DE69912119D1 - Tantal-silizium legierungen, deren produkte und verfahren zu deren herstellung - Google Patents
Tantal-silizium legierungen, deren produkte und verfahren zu deren herstellungInfo
- Publication number
- DE69912119D1 DE69912119D1 DE69912119T DE69912119T DE69912119D1 DE 69912119 D1 DE69912119 D1 DE 69912119D1 DE 69912119 T DE69912119 T DE 69912119T DE 69912119 T DE69912119 T DE 69912119T DE 69912119 D1 DE69912119 D1 DE 69912119D1
- Authority
- DE
- Germany
- Prior art keywords
- alloy
- tantalum
- silicon
- tensile strength
- blend
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B5/00—General methods of reducing to metals
- C22B5/02—Dry methods smelting of sulfides or formation of mattes
- C22B5/04—Dry methods smelting of sulfides or formation of mattes by aluminium, other metals or silicon
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/20—Obtaining niobium, tantalum or vanadium
- C22B34/24—Obtaining niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/02—Alloys based on vanadium, niobium, or tantalum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
- C22F1/18—High-melting or refractory metals or alloys based thereon
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US8638598P | 1998-05-22 | 1998-05-22 | |
US86385P | 1998-05-22 | ||
PCT/US1999/011169 WO1999061672A1 (en) | 1998-05-22 | 1999-05-20 | Tantalum-silicon alloys and products containing the same and processes of making the same |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69912119D1 true DE69912119D1 (de) | 2003-11-20 |
DE69912119T2 DE69912119T2 (de) | 2004-07-22 |
Family
ID=22198232
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69912119T Expired - Fee Related DE69912119T2 (de) | 1998-05-22 | 1999-05-20 | Tantal-silizium legierungen, deren produkte und verfahren zu deren herstellung |
Country Status (17)
Country | Link |
---|---|
US (2) | US6576069B1 (de) |
EP (1) | EP1080242B1 (de) |
JP (1) | JP5070617B2 (de) |
KR (1) | KR20010025086A (de) |
CN (1) | CN1113972C (de) |
AT (1) | ATE252165T1 (de) |
AU (1) | AU744454B2 (de) |
BR (1) | BR9910664A (de) |
CZ (1) | CZ302590B6 (de) |
DE (1) | DE69912119T2 (de) |
DK (1) | DK1080242T3 (de) |
ES (1) | ES2207946T3 (de) |
HU (1) | HUP0102315A3 (de) |
IL (1) | IL139757A (de) |
PT (1) | PT1080242E (de) |
RU (1) | RU2228382C2 (de) |
WO (1) | WO1999061672A1 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6660057B1 (en) * | 1999-10-01 | 2003-12-09 | Showa Denko K.K. | Powder composition for capacitor, sintered body using the composition and capacitor using the sintered body |
JP2004518818A (ja) * | 2001-02-12 | 2004-06-24 | ハー ツェー シュタルク インコーポレイテッド | コンデンサー陽極のためのタンタル−シリコン基体およびニオブ−シリコン基体 |
US7666243B2 (en) | 2004-10-27 | 2010-02-23 | H.C. Starck Inc. | Fine grain niobium sheet via ingot metallurgy |
US20070044873A1 (en) * | 2005-08-31 | 2007-03-01 | H. C. Starck Inc. | Fine grain niobium sheet via ingot metallurgy |
DE102006002342A1 (de) * | 2006-01-18 | 2007-07-26 | Kompetenzzentrum Neue Materialien Nordbayern Gmbh | Werkzeug |
EP2152924B1 (de) * | 2007-04-27 | 2017-08-09 | H.C. Starck Inc. | Auf tantal basierende legierung, die gegenüber wässriger korrosion beständig ist |
US9994929B2 (en) | 2013-03-15 | 2018-06-12 | Ati Properties Llc | Processes for producing tantalum alloys and niobium alloys |
RU2623959C2 (ru) * | 2015-12-07 | 2017-06-29 | Федеральное государственное бюджетное учреждение науки Институт физики прочности и материаловедения Сибирского отделения Российской академии наук (ИФПМ СО РАН) | Способ получения сплава из порошков металлов с разницей температур плавления |
Family Cites Families (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA883221A (en) | 1971-10-12 | E.I. Du Pont De Nemours And Company | Metal alloy | |
GB190806051A (en) | 1907-03-26 | 1908-07-16 | Siemens Ag | An Improved Process for Hardening Tantalum. |
US3166414A (en) | 1962-07-09 | 1965-01-19 | Westinghouse Electric Corp | Tantalum base alloys |
US3597192A (en) | 1968-12-05 | 1971-08-03 | Atomic Energy Commission | Preparation of tantalum metal |
JPS539399B2 (de) | 1972-12-09 | 1978-04-05 | ||
US4062679A (en) | 1973-03-29 | 1977-12-13 | Fansteel Inc. | Embrittlement-resistant tantalum wire |
US3790913A (en) | 1973-04-02 | 1974-02-05 | F Peters | Thin film resistor comprising sputtered alloy of silicon and tantalum |
US4073971A (en) | 1973-07-31 | 1978-02-14 | Nobuo Yasujima | Process of manufacturing terminals of a heat-proof metallic thin film resistor |
US3933474A (en) * | 1974-03-27 | 1976-01-20 | Norton Company | Leech alloying |
US4235629A (en) | 1977-10-17 | 1980-11-25 | Fansteel Inc. | Method for producing an embrittlement-resistant tantalum wire |
US4394352A (en) | 1980-03-17 | 1983-07-19 | Motorola, Inc. | Melt recharge apparatus |
US4631560A (en) | 1984-12-19 | 1986-12-23 | Eaton Corporation | MOMS tunnel emission transistor |
JPS61206243A (ja) | 1985-03-08 | 1986-09-12 | Mitsubishi Electric Corp | 高融点金属電極・配線膜を用いた半導体装置 |
DE3663871D1 (en) | 1985-04-11 | 1989-07-13 | Siemens Ag | Integrated semiconductor circuit having an aluminium or aluminium alloy contact conductor path and an intermediate tantalum silicide layer as a diffusion barrier |
JPS62170450A (ja) * | 1986-01-22 | 1987-07-27 | Nec Corp | Ta系非晶質合金及びその製造方法 |
DE3700659A1 (de) * | 1986-01-29 | 1987-07-30 | Fansteel Inc | Feinkoerniger versproedungsfester tantaldraht |
US4859257A (en) | 1986-01-29 | 1989-08-22 | Fansteel Inc. | Fine grained embrittlement resistant tantalum wire |
US5247198A (en) | 1988-09-20 | 1993-09-21 | Hitachi, Ltd. | Semiconductor integrated circuit device with multiplayered wiring |
US5286669A (en) | 1989-07-06 | 1994-02-15 | Kabushiki Kaisha Toshiba | Solid-state imaging device and method of manufacturing the same |
AU8077491A (en) * | 1990-06-06 | 1991-12-31 | Cabot Corporation | Tantalum or niobium base alloys |
DE69117443T2 (de) | 1990-11-12 | 1996-08-08 | Olle Salvador Plaxats | Verfahren zum Blasformen von thermoplastischen Kunstharzen |
JP2962813B2 (ja) * | 1990-11-20 | 1999-10-12 | 三洋電機株式会社 | 水素吸蔵合金電極 |
KR960001611B1 (ko) | 1991-03-06 | 1996-02-02 | 가부시끼가이샤 한도다이 에네르기 겐뀨쇼 | 절연 게이트형 전계 효과 반도체 장치 및 그 제작방법 |
US5171379A (en) | 1991-05-15 | 1992-12-15 | Cabot Corporation | Tantalum base alloys |
US5545571A (en) | 1991-08-26 | 1996-08-13 | Semiconductor Energy Laboratory Co., Ltd. | Method of making TFT with anodic oxidation process using positive and negative voltages |
US5576225A (en) | 1992-05-09 | 1996-11-19 | Semiconductor Energy Laboratory Co., Ltd. | Method of forming electric circuit using anodic oxidation |
US5411611A (en) | 1993-08-05 | 1995-05-02 | Cabot Corporation | Consumable electrode method for forming micro-alloyed products |
JPH08165528A (ja) * | 1994-12-09 | 1996-06-25 | Japan Energy Corp | 高純度高融点金属または合金の製造方法 |
-
1999
- 1999-05-19 US US09/314,506 patent/US6576069B1/en not_active Expired - Fee Related
- 1999-05-20 WO PCT/US1999/011169 patent/WO1999061672A1/en not_active Application Discontinuation
- 1999-05-20 DE DE69912119T patent/DE69912119T2/de not_active Expired - Fee Related
- 1999-05-20 AU AU41937/99A patent/AU744454B2/en not_active Ceased
- 1999-05-20 BR BR9910664-7A patent/BR9910664A/pt not_active IP Right Cessation
- 1999-05-20 PT PT99925700T patent/PT1080242E/pt unknown
- 1999-05-20 CN CN99807719A patent/CN1113972C/zh not_active Expired - Fee Related
- 1999-05-20 KR KR1020007013120A patent/KR20010025086A/ko not_active Application Discontinuation
- 1999-05-20 AT AT99925700T patent/ATE252165T1/de not_active IP Right Cessation
- 1999-05-20 DK DK99925700T patent/DK1080242T3/da active
- 1999-05-20 RU RU2000132200/02A patent/RU2228382C2/ru not_active IP Right Cessation
- 1999-05-20 JP JP2000551051A patent/JP5070617B2/ja not_active Expired - Lifetime
- 1999-05-20 CZ CZ20004331A patent/CZ302590B6/cs not_active IP Right Cessation
- 1999-05-20 EP EP99925700A patent/EP1080242B1/de not_active Expired - Lifetime
- 1999-05-20 HU HU0102315A patent/HUP0102315A3/hu unknown
- 1999-05-20 IL IL13975799A patent/IL139757A/en not_active IP Right Cessation
- 1999-05-20 ES ES99925700T patent/ES2207946T3/es not_active Expired - Lifetime
-
2001
- 2001-08-03 US US09/922,049 patent/US6540851B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69912119T2 (de) | 2004-07-22 |
AU4193799A (en) | 1999-12-13 |
CN1306585A (zh) | 2001-08-01 |
ES2207946T3 (es) | 2004-06-01 |
PT1080242E (pt) | 2004-03-31 |
CN1113972C (zh) | 2003-07-09 |
CZ302590B6 (cs) | 2011-07-27 |
IL139757A0 (en) | 2002-02-10 |
CZ20004331A3 (cs) | 2001-12-12 |
BR9910664A (pt) | 2001-01-30 |
AU744454B2 (en) | 2002-02-21 |
US20020011290A1 (en) | 2002-01-31 |
DK1080242T3 (da) | 2004-02-23 |
US6540851B2 (en) | 2003-04-01 |
WO1999061672A1 (en) | 1999-12-02 |
IL139757A (en) | 2004-09-27 |
EP1080242B1 (de) | 2003-10-15 |
JP2002516919A (ja) | 2002-06-11 |
JP5070617B2 (ja) | 2012-11-14 |
ATE252165T1 (de) | 2003-11-15 |
EP1080242A1 (de) | 2001-03-07 |
HUP0102315A2 (hu) | 2001-11-28 |
US6576069B1 (en) | 2003-06-10 |
HUP0102315A3 (en) | 2002-01-28 |
KR20010025086A (ko) | 2001-03-26 |
RU2228382C2 (ru) | 2004-05-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |