DE69940315D1 - Verfahren und vorrichtung zur analyse von topologischen merkmalen auf einer oberfläche - Google Patents

Verfahren und vorrichtung zur analyse von topologischen merkmalen auf einer oberfläche

Info

Publication number
DE69940315D1
DE69940315D1 DE69940315T DE69940315T DE69940315D1 DE 69940315 D1 DE69940315 D1 DE 69940315D1 DE 69940315 T DE69940315 T DE 69940315T DE 69940315 T DE69940315 T DE 69940315T DE 69940315 D1 DE69940315 D1 DE 69940315D1
Authority
DE
Germany
Prior art keywords
topological characteristics
analyzing topological
analyzing
topological
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69940315T
Other languages
English (en)
Inventor
Yung-Ho Chuang
Joseph J Armstrong
David L Brown
Jason Z Lin
Bin-Ming Benjamin Tsai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Application granted granted Critical
Publication of DE69940315D1 publication Critical patent/DE69940315D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
DE69940315T 1998-06-30 1999-06-10 Verfahren und vorrichtung zur analyse von topologischen merkmalen auf einer oberfläche Expired - Lifetime DE69940315D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/107,391 US6137570A (en) 1998-06-30 1998-06-30 System and method for analyzing topological features on a surface
PCT/US1999/013150 WO2000000817A1 (en) 1998-06-30 1999-06-10 A system and method for analyzing topological features on a surface

Publications (1)

Publication Number Publication Date
DE69940315D1 true DE69940315D1 (de) 2009-03-05

Family

ID=22316409

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69940315T Expired - Lifetime DE69940315D1 (de) 1998-06-30 1999-06-10 Verfahren und vorrichtung zur analyse von topologischen merkmalen auf einer oberfläche

Country Status (6)

Country Link
US (1) US6137570A (de)
EP (1) EP1092145B1 (de)
JP (1) JP3922885B2 (de)
AU (1) AU4679199A (de)
DE (1) DE69940315D1 (de)
WO (1) WO2000000817A1 (de)

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Also Published As

Publication number Publication date
JP3922885B2 (ja) 2007-05-30
EP1092145A4 (de) 2002-10-02
WO2000000817A1 (en) 2000-01-06
EP1092145A1 (de) 2001-04-18
EP1092145B1 (de) 2009-01-14
JP2002519667A (ja) 2002-07-02
US6137570A (en) 2000-10-24
AU4679199A (en) 2000-01-17

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