DE69929271D1 - Apparat und Verfahren zur Plasmabehandlung - Google Patents

Apparat und Verfahren zur Plasmabehandlung

Info

Publication number
DE69929271D1
DE69929271D1 DE69929271T DE69929271T DE69929271D1 DE 69929271 D1 DE69929271 D1 DE 69929271D1 DE 69929271 T DE69929271 T DE 69929271T DE 69929271 T DE69929271 T DE 69929271T DE 69929271 D1 DE69929271 D1 DE 69929271D1
Authority
DE
Germany
Prior art keywords
plasma treatment
plasma
treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69929271T
Other languages
English (en)
Other versions
DE69929271T2 (de
Inventor
Yasushi Sawada
Kosuke Nakamura
Hiroaki Kitamura
Yoshitami Inoue
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Electric Works Co Ltd
Original Assignee
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Works Ltd filed Critical Matsushita Electric Works Ltd
Application granted granted Critical
Publication of DE69929271D1 publication Critical patent/DE69929271D1/de
Publication of DE69929271T2 publication Critical patent/DE69929271T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32348—Dielectric barrier discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32559—Protection means, e.g. coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H01J37/32724—Temperature
DE69929271T 1998-10-26 1999-10-20 Apparat und Verfahren zur Plasmabehandlung Expired - Fee Related DE69929271T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP30400398 1998-10-26
JP30400398 1998-10-26

Publications (2)

Publication Number Publication Date
DE69929271D1 true DE69929271D1 (de) 2006-03-30
DE69929271T2 DE69929271T2 (de) 2006-09-21

Family

ID=17927898

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69929271T Expired - Fee Related DE69929271T2 (de) 1998-10-26 1999-10-20 Apparat und Verfahren zur Plasmabehandlung

Country Status (7)

Country Link
US (1) US6424091B1 (de)
EP (1) EP0997926B1 (de)
KR (1) KR100320574B1 (de)
CN (1) CN1141009C (de)
DE (1) DE69929271T2 (de)
HK (1) HK1026329A1 (de)
TW (1) TW518367B (de)

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JP4884180B2 (ja) * 2006-11-21 2012-02-29 東京エレクトロン株式会社 基板処理装置および基板処理方法
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JP6678232B2 (ja) * 2016-03-14 2020-04-08 株式会社Ｆｕｊｉ プラズマ発生装置
CN105929507B (zh) * 2016-06-29 2018-04-03 深圳长飞智连技术有限公司 一种具有粘接涂覆层的钢丝加强元件及其制造方法
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CN110916294A (zh) * 2018-09-19 2020-03-27 钜翁企业有限公司 一种用于处理鞋材的电浆生成器及其处理方法
CN112087854B (zh) * 2019-06-12 2024-01-23 中国石油化工股份有限公司 介质阻挡放电等离子体发生装置
CN112218418A (zh) * 2020-11-30 2021-01-12 清华大学 一种介质阻挡面放电单元以及电子设备
CN113141700B (zh) * 2021-03-16 2022-07-12 深圳大学 大气压空气均匀介质阻挡放电的电极结构和方法
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Also Published As

Publication number Publication date
HK1026329A1 (en) 2000-12-08
KR20000029287A (ko) 2000-05-25
DE69929271T2 (de) 2006-09-21
EP0997926A2 (de) 2000-05-03
TW518367B (en) 2003-01-21
KR100320574B1 (ko) 2002-01-12
CN1254250A (zh) 2000-05-24
EP0997926A3 (de) 2000-05-17
CN1141009C (zh) 2004-03-03
US6424091B1 (en) 2002-07-23
EP0997926B1 (de) 2006-01-04

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