DE69737315D1 - Auslasssystem - Google Patents

Auslasssystem

Info

Publication number
DE69737315D1
DE69737315D1 DE69737315T DE69737315T DE69737315D1 DE 69737315 D1 DE69737315 D1 DE 69737315D1 DE 69737315 T DE69737315 T DE 69737315T DE 69737315 T DE69737315 T DE 69737315T DE 69737315 D1 DE69737315 D1 DE 69737315D1
Authority
DE
Germany
Prior art keywords
exhaust system
exhaust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69737315T
Other languages
English (en)
Other versions
DE69737315T2 (de
Inventor
Nobuharu Noji
Yasuhiro Niimura
Hiroaki Ogamino
Hiroshi Hattori
Norihiko Nomura
Tetsuro Sugiura
Yuji Matsuoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP15159096A external-priority patent/JP3617575B2/ja
Priority claimed from JP35317496A external-priority patent/JP3544604B2/ja
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of DE69737315D1 publication Critical patent/DE69737315D1/de
Application granted granted Critical
Publication of DE69737315T2 publication Critical patent/DE69737315T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/002—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by condensation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
    • F25B—REFRIGERATION MACHINES, PLANTS OR SYSTEMS; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS
    • F25B21/00—Machines, plants or systems, using electric or magnetic effects
    • F25B21/02—Machines, plants or systems, using electric or magnetic effects using Peltier effect; using Nernst-Ettinghausen effect
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Drying Of Semiconductors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
DE69737315T 1996-05-23 1997-05-22 Auslasssystem Expired - Fee Related DE69737315T2 (de)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP15159096 1996-05-23
JP15158996 1996-05-23
JP15159096A JP3617575B2 (ja) 1996-05-23 1996-05-23 真空排気システム
JP15158996 1996-05-23
JP35317496A JP3544604B2 (ja) 1996-12-16 1996-12-16 切替式トラップ装置
JP35317496 1996-12-16

Publications (2)

Publication Number Publication Date
DE69737315D1 true DE69737315D1 (de) 2007-03-22
DE69737315T2 DE69737315T2 (de) 2007-11-08

Family

ID=27320135

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69737315T Expired - Fee Related DE69737315T2 (de) 1996-05-23 1997-05-22 Auslasssystem

Country Status (4)

Country Link
US (1) US6332925B1 (de)
EP (2) EP1719551A3 (de)
KR (1) KR100504227B1 (de)
DE (1) DE69737315T2 (de)

Families Citing this family (43)

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GB9812497D0 (en) * 1998-06-10 1998-08-05 Boc Group Plc Metal-organic gas scrubber
JP2000256856A (ja) * 1999-03-11 2000-09-19 Tokyo Electron Ltd 処理装置及び処理装置用真空排気システム及び減圧ｃｖｄ装置及び減圧ｃｖｄ装置用真空排気システム及びトラップ装置
FI110311B (fi) * 1999-07-20 2002-12-31 Asm Microchemistry Oy Menetelmä ja laitteisto aineiden poistamiseksi kaasuista
JP4252702B2 (ja) 2000-02-14 2009-04-08 株式会社荏原製作所 反応副生成物の配管内付着防止装置及び付着防止方法
JP2001252527A (ja) * 2000-03-13 2001-09-18 Seiko Epson Corp Ｐｆｃの処理方法および処理装置
US6863019B2 (en) * 2000-06-13 2005-03-08 Applied Materials, Inc. Semiconductor device fabrication chamber cleaning method and apparatus with recirculation of cleaning gas
JP4046474B2 (ja) 2000-11-13 2008-02-13 株式会社荏原製作所 連続処理型トラップ装置及び該トラップ装置の運転方法
EP1408293A4 (de) * 2001-06-21 2006-06-21 Air Water Inc Kaltlagerungs-gefriereinrichtung
KR100553194B1 (ko) * 2001-12-20 2006-02-22 다나까 기낀조꾸 고교 가부시끼가이샤 Ｌｐｃｖｄ 장치 및 박막 제조방법
JP4056829B2 (ja) * 2002-08-30 2008-03-05 東京エレクトロン株式会社 基板処理装置
US6667475B1 (en) 2003-01-08 2003-12-23 Applied Materials, Inc. Method and apparatus for cleaning an analytical instrument while operating the analytical instrument
US7217441B2 (en) * 2003-03-28 2007-05-15 Halliburton Energy Services, Inc. Methods for coating pipe comprising using cement compositions comprising high tensile strength fibers and/or a multi-purpose cement additive
WO2005064649A2 (en) * 2003-12-23 2005-07-14 Schumacher John C Exhaust conditioning system for semiconductor reactor
JP4642379B2 (ja) 2004-05-12 2011-03-02 東京エレクトロン株式会社 排気捕集装置
JP4626956B2 (ja) * 2004-10-18 2011-02-09 東京エレクトロン株式会社 半導体製造装置、液量監視装置、半導体製造装置の液体材料監視方法、及び、液量監視方法
GB0502148D0 (en) * 2005-02-02 2005-03-09 Boc Group Plc Trap device
GB0504312D0 (en) * 2005-03-02 2005-04-06 Boc Group Plc Trap device
GB0506089D0 (en) * 2005-03-24 2005-05-04 Boc Group Plc Trap device
KR101388817B1 (ko) * 2006-03-14 2014-04-23 프랙스에어 테크놀로지, 인코포레이티드 증착 방법을 위한 온도 제어 콜드 트랩 및 그의 용도
US20090249801A1 (en) * 2008-04-04 2009-10-08 Hedberg Herbert J Cold trap to increase gas residence time to increase condensation of vapor molecules
JP5460982B2 (ja) * 2008-07-30 2014-04-02 東京エレクトロン株式会社 弁体、粒子進入阻止機構、排気制御装置及び基板処理装置
KR101132605B1 (ko) * 2009-03-13 2012-04-06 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 트랩 장치, 기판 처리 장치의 제어 방법 및 트랩 장치의 제어 방법
JP5276679B2 (ja) * 2011-02-01 2013-08-28 東京エレクトロン株式会社 成膜装置
DE102011103788A1 (de) * 2011-06-01 2012-12-06 Leybold Optics Gmbh Vorrichtung zur Oberflächenbehandlung mit einem Prozessdampf
US10118122B2 (en) * 2011-08-29 2018-11-06 The Boeing Company CO2 collection methods and systems
JP5921168B2 (ja) * 2011-11-29 2016-05-24 株式会社日立国際電気 基板処理装置
JP5874469B2 (ja) * 2012-03-19 2016-03-02 東京エレクトロン株式会社 トラップ装置及び成膜装置
US9205357B2 (en) 2012-03-29 2015-12-08 The Boeing Company Carbon dioxide separation system and method
JP6007715B2 (ja) * 2012-03-29 2016-10-12 東京エレクトロン株式会社 トラップ機構、排気系及び成膜装置
US9156703B2 (en) 2012-03-30 2015-10-13 The Boeing Company System and method for producing carbon dioxide
US9103549B2 (en) 2012-08-23 2015-08-11 The Boeing Company Dual stream system and method for producing carbon dioxide
US9777628B2 (en) 2012-08-23 2017-10-03 The Boeing Company System and method for processing greenhouse gases
WO2014081932A1 (en) * 2012-11-21 2014-05-30 D-Wave Systems Inc. Systems and methods for cryogenic refrigeration
US9073001B2 (en) 2013-02-14 2015-07-07 The Boeing Company Monolithic contactor and associated system and method for collecting carbon dioxide
KR101682473B1 (ko) * 2013-10-18 2016-12-05 삼성전자주식회사 사이드 스토리지 및 이를 구비하는 반도체 소자 제조 설비
JP6468884B2 (ja) * 2014-04-21 2019-02-13 東京エレクトロン株式会社 排気システム
US10378803B2 (en) 2014-08-08 2019-08-13 D-Wave Systems Inc. Systems and methods for electrostatic trapping of contaminants in cryogenic refrigeration systems
JP6980406B2 (ja) * 2017-04-25 2021-12-15 株式会社日立ハイテク 半導体製造装置及び半導体装置の製造方法
TWI796604B (zh) 2019-10-29 2023-03-21 日商住友重機械工業股份有限公司 低溫泵、低溫泵系統及低溫泵的運轉開始方法
CN112430805B (zh) * 2020-11-23 2022-12-30 中国科学院光电技术研究所 一种原子层沉积镀膜机的真空控制系统
US20220112598A1 (en) * 2021-12-21 2022-04-14 Intel Corporation Trap filter system for semiconductor equipment
KR102601305B1 (ko) * 2022-12-27 2023-11-14 크라이오에이치앤아이(주) 공정가스 제거 장치

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US3719052A (en) 1971-05-04 1973-03-06 G White Vacuum system cold trap
JPS5329237A (en) 1976-08-31 1978-03-18 Tokyo Shibaura Electric Co Gas reaction device
DE2705056A1 (de) * 1977-02-08 1978-08-10 Krupp Koppers Gmbh Verfahren und vorrichtung zur aufarbeitung des bei der gasentschwefelung anfallenden sauergases
US4609388A (en) * 1979-04-18 1986-09-02 Cng Research Company Gas separation process
JPS58106186A (ja) 1981-12-18 1983-06-24 Hitachi Ltd トラツプ装置
FR2523113A1 (fr) 1982-03-10 1983-09-16 G Pi Procede de regeneration des chlorosilanes et de l'hydrogene non entres en reaction lors de l'obtention de silicium semi-conducteur polycristallin; chlorosilanes et hydrogene regeneres par ledit procede
DE3404802A1 (de) * 1983-02-16 1984-08-23 Siemens AG, 1000 Berlin und 8000 München Vollautomatische kuehlfalle
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US4551197A (en) 1984-07-26 1985-11-05 Guilmette Joseph G Method and apparatus for the recovery and recycling of condensable gas reactants
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DE3701544A1 (de) 1987-01-21 1988-08-04 Messer Griesheim Gmbh Verfahren zum entfernen von verunreinigungen aus abgasen
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JPH0757298B2 (ja) 1987-05-19 1995-06-21 日本真空技術株式会社 真空排気系用微粒子捕集装置
JPH02170981A (ja) * 1988-12-21 1990-07-02 Fujitsu Ltd Ｃｖｄ装置
US5083445A (en) * 1989-01-20 1992-01-28 Hitachi, Ltd. Cryopump
JPH0328377A (ja) * 1989-06-26 1991-02-06 Mitsubishi Electric Corp 半導体製造装置
IT1243417B (it) 1990-09-25 1994-06-10 Gianclaudio Masetto Metodo per la rimozione di sostanze inquinanti in forma di gas, vaporeo aerosol da un effluente gassoso.
JP2580928Y2 (ja) * 1991-08-22 1998-09-17 日本電気株式会社 気相成長装置
JPH08507575A (ja) 1993-08-17 1996-08-13 アクツィオネルノエ オブシュストボ “ルッスコエ オブシュストボ プリクラドノイ エレクトロニキ” 炭化ケイ素層の製造方法とその物品
KR0114991Y1 (ko) * 1994-07-15 1998-04-15 김주용 엘피씨브디(lpcvd) 공정튜브
DE4438874A1 (de) 1994-10-31 1996-05-02 Bayer Ag Verfahren zur Reinigung von Abluftströmen durch Kristallisation oder Kondensation aus der Dampfphase
US5928426A (en) * 1996-08-08 1999-07-27 Novellus Systems, Inc. Method and apparatus for treating exhaust gases from CVD, PECVD or plasma etch reactors

Also Published As

Publication number Publication date
EP0811413A2 (de) 1997-12-10
EP0811413A3 (de) 1999-04-14
EP1719551A3 (de) 2007-10-31
KR100504227B1 (ko) 2005-11-08
US6332925B1 (en) 2001-12-25
KR19980063312A (ko) 1998-10-07
EP0811413B1 (de) 2007-02-07
DE69737315T2 (de) 2007-11-08
EP1719551A2 (de) 2006-11-08

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee