EP0884753A1 - Method for making spacers for a flat panel display - Google Patents

Method for making spacers for a flat panel display Download PDF

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Publication number
EP0884753A1
EP0884753A1 EP98401420A EP98401420A EP0884753A1 EP 0884753 A1 EP0884753 A1 EP 0884753A1 EP 98401420 A EP98401420 A EP 98401420A EP 98401420 A EP98401420 A EP 98401420A EP 0884753 A1 EP0884753 A1 EP 0884753A1
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EP
European Patent Office
Prior art keywords
central core
spacers
reinforcements
pixels
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP98401420A
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German (de)
French (fr)
Inventor
Aimé Perrin
Jean-Francois Boronat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
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Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of EP0884753A1 publication Critical patent/EP0884753A1/en
Withdrawn legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/24—Manufacture or joining of vessels, leading-in conductors or bases
    • H01J9/241—Manufacture or joining of vessels, leading-in conductors or bases the vessel being for a flat panel display
    • H01J9/242—Spacers between faceplate and backplate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86—Vessels; Containers; Vacuum locks
    • H01J29/864—Spacers between faceplate and backplate of flat panel cathode ray tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J31/00—Cathode ray tubes; Electron beam tubes
    • H01J31/08—Cathode ray tubes; Electron beam tubes having a screen on or from which an image or pattern is formed, picked up, converted, or stored
    • H01J31/10—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes
    • H01J31/12—Image or pattern display tubes, i.e. having electrical input and optical output; Flying-spot tubes for scanning purposes with luminescent screen
    • H01J31/123—Flat display tubes
    • H01J31/125—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection
    • H01J31/127—Flat display tubes provided with control means permitting the electron beam to reach selected parts of the screen, e.g. digital selection using large area or array sources, i.e. essentially a source for each pixel group
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00—Electron emission display panels, e.g. field emission display panels
    • H01J2329/86—Vessels
    • H01J2329/8625—Spacing members
    • H01J2329/863—Spacing members characterised by the form or structure

Definitions

  • the present invention relates to a method of manufacturing spacers for flat screen visualization.
  • spacers can be used, especially in display devices by cathodoluminescence excited by field emission.
  • a display device by cathodoluminescence excited by field emission is shown in cross section at figure 1.
  • This screen-shaped device is limited by two glass blades 1 and 2.
  • the blade 1 supports a cathode 3 provided with emissive tips 4.
  • a layer insulator 5 is deposited on the cathode 3 presenting holes 6 in order to release the emissive points 4.
  • the insulating layer 5 is covered with a metallization 7 serving as an extraction grid for the electrons emitted by the tips 4.
  • the blade 2 supports, on its internal face, an electrode 8 acting as an anode which supports turn a layer 9 of cathodoluminescent material also called luminophore.
  • electrode 8 must be transparent and for example consists of oxide mixed of tin and indium (ITO electrode).
  • Blades 1 and 2 are held at a distance determined from each other and are separated by a space 10 in which a vacuum has been created. Of spacers 11 allow this distance to be maintained determined despite the atmospheric pressure which is exerted on the blades of the device.
  • spacers In flat screens of the emission type field, like the one shown in Figure 1, it's important to maintain a high vacuum between the two blades. Therefore, the pressure difference with the outside creates a force which tends to crush the screen.
  • spacers For screens larger than a few centimeters, the use of spacers is essential. These spacers must have certain properties. They must of course be able to resist crushing due to pressure surrounding. Their electrical resistance must be large enough to avoid strikes between electrodes located on either side of the space interior while this interior space is subject to potential differences reaching a few hundreds of volts (typically 300 V) and which will go in increasing in future applications (up to several thousand volts). The spacers must ability to withstand relatively high temperatures (of the order of 400 to 450 ° C) necessary for the sealing of devices. Finally, these spacers must be thin enough to remain invisible to a screen user.
  • the spacing between the two electrodes is around of 200 ⁇ m. This spacing is achieved by balls (as shown in Figure 1) or by glass balusters evenly distributed.
  • the distance between the two blades must be increased. This spacing can then vary between 0.5 mm and a few millimeters. In this case, the balls, which should be the same diameter, become visible by the screen user. As for the balusters, which should keep their current diameter of 25 to 50 ⁇ m, their height would make them too fragile.
  • FIG. 2 represents, in perspective view, such a source of microtip electrons.
  • a network of conductive columns 21 for supplying emissive points 22 then an insulating layer 23.
  • Des holes 24 made in the insulating layer 23 allow the microtips to be released 22.
  • the grid of electron extraction consists of a network of conductive lines 25 perpendicular to the columns 21 and provided with holes aligned with the holes 24 of the insulating layer to release the microtips 22. In appropriately feeding a line and a column, we will get an electron emission for points of the image element (or pixel) located at the crossing of this line and this column.
  • the present invention provides a solution to this problem.
  • the cutting step may include the transverse and / or longitudinal cutting of the profiled structure.
  • the substrate used is made of a material such as silicon, photosensitive glass or quartz, its machining can be carried out by etching anisotropic.
  • the machining step can be carried out that said section includes a straight central core and that the side reinforcements constitute ribs grafted onto the central core.
  • These lateral reinforcements may only be present on one side of the soul central. They can also be arranged both sides of the central core, either symmetrically by relation to the central core, either alternately along the central soul.
  • Figure 3 is a perspective view of a profiled structure 30. It was obtained by example by anisotropic etching of a substrate of silicon.
  • the substrate of initial thickness h, has been engraved so as to reduce its thickness to the value e.
  • the engraving therefore made it possible to obtain a profiled structure with cross section 32 has a straight central core 33 and reinforcements lateral 34.
  • the thickness h of the substrate, the thickness e of the central core, the width d of the ribs and their no p are provided so that section 32 can fit between the pixels of a flat screen visualization without covering them.
  • the ribs 31 are perpendicular to the core 33 for a use of spacers in an access screen matrix where the pixels are square or rectangular. For a screen where the pixels would be different shape, for example hexagonal, the inclination of the ribs relative to the central core should be planned accordingly.
  • the profiled structure 30 is then cut perpendicular to the direction of ribs 34 in strips 35 of width 1.
  • This width 1 corresponds to the desired spacing between the plates constituting a flat display screen.
  • Groups 35 can directly constitute the desired spacers or, if they are too long, be cut again parallel to the ribs 34 to provide spacers shorter length.
  • Figures 4 to 6 illustrate, in a way schematic, the arrangement of the spacers according to the invention with respect to the pixels of a screen of visualization.
  • the pixels were represented by squares 28 representing the crossing of lines and addressing columns.
  • Figures 4 to 6 correspond so to a top view of the electron source at microtips shown in perspective in Figure 2. For this reason, a single address line 21 and a single addressing column 25 was initiated in mixed line.
  • Figure 4 shows how the spacers 35 (seen in perspective in FIG. 3), of which we only see the shape of section 32, between the pixels 28 that is to say in the line spaces and intercolumns.
  • the length of the side reinforcements 34 may possibly cover several pixels.
  • Figure 5 shows how to insert, between the pixels 28, spacers whose section 42 has a central core 43 and reinforcements 44 located on one side of the central core.
  • the length of side reinforcements can possibly cover several pixels.
  • Figure 6 shows how to insert, between the pixels 28, spacers whose section 52 has a central core 53 and lateral reinforcements 54 located alternately along the central core. As before, the length of the side reinforcements can span multiple pixels.
  • the pitch P of ribs or side reinforcements is identical to the pitch pixels.
  • the pitch of the side reinforcements can also be a multiple of the pixel pitch, this pitch can moreover vary along the same spacer.

Abstract

The spacer manufacture method has transverse sections (32) formed from a central core (33) and lateral reinforcing protrusions (34). The section can be inserted between pixels without touching the pixels because of the length between protrusions and thickness of the protrusions. The decoupling of the structure (30) is obtained along the length required.

Description

La présente invention se rapporte à un procédé de fabrication d'espaceurs pour écran plat de visualisation. De tels espaceurs peuvent être utilisés, en particulier dans des dispositifs de visualisation par cathodoluminescence excitée par émission de champ.The present invention relates to a method of manufacturing spacers for flat screen visualization. Such spacers can be used, especially in display devices by cathodoluminescence excited by field emission.

Un dispositif de visualisation par cathodoluminescence excitée par émission de champ selon l'art connu est représenté en coupe transversale à la figure 1. Ce dispositif, en forme d'écran, est limité par deux lames de verre 1 et 2. La lame 1 supporte une cathode 3 pourvue de pointes émissives 4. Une couche isolante 5 est déposée sur la cathode 3 en présentant des trous 6 afin de dégager les pointes émissives 4. La couche isolante 5 est recouverte d'une métallisation 7 servant de grille d'extraction des électrons émis par les pointes 4. La lame 2 supporte, sur sa face interne, une électrode 8 jouant le rôle d'anode qui supporte à son tour une couche 9 de matériau cathodoluminescent encore appelé luminophore.A display device by cathodoluminescence excited by field emission according to known art is shown in cross section at figure 1. This screen-shaped device is limited by two glass blades 1 and 2. The blade 1 supports a cathode 3 provided with emissive tips 4. A layer insulator 5 is deposited on the cathode 3 presenting holes 6 in order to release the emissive points 4. The insulating layer 5 is covered with a metallization 7 serving as an extraction grid for the electrons emitted by the tips 4. The blade 2 supports, on its internal face, an electrode 8 acting as an anode which supports turn a layer 9 of cathodoluminescent material also called luminophore.

Si le dispositif est destiné à être regardé du côté de la lame 2, l'électrode 8 doit être transparente et est par exemple constituée d'oxyde mixte d'étain et d'indium (électrode ITO).If the device is intended to be viewed on the side of blade 2, electrode 8 must be transparent and for example consists of oxide mixed of tin and indium (ITO electrode).

Les lames 1 et 2 sont maintenues à une distance déterminée l'une de l'autre et sont séparées par un espace 10 dans lequel on a fait le vide. Des espaceurs 11 permettent de maintenir cette distance déterminée malgré la pression atmosphérique qui s'exerce sur les lames du dispositif.Blades 1 and 2 are held at a distance determined from each other and are separated by a space 10 in which a vacuum has been created. Of spacers 11 allow this distance to be maintained determined despite the atmospheric pressure which is exerted on the blades of the device.

Dans des écrans plats du type à émission de champ, comme celui représenté à la figure 1, il est important de maintenir un vide poussé entre les deux lames. De ce fait, la différence de pression avec l'extérieur crée une force qui tend à écraser l'écran. Pour des écrans dont la taille est supérieure à quelques centimètres, l'utilisation d'espaceurs est indispensable. Ces espaceurs doivent présenter certaines propriétés. Ils doivent bien sûr être capables de résister à l'écrasement dû à la pression environnante. Leur résistance électrique doit être suffisamment grande pour éviter les amorçages entre les électrodes situées de part et d'autre de l'espace intérieur alors que cet espace intérieur est soumis à des différences de potentiel atteignant quelques centaines de volts (typiquement 300 V) et qui iront en s'accroissant dans les applications futures (jusqu'à plusieurs milliers de volts). Les espaceurs doivent pouvoir supporter les températures relativement élevées (de l'ordre de 400 à 450°C) nécessaires pour le scellement des dispositifs. Enfin, ces espaceurs doivent être suffisamment fins pour rester invisibles à un utilisateur de l'écran.In flat screens of the emission type field, like the one shown in Figure 1, it's important to maintain a high vacuum between the two blades. Therefore, the pressure difference with the outside creates a force which tends to crush the screen. For screens larger than a few centimeters, the use of spacers is essential. These spacers must have certain properties. They must of course be able to resist crushing due to pressure surrounding. Their electrical resistance must be large enough to avoid strikes between electrodes located on either side of the space interior while this interior space is subject to potential differences reaching a few hundreds of volts (typically 300 V) and which will go in increasing in future applications (up to several thousand volts). The spacers must ability to withstand relatively high temperatures (of the order of 400 to 450 ° C) necessary for the sealing of devices. Finally, these spacers must be thin enough to remain invisible to a screen user.

Pour les écrans plats à émission de champ actuels, c'est-à-dire travaillant sous 300 V, l'écartement entre les deux électrodes est de l'ordre de 200 µm. Cet écartement est réalisé par des billes (comme cela est représenté sur la figure 1) ou par des colonnettes de verre réparties uniformément.For flat screens with field emission current, that is to say working at 300 V, the spacing between the two electrodes is around of 200 µm. This spacing is achieved by balls (as shown in Figure 1) or by glass balusters evenly distributed.

Pour des dispositifs destinés à travailler sous plus haute tension (quelques milliers de volts), l'écartement entre les deux lames doit être augmenté. Cet écartement peut alors varier entre 0,5 mm et quelques millimètres. Dans ce cas, les billes, qui devraient être du même diamètre, deviennent visibles par l'utilisateur de l'écran. Quant aux colonnettes, qui devraient conserver leur diamètre actuel de 25 à 50 µm, leur hauteur les rendraient trop fragiles. For devices intended for working under higher voltage (a few thousand volts), the distance between the two blades must be increased. This spacing can then vary between 0.5 mm and a few millimeters. In this case, the balls, which should be the same diameter, become visible by the screen user. As for the balusters, which should keep their current diameter of 25 to 50 µm, their height would make them too fragile.

Ce problème est encore accentué par le fait que les écrans de grande taille utilisent des sources d'électrons à micropointes à commande matricielle, ce qui laisse peu de place pour les espaceurs.This problem is further accentuated by the fact that large screens use sources matrix-controlled microtip electrons, this which leaves little room for spacers.

La figure 2 représente, vue en perspective, une telle source d'électrons à micropointes. Sur une face d'une lame de verre 20, on a déposé un réseau de colonnes conductrices 21 permettant d'alimenter des pointes émissives 22 puis une couche isolante 23. Des trous 24 pratiqués dans la couche isolante 23 permettent de dégager les micropointes 22. La grille d'extraction des électrons est constituée par un réseau de lignes conductrices 25 perpendiculaires aux colonnes 21 et pourvues de trous alignés avec les trous 24 de la couche isolante pour dégager les micropointes 22. En alimentant de manière appropriée une ligne et une colonne, on obtiendra une émission d'électrons pour les pointes de l'élément d'image (ou pixel) situé au croisement de cette ligne et de cette colonne.FIG. 2 represents, in perspective view, such a source of microtip electrons. On a face of a glass slide 20, a network of conductive columns 21 for supplying emissive points 22 then an insulating layer 23. Des holes 24 made in the insulating layer 23 allow the microtips to be released 22. The grid of electron extraction consists of a network of conductive lines 25 perpendicular to the columns 21 and provided with holes aligned with the holes 24 of the insulating layer to release the microtips 22. In appropriately feeding a line and a column, we will get an electron emission for points of the image element (or pixel) located at the crossing of this line and this column.

Pour que les espaceurs maintenant l'écartement entre les deux lames de l'écran ne soient pas gênants, il faut les placer soit dans les interlignes, soit dans les intercolonnes, soit au croisement des interlignes et des intercolonnes. Ceci impose pour les espaceurs utilisés classiquement (billes ou colonnes) un diamètre de quelques dizaines de µm typiquement 30 µm pour des écrans de haute résolution.So that the spacers now the distance between the two blades of the screen are not bothersome, they should be placed either in the spaces, either in the intercolumns, or in the intersection of interlines and intercolumns. This imposes for conventionally used spacers (balls or columns) a diameter of a few tens of µm typically 30 µm for high screens resolution.

Avec les espaceurs de l'art connu, il n'est donc pas possible d'obtenir des écrans de haute résolution fonctionnant sous tension élevée, c'est-à-dire nécessitant un écartement important entre lames.With the spacers of known art, it is not therefore not possible to get high screens resolution operating under high voltage, that is to say requiring a large spacing between blades.

La présente invention apporte une solution à ce problème. The present invention provides a solution to this problem.

Elle a pour objet uon procédé de réalisation collective d'espaceurs pour écran plat de visualisation à tension de commande élevée et divisé en éléments d'image ou pixels, caractérisé en ce qu'il comprend les étapes suivantes :

  • usinage d'un substrat, en matériau approprié à la réalisation d'espaceurs, pour obtenir une structure profilée dont la section transversale comporte une âme centrale et des renforts latéraux l'épaisseur de l'âme centrale et des renforts latéraux ainsi que la distance séparant les renforts latéraux étant telles que ladite section peut s'insérer entre les pixels de l'écran sans les recouvrir,
  • découpe de la structure profilée obtenue à l'étape précédente pour obtenir des profilés de longueur déterminée, destinés à constituer lesdits espaceurs.
It relates to a process for the collective production of spacers for flat display screen with high control voltage and divided into image elements or pixels, characterized in that it comprises the following steps:
  • machining of a substrate, made of a material suitable for producing spacers, to obtain a profiled structure whose cross section comprises a central core and lateral reinforcements the thickness of the central core and lateral reinforcements as well as the distance separating the lateral reinforcements being such that said section can be inserted between the pixels of the screen without covering them,
  • cutting of the profiled structure obtained in the previous step to obtain profiles of determined length, intended to constitute said spacers.

L'étape de découpe peut comprendre la découpe etransversale et/ou la découpe longitudinale de la structure profilée.The cutting step may include the transverse and / or longitudinal cutting of the profiled structure.

Si le substrat utilisé est en un matériau tel que le silicium, le verre photosensible ou le quartz, son usinage peut être réalisé par gravure anisotrope.If the substrate used is made of a material such as silicon, photosensitive glass or quartz, its machining can be carried out by etching anisotropic.

L'étape d'usinage peut être menée de façon que ladite section comporte une âme centrale rectiligne et que les renforts latéraux constituent des nervures greffées sur l'âme centrale.Ces renforts latéraux peuvenet n'être présents que d'un seul côté de l'âme centrale. Ils peuvent aussi être disposés des deux côtés de l'âme centrale, soit symétriquement par rapport à l'âme centrale, soit en alternance le long de l'âme centrale.The machining step can be carried out that said section includes a straight central core and that the side reinforcements constitute ribs grafted onto the central core. These lateral reinforcements may only be present on one side of the soul central. They can also be arranged both sides of the central core, either symmetrically by relation to the central core, either alternately along the central soul.

L'invention sera mieux comprise et d'autres avantages et particularités apparaítront à la lecture de la description qui va suivre, donnée à titre d'exemple non limitatif, accompagnée des dessins annexés parmi lesquels :

  • la figure 1 est une vue en coupe transversale d'un dispositif de visualisation par cathodoluminescence excitée par émission de champ selon l'art connu,
  • la figure 2 est une vue en perspective d'une source d'électrons à micropointes et à commande matricielle utilisée dans un écran de visualisation selon l'art connu,
  • la figure 3 est une vue en perspective d'une structure profilée obtenue à l'issue de l'étape d'usinage d'un substrat conformément au procédé selon la présente invention,
  • les figures 4 à 6 sont des vues représentatives de la disposition d'espaceurs, obtenus par le procédé selon la présente invention, par rapport aux pixels d'un écran de visualisation à accès matriciel.
The invention will be better understood and other advantages and features will appear on reading the description which follows, given by way of nonlimiting example, accompanied by the appended drawings among which:
  • FIG. 1 is a cross-sectional view of a display device by cathodoluminescence excited by field emission according to the prior art,
  • FIG. 2 is a perspective view of a source of microtip electrons and with matrix control used in a display screen according to the prior art,
  • FIG. 3 is a perspective view of a profiled structure obtained at the end of the step of machining a substrate in accordance with the method according to the present invention,
  • Figures 4 to 6 are representative views of the arrangement of spacers, obtained by the method according to the present invention, with respect to the pixels of a matrix access display screen.

La figure 3 est une vue en perspective d'une structure profilée 30. Elle a été obtenue par exemple par gravure anisotrope d'un substrat de silicium. Le substrat, d'épaisseur initiale h, a été gravé de façon à ramener son épaisseur à la valeur e. Des nervures 31, parallèles entre elles, ont été conservées. Elles ont une largeur d et sont régulièrement espacées au pas p.Figure 3 is a perspective view of a profiled structure 30. It was obtained by example by anisotropic etching of a substrate of silicon. The substrate, of initial thickness h, has been engraved so as to reduce its thickness to the value e. Ribs 31, parallel to each other, have been preserved. They have a width d and are regularly spaced at p.

La gravure a donc permis d'obtenir une structure profilée dont la section transversale 32 comporte une âme centrale rectiligne 33 et des renforts latéraux 34. L'épaisseur h du substrat, l'épaisseur e de l'âme centrale, la largeur d des nervures et leur pas p sont prévus pour que la section 32 puisse s'insérer entre les pixels d'un écran plat de visualisation sans les recouvrir. Sur la figure 3, les nervures 31 sont perpendiculaires à l'âme 33 pour une utilisation des espaceurs dans un écran à accès matriciel où les pixels sont de forme carrée ou rectangulaire. Pour un écran où les pixels seraient de forme différente, par exemple de forme hexagonale, l'inclinaison des nervures par rapport à l'âme centrale doit être prévue en conséquence.The engraving therefore made it possible to obtain a profiled structure with cross section 32 has a straight central core 33 and reinforcements lateral 34. The thickness h of the substrate, the thickness e of the central core, the width d of the ribs and their no p are provided so that section 32 can fit between the pixels of a flat screen visualization without covering them. In Figure 3, the ribs 31 are perpendicular to the core 33 for a use of spacers in an access screen matrix where the pixels are square or rectangular. For a screen where the pixels would be different shape, for example hexagonal, the inclination of the ribs relative to the central core should be planned accordingly.

La structure profilée 30 est ensuite découpée perpendiculairement à la direction des nervures 34 en bandes 35 de largeur 1. Cette largeur 1 correspond à l'écartement désiré entre les plaques constituant un écran plat de visualisation. Les bandes 35 peuvent constituer directement les espaceurs désirés ou, si elles sont trop longues, être redécoupées parallèlement aux nervures 34 pour donner des espaceurs de longueur plus petite.The profiled structure 30 is then cut perpendicular to the direction of ribs 34 in strips 35 of width 1. This width 1 corresponds to the desired spacing between the plates constituting a flat display screen. Groups 35 can directly constitute the desired spacers or, if they are too long, be cut again parallel to the ribs 34 to provide spacers shorter length.

Les figures 4 à 6 illustrent, de manière schématique, la disposition des espaceurs selon l'invention par rapport aux pixels d'un écran de visualisation. Les pixels ont été figurés par des carrés 28 représentant le croisement des lignes et des colonnes d'adressage. Les figures 4 à 6 correspondent donc à une vue de dessus de la source d'électrons à micropointes représentée en perspective à la figure 2. Pour cette raison, une seule ligne d'adressage 21 et une seule colonne d'adressage 25 ont été amorcées en trait mixte.Figures 4 to 6 illustrate, in a way schematic, the arrangement of the spacers according to the invention with respect to the pixels of a screen of visualization. The pixels were represented by squares 28 representing the crossing of lines and addressing columns. Figures 4 to 6 correspond so to a top view of the electron source at microtips shown in perspective in Figure 2. For this reason, a single address line 21 and a single addressing column 25 was initiated in mixed line.

La figure 4 montre comment s'insèrent les espaceurs 35 (vus en perspective sur la figure 3), dont on ne voit que la forme de la section 32, entre les pixels 28 c'est-à-dire dans les espaces interlignes et intercolonnes. La longueur des renforts latéraux 34 peut éventuellement couvrir plusieurs pixels. Figure 4 shows how the spacers 35 (seen in perspective in FIG. 3), of which we only see the shape of section 32, between the pixels 28 that is to say in the line spaces and intercolumns. The length of the side reinforcements 34 may possibly cover several pixels.

La figure 5 montre comment s'insèrent, entre les pixels 28, des espaceurs dont la section 42 comporte une âme centrale 43 et des renforts 44 situés d'un seul côté de l'âme centrale. La longueur des renforts latéraux peut éventuellement couvrir plusieurs pixels.Figure 5 shows how to insert, between the pixels 28, spacers whose section 42 has a central core 43 and reinforcements 44 located on one side of the central core. The length of side reinforcements can possibly cover several pixels.

La figure 6 montre comment s'insèrent, entre les pixels 28, des espaceurs dont la section 52 comporte une âme centrale 53 et des renforts latéraux 54 situés en alternance le long de l'âme centrale. Comme précédemment, la longueur des renforts latéraux peut couvrir plusieurs pixels.Figure 6 shows how to insert, between the pixels 28, spacers whose section 52 has a central core 53 and lateral reinforcements 54 located alternately along the central core. As before, the length of the side reinforcements can span multiple pixels.

Dans les figures 4 à 6 le pas P des nervures ou des renforts latéraux est identique au pas des pixels. Le pas des renforts latéraux peut également être un multiple du pas des pixels, ce pas pouvant d'ailleurs varier le long d'un même espaceur.In Figures 4 to 6 the pitch P of ribs or side reinforcements is identical to the pitch pixels. The pitch of the side reinforcements can also be a multiple of the pixel pitch, this pitch can moreover vary along the same spacer.

Claims (7)

Procédé de réalisation collective d'espaceurs (35) pour écran plat de visualisation à tension de commande élevée et divisé en éléments d'image ou pixels (28), caractérisé en ce qu'il comprend les étapes suivantes : usinage d'un substrat, en matériau approprié à la réalisation d'espaceurs, pour obtenir une structure profilée (30) dont la section transversale (32,42,52) comporte une âme centrale (33,43,53) et des renforts latéraux (34,44,54) l'épaisseur de l'âme centrale et des renforts latéraux ainsi que la distance séparant les renforts latéraux étant telles que ladite section peut s'insérer entre les pixels de l'écran sans les recouvrir, découpe de la structure profilée (30) obtenue à l'étape précédente pour obtenir des profilés de longueur déterminée, destinés à constituer lesdits espaceurs (35). Method for the collective production of spacers (35) for a flat display screen with a high control voltage and divided into image elements or pixels (28), characterized in that it comprises the following steps: machining of a substrate, of material suitable for the production of spacers, to obtain a profiled structure (30) whose cross section (32,42,52) comprises a central core (33,43,53) and lateral reinforcements (34,44,54) the thickness of the central core and the lateral reinforcements as well as the distance separating the lateral reinforcements being such that said section can be inserted between the pixels of the screen without covering them, cutting the profiled structure (30) obtained in the previous step to obtain profiles of determined length, intended to constitute said spacers (35). Procédé selon la revendication 1, caractérisé en ce que l'étape de découpe comprend la découpe transversale de la structure profilée (30).Method according to claim 1, characterized in that the cutting step comprises the transverse cutting of the profiled structure (30). Procédé selon la revendication 1 ou 2, caractérisé en ce que l'étape de découpe comprend la découpe longitudinale de la structure profilée (30).Method according to claim 1 or 2, characterized in that the cutting step comprises the longitudinal cutting of the profiled structure (30). Procédé selon l'une quelconque des revendications 1 à 3, caractérisé en ce que, le substrat étant en silicium, en verre photosensible ou en quartz, l'usinage du substrat est réalisé par gravure anisotrope.Method according to any one of Claims 1 to 3, characterized in that, the substrate being silicon, photosensitive glass or in quartz, the machining of the substrate is carried out by anisotropic etching. Procédé selon l'une quelconque des revendications 1 à 4, caractérisé en ce que l'étape d'usinage est menée de façon que ladite section (32,42,52) comporte une âme centrale (33,43,53) rectiligne et que les renforts latéraux constituent des nervures (34,44,54) greffées sur l'âme centrale.Method according to any one of claims 1 to 4, characterized in that the step machining is carried out so that said section (32,42,52) has a central core (33,43,53) straight and the side reinforcements are ribs (34,44,54) grafted onto the central core. Procédé selon la revendication 5, caractérisé en ce que les renforts latéraux (44) sont présents d'un seul côté de l'âme centrale (43).Method according to claim 5, characterized in that the side reinforcements (44) are present on one side of the central core (43). Procédé selon la revendication 5, caractérisé en ce- que les renforts latéraux sont disposés des deux côtés de l'âme centrale, soit symétriquement par rapport à l'âme centrale, soit en alternance le long de l'âme centrale.Method according to claim 5, characterized in that the side reinforcements are arranged on both sides of the central core, i.e. symmetrically with respect to the central core, either in alternating along the central core.
EP98401420A 1997-06-13 1998-06-11 Method for making spacers for a flat panel display Withdrawn EP0884753A1 (en)

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FR9707340 1997-06-13
FR9707340A FR2764729A1 (en) 1997-06-13 1997-06-13 METHOD OF MANUFACTURING SPACERS FOR FLAT VISUALIZATION SCREEN

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KR100403081B1 (en) * 2001-04-18 2003-10-30 엘지전자 주식회사 Cell and spacer of structure of feild display
KR100444506B1 (en) * 2001-12-27 2004-08-16 엘지전자 주식회사 Spacer in field emission display and method of forming and installing the same
US20060066235A1 (en) * 2004-09-27 2006-03-30 Brody Thomas P Receptacles for inkjet deposited PLED/OLED devices and method of making the same

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FR2764729A1 (en) 1998-12-18
JPH1116494A (en) 1999-01-22

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