EP0558007A3 - Semiconductor apparatus having excellent contact characteristics - Google Patents
Semiconductor apparatus having excellent contact characteristics Download PDFInfo
- Publication number
- EP0558007A3 EP0558007A3 EP19930102982 EP93102982A EP0558007A3 EP 0558007 A3 EP0558007 A3 EP 0558007A3 EP 19930102982 EP19930102982 EP 19930102982 EP 93102982 A EP93102982 A EP 93102982A EP 0558007 A3 EP0558007 A3 EP 0558007A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- semiconductor apparatus
- contact characteristics
- excellent contact
- semiconductor
- contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/53204—Conductive materials
- H01L23/53209—Conductive materials based on metals, e.g. alloys, metal silicides
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP75981/92 | 1992-02-28 | ||
JP4075981A JPH05243579A (en) | 1992-02-28 | 1992-02-28 | Semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0558007A2 EP0558007A2 (en) | 1993-09-01 |
EP0558007A3 true EP0558007A3 (en) | 1993-11-03 |
EP0558007B1 EP0558007B1 (en) | 1998-10-14 |
Family
ID=13591953
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP93102982A Expired - Lifetime EP0558007B1 (en) | 1992-02-28 | 1993-02-25 | Electrical connection between a region of silicon and a film of oxide containing indium |
Country Status (4)
Country | Link |
---|---|
US (1) | US5650664A (en) |
EP (1) | EP0558007B1 (en) |
JP (1) | JPH05243579A (en) |
DE (1) | DE69321499T2 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2860869B2 (en) * | 1993-12-02 | 1999-02-24 | 株式会社半導体エネルギー研究所 | Semiconductor device and manufacturing method thereof |
JPH07221174A (en) * | 1993-12-10 | 1995-08-18 | Canon Inc | Semiconductor device and manufacturing method thereof |
JP3486993B2 (en) * | 1994-12-28 | 2004-01-13 | セイコーエプソン株式会社 | Active matrix substrate and liquid crystal display device |
US6900855B1 (en) * | 1995-10-12 | 2005-05-31 | Semiconductor Energy Laboratory Co., Ltd. | Display device having resin black matrix over counter substrate |
JPH09105953A (en) * | 1995-10-12 | 1997-04-22 | Semiconductor Energy Lab Co Ltd | Liquid crystal display device |
JP3597305B2 (en) | 1996-03-05 | 2004-12-08 | 株式会社半導体エネルギー研究所 | Liquid crystal display device and manufacturing method thereof |
JP2850850B2 (en) * | 1996-05-16 | 1999-01-27 | 日本電気株式会社 | Method for manufacturing semiconductor device |
JP3640224B2 (en) * | 1996-06-25 | 2005-04-20 | 株式会社半導体エネルギー研究所 | LCD panel |
US7298447B1 (en) * | 1996-06-25 | 2007-11-20 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display panel |
JP3856889B2 (en) | 1997-02-06 | 2006-12-13 | 株式会社半導体エネルギー研究所 | Reflective display device and electronic device |
TW531684B (en) * | 1997-03-31 | 2003-05-11 | Seiko Epson Corporatoin | Display device and method for manufacturing the same |
KR100252223B1 (en) * | 1997-08-30 | 2000-04-15 | 윤종용 | Cleaning method of contact hole of semiconductor device |
JP3362008B2 (en) * | 1999-02-23 | 2003-01-07 | シャープ株式会社 | Liquid crystal display device and manufacturing method thereof |
JP4450850B2 (en) * | 2007-09-26 | 2010-04-14 | Okiセミコンダクタ株式会社 | Manufacturing method of semiconductor device |
KR101804589B1 (en) * | 2009-12-11 | 2018-01-10 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | Semiconductor device and manufacturing method thereof |
CN106960814A (en) * | 2016-01-08 | 2017-07-18 | 中华映管股份有限公司 | The manufacture method of dot structure |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0211402A2 (en) * | 1985-08-02 | 1987-02-25 | General Electric Company | Process and structure for thin film transistor matrix addressed liquid crystal displays |
EP0313199A1 (en) * | 1987-10-15 | 1989-04-26 | Sharp Kabushiki Kaisha | Liquid crystal display device |
EP0315319A2 (en) * | 1987-11-06 | 1989-05-10 | Sharp Kabushiki Kaisha | Liquid crystal display device |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58190063A (en) * | 1982-04-30 | 1983-11-05 | Seiko Epson Corp | Thin film transistor for transmission type liquid crystal display panel |
JPS5922361A (en) * | 1982-07-28 | 1984-02-04 | Seiko Epson Corp | Semiconductor device |
JPS5940582A (en) * | 1982-08-30 | 1984-03-06 | Seiko Epson Corp | Semiconductor device |
US4646424A (en) * | 1985-08-02 | 1987-03-03 | General Electric Company | Deposition and hardening of titanium gate electrode material for use in inverted thin film field effect transistors |
JPS62250422A (en) * | 1986-04-23 | 1987-10-31 | Matsushita Electric Ind Co Ltd | Liquid crystal panel and its production |
JPH01276746A (en) * | 1988-04-28 | 1989-11-07 | Sony Corp | Formation of wiring |
JP2893686B2 (en) * | 1988-09-02 | 1999-05-24 | ソニー株式会社 | Method for manufacturing semiconductor device |
JP2756841B2 (en) * | 1989-10-13 | 1998-05-25 | 株式会社日立製作所 | Display device |
JP2940051B2 (en) * | 1990-02-09 | 1999-08-25 | 富士通株式会社 | Method of forming insulating thin film |
JPH06208132A (en) * | 1990-03-24 | 1994-07-26 | Sony Corp | Liquid crystal display device |
US5367179A (en) * | 1990-04-25 | 1994-11-22 | Casio Computer Co., Ltd. | Thin-film transistor having electrodes made of aluminum, and an active matrix panel using same |
US5402254B1 (en) * | 1990-10-17 | 1998-09-22 | Hitachi Ltd | Liquid crystal display device with tfts in which pixel electrodes are formed in the same plane as the gate electrodes with anodized oxide films before the deposition of silicon |
KR960014823B1 (en) * | 1991-03-15 | 1996-10-21 | 가부시기가이샤 히다찌세이사구쇼 | Liquid crystal display device |
-
1992
- 1992-02-28 JP JP4075981A patent/JPH05243579A/en active Pending
-
1993
- 1993-02-24 US US08/021,670 patent/US5650664A/en not_active Expired - Fee Related
- 1993-02-25 DE DE69321499T patent/DE69321499T2/en not_active Expired - Fee Related
- 1993-02-25 EP EP93102982A patent/EP0558007B1/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0211402A2 (en) * | 1985-08-02 | 1987-02-25 | General Electric Company | Process and structure for thin film transistor matrix addressed liquid crystal displays |
EP0313199A1 (en) * | 1987-10-15 | 1989-04-26 | Sharp Kabushiki Kaisha | Liquid crystal display device |
EP0315319A2 (en) * | 1987-11-06 | 1989-05-10 | Sharp Kabushiki Kaisha | Liquid crystal display device |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 16, no. 14 (E-1154)14 January 1992 & JP-A-3 234 025 ( FUJITSU LTD ) 18 October 1991 * |
Also Published As
Publication number | Publication date |
---|---|
US5650664A (en) | 1997-07-22 |
EP0558007A2 (en) | 1993-09-01 |
EP0558007B1 (en) | 1998-10-14 |
JPH05243579A (en) | 1993-09-21 |
DE69321499T2 (en) | 1999-05-06 |
DE69321499D1 (en) | 1998-11-19 |
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