DE69838412D1 - Transparente, elektrisch leitende Struktur, Verfahren zu ihrer Herstellung, Beschichtungs-Fluid zur Herstellung einer transparenten, elektrisch leitenden Schicht für die Struktur, und Verfahren zur Herstellung des Fluids - Google Patents

Transparente, elektrisch leitende Struktur, Verfahren zu ihrer Herstellung, Beschichtungs-Fluid zur Herstellung einer transparenten, elektrisch leitenden Schicht für die Struktur, und Verfahren zur Herstellung des Fluids

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Publication number
DE69838412D1
DE69838412D1 DE69838412T DE69838412T DE69838412D1 DE 69838412 D1 DE69838412 D1 DE 69838412D1 DE 69838412 T DE69838412 T DE 69838412T DE 69838412 T DE69838412 T DE 69838412T DE 69838412 D1 DE69838412 D1 DE 69838412D1
Authority
DE
Germany
Prior art keywords
transparent
producing
electrically conductive
fluid
preparation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69838412T
Other languages
English (en)
Inventor
Masaya Yukinobu
Kenji Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Application granted granted Critical
Publication of DE69838412D1 publication Critical patent/DE69838412D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24—Electrically-conducting paints
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86—Vessels; Containers; Vacuum locks
    • H01J29/867—Means associated with the outside of the vessel for shielding, e.g. magnetic shields
    • H01J29/868—Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/45—Inorganic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/476—Tin oxide or doped tin oxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/479—Metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20—Constructional details
    • H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/44—Optical arrangements or shielding arrangements, e.g. filters or lenses
    • H01J2211/446—Electromagnetic shielding means; Antistatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00—Details of cathode ray tubes or electron beam tubes
    • H01J2229/863—Passive shielding means associated with the vessel
    • H01J2229/8631—Coatings
    • H01J2229/8632—Coatings characterised by the material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00—Electron emission display panels, e.g. field emission display panels
    • H01J2329/86—Vessels
    • H01J2329/868—Passive shielding means of vessels
    • H01J2329/869—Electromagnetic shielding
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/918—Material abnormally transparent
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/923—Physical dimension
    • Y10S428/924—Composite
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
DE69838412T 1997-10-23 1998-10-21 Transparente, elektrisch leitende Struktur, Verfahren zu ihrer Herstellung, Beschichtungs-Fluid zur Herstellung einer transparenten, elektrisch leitenden Schicht für die Struktur, und Verfahren zur Herstellung des Fluids Expired - Fee Related DE69838412D1 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP30935197 1997-10-23
JP30935097 1997-10-23
JP33240197 1997-11-17
JP33240097 1997-11-17

Publications (1)

Publication Number Publication Date
DE69838412D1 true DE69838412D1 (de) 2007-10-25

Family

ID=27479994

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69838412T Expired - Fee Related DE69838412D1 (de) 1997-10-23 1998-10-21 Transparente, elektrisch leitende Struktur, Verfahren zu ihrer Herstellung, Beschichtungs-Fluid zur Herstellung einer transparenten, elektrisch leitenden Schicht für die Struktur, und Verfahren zur Herstellung des Fluids

Country Status (5)

Country Link
US (4) US6261479B1 (de)
EP (1) EP0911859B1 (de)
KR (1) KR100621050B1 (de)
DE (1) DE69838412D1 (de)
TW (1) TW432397B (de)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6447909B1 (en) 1999-01-14 2002-09-10 Sumitomo Metal Mining Co., Ltd. Transparent conductive layered structure and method of producing the same, and coating liquid for forming transparent conductive layer used in production of transparent conductive layered structure and method of producing the same
KR100453188B1 (ko) 1999-05-31 2004-10-15 삼성에스디아이 주식회사 콘트라스트가 향상된 음극선관 및 그 제조방법
DE60023614T2 (de) * 1999-08-26 2006-07-27 Sumitomo Metal Mining Co. Ltd. Transparente, electrisch leitende Struktur und Verfahren zu ihrer Herstellung, Beschichtungs-Fluid dafür und Anzeigevorrichtung mit dieser Struktur
JP2001131485A (ja) * 1999-10-29 2001-05-15 Sumitomo Osaka Cement Co Ltd 透明導電性膜形成用塗料及び透明導電性膜
US6486413B1 (en) * 1999-11-17 2002-11-26 Ebara Corporation Substrate coated with a conductive layer and manufacturing method thereof
JP2002083518A (ja) 1999-11-25 2002-03-22 Sumitomo Metal Mining Co Ltd 透明導電性基材とその製造方法並びにこの透明導電性基材が適用された表示装置、および透明導電層形成用塗液とその製造方法
JP2002038053A (ja) * 2000-07-25 2002-02-06 Sumitomo Metal Mining Co Ltd 透明導電層形成用塗液
JP4788852B2 (ja) * 2000-07-25 2011-10-05 住友金属鉱山株式会社 透明導電性基材とその製造方法およびこの製造方法に用いられる透明コート層形成用塗布液と透明導電性基材が適用された表示装置
WO2002011792A1 (en) 2000-08-10 2002-02-14 Novo Nordisk A/S A support for a cartridge for transferring an electronically readable information to an electronic circuit, and use of a composite material in a support
US7557149B2 (en) * 2000-08-11 2009-07-07 Ishihara Sangyo Kaisha, Ltd. Colloidal metal solution, process for producing the same, and coating material containing the same
FR2823992B1 (fr) * 2001-04-27 2003-06-20 Rhodia Chimie Sa Dispersions d'hydroxyapatite comprenant un acide amine en tant qu'agent stabilisant, et leur procede de preparation
JPWO2002094954A1 (ja) * 2001-05-21 2004-09-09 日本ペイント株式会社 金属コロイド高濃度溶液の製造方法
JP3876811B2 (ja) * 2001-11-02 2007-02-07 住友金属鉱山株式会社 透明導電層形成用塗液の製造方法
US7045534B2 (en) * 2002-02-12 2006-05-16 The Board Of Trustees Of The Leland Stanford Junior University Methods of reducing angiogenesis
JP4232480B2 (ja) * 2002-03-25 2009-03-04 住友金属鉱山株式会社 貴金属コート銀微粒子分散液の製造方法と透明導電層形成用塗布液および透明導電性基材と表示装置
JP4479161B2 (ja) * 2002-03-25 2010-06-09 住友金属鉱山株式会社 透明導電膜とこの透明導電膜形成用塗布液および透明導電性積層構造体と表示装置
US7736693B2 (en) * 2002-06-13 2010-06-15 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
US7566360B2 (en) 2002-06-13 2009-07-28 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
US7601406B2 (en) * 2002-06-13 2009-10-13 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
KR100500047B1 (ko) * 2002-06-20 2005-07-07 한국타이어 주식회사 타이어 고무 절단용 커팅장치
US6939388B2 (en) * 2002-07-23 2005-09-06 General Electric Company Method for making materials having artificially dispersed nano-size phases and articles made therewith
DE10311639A1 (de) 2003-03-14 2004-09-23 Röhm GmbH & Co. KG Antistatisch beschichteter Formkörper und Verfahren zu seiner Herstellung
ATE402688T1 (de) 2003-03-24 2008-08-15 Novo Nordisk As Transparentes elektronisches markieren eines medikamentenbehälters
JPWO2004096470A1 (ja) * 2003-04-28 2006-07-13 住友金属鉱山株式会社 銀微粒子コロイド分散液の製造方法と銀微粒子コロイド分散液および銀導電膜
US7374867B2 (en) * 2003-10-06 2008-05-20 Intel Corporation Enhancing photoresist performance using electric fields
GB2429665B (en) * 2004-03-29 2009-07-08 Nippon Paint Co Ltd Method of forming bright coating film and bright coated article
US20050237473A1 (en) * 2004-04-27 2005-10-27 Stephenson Stanley W Coatable conductive layer
JP2008527169A (ja) * 2005-01-10 2008-07-24 イシウム リサーチ デベロップメント カンパニー オブ ザ ヘブリュー ユニバーシティー オブ イエルサレム 金属ナノ粒子の水系分散物
US7531239B2 (en) * 2005-04-06 2009-05-12 Eclipse Energy Systems Inc Transparent electrode
EP1881859B1 (de) 2005-05-10 2011-01-19 Novo Nordisk A/S Injektionsvorrichtung mit optischem sensor
CN101522947A (zh) * 2005-06-10 2009-09-02 西玛耐诺技术以色列有限公司 增强的透明导电涂料及其制备方法
PL1999691T3 (pl) 2006-03-20 2011-02-28 Novo Nordisk As Bezkontaktowy odczyt kodów identyfikacyjnych wkładu
US8994382B2 (en) 2006-04-12 2015-03-31 Novo Nordisk A/S Absolute position determination of movably mounted member in medication delivery device
AU2007242758B2 (en) 2006-04-26 2012-04-05 Novo Nordisk A/S Contact free absolute position determination of a moving element in a medication delivery device
US20090135492A1 (en) * 2006-08-11 2009-05-28 Kouji Kusuda Anti-reflective film, polarizer, liquid crystal display element and display element
EP2071392A4 (de) 2006-09-28 2009-09-23 Sharp Kk Flüssigkristallanzeigeschirm und flüssigkristallanzeigevorrichtung
CN102316917B (zh) 2009-02-13 2014-09-10 诺沃—诺迪斯克有限公司 医疗设备和筒
JP5389568B2 (ja) * 2009-08-19 2014-01-15 富士フイルム株式会社 透明導電性フィルム
DE102011003977A1 (de) * 2011-02-11 2012-08-16 Itn Nanovation Ag Schutzbeschichtung insbesondere für Bauteile aus der Luft- und Raumfahrttechnik und ihre Herstellung
JP6051960B2 (ja) 2012-03-19 2016-12-27 株式会社リコー 導電性薄膜、導電性薄膜形成用塗布液、電界効果型トランジスタ、及び電界効果型トランジスタの製造方法
US9328253B2 (en) * 2013-01-22 2016-05-03 Eastman Kodak Company Method of making electrically conductive micro-wires
KR101939884B1 (ko) * 2016-12-15 2019-01-17 고려대학교 산학협력단 은 나노입자 전극 및 이의 제조방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3923612A (en) * 1974-02-25 1975-12-02 Us Energy Electroplating a gold-platinum alloy and electrolyte therefor
US4337091A (en) * 1981-03-23 1982-06-29 Hooker Chemicals & Plastics Corp. Electroless gold plating
EP0649160B1 (de) 1993-10-18 2001-09-19 Philips Electronics N.V. Verfahren zur Herstellung einer Beschichtung auf einen Bildschirm und Anzeigevorrichtung die diese enthalt
JPH07282745A (ja) 1994-04-14 1995-10-27 Colcoat Kk 陰極線管及びその製造方法
JP3302186B2 (ja) 1994-09-01 2002-07-15 触媒化成工業株式会社 透明導電性被膜付基材、その製造方法および該基材を備えた表示装置
JP3288557B2 (ja) * 1995-08-11 2002-06-04 住友大阪セメント株式会社 透明性電磁波遮蔽膜付き陰極線管
JP3697760B2 (ja) * 1995-10-20 2005-09-21 旭硝子株式会社 塗布液
JPH09286936A (ja) 1996-04-22 1997-11-04 Sumitomo Metal Mining Co Ltd 透明導電膜形成用塗布液、これを用いた透明導電膜及びその形成方法
EP0910864B1 (de) * 1997-04-28 2004-11-24 Koninklijke Philips Electronics N.V. Anzeigevorrichtung mit antistatischem, reflektionsfreiem filter und verfahren zur herstellung eines reflektionsfreien filters auf einer kathodenstrahlröhre

Also Published As

Publication number Publication date
US6482466B2 (en) 2002-11-19
US6398985B2 (en) 2002-06-04
TW432397B (en) 2001-05-01
KR100621050B1 (ko) 2006-11-30
KR19990037355A (ko) 1999-05-25
US20010032970A1 (en) 2001-10-25
US6558581B2 (en) 2003-05-06
US6261479B1 (en) 2001-07-17
EP0911859B1 (de) 2007-09-12
US20010032968A1 (en) 2001-10-25
US20010032969A1 (en) 2001-10-25
EP0911859A1 (de) 1999-04-28

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