EP1631396A4 - Megasonic cleaning using supersaturated cleaning solution - Google Patents
Megasonic cleaning using supersaturated cleaning solutionInfo
- Publication number
- EP1631396A4 EP1631396A4 EP04776442.8A EP04776442A EP1631396A4 EP 1631396 A4 EP1631396 A4 EP 1631396A4 EP 04776442 A EP04776442 A EP 04776442A EP 1631396 A4 EP1631396 A4 EP 1631396A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- cleaning
- supersaturated
- megasonic
- solution
- cleaning solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US47760203P | 2003-06-11 | 2003-06-11 | |
PCT/US2004/018464 WO2005006396A2 (en) | 2003-06-11 | 2004-06-10 | Megasonic cleaning using supersaturated cleaning solution |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1631396A2 EP1631396A2 (en) | 2006-03-08 |
EP1631396A4 true EP1631396A4 (en) | 2013-08-14 |
Family
ID=34061915
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04776442.8A Withdrawn EP1631396A4 (en) | 2003-06-11 | 2004-06-10 | Megasonic cleaning using supersaturated cleaning solution |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1631396A4 (en) |
JP (1) | JP4643582B2 (en) |
KR (1) | KR101110905B1 (en) |
CN (1) | CN1849182A (en) |
TW (1) | TWI330552B (en) |
WO (1) | WO2005006396A2 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010108641A (en) * | 2000-05-30 | 2001-12-08 | 강병근 | Healthy beverage with radish and manufacturing method thereof |
KR20020037177A (en) * | 2000-11-13 | 2002-05-18 | 김용현 | Honey drink added radish |
KR100827618B1 (en) * | 2006-05-11 | 2008-05-07 | 한국기계연구원 | Ultrasonic device for cleaning and ultrasonic cleaning system using the same |
US7969548B2 (en) * | 2006-05-22 | 2011-06-28 | Asml Netherlands B.V. | Lithographic apparatus and lithographic apparatus cleaning method |
WO2008050832A1 (en) * | 2006-10-27 | 2008-05-02 | Tokyo Electron Limited | Substrate cleaning apparatus, substrate cleaning method, program and recording medium |
KR100748480B1 (en) * | 2007-06-27 | 2007-08-10 | 한국기계연구원 | Ultrasonic device for cleaning and ultrasonic cleaning system using the same |
JP4532580B2 (en) * | 2008-08-20 | 2010-08-25 | 株式会社カイジョー | Ultrasonic cleaning equipment |
JP4915455B2 (en) * | 2010-02-25 | 2012-04-11 | トヨタ自動車株式会社 | Degreasing system using microbubbles for large products such as vehicles |
JP2014130881A (en) * | 2012-12-28 | 2014-07-10 | Ebara Corp | Polishing device |
JP6678448B2 (en) * | 2015-12-22 | 2020-04-08 | 株式会社Screenホールディングス | Substrate cleaning method and substrate cleaning apparatus |
WO2020095091A1 (en) * | 2018-11-06 | 2020-05-14 | Arcelormittal | Equipment improving the ultrasound cleaning |
JP7233691B2 (en) | 2019-03-28 | 2023-03-07 | 株式会社エアレックス | Decontamination method for low-temperature goods and pass box used for this |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5562778A (en) * | 1993-12-17 | 1996-10-08 | International Business Machines Corporation | Ultrasonic jet semiconductor wafer cleaning method |
US20010009155A1 (en) * | 1999-12-24 | 2001-07-26 | m . FSI LTD. | Substrate treatment process and apparatus |
US6290777B1 (en) * | 1996-08-20 | 2001-09-18 | Organo Corp. | Method and device for washing electronic parts member, or the like |
WO2003033178A1 (en) * | 2001-10-18 | 2003-04-24 | The Procter & Gamble Company | Ultrasonic cleaning products comprising cleaning composition having dissolved gas |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH1022246A (en) | 1996-07-04 | 1998-01-23 | Tadahiro Omi | Cleaning method |
US5800626A (en) | 1997-02-18 | 1998-09-01 | International Business Machines Corporation | Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates |
US5849091A (en) | 1997-06-02 | 1998-12-15 | Micron Technology, Inc. | Megasonic cleaning methods and apparatus |
US6167891B1 (en) * | 1999-05-25 | 2001-01-02 | Infineon Technologies North America Corp. | Temperature controlled degassification of deionized water for megasonic cleaning of semiconductor wafers |
JP3322853B2 (en) * | 1999-08-10 | 2002-09-09 | 株式会社プレテック | Substrate drying device and cleaning device, and drying method and cleaning method |
US6684890B2 (en) | 2001-07-16 | 2004-02-03 | Verteq, Inc. | Megasonic cleaner probe system with gasified fluid |
-
2004
- 2004-06-10 EP EP04776442.8A patent/EP1631396A4/en not_active Withdrawn
- 2004-06-10 WO PCT/US2004/018464 patent/WO2005006396A2/en not_active Application Discontinuation
- 2004-06-10 KR KR1020057023902A patent/KR101110905B1/en active IP Right Grant
- 2004-06-10 JP JP2006533684A patent/JP4643582B2/en not_active Expired - Fee Related
- 2004-06-10 CN CNA2004800205237A patent/CN1849182A/en active Pending
- 2004-06-11 TW TW093116958A patent/TWI330552B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5562778A (en) * | 1993-12-17 | 1996-10-08 | International Business Machines Corporation | Ultrasonic jet semiconductor wafer cleaning method |
US6290777B1 (en) * | 1996-08-20 | 2001-09-18 | Organo Corp. | Method and device for washing electronic parts member, or the like |
US20010009155A1 (en) * | 1999-12-24 | 2001-07-26 | m . FSI LTD. | Substrate treatment process and apparatus |
WO2003033178A1 (en) * | 2001-10-18 | 2003-04-24 | The Procter & Gamble Company | Ultrasonic cleaning products comprising cleaning composition having dissolved gas |
Non-Patent Citations (1)
Title |
---|
See also references of WO2005006396A2 * |
Also Published As
Publication number | Publication date |
---|---|
TW200507954A (en) | 2005-03-01 |
WO2005006396A2 (en) | 2005-01-20 |
JP2007502032A (en) | 2007-02-01 |
CN1849182A (en) | 2006-10-18 |
TWI330552B (en) | 2010-09-21 |
EP1631396A2 (en) | 2006-03-08 |
JP4643582B2 (en) | 2011-03-02 |
KR101110905B1 (en) | 2012-02-20 |
KR20060037270A (en) | 2006-05-03 |
WO2005006396A3 (en) | 2005-09-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20051216 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL HR LT LV MK |
|
DAX | Request for extension of the european patent (deleted) | ||
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: AKRION TECHNOLOGIES, INC. |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: FRASER, BRIAN Inventor name: WU, YI Inventor name: FRANKLIN, COLE, S. |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20130715 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: H01L 21/67 20060101ALI20130709BHEP Ipc: B08B 3/12 20060101AFI20130709BHEP |
|
17Q | First examination report despatched |
Effective date: 20131024 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
INTG | Intention to grant announced |
Effective date: 20151014 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20160225 |