DE69912119D1 - Tantal-silizium legierungen, deren produkte und verfahren zu deren herstellung - Google Patents

Tantal-silizium legierungen, deren produkte und verfahren zu deren herstellung

Info

Publication number
DE69912119D1
DE69912119D1 DE69912119T DE69912119T DE69912119D1 DE 69912119 D1 DE69912119 D1 DE 69912119D1 DE 69912119 T DE69912119 T DE 69912119T DE 69912119 T DE69912119 T DE 69912119T DE 69912119 D1 DE69912119 D1 DE 69912119D1
Authority
DE
Germany
Prior art keywords
alloy
tantalum
silicon
tensile strength
blend
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69912119T
Other languages
English (en)
Other versions
DE69912119T2 (de
Inventor
E Hubert
A Michaluk
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cabot Corp
Original Assignee
Cabot Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Application granted granted Critical
Publication of DE69912119D1 publication Critical patent/DE69912119D1/de
Publication of DE69912119T2 publication Critical patent/DE69912119T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B5/00General methods of reducing to metals
    • C22B5/02Dry methods smelting of sulfides or formation of mattes
    • C22B5/04Dry methods smelting of sulfides or formation of mattes by aluminium, other metals or silicon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22BPRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B34/00Obtaining refractory metals
    • C22B34/20Obtaining niobium, tantalum or vanadium
    • C22B34/24Obtaining niobium or tantalum
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/04Making non-ferrous alloys by powder metallurgy
    • C22C1/045Alloys based on refractory metals
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C27/00Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02Alloys based on vanadium, niobium, or tantalum
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18High-melting or refractory metals or alloys based thereon
DE69912119T 1998-05-22 1999-05-20 Tantal-silizium legierungen, deren produkte und verfahren zu deren herstellung Expired - Fee Related DE69912119T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US8638598P 1998-05-22 1998-05-22
US86385P 1998-05-22
PCT/US1999/011169 WO1999061672A1 (en) 1998-05-22 1999-05-20 Tantalum-silicon alloys and products containing the same and processes of making the same

Publications (2)

Publication Number Publication Date
DE69912119D1 true DE69912119D1 (de) 2003-11-20
DE69912119T2 DE69912119T2 (de) 2004-07-22

Family

ID=22198232

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69912119T Expired - Fee Related DE69912119T2 (de) 1998-05-22 1999-05-20 Tantal-silizium legierungen, deren produkte und verfahren zu deren herstellung

Country Status (17)

Country Link
US (2) US6576069B1 (de)
EP (1) EP1080242B1 (de)
JP (1) JP5070617B2 (de)
KR (1) KR20010025086A (de)
CN (1) CN1113972C (de)
AT (1) ATE252165T1 (de)
AU (1) AU744454B2 (de)
BR (1) BR9910664A (de)
CZ (1) CZ302590B6 (de)
DE (1) DE69912119T2 (de)
DK (1) DK1080242T3 (de)
ES (1) ES2207946T3 (de)
HU (1) HUP0102315A3 (de)
IL (1) IL139757A (de)
PT (1) PT1080242E (de)
RU (1) RU2228382C2 (de)
WO (1) WO1999061672A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6660057B1 (en) * 1999-10-01 2003-12-09 Showa Denko K.K. Powder composition for capacitor, sintered body using the composition and capacitor using the sintered body
JP2004518818A (ja) * 2001-02-12 2004-06-24 ハー ツェー シュタルク インコーポレイテッド コンデンサー陽極のためのタンタル−シリコン基体およびニオブ−シリコン基体
US7666243B2 (en) 2004-10-27 2010-02-23 H.C. Starck Inc. Fine grain niobium sheet via ingot metallurgy
US20070044873A1 (en) * 2005-08-31 2007-03-01 H. C. Starck Inc. Fine grain niobium sheet via ingot metallurgy
DE102006002342A1 (de) * 2006-01-18 2007-07-26 Kompetenzzentrum Neue Materialien Nordbayern Gmbh Werkzeug
EP2152924B1 (de) * 2007-04-27 2017-08-09 H.C. Starck Inc. Auf tantal basierende legierung, die gegenüber wässriger korrosion beständig ist
US9994929B2 (en) 2013-03-15 2018-06-12 Ati Properties Llc Processes for producing tantalum alloys and niobium alloys
RU2623959C2 (ru) * 2015-12-07 2017-06-29 Федеральное государственное бюджетное учреждение науки Институт физики прочности и материаловедения Сибирского отделения Российской академии наук (ИФПМ СО РАН) Способ получения сплава из порошков металлов с разницей температур плавления

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA883221A (en) 1971-10-12 E.I. Du Pont De Nemours And Company Metal alloy
GB190806051A (en) 1907-03-26 1908-07-16 Siemens Ag An Improved Process for Hardening Tantalum.
US3166414A (en) 1962-07-09 1965-01-19 Westinghouse Electric Corp Tantalum base alloys
US3597192A (en) 1968-12-05 1971-08-03 Atomic Energy Commission Preparation of tantalum metal
JPS539399B2 (de) 1972-12-09 1978-04-05
US4062679A (en) 1973-03-29 1977-12-13 Fansteel Inc. Embrittlement-resistant tantalum wire
US3790913A (en) 1973-04-02 1974-02-05 F Peters Thin film resistor comprising sputtered alloy of silicon and tantalum
US4073971A (en) 1973-07-31 1978-02-14 Nobuo Yasujima Process of manufacturing terminals of a heat-proof metallic thin film resistor
US3933474A (en) * 1974-03-27 1976-01-20 Norton Company Leech alloying
US4235629A (en) 1977-10-17 1980-11-25 Fansteel Inc. Method for producing an embrittlement-resistant tantalum wire
US4394352A (en) 1980-03-17 1983-07-19 Motorola, Inc. Melt recharge apparatus
US4631560A (en) 1984-12-19 1986-12-23 Eaton Corporation MOMS tunnel emission transistor
JPS61206243A (ja) 1985-03-08 1986-09-12 Mitsubishi Electric Corp 高融点金属電極・配線膜を用いた半導体装置
DE3663871D1 (en) 1985-04-11 1989-07-13 Siemens Ag Integrated semiconductor circuit having an aluminium or aluminium alloy contact conductor path and an intermediate tantalum silicide layer as a diffusion barrier
JPS62170450A (ja) * 1986-01-22 1987-07-27 Nec Corp Ta系非晶質合金及びその製造方法
DE3700659A1 (de) * 1986-01-29 1987-07-30 Fansteel Inc Feinkoerniger versproedungsfester tantaldraht
US4859257A (en) 1986-01-29 1989-08-22 Fansteel Inc. Fine grained embrittlement resistant tantalum wire
US5247198A (en) 1988-09-20 1993-09-21 Hitachi, Ltd. Semiconductor integrated circuit device with multiplayered wiring
US5286669A (en) 1989-07-06 1994-02-15 Kabushiki Kaisha Toshiba Solid-state imaging device and method of manufacturing the same
AU8077491A (en) * 1990-06-06 1991-12-31 Cabot Corporation Tantalum or niobium base alloys
DE69117443T2 (de) 1990-11-12 1996-08-08 Olle Salvador Plaxats Verfahren zum Blasformen von thermoplastischen Kunstharzen
JP2962813B2 (ja) * 1990-11-20 1999-10-12 三洋電機株式会社 水素吸蔵合金電極
KR960001611B1 (ko) 1991-03-06 1996-02-02 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 절연 게이트형 전계 효과 반도체 장치 및 그 제작방법
US5171379A (en) 1991-05-15 1992-12-15 Cabot Corporation Tantalum base alloys
US5545571A (en) 1991-08-26 1996-08-13 Semiconductor Energy Laboratory Co., Ltd. Method of making TFT with anodic oxidation process using positive and negative voltages
US5576225A (en) 1992-05-09 1996-11-19 Semiconductor Energy Laboratory Co., Ltd. Method of forming electric circuit using anodic oxidation
US5411611A (en) 1993-08-05 1995-05-02 Cabot Corporation Consumable electrode method for forming micro-alloyed products
JPH08165528A (ja) * 1994-12-09 1996-06-25 Japan Energy Corp 高純度高融点金属または合金の製造方法

Also Published As

Publication number Publication date
DE69912119T2 (de) 2004-07-22
AU4193799A (en) 1999-12-13
CN1306585A (zh) 2001-08-01
ES2207946T3 (es) 2004-06-01
PT1080242E (pt) 2004-03-31
CN1113972C (zh) 2003-07-09
CZ302590B6 (cs) 2011-07-27
IL139757A0 (en) 2002-02-10
CZ20004331A3 (cs) 2001-12-12
BR9910664A (pt) 2001-01-30
AU744454B2 (en) 2002-02-21
US20020011290A1 (en) 2002-01-31
DK1080242T3 (da) 2004-02-23
US6540851B2 (en) 2003-04-01
WO1999061672A1 (en) 1999-12-02
IL139757A (en) 2004-09-27
EP1080242B1 (de) 2003-10-15
JP2002516919A (ja) 2002-06-11
JP5070617B2 (ja) 2012-11-14
ATE252165T1 (de) 2003-11-15
EP1080242A1 (de) 2001-03-07
HUP0102315A2 (hu) 2001-11-28
US6576069B1 (en) 2003-06-10
HUP0102315A3 (en) 2002-01-28
KR20010025086A (ko) 2001-03-26
RU2228382C2 (ru) 2004-05-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee