DE69940315D1 - Verfahren und vorrichtung zur analyse von topologischen merkmalen auf einer oberfläche - Google Patents
Verfahren und vorrichtung zur analyse von topologischen merkmalen auf einer oberflächeInfo
- Publication number
- DE69940315D1 DE69940315D1 DE69940315T DE69940315T DE69940315D1 DE 69940315 D1 DE69940315 D1 DE 69940315D1 DE 69940315 T DE69940315 T DE 69940315T DE 69940315 T DE69940315 T DE 69940315T DE 69940315 D1 DE69940315 D1 DE 69940315D1
- Authority
- DE
- Germany
- Prior art keywords
- topological characteristics
- analyzing topological
- analyzing
- topological
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N21/4788—Diffraction
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95692—Patterns showing hole parts, e.g. honeycomb filtering structures
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/107,391 US6137570A (en) | 1998-06-30 | 1998-06-30 | System and method for analyzing topological features on a surface |
PCT/US1999/013150 WO2000000817A1 (en) | 1998-06-30 | 1999-06-10 | A system and method for analyzing topological features on a surface |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69940315D1 true DE69940315D1 (de) | 2009-03-05 |
Family
ID=22316409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69940315T Expired - Lifetime DE69940315D1 (de) | 1998-06-30 | 1999-06-10 | Verfahren und vorrichtung zur analyse von topologischen merkmalen auf einer oberfläche |
Country Status (6)
Country | Link |
---|---|
US (1) | US6137570A (de) |
EP (1) | EP1092145B1 (de) |
JP (1) | JP3922885B2 (de) |
AU (1) | AU4679199A (de) |
DE (1) | DE69940315D1 (de) |
WO (1) | WO2000000817A1 (de) |
Families Citing this family (91)
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-
1999
- 1999-06-10 JP JP2000557139A patent/JP3922885B2/ja not_active Expired - Fee Related
- 1999-06-10 DE DE69940315T patent/DE69940315D1/de not_active Expired - Lifetime
- 1999-06-10 AU AU46791/99A patent/AU4679199A/en not_active Abandoned
- 1999-06-10 EP EP99930207A patent/EP1092145B1/de not_active Expired - Lifetime
- 1999-06-10 WO PCT/US1999/013150 patent/WO2000000817A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
AU4679199A (en) | 2000-01-17 |
JP2002519667A (ja) | 2002-07-02 |
EP1092145B1 (de) | 2009-01-14 |
EP1092145A4 (de) | 2002-10-02 |
JP3922885B2 (ja) | 2007-05-30 |
US6137570A (en) | 2000-10-24 |
EP1092145A1 (de) | 2001-04-18 |
WO2000000817A1 (en) | 2000-01-06 |
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