DE69905994D1 - Positiv arbeitende Photoresist-Zusammensetzung mit chemischem Verstärkungseffekt - Google Patents
Positiv arbeitende Photoresist-Zusammensetzung mit chemischem VerstärkungseffektInfo
- Publication number
- DE69905994D1 DE69905994D1 DE69905994T DE69905994T DE69905994D1 DE 69905994 D1 DE69905994 D1 DE 69905994D1 DE 69905994 T DE69905994 T DE 69905994T DE 69905994 T DE69905994 T DE 69905994T DE 69905994 D1 DE69905994 D1 DE 69905994D1
- Authority
- DE
- Germany
- Prior art keywords
- photoresist composition
- chemical amplification
- amplification effect
- positive working
- working photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/111—Polymer of unsaturated acid or ester
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23545398A JP3638086B2 (ja) | 1998-08-21 | 1998-08-21 | ポジ型レジスト組成物及びそれを用いたレジストパターン形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69905994D1 true DE69905994D1 (de) | 2003-04-24 |
DE69905994T2 DE69905994T2 (de) | 2003-12-04 |
Family
ID=16986337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69905994T Expired - Lifetime DE69905994T2 (de) | 1998-08-21 | 1999-08-11 | Positiv arbeitende Photoresist-Zusammensetzung mit chemischem Verstärkungseffekt |
Country Status (4)
Country | Link |
---|---|
US (3) | US20020119393A1 (de) |
EP (1) | EP0985975B1 (de) |
JP (1) | JP3638086B2 (de) |
DE (1) | DE69905994T2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4694686B2 (ja) * | 2000-08-31 | 2011-06-08 | 東京応化工業株式会社 | 半導体素子製造方法 |
DE10058951A1 (de) * | 2000-11-28 | 2002-06-20 | Infineon Technologies Ag | Verfahren zur Herstellung einer Lithographiemaske für eine integrierte Schaltung |
JP3812569B2 (ja) | 2001-06-22 | 2006-08-23 | 和光純薬工業株式会社 | レジスト組成物 |
KR100944227B1 (ko) * | 2007-12-17 | 2010-02-24 | 제일모직주식회사 | 방향족 산 분해성 기를 갖는 (메타)아크릴레이트 화합물 및감광성 고분자 및 레지스트 조성물 |
US8039194B2 (en) * | 2008-01-08 | 2011-10-18 | Internatinal Business Machines Corporation | Photoacid generators for extreme ultraviolet lithography |
JP5416955B2 (ja) * | 2008-12-05 | 2014-02-12 | 富士フイルム株式会社 | 化学増幅型ポジ型レジスト組成物及びパターン形成方法 |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1447956A1 (de) * | 1965-01-02 | 1968-11-21 | Kalle Ag | Verfahren zur Herstellung einer mit einem Diazoniumsalz vorsensibilisierten Druckform |
JPS50120825A (de) * | 1974-03-08 | 1975-09-22 | ||
US5393624A (en) * | 1988-07-29 | 1995-02-28 | Tokyo Electron Limited | Method and apparatus for manufacturing a semiconductor device |
JP2930369B2 (ja) * | 1990-05-21 | 1999-08-03 | 富士写真フイルム 株式会社 | 感光性組成物 |
JPH05181281A (ja) * | 1991-11-01 | 1993-07-23 | Fuji Photo Film Co Ltd | フオトレジスト組成物及びエツチング方法 |
CA2092774A1 (en) * | 1992-04-10 | 1993-10-11 | Yuji Ueda | Positive photoresist composition |
US5550004A (en) * | 1992-05-06 | 1996-08-27 | Ocg Microelectronic Materials, Inc. | Chemically amplified radiation-sensitive composition |
KR100233367B1 (ko) * | 1993-04-15 | 1999-12-01 | 카나가와 치히로 | 레지스트 재료 |
US5744281A (en) * | 1993-09-14 | 1998-04-28 | Kabushiki Kaisha Toshiba | Resist composition for forming a pattern and method of forming a pattern wherein the composition 4-phenylpyridine as an additive |
EP0653681B1 (de) * | 1993-11-17 | 2000-09-13 | AT&T Corp. | Verfahren zur Herstellung einer Vorrichtung unter Benutzung einer lichtempfindlichen Zusammensetzung |
EP0701173B1 (de) * | 1994-09-08 | 1997-11-12 | Agfa-Gevaert N.V. | Verfahren zur Herstellung lithographischer Druckplatten mittels Bildelementen, einen lichtempfindlichen Säurespender enthaltend |
JPH0915852A (ja) * | 1995-07-03 | 1997-01-17 | Fuji Hanto Electron Technol Kk | ポジ型レジスト組成物とそれを用いた微細パターン形成方法 |
US5861231A (en) * | 1996-06-11 | 1999-01-19 | Shipley Company, L.L.C. | Copolymers and photoresist compositions comprising copolymer resin binder component |
JP3808140B2 (ja) * | 1996-09-10 | 2006-08-09 | Azエレクトロニックマテリアルズ株式会社 | 新規酸感応性基で保護されたヒドロキシスチレン重合体およびこれらを含む放射線感応性材料 |
US6187504B1 (en) * | 1996-12-19 | 2001-02-13 | Jsr Corporation | Radiation sensitive resin composition |
KR100551653B1 (ko) * | 1997-08-18 | 2006-05-25 | 제이에스알 가부시끼가이샤 | 감방사선성수지조성물 |
US6815144B2 (en) * | 1998-04-23 | 2004-11-09 | Tokyo Ohka Kogyo Co., Ltd. | Positive-working chemical-amplification photoresist composition |
JP3761322B2 (ja) * | 1998-04-23 | 2006-03-29 | 東京応化工業株式会社 | 化学増幅型ポジ型ホトレジスト |
JP3711198B2 (ja) * | 1998-04-23 | 2005-10-26 | 東京応化工業株式会社 | レジストパターンの形成方法 |
JP3662774B2 (ja) * | 1999-06-02 | 2005-06-22 | 東京応化工業株式会社 | ポジ型レジスト組成物 |
-
1998
- 1998-08-21 JP JP23545398A patent/JP3638086B2/ja not_active Expired - Fee Related
-
1999
- 1999-08-11 EP EP99306350A patent/EP0985975B1/de not_active Expired - Lifetime
- 1999-08-11 DE DE69905994T patent/DE69905994T2/de not_active Expired - Lifetime
-
2002
- 2002-04-22 US US10/126,673 patent/US20020119393A1/en not_active Abandoned
-
2003
- 2003-07-31 US US10/630,744 patent/US20040023163A1/en not_active Abandoned
-
2004
- 2004-03-29 US US10/810,902 patent/US7147984B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0985975A1 (de) | 2000-03-15 |
EP0985975B1 (de) | 2003-03-19 |
US20040191677A1 (en) | 2004-09-30 |
DE69905994T2 (de) | 2003-12-04 |
JP3638086B2 (ja) | 2005-04-13 |
US20020119393A1 (en) | 2002-08-29 |
JP2000066401A (ja) | 2000-03-03 |
US7147984B2 (en) | 2006-12-12 |
US20040023163A1 (en) | 2004-02-05 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |