EP1318524A2 - X-ray optical system and method for imaging a source - Google Patents
X-ray optical system and method for imaging a source Download PDFInfo
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- EP1318524A2 EP1318524A2 EP02026625A EP02026625A EP1318524A2 EP 1318524 A2 EP1318524 A2 EP 1318524A2 EP 02026625 A EP02026625 A EP 02026625A EP 02026625 A EP02026625 A EP 02026625A EP 1318524 A2 EP1318524 A2 EP 1318524A2
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- 230000003287 optical effect Effects 0.000 title claims description 12
- 238000003384 imaging method Methods 0.000 title claims description 6
- 230000005855 radiation Effects 0.000 claims abstract description 16
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- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
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- the invention relates to an X-ray optical system with two X-ray mirrors for imaging an X-ray source on a target area.
- the basic mode of operation of a generic arrangement comprises two in a row concave X-ray mirrors that are set up so that the reflection plane of the first mirror perpendicular to the reflection plane of the second mirror stands.
- the one falling on the first mirror at a very flat angle X-rays are focused in a coordinate direction and then fall also at a flat angle to the second mirror, where they are in the second coordinate direction perpendicular to it is focused.
- the two concave X-ray mirrors can be cylindrical, elliptical or have parabolic curvature surfaces.
- Parabolic mirrors are in particular a parallelization of the incident X-rays possible.
- the acceptance angle of typical multilayer mirrors is in the range of 1 mrad and the usual focal lengths are in the range of a few centimeters.
- the electron focus of the X-ray source varies in a linear range from 10 ⁇ m to a few millimeters.
- the acceptance range of a mirror has a smallest linear dimension in a range around a few 10 ⁇ m and is typically strip-shaped.
- the usual X-ray samples on the other hand, have linear dimensions in the range from 100 ⁇ m to a few millimeters, typically several tenths of a millimeter.
- a main problem with the generic X-ray optical systems therefore lies in the relatively low of the mirror arrangement due to the Bragg conditions reflected the intensity of the focused X-ray radiation in relation to the theoretically possible yield due to the size of the radiating area of the x-ray source and on the other hand, the "need" for X-rays due to the area size of the sample to be examined.
- the object of the invention is an X-ray optical system with the features mentioned at the outset, with as much as possible minor and simple technical modifications without problems Increase the intensity of the focused X-ray radiation on the sample enabled with constant emission power of the X-ray source.
- this task is just as surprisingly simple how effective way solved by the x-ray mirror deviating from 90 ° are arranged such that they are tilted against one another in such a way that the combined acceptance range of the x-ray mirror to the shape of the X-ray source and / or the target area is adapted.
- the above object is also achieved solved in that the X-ray mirror deviates from 90 ° with a Deviation of the tilt angle of 90 ° in amount by at least 20 °, preferably tilted between 30 ° and 85 ° against each other are arranged.
- the combined acceptance range of the both mirrors also focus on the geometric shape of the electron and / or the sample.
- the tilting of the X-ray mirror according to the invention results in a considerable gain in intensity because of the combined acceptance range compared to the case of the 90 ° arrangement known from the prior art can be enlarged considerably (as shown in the figure below) Drawing becomes clear).
- the acceptance range is not from the electron focus of the source or the Target focus of the sample moves out.
- the invention does not only show its advantages unfolded in the field of X-ray optics, but also in the field of Neutron optics and with synchrotron radiation as the source is applicable.
- the mirrors used can be flat, cylindrical, spherical, be elliptical, parabolic or hyperbolic. It can Gradient mirrors are used, in which the Layer spacing varies laterally and / or in depth. But also can also single crystals or other X-ray or neutron optical elements can be used as a mirror.
- An embodiment of the invention is particularly preferred X-ray optical system in which at least one X-ray mirror is one Has multilayer structure. This allows a particularly high intensity of the reflected radiation.
- the tilt angle is of the two x-ray mirrors fixed. You can do this in advance set optical adjustment to a specific geometry "freeze".
- the tilt angle can also be variable. This allows several different geometries to be created adjust the overall arrangement.
- the X-ray mirrors are can be snapped into different positions when tilted. On In this way, a selection of predefined ones can be made Make problem adjustments in advance, with the individual Adjustment due to the grid not much adjustment effort must become.
- the X-ray mirror can also be continuous be tiltable against each other. This allows a completely free On-line optimization tailored to the special needs entirely realize different examination arrangements.
- the invention is the deviation of the tilt angle of 90 ° amount at least 3 °, preferably at least 10 °, particularly preferably between 30 ° and 85 °.
- the arrangement is exactly two X-ray mirrors (or neutron mirrors) intended.
- the X-ray mirror a tilted Kirkpatrick-Baez arrangement, as has been common for many decades.
- the X-ray mirror can form a tilted side-by-side arrangement like you is described in US-A 6,041,099 cited above.
- the x-ray mirror can form a tilted multiple corner arrangement.
- An untilted multiple-corner arrangement is, for example, from the US-A 6,014,423 known per se.
- the condition for the deviation of the Tilt angle of 90 ° according to the further aspect discussed above the invention then applies to pairs of adjacent x-ray mirrors.
- An X-ray spectrometer also falls within the scope of the present invention or an X-ray diffractometer or an X-ray microscope, each with an X-ray optical system as described above Art.
- the invention is shown in the drawing and is based on exemplary embodiments explained in more detail.
- Fig. 1 is a cross section through an X-ray mirror A is schematic shown on the radiation from an acceptance range ⁇ x in the focus of the Mirror A hits, which comes from a X-ray source, which is usually is also arranged in this focus.
- the acceptance angle for the Useful radiation, taking into account the Bragg condition from the X-ray mirror A is reflected is denoted by ⁇ in the drawing.
- Fig. 2a is an embodiment of a very schematically Arrangement according to the invention shown, in which two X-ray mirrors A, B tilted at an angle other than 90 ° are arranged.
- the two X-ray mirrors A, B shown are intended in shown embodiment each a parabolic or elliptical Have surface, the radius of curvature of the long or short Dashed line a (for mirror A) or b (for mirror B) follows.
- the focus of the first X-ray mirror A is x
- the focus of the second X-ray mirror B is denoted by y.
- FIG. 2b shows an enlarged section from FIG. 2a, with ⁇ x den Acceptance range of the x-ray source seen from x-ray mirror A. and ⁇ y the acceptance range of the X-ray source from the X-ray mirror B designate seen from.
- the area F is the intersection of both Acceptance ranges ⁇ x and ⁇ y.
- the dashed, white ellipse S is intended in shown example a commonly occurring form of an X-ray source represent.
- FIG. 3 schematically shows the division of the effective area F as the intersection of the two acceptance ranges ⁇ x and ⁇ y of the two X-ray mirrors A, B at the location of the X-ray source.
- the resulting parallelogram has a side length b, a long diagonal d 1 and a short diagonal d 2 .
- the drawing shows the angle of deviation ⁇ with respect to a tilt of the two X-ray mirrors A, B by 90 °.
- Fig. 4 finally represents the area F shown in Fig. 3 as a function of increasing angle deviation ⁇ from the angle 90 ° provided that the two acceptance ranges ⁇ x and ⁇ y with each other are equal and standardized to 1.
Abstract
Description
Die Erfindung betrifft ein Röntgen-optisches System mit zwei Röntgen-Spiegeln zum Abbilden einer Röntgen-Quelle auf einen Zielbereich. The invention relates to an X-ray optical system with two X-ray mirrors for imaging an X-ray source on a target area.
Ein solches System bzw. Verfahren ist bekannt aus Paul Kirkpatrick and A.V.Baez, J. Opt. Soc. Am. 38, 9 (1948).Such a system or method is known from Paul Kirkpatrick and AVBaez, J. Opt. Soc. At the. 38 , 9 (1948).
Die prinzipielle Funktionsweise einer gattungsgemäßen Anordnung ist darin ausführlich beschrieben. Sie umfasst zwei hintereinander angeordnete konkave Röntgenspiegel, die so aufgestellt sind, dass die Reflexionsebene des ersten Spiegels senkrecht zur Reflexionsebene des zweiten Spiegels steht. Die in sehr flachem Winkel auf den ersten Spiegel einfallende Röntgenstrahlung wird in einer Koordinatenrichtung fokussiert und fällt dann ebenfalls unter einen flachen Winkel auf den zweiten Spiegel, wo sie in der zweiten, dazu senkrechten Koordinatenrichtung fokussiert wird. Auf diese Weise erhält man einen in zwei Koordinatenrichtungen fokussierten Röntgen-Strahl, so dass Strahldivergenzen zumindest teilweise rückgängig gemacht werden können.The basic mode of operation of a generic arrangement is therein described in detail. It comprises two in a row concave X-ray mirrors that are set up so that the reflection plane of the first mirror perpendicular to the reflection plane of the second mirror stands. The one falling on the first mirror at a very flat angle X-rays are focused in a coordinate direction and then fall also at a flat angle to the second mirror, where they are in the second coordinate direction perpendicular to it is focused. To this One obtains one that is focused in two coordinate directions X-ray beam, so that beam divergences at least partially reverse can be made.
Die beiden konkaven Röntgenspiegel können zylindrische, elliptische oder parabolische Krümmungsflächen aufweisen. Bei Verwendung von Parabolspiegeln ist insbesondere auch eine Parallelisierung der einfallenden Röntgenstrahlung möglich.The two concave X-ray mirrors can be cylindrical, elliptical or have parabolic curvature surfaces. When using Parabolic mirrors are in particular a parallelization of the incident X-rays possible.
Nachteilig bei dieser altbekannten Kirkpatrick-Baez-Anordnung ist der erheblich begrenzte Akzeptanzbereich der beiden Spiegel. Aufgrund der Notwendigkeit der Erfüllung der Bragg-Bedingung für beide Spiegel wird nur eine wesentlich kleinere Fläche (ca. 1/100) im Verhältnis zur sichtbaren, strahlenden Gesamtfläche der Röntgen-Quelle abgebildet.The disadvantage of this well-known Kirkpatrick-Baez arrangement is that considerably limited acceptance range of the two mirrors. Due to the The need to meet the Bragg condition for both mirrors will only a much smaller area (approx. 1/100) in relation to the visible, total radiating area of the X-ray source is shown.
Als Verbesserung zur Kirkpatrick-Baez-Anordnung ist in der US-A 6,041,099 ein einstückiger Spiegel mit zwei unter 90° gegeneinander angeordneten reflektierenden Oberflächen vorgeschlagen, der als "Side-by-Side"-Anordnung bezeichnet wird. Hierdurch soll die reflektierte Intensität der einfallenden Röntgen-Strahlung ungefähr verdoppelt werden, wobei die Anordnung kompakter ist als die klassische Kirkpatrick-Baez-Anordnung mit zwei hintereinander geschalteten Spiegeln.As an improvement to the Kirkpatrick-Baez arrangement is in US-A 6,041,099 a one-piece mirror with two arranged at 90 ° to each other reflective surfaces proposed as a "side-by-side" arrangement referred to as. This is intended to reflect the reflected intensity of the incident X-rays are approximately doubled, the Arrangement is more compact than the classic Kirkpatrick-Baez arrangement with two mirrors connected in series.
Die Verwendung von Multilayer-Spiegeln im Zusammenhang mit einer Kirkpatrick-Baez-Anordnung ist in einem Aufsatz von J. Underwood in der Zeitschrift Applied Optics, Vol. 25, No. 11 (1986) beschrieben.The use of multilayer mirrors in connection with a Kirkpatrick-Baez arrangement is in an essay by J. Underwood in the Applied Optics, Vol. 25, No. 11 (1986).
Um einen Eindruck der Größenordnungen bei den problembehafteten Größen zu vermitteln, sei erwähnt, dass der Akzeptanzwinkel von typischen Multilayer-Spiegeln im Bereich von 1 mrad und die üblichen Brennweiten im Bereich einiger Zentimeter liegen. Der Elektronenfokus der Röntgen-Quelle variiert in einem linearen Bereich von 10 µm bis einige Millimeter. Der Akzeptanzbereich eines Spiegels hat eine kleinste Lineardimension in einem Bereich um einige 10 µm und ist typischerweise streifenförmig. Die üblichen Röntgen-Proben andererseits haben lineare Ausdehnungen im Bereich von 100 µm bis einige Millimeter, typischerweise mehrere zehntel Millimeter.To give an impression of the order of magnitude of the problematic sizes, it should be mentioned that the acceptance angle of typical multilayer mirrors is in the range of 1 mrad and the usual focal lengths are in the range of a few centimeters. The electron focus of the X-ray source varies in a linear range from 10 µm to a few millimeters. The acceptance range of a mirror has a smallest linear dimension in a range around a few 10 µm and is typically strip-shaped. The usual X-ray samples, on the other hand, have linear dimensions in the range from 100 μm to a few millimeters, typically several tenths of a millimeter.
Ein Hauptproblem bei den gattungsgemäßen Röntgen-optischen Systemen liegt daher in der relativ niedrigen von der Spiegel-Anordnung aufgrund der Bragg-Bedingungen reflektierten Intensität der fokussierten Röntgen-Strahlung im Verhältnis einerseits zur theoretisch möglichen Ausbeute aufgrund der Größe der strahlenden Fläche der Röntgen-Quelle und andererseits des "Bedarfs" an Röntgenstrahlung aufgrund der flächenmäßigen Größe der zu untersuchenden Probe.A main problem with the generic X-ray optical systems therefore lies in the relatively low of the mirror arrangement due to the Bragg conditions reflected the intensity of the focused X-ray radiation in relation to the theoretically possible yield due to the size of the radiating area of the x-ray source and on the other hand, the "need" for X-rays due to the area size of the sample to be examined.
Aufgabe der Erfindung ist es demgegenüber, ein Röntgen-optisches System mit den eingangs genannten Merkmalen vorzustellen, das mit möglichst geringen und technischen einfachen Modifikationen problemlos eine Erhöhung der Intensität der fokussierten Röntgen-Strahlung auf der Probe bei gleichbleibender Emissionsleistung der Röntgen-Quelle ermöglicht.In contrast, the object of the invention is an X-ray optical system with the features mentioned at the outset, with as much as possible minor and simple technical modifications without problems Increase the intensity of the focused X-ray radiation on the sample enabled with constant emission power of the X-ray source.
Erfindungsgemäß wird diese Aufgabe auf ebenso überraschend einfache wie wirkungsvolle Art und Weise dadurch gelöst, dass die Röntgen-Spiegel abweichend von 90° derart gegeneinander verkippt angeordnet sind, dass der kombinierte Akzeptanzbereich der Röntgen-Spiegel an die Form der Röntgen-Quelle und/oder des Zielbereichs angepasst ist.According to the invention, this task is just as surprisingly simple how effective way solved by the x-ray mirror deviating from 90 ° are arranged such that they are tilted against one another in such a way that the combined acceptance range of the x-ray mirror to the shape of the X-ray source and / or the target area is adapted.
Dadurch wird der kombinierte Akzeptanzbereich der beiden Spiegel optimal an die geometrische Form des Elektronen-Fokus und/oder der Probe angepasst, so dass die Ausbeute an nutzbarer Röntgen-Strahlung auf de Probe deutlich erhöht wird. Dies ist dann besonders vorteilhaft, wenn die beiden Bereiche in der gleichen Größenordnung liegen.This makes the combined acceptance range of the two mirrors optimal the geometric shape of the electron focus and / or the sample adjusted so that the yield of usable X-rays on de Sample is increased significantly. This is particularly advantageous if the both areas are of the same order of magnitude.
Gemäß einem weiteren Aspekt der Erfindung wird die obige Aufgabe auch dadurch gelöst, dass die Röntgen-Spiegel abweichend von 90° mit einer Abweichung des Verkippungswinkels von 90° betragsmäßig um mindestens 20°, vorzugsweise zwischen 30° und 85° gegeneinander verkippt angeordnet sind. Hierdurch kann der kombinierte Akzeptanzbereich der beiden Spiegel ebenfalls an die geometrische Form des Elektronen-Fokus und/oder der Probe angepasst werden.According to a further aspect of the invention, the above object is also achieved solved in that the X-ray mirror deviates from 90 ° with a Deviation of the tilt angle of 90 ° in amount by at least 20 °, preferably tilted between 30 ° and 85 ° against each other are arranged. As a result, the combined acceptance range of the both mirrors also focus on the geometric shape of the electron and / or the sample.
Auch für den Fall, daß der kombinierte Akzeptanzbereich der Röntgen-Spiegel erheblich kleiner ist als der Elektronenfokus und/oder die Probe, ergibt die erfindungsgemäße Verkippung der Röntgen-Spiegel einen erheblichen Intensitätsgewinn, weil sich der kombinierte Akzeptanzbereich gegenüber dem aus dem Stand der Technik bekannten Fall der 90°-Anordnung erheblich Vergrößern läßt (wie aus der unten gezeigten Zeichnung deutlich wird). Es muss allerdings dabei beachtet werden, dass der Akzeptanzbereich nicht aus dem Elektronenfokus der Quelle oder dem Zielfokus der Probe herauswandert.Also in the event that the combined acceptance range of the X-ray mirror is considerably smaller than the electron focus and / or the sample, the tilting of the X-ray mirror according to the invention results in a considerable gain in intensity because of the combined acceptance range compared to the case of the 90 ° arrangement known from the prior art can be enlarged considerably (as shown in the figure below) Drawing becomes clear). However, it must be borne in mind that the acceptance range is not from the electron focus of the source or the Target focus of the sample moves out.
An dieser Stelle sei erwähnt, dass die Erfindung ihre Vorteile nicht nur auf dem Gebiet der Röntgen-Optik entfaltet, sondern auch im Bereich der Neutronenoptik und mit Synchrotronstrahlung als Quelle anwendbar ist.At this point it should be mentioned that the invention does not only show its advantages unfolded in the field of X-ray optics, but also in the field of Neutron optics and with synchrotron radiation as the source is applicable.
Die verwendeten Spiegel können eben, zylindrisch, kugelschalenförmig, elliptisch, parabolisch oder hyperbolisch ausgestaltet sein. Es können Gradientenspiegel (graded mirrors) verwendet werden, bei denen der Schichtabstand lateral und/oder in der Tiefe variiert. Ebenso können aber auch Einkristalle oder andere Röntgen- oder Neutronen-optische Elemente als Spiegel eingesetzt werden.The mirrors used can be flat, cylindrical, spherical, be elliptical, parabolic or hyperbolic. It can Gradient mirrors are used, in which the Layer spacing varies laterally and / or in depth. But also can also single crystals or other X-ray or neutron optical elements can be used as a mirror.
Besonders bevorzugt ist eine Ausführungsform des erfindungsgemäßen Röntgen-optischen Systems, bei der mindestens ein Röntgen-Spiegel eine Multilayer-Struktur aufweist. Damit lässt sich eine besonders hohe Intensität der reflektierten Strahlung erreichen.An embodiment of the invention is particularly preferred X-ray optical system in which at least one X-ray mirror is one Has multilayer structure. This allows a particularly high intensity of the reflected radiation.
Bei einfachen Ausführungsformen der Erfindung ist der Verkippungswinkel der beiden Röntgen-Spiegel fest gewählt. Damit lässt sich eine vorab eingestellte optische Anpassung an eine ganz bestimmte Geometrie fest "einfrieren".In simple embodiments of the invention, the tilt angle is of the two x-ray mirrors fixed. You can do this in advance set optical adjustment to a specific geometry "freeze".
Bei alternativen Ausführungsformen kann aber auch der Verkippungswinkel variierbar sein. Damit lassen sich dann mehrere verschiedene Geometrien der Gesamtanordnung einstellen.In alternative embodiments, however, the tilt angle can also be variable. This allows several different geometries to be created adjust the overall arrangement.
Bei einer Weiterbildung dieser Ausführungsform sind die Röntgen-Spiegel beim Verkippen gegeneinander in verschiedenen Stellungen einrastbar. Auf diese Weise lässt sich eine Auswahl von fest vorgegebenen Problemanpassungen vorab treffen, wobei bei der jeweiligen individuellen Einstellung aufgrund der Rasterung kein großer Justageaufwand getrieben werden muss.In a further development of this embodiment, the X-ray mirrors are can be snapped into different positions when tilted. On In this way, a selection of predefined ones can be made Make problem adjustments in advance, with the individual Adjustment due to the grid not much adjustment effort must become.
Alternativ können die Röntgen-Spiegel aber auch kontinuierlich gegeneinander verkippbar ausgestaltet sein. Damit lässt sich eine völlig freie On-line-Optimierung zugeschnitten auf die speziellen Bedürfnisse ganz unterschiedlicher Untersuchungsanordnungen verwirklichen.Alternatively, the X-ray mirror can also be continuous be tiltable against each other. This allows a completely free On-line optimization tailored to the special needs entirely realize different examination arrangements.
Generell gilt bei der erfindungsgemäßen Anordnung, dass die abgebildete Quellenfläche umso größer ist, je größer die Verkippung der beiden Röntgen-Spiegel gegeneinander ist. Bei vorteilhaften Ausführungsformen der Erfindung beträgt die Abweichung des Verkippungswinkels von 90° betragsmäßig mindestens 3°, vorzugsweise mindestens 10°, besonders bevorzugt zwischen 30° und 85°.In general, it applies to the arrangement according to the invention that the one shown Source area is larger, the greater the tilt of the two X-ray mirror is against each other. In advantageous embodiments the invention is the deviation of the tilt angle of 90 ° amount at least 3 °, preferably at least 10 °, particularly preferably between 30 ° and 85 °.
Bei einer besonders einfachen Ausführungsform der erfindungsgemäßen Anordnung sind genau zwei Röntgen-Spiegel (bzw. Neutronen-Spiegel) vorgesehen.In a particularly simple embodiment of the invention The arrangement is exactly two X-ray mirrors (or neutron mirrors) intended.
Bei einer weiteren bevorzugten Ausführungsform der Erfindung bilden die Röntgen-Spiegel eine gegeneinander verkippte Kirkpatrick-Baez Anordnung, wie sie unverkippt seit vielen Jahrzehnten üblich ist.In a further preferred embodiment of the invention, the X-ray mirror a tilted Kirkpatrick-Baez arrangement, as has been common for many decades.
In einer Weiterbildung dieser Ausführungsform können die Röntgen-Spiegel eine gegeneinander verkippte side-by-side Anordnung bilden, wie sie unverkippt in der oben zitierten US-A 6,041,099 beschrieben ist. In a further development of this embodiment, the X-ray mirror can form a tilted side-by-side arrangement like you is described in US-A 6,041,099 cited above.
Bei alternativen Ausführungsformen der Erfindung können die Röntgen-Spiegel eine gegeneinander verkippte Multiple-corner Anordnung bilden. Eine unverkippte Multiple-corner Anordnung ist beispielsweise aus der US-A 6,014,423 an sich bekannt. Die Bedingung für die Abweichung des Verkippungswinkels von 90° gemäß dem oben diskutierten weiteren Aspekt der Erfindung gilt dann jeweils für Paare benachbarter Röntgen-Spiegel.In alternative embodiments of the invention, the x-ray mirror can form a tilted multiple corner arrangement. An untilted multiple-corner arrangement is, for example, from the US-A 6,014,423 known per se. The condition for the deviation of the Tilt angle of 90 ° according to the further aspect discussed above the invention then applies to pairs of adjacent x-ray mirrors.
In den Rahmen der vorliegenden Erfindung fällt auch ein Röntgen-Spektrometer oder ein Röntgen-Diffraktometer oder ein Röntgen-Mikroskop, jeweils mit einem Röntgen-optischen System der oben beschriebenen erfindungsgemäßen Art.An X-ray spectrometer also falls within the scope of the present invention or an X-ray diffractometer or an X-ray microscope, each with an X-ray optical system as described above Art.
Weiterhin fällt in den Rahmen der vorliegenden Erfindung ein Verfahren zum Abbilden einer Strahlungsquelle für Röntgen- oder Neutronen-Strahlung auf einen Zielbereich, wobei die von der Quelle emittierte Strahlung an einem ersten Röntgen- bzw. Neutronen-Spiegel und anschließend an einem zweiten Spiegel reflektiert wird, welches sich dadurch gekennzeichnet, dass der Winkel zwischen der Ebene der ersten Reflexion und der Ebene der zweiten Reflexion derart abweichend von 90° verkippt eingestellt wird, dass der kombinierte Akzeptanzbereich der ersten und zweiten Reflexion an die Form der Strahlungs-Quelle und/oder des Zielbereichs angepasst ist.Furthermore, a method for Imaging a radiation source for X-ray or neutron radiation a target area, the radiation emitted by the source at a first X-ray or neutron mirror and then on one second mirror is reflected, which is characterized in that the angle between the plane of the first reflection and the plane of the second reflection is set so deviated from 90 ° that the combined acceptance range of the first and second reflection on the Shape of the radiation source and / or the target area is adapted.
Damit wird ebenfalls die oben genannte Erfindungsaufgabe gelöst.This also solves the above-mentioned object of the invention.
Besonders bevorzugt ist eine Variante des erfindungsgemäßen Verfahrens, bei der der Verkippungswinkel zwischen der Ebene der ersten Reflexion und der Ebene der zweiten Reflexion während einer Datenaufnahmefolge (=Scan) erneut mindestens ein weiteres Mal angepasst wird. Dadurch wird beispielsweise bei einem Scan mit Beleuchtung der Probe unter verschiedenen Winkeln eine optimale Anpassung an die Gegebenheiten bei jeder einzelnen Aufnahme des Scans durch entsprechendes Nachfahren der Winkeleinstellung ermöglicht.A variant of the method according to the invention is particularly preferred, where the tilt angle between the plane of the first reflection and the level of the second reflection during a data acquisition sequence (= Scan) is adjusted again at least one more time. This will for example during a scan with the sample illuminated under optimal adaptation to the circumstances at different angles each individual recording of the scan by correspondingly tracing the Allows angle adjustment.
Weitere Vorteile der Erfindung ergeben sich aus der Beschreibung und der Zeichnung. Ebenso können die vorstehend genannten und die noch weiter aufgeführten Merkmale erfindungsgemäß jeweils einzeln für sich oder zu mehreren in beliebigen Kombinationen Verwendung finden. Die gezeigten und beschriebenen Ausführungsformen sind nicht als abschließende Aufzählung zu verstehen, sondern haben vielmehr beispielhaften Charakter für die Schilderung der Erfindung.Further advantages of the invention result from the description and the Drawing. Likewise, the above and the others According to the invention, the features listed are each individually or individually several can be used in any combination. The shown and described embodiments are not intended to be final Understand enumeration, but rather have exemplary character for the description of the invention.
Die Erfindung ist in der Zeichnung dargestellt und wird anhand von Ausführungsbeispielen näher erläutert.The invention is shown in the drawing and is based on exemplary embodiments explained in more detail.
Im Einzelnen zeigen die Abbildungen Folgendes:
- Fig. 1
- ein Prinzipschema für den Akzeptanzbereich von Nutzstrahlung aus einer Röntgenquelle im Fokus eines Röntgen-Spiegels;
- Fig. 2a
- den schematischen Aufbau einer Ausführungsform des erfindungsgemäßen Röntgen-optischen Systems;
- Fig. 2b
- einen vergrößerten Ausschnitt der Strahlungsverhältnisse im Fokus von Fig. 2a;
- Fig. 3
- die wirksame Fläche als Schnittmenge der Akzeptanzbereiche der beiden Spiegel gemäß Fig. 2b; und
- Fig. 4
- die wirksame Fläche F als Funktion des von 90° abweichenden Verkippungswinkels β.
- Fig. 1
- a schematic diagram for the acceptance range of useful radiation from an X-ray source in the focus of an X-ray mirror;
- Fig. 2a
- the schematic structure of an embodiment of the X-ray optical system according to the invention;
- Fig. 2b
- an enlarged section of the radiation conditions in the focus of Fig. 2a;
- Fig. 3
- the effective area as the intersection of the acceptance areas of the two mirrors according to FIG. 2b; and
- Fig. 4
- the effective area F as a function of the tilt angle β deviating from 90 °.
In Fig. 1 ist schematisch ein Querschnitt durch einen Röntgen-Spiegel A dargestellt, auf den Strahlung aus einem Akzeptanzbereich Δx im Fokus des Spiegels A trifft, die von einer Röngten-Quelle stammt, welche üblicherweise ebenfalls in diesem Fokus angeordnet ist. Der Akzeptanzwinkel für die Nutzstrahlung, die unter Beachtung der Bragg-Bedingung vom Röntgen-Spiegel A reflektiert wird, ist in der Zeichnung mit α bezeichnet.In Fig. 1 is a cross section through an X-ray mirror A is schematic shown on the radiation from an acceptance range Δx in the focus of the Mirror A hits, which comes from a X-ray source, which is usually is also arranged in this focus. The acceptance angle for the Useful radiation, taking into account the Bragg condition from the X-ray mirror A is reflected is denoted by α in the drawing.
In Fig. 2a ist sehr schematisch eine Ausführungsform einer erfindungsgemäßen Anordnung dargestellt, bei der zwei Röntgen-Spiegel A, B um einen von 90° abweichenden Winkel gegeneinander verkippt angeordnet sind. Die beiden dargestellten Röntgen-Spiegel A, B sollen im gezeigten Ausführungsbeispiel jeweils eine parabolische oder elliptische Oberfläche aufweisen, deren Krümmungsradius jeweils der lang bzw. kurz gestrichelten Linie a (für Spiegel A) bzw. b (für Spiegel B) folgt. Der Fokus des ersten Röntgen-Spiegels A ist mit x, der Fokus des zweiten Röntgen-Spiegels B ist mit y bezeichnet.In Fig. 2a is an embodiment of a very schematically Arrangement according to the invention shown, in which two X-ray mirrors A, B tilted at an angle other than 90 ° are arranged. The two X-ray mirrors A, B shown are intended in shown embodiment each a parabolic or elliptical Have surface, the radius of curvature of the long or short Dashed line a (for mirror A) or b (for mirror B) follows. The focus of the first X-ray mirror A is x, the focus of the second X-ray mirror B is denoted by y.
Fig. 2b zeigt einen vergrößerten Ausschnitt aus Fig. 2a, wobei Δx den Akzeptanzbereich der Röntgen-Quelle vom Röntgen-Spiegel A aus gesehen und Δy den Akzeptanzbereich der Röntgen-Quelle vom Röntgen-Spiegel B aus gesehen bezeichnen. Die Fläche F ist die Schnittmenge beider Akzeptanzbereiche Δx und Δy. Die gestrichelte, weiße Ellipse S soll im gezeigten Beispiel eine üblicherweise auftretende Form einer Röntgen-Quelle darstellen.FIG. 2b shows an enlarged section from FIG. 2a, with Δx den Acceptance range of the x-ray source seen from x-ray mirror A. and Δy the acceptance range of the X-ray source from the X-ray mirror B designate seen from. The area F is the intersection of both Acceptance ranges Δx and Δy. The dashed, white ellipse S is intended in shown example a commonly occurring form of an X-ray source represent.
Fig. 3 zeigt schematisch die Aufteilung der wirksamen Fläche F als Schnittmenge der beiden Akzeptanzbereiche Δx und Δy der beiden Röntgen-Spiegel A, B am Ort der Röntgen-Quelle. Das sich ergebende Parallelogramm weist eine Seitenlänge b, eine lange Diagonale d1 sowie eine kurze Diagonale d2 auf. Außerdem ist in der Zeichnung der Abweichungswinkel β gegenüber einer Verkippung der beiden Röntgen-Spiegel A, B um 90° zu erkennen.3 schematically shows the division of the effective area F as the intersection of the two acceptance ranges Δx and Δy of the two X-ray mirrors A, B at the location of the X-ray source. The resulting parallelogram has a side length b, a long diagonal d 1 and a short diagonal d 2 . In addition, the drawing shows the angle of deviation β with respect to a tilt of the two X-ray mirrors A, B by 90 °.
Zwischen den in Fig. 3 gezeigten Größen gelten folgende geometrische
Beziehungen:
Fig. 4 schließlich stellt die in Fig. 3 gezeigte Fläche F als Funktion der zunehmenden Winkelabweichung β vom Winkel 90° dar. Dabei wird vorausgesetzt, dass die beiden Akzeptanzbereiche Δx und Δy untereinander gleich und auf 1 normiert sind.Fig. 4 finally represents the area F shown in Fig. 3 as a function of increasing angle deviation β from the angle 90 ° provided that the two acceptance ranges Δx and Δy with each other are equal and standardized to 1.
Claims (10)
dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) abweichend von 90° derart gegeneinander verkippt angeordnet sind, dass der kombinierte Akzeptanzbereich der Röntgen-Spiegel (A, B) an die Form der Röntgen-Quelle (S) und/oder des Zielbereichs angepasst ist.X-ray optical system with two X-ray mirrors (A, B) for imaging an X-ray source (S) on a target area,
characterized in that the X-ray mirrors (A, B) are arranged so as to be tilted relative to one another in such a way that the combined acceptance range of the X-ray mirrors (A, B) matches the shape of the X-ray source (S) and / or the Target range is adjusted.
dadurch gekennzeichnet, dass die Röntgen-Spiegel (A, B) abweichend von 90° mit einer Abweichung β des Verkippungswinkels von 90° betragsmäßig um mindestens 20°, vorzugsweise zwischen 30° und 85° gegeneinander verkippt angeordnet sind.X-ray optical system with two X-ray mirrors (A, B) for imaging an X-ray source (S) on a target area,
characterized in that the X-ray mirrors (A, B) are deviated from one another by 90 ° with a deviation β of the tilt angle of 90 ° in terms of amount by at least 20 °, preferably between 30 ° and 85 °.
dadurch gekennzeichnet, dass der Winkel zwischen der Ebene der ersten Reflexion und der Ebene der zweiten Reflexion derart abweichend von 90° verkippt eingestellt wird, dass der kombinierte Akzeptanzbereich F der ersten (Δx) und zweiten (Δy) Reflexion an die Form der Strahlungs-Quelle (S) und/oder des Zielbereichs angepasst ist.Method for imaging a radiation source (S) for X-ray or neutron radiation onto a target area, the radiation emitted by the source (S) at a first X-ray or neutron mirror (A) and then at a second mirror (B ) is reflected,
characterized in that the angle between the plane of the first reflection and the plane of the second reflection is set so as to deviate from 90 ° in such a way that the combined acceptance range F of the first (Δx) and second (Δy) reflection on the shape of the radiation source (S) and / or the target area is adjusted.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10160472 | 2001-12-08 | ||
| DE10160472A DE10160472B4 (en) | 2001-12-08 | 2001-12-08 | X-ray optical system and method for imaging a radiation source |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| EP1318524A2 true EP1318524A2 (en) | 2003-06-11 |
| EP1318524A3 EP1318524A3 (en) | 2007-07-04 |
| EP1318524B1 EP1318524B1 (en) | 2009-03-18 |
Family
ID=7708587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP02026625A Expired - Lifetime EP1318524B1 (en) | 2001-12-08 | 2002-11-29 | X-ray optical system and method for imaging a source |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6925147B2 (en) |
| EP (1) | EP1318524B1 (en) |
| DE (1) | DE10160472B4 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1791135A2 (en) | 2005-11-25 | 2007-05-30 | Axo Dresden GmbH | X-ray optical element |
| US10153062B2 (en) | 2015-06-30 | 2018-12-11 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Illumination and imaging device for high-resolution X-ray microscopy with high photon energy |
Families Citing this family (3)
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|---|---|---|---|---|
| US7280634B2 (en) * | 2003-06-13 | 2007-10-09 | Osmic, Inc. | Beam conditioning system with sequential optic |
| US7920676B2 (en) * | 2007-05-04 | 2011-04-05 | Xradia, Inc. | CD-GISAXS system and method |
| DE102010062472A1 (en) | 2010-12-06 | 2012-06-06 | Bruker Axs Gmbh | Dot-dash Converter |
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| WO1995031815A1 (en) | 1994-05-11 | 1995-11-23 | The Regents Of The University Of Colorado | Spherical mirror grazing incidence x-ray optics |
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| US5259013A (en) * | 1991-12-17 | 1993-11-02 | The United States Of America As Represented By The Secretary Of Commerce | Hard x-ray magnification apparatus and method with submicrometer spatial resolution of images in more than one dimension |
| JPH06294899A (en) * | 1993-04-09 | 1994-10-21 | Mc Sci:Kk | Curved total reflection mirror camera |
| US6167111A (en) * | 1997-07-02 | 2000-12-26 | Canon Kabushiki Kaisha | Exposure apparatus for synchrotron radiation lithography |
| US6041099A (en) * | 1998-02-19 | 2000-03-21 | Osmic, Inc. | Single corner kirkpatrick-baez beam conditioning optic assembly |
| JP3734366B2 (en) * | 1998-03-20 | 2006-01-11 | 株式会社リガク | X-ray analyzer |
| DE19833524B4 (en) * | 1998-07-25 | 2004-09-23 | Bruker Axs Gmbh | X-ray analyzer with gradient multilayer mirror |
| EP1110224A2 (en) * | 1999-01-26 | 2001-06-27 | Focused X-Rays LLC | X-ray interferometer |
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| US6606371B2 (en) * | 1999-12-20 | 2003-08-12 | Agere Systems Inc. | X-ray system |
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| WO1995031815A1 (en) | 1994-05-11 | 1995-11-23 | The Regents Of The University Of Colorado | Spherical mirror grazing incidence x-ray optics |
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| EP1791135A2 (en) | 2005-11-25 | 2007-05-30 | Axo Dresden GmbH | X-ray optical element |
| EP1791135A3 (en) * | 2005-11-25 | 2010-03-10 | Axo Dresden GmbH | X-ray optical element |
| US10153062B2 (en) | 2015-06-30 | 2018-12-11 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. | Illumination and imaging device for high-resolution X-ray microscopy with high photon energy |
Also Published As
| Publication number | Publication date |
|---|---|
| US20030108153A1 (en) | 2003-06-12 |
| EP1318524A3 (en) | 2007-07-04 |
| DE10160472A1 (en) | 2003-06-26 |
| EP1318524B1 (en) | 2009-03-18 |
| US6925147B2 (en) | 2005-08-02 |
| DE10160472B4 (en) | 2004-06-03 |
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