd. | Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof |
EP0546196B1 (de) * | 1991-06-29 | 1997-05-02 | Shin-Etsu Quartz Products Co., Ltd. | Synthetisches optisches element aus quarzglas für excimer-laser und seine herstellung |
JP2588447B2 (ja) * | 1991-06-29 | 1997-03-05 | 信越石英株式会社 | エキシマレーザー用石英ガラス部材の製造方法 |
JP2859095B2 (ja) * | 1993-07-30 | 1999-02-17 | 信越化学工業株式会社 | エキシマレーザリソグラフィー用合成石英マスク基板 |
US5547482A (en) * | 1994-07-05 | 1996-08-20 | Chalk; Julie B. | Method of making fused silica articles |
JP3283383B2 (ja) * | 1994-07-06 | 2002-05-20 | 松下電器産業株式会社 | 設計検証装置 |
US5594651A (en) * | 1995-02-14 | 1997-01-14 | St. Ville; James A. | Method and apparatus for manufacturing objects having optimized response characteristics |
US5616159A (en) * | 1995-04-14 | 1997-04-01 | Corning Incorporated | Method of forming high purity fused silica having high resistance to optical damage |
EP0747327B2 (de) * | 1995-06-07 | 2003-08-27 | Corning Incorporated | Verfahren zur thermischen Behandlung und zum Konsolidieren von Vorformen aus Siliciumdioxid zur Verminderung von durch Laser hervorgerufenen optischen Defekten |
EP0914301A4 (de) * | 1996-07-26 | 2000-03-22 | Corning Inc | Geschmolzenes quartzglas mit hohem widerstand gegen optische bschädigung |
EP0960074B1 (de) * | 1996-08-29 | 2005-11-16 | Corning Incorporated | Verfahren zur determinierung von laser-induzierter kompaktierung in geschmolzenem quarz |
-
1997
- 1997-08-27 EP EP97945187A patent/EP0960074B1/de not_active Expired - Lifetime
- 1997-08-27 RU RU99105849/03A patent/RU2175647C2/ru not_active IP Right Cessation
- 1997-08-27 KR KR1019997001649A patent/KR20000035913A/ko not_active Application Discontinuation
- 1997-08-27 WO PCT/US1997/015234 patent/WO1998008776A1/en active IP Right Grant
- 1997-08-27 EP EP97944297A patent/EP0958255B1/de not_active Revoked
- 1997-08-27 JP JP10511953A patent/JP2001500631A/ja active Pending
- 1997-08-27 DE DE69736563T patent/DE69736563T2/de not_active Revoked
- 1997-08-27 KR KR1019997001594A patent/KR20000035883A/ko not_active Application Discontinuation
- 1997-08-27 JP JP10511954A patent/JP2000517284A/ja not_active Ceased
- 1997-08-27 WO PCT/US1997/015233 patent/WO1998008775A1/en active IP Right Grant
- 1997-08-27 DE DE69734675T patent/DE69734675T2/de not_active Expired - Lifetime
-
1999
- 1999-02-25 US US09/254,113 patent/US6295841B1/en not_active Expired - Fee Related
-
2001
- 2001-09-26 US US09/964,987 patent/US6543254B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0960074A1 (de) | 1999-12-01 |
JP2001500631A (ja) | 2001-01-16 |
EP0958255A4 (de) | 2004-03-31 |
DE69734675D1 (de) | 2005-12-22 |
US6295841B1 (en) | 2001-10-02 |
RU2175647C2 (ru) | 2001-11-10 |
EP0958255A1 (de) | 1999-11-24 |
US6543254B2 (en) | 2003-04-08 |
US20020036188A1 (en) | 2002-03-28 |
DE69734675T2 (de) | 2006-06-14 |
JP2000517284A (ja) | 2000-12-26 |
EP0960074A4 (de) | 2002-09-04 |
EP0958255B1 (de) | 2006-08-23 |
WO1998008776A1 (en) | 1998-03-05 |
WO1998008775A1 (en) | 1998-03-05 |
KR20000035913A (ko) | 2000-06-26 |
KR20000035883A (ko) | 2000-06-26 |
EP0960074B1 (de) | 2005-11-16 |
DE69736563T2 (de) | 2008-01-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee | ||
8328 | Change in the person/name/address of the agent |
Representative=s name: PAE REINHARD, SKUHRA, WEISE & PARTNER GBR, 80801 M |
|
8370 | Indication of lapse of patent is to be deleted | ||
8331 | Complete revocation | ||
8363 | Opposition against the patent |