DE69938134D1 - Spektroskopisches ellipsometer - Google Patents

Spektroskopisches ellipsometer

Info

Publication number
DE69938134D1
DE69938134D1 DE69938134T DE69938134T DE69938134D1 DE 69938134 D1 DE69938134 D1 DE 69938134D1 DE 69938134 T DE69938134 T DE 69938134T DE 69938134 T DE69938134 T DE 69938134T DE 69938134 D1 DE69938134 D1 DE 69938134D1
Authority
DE
Germany
Prior art keywords
time
ellipsometric parameters
spectrograph
imaging
disperses
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69938134T
Other languages
English (en)
Other versions
DE69938134T2 (de
Inventor
David U Fluckiger
Andrew W Kueny
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Verity Instruments Inc
Original Assignee
Verity Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Verity Instruments Inc filed Critical Verity Instruments Inc
Application granted granted Critical
Publication of DE69938134D1 publication Critical patent/DE69938134D1/de
Publication of DE69938134T2 publication Critical patent/DE69938134T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
DE69938134T 1998-07-08 1999-07-08 Spektroskopisches ellipsometer Expired - Fee Related DE69938134T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US111828 1987-10-22
US09/111,828 US6052188A (en) 1998-07-08 1998-07-08 Spectroscopic ellipsometer
PCT/US1999/015502 WO2000003228A1 (en) 1998-07-08 1999-07-08 Spectroscopic ellipsometer

Publications (2)

Publication Number Publication Date
DE69938134D1 true DE69938134D1 (de) 2008-03-27
DE69938134T2 DE69938134T2 (de) 2009-02-05

Family

ID=22340654

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69938134T Expired - Fee Related DE69938134T2 (de) 1998-07-08 1999-07-08 Spektroskopisches ellipsometer

Country Status (8)

Country Link
US (1) US6052188A (de)
EP (1) EP1095259B1 (de)
JP (1) JP3803550B2 (de)
KR (1) KR100484377B1 (de)
AT (1) ATE386261T1 (de)
AU (1) AU5314199A (de)
DE (1) DE69938134T2 (de)
WO (1) WO2000003228A1 (de)

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US7142296B2 (en) * 2000-10-30 2006-11-28 Sru Biosystems, Inc. Method and apparatus for detecting biomolecular interactions
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US6617087B1 (en) 2001-06-27 2003-09-09 Advanced Micro Devices, Inc. Use of scatterometry to measure pattern accuracy
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US7006221B2 (en) * 2001-07-13 2006-02-28 Rudolph Technologies, Inc. Metrology system with spectroscopic ellipsometer and photoacoustic measurements
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US6849151B2 (en) * 2002-08-07 2005-02-01 Michael S. Barnes Monitoring substrate processing by detecting reflectively diffracted light
US7306696B2 (en) * 2002-11-01 2007-12-11 Applied Materials, Inc. Interferometric endpoint determination in a substrate etching process
DE10324934A1 (de) * 2003-06-03 2004-12-23 Carl Zeiss Jena Gmbh Anordnung und ein Verfahren zur Erkennung von Schichten, die auf Oberflächen von Bauteilen angeordnet sind, und Bestimmung deren Eigenschaften
US7061613B1 (en) 2004-01-13 2006-06-13 Nanometrics Incorporated Polarizing beam splitter and dual detector calibration of metrology device having a spatial phase modulation
KR100574776B1 (ko) * 2004-01-15 2006-04-28 한국표준과학연구원 분광결상을 이용한 타원계측 장치 및 타원계측 방법
DE102004012125B3 (de) * 2004-03-12 2005-09-01 Nanofilm Technologie Gmbh Ellipsometrisches Messverfahren mit ROI-gestützter Bildkorrektur
DE102004012161B3 (de) * 2004-03-12 2005-11-03 Nanofilm Technologie Gmbh Abbildendes Ellipsometer mit synchronisiertem Probenvorschub und ellipsometrisches Messverfahren
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CA2667992A1 (en) * 2006-10-31 2008-05-08 Sru Biosystems, Inc. Method for blocking non-specific protein binding on a functionalized surface
JP2012008055A (ja) * 2010-06-25 2012-01-12 Olympus Corp 画像解析方法および画像解析装置
DE102010041814B4 (de) * 2010-09-30 2020-07-23 Carl Zeiss Ag Ellipsometer
KR101590241B1 (ko) * 2011-02-28 2016-01-29 고쿠리츠다이가쿠호우징 카가와다이가쿠 광학특성 측정장치 및 광학특성 측정방법
KR101614780B1 (ko) * 2011-04-21 2016-04-22 아리스토틀 유니버시티 오브 테살로니키 - 리서치 커미티 유기 전자소자 제조를 위한 인쇄 공정 중에 막 두께 및 품질을 인라인으로 측정하는 방법
JP5827507B2 (ja) * 2011-07-12 2015-12-02 国立大学法人宇都宮大学 偏光解析システム
KR20130019495A (ko) 2011-08-17 2013-02-27 한국표준과학연구원 광소자-회전형 타원계측기 및 이를 이용한 시료의 물성 측정 방법
RU2539828C1 (ru) * 2013-11-08 2015-01-27 Федеральное государственное автономное образовательное учреждение высшего профессионального образования "Национальный исследовательский технологический университет "МИСиС" Спектральный эллипсометр с устройством магнитодинамических измерений
KR101698022B1 (ko) 2015-03-13 2017-02-01 한국표준과학연구원 무색수차 광소자-회전형 타원계측기 및 이를 이용한 시편의 뮬러-행렬 측정 방법
US11262293B2 (en) * 2017-02-08 2022-03-01 Ralfy KENAZ System and method for use in high spatial resolution ellipsometry
US10690588B2 (en) * 2017-07-21 2020-06-23 Ningbo Molian Materials Technology Inc. System for measuring transport properties of materials and related method
KR102015811B1 (ko) * 2017-09-25 2019-08-29 (주)엘립소테크놀러지 분광 타원계를 이용한 표면 검사장치
KR102550690B1 (ko) 2018-05-28 2023-07-04 삼성디스플레이 주식회사 타원해석기
CN108844635B (zh) * 2018-07-04 2020-11-06 南京帕卓丽电子科技有限公司 一种用于测量空间光偏振态的方法、自动测量系统与自动测量方法
US10634607B1 (en) * 2018-10-12 2020-04-28 J.A. Woollam Co., Inc. Snapshot ellipsometer
CN111693561B (zh) * 2020-05-28 2023-02-10 复旦大学 一种纳米材料燃点测量方法及测量系统
KR20220032922A (ko) * 2020-09-08 2022-03-15 삼성전자주식회사 퓨필 타원 편광 계측 장치 및 방법, 및 그 방법을 이용한 반도체 소자 제조방법

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Also Published As

Publication number Publication date
AU5314199A (en) 2000-02-01
EP1095259B1 (de) 2008-02-13
EP1095259A1 (de) 2001-05-02
KR100484377B1 (ko) 2005-04-22
US6052188A (en) 2000-04-18
JP2002520589A (ja) 2002-07-09
DE69938134T2 (de) 2009-02-05
JP3803550B2 (ja) 2006-08-02
ATE386261T1 (de) 2008-03-15
EP1095259A4 (de) 2004-06-02
KR20010053381A (ko) 2001-06-25
WO2000003228A1 (en) 2000-01-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee