US20010009430A1 - Differential thermal ink jet printing mechanism - Google Patents
Differential thermal ink jet printing mechanism Download PDFInfo
- Publication number
- US20010009430A1 US20010009430A1 US09/798,416 US79841601A US2001009430A1 US 20010009430 A1 US20010009430 A1 US 20010009430A1 US 79841601 A US79841601 A US 79841601A US 2001009430 A1 US2001009430 A1 US 2001009430A1
- Authority
- US
- United States
- Prior art keywords
- nozzle
- arms
- ink
- chamber
- assembly according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007641 inkjet printing Methods 0.000 title description 14
- 230000007246 mechanism Effects 0.000 title description 4
- 230000000694 effects Effects 0.000 claims abstract description 6
- 238000010438 heat treatment Methods 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 17
- 238000004891 communication Methods 0.000 claims description 5
- 239000012530 fluid Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 230000002829 reductive effect Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 93
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 20
- 238000000429 assembly Methods 0.000 description 16
- 230000000712 assembly Effects 0.000 description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 15
- 229910052710 silicon Inorganic materials 0.000 description 15
- 239000010703 silicon Substances 0.000 description 15
- 239000004642 Polyimide Substances 0.000 description 12
- 229920001721 polyimide Polymers 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 7
- 238000010276 construction Methods 0.000 description 7
- 238000007639 printing Methods 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 238000005452 bending Methods 0.000 description 5
- 230000005499 meniscus Effects 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 238000011161 development Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000009987 spinning Methods 0.000 description 3
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 2
- 229910033181 TiB2 Inorganic materials 0.000 description 2
- 235000009508 confectionery Nutrition 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 101100269850 Caenorhabditis elegans mask-1 gene Proteins 0.000 description 1
- 229910020968 MoSi2 Inorganic materials 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000007648 laser printing Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002991 molded plastic Substances 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000000153 supplemental effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000007514 turning Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/222—Studio circuitry; Studio devices; Studio equipment
- H04N5/262—Studio circuits, e.g. for mixing, switching-over, change of character of image, other special effects ; Cameras specially adapted for the electronic generation of special effects
- H04N5/2628—Alteration of picture size, shape, position or orientation, e.g. zooming, rotation, rolling, perspective, translation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14427—Structure of ink jet print heads with thermal bend detached actuators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1635—Manufacturing processes dividing the wafer into individual chips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1637—Manufacturing processes molding
- B41J2/1639—Manufacturing processes molding sacrificial molding
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1645—Manufacturing processes thin film formation thin film formation by spincoating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1648—Production of print heads with thermal bend detached actuators
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/175—Ink supply systems ; Circuit parts therefor
- B41J2/17596—Ink pumps, ink valves
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/21—Intermediate information storage
- H04N1/2104—Intermediate information storage for one or a few pictures
- H04N1/2112—Intermediate information storage for one or a few pictures using still video cameras
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/21—Intermediate information storage
- H04N1/2104—Intermediate information storage for one or a few pictures
- H04N1/2112—Intermediate information storage for one or a few pictures using still video cameras
- H04N1/2154—Intermediate information storage for one or a few pictures using still video cameras the still video camera incorporating a hardcopy reproducing device, e.g. a printer
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/165—Preventing or detecting of nozzle clogging, e.g. cleaning, capping or moistening for nozzles
- B41J2/16585—Preventing or detecting of nozzle clogging, e.g. cleaning, capping or moistening for nozzles for paper-width or non-reciprocating print heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/015—Ink jet characterised by the jet generation process
- B41J2/04—Ink jet characterised by the jet generation process generating single droplets or particles on demand
- B41J2002/041—Electromagnetic transducer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2002/14346—Ejection by pressure produced by thermal deformation of ink chamber, e.g. buckling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14427—Structure of ink jet print heads with thermal bend detached actuators
- B41J2002/14435—Moving nozzle made of thermal bend detached actuator
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N2101/00—Still video cameras
Definitions
- the present invention relates to ink jet printing systems and, in particular, discloses a thermally actuated slotted chamber wall ink jet printer.
- Ink Jet printers themselves come in many different types.
- the utilisation of a continuous stream of ink in ink jet printing appears to date back to at least 1929 wherein U.S. Pat. No. 1,941,001 by Hansell discloses a simple form of continuous stream electrostatic ink jet printing.
- U.S. Pat. No. 3,596,275 by Sweet also discloses a process of continuous ink jet printing including the step wherein the inkjet stream is modulated by a high frequency electrostatic field so as to cause drop separation. This technique is still utilized by several manufacturers including Elmjet and Scitex (see also U.S. Pat. No.3,373,437 by Sweet et al)
- Piezoelectric ink jet printers are also one form of commonly utilized ink jet printing device. Piezoelectric systems are disclosed by Kyser et. al. in U.S. Pat. No. 3,946,398 (1970) which utilizes a diaphragm mode of operation, by Zolten in U.S. Pat. No. 3,683,212 (1970) which discloses a squeeze mode of operation of a piezoelectric crystal, by Stemme in U.S. Pat. No. 3,747,120 (1972) which discloses a bend mode of piezoelectric operation, by Howkins in U.S. Pat. No. 4,459,601 which discloses a Piezoelectric push mode actuation of the ink jet stream and by Fischbeck in U.S. Pat. No. 4,584,590 which discloses a sheer mode type of piezoelectric transducer element.
- thermal ink jet printing has become an extremely popular form of ink jet printing.
- the ink jet printing techniques include those disclosed by Endo et al in GB 2007162 (1979) and by Vaught et al in U.S. Pat. No. 4,490,728. Both the aforementioned referenced ink jet printing techniques rely upon the activation of an electrothermal actuator which results in the creation of a bubble in a constricted space, such as a nozzle, which thereby causes the ejection of ink from an aperture in communication with the confined space onto a relevant print media.
- Printing devices utilizing the electrothermal actuator are manufactured by manufacturers such as Canon and Hewlett Packard.
- a printing technology should have a number of desirable attributes. These include inexpensive construction and operation, high speed operation, safe and continuous long term operation etc. Each technology may have its own advantages and disadvantages in the areas of cost, speed, quality, reliability, power usage, simplicity of construction, operation, durability and consumables.
- an ink jet nozzle assembly including a nozzle chamber having a nozzle, the chamber including a movable portion configured for movement to effect ejection of ink from the chamber via said nozzle, and a pair of actuating arms attached to or formed integrally with the movable portion, the arms effecting movement of said movable portion as a result of one of said arms being periodically hotter than the other said arm in use.
- one of the arms can be made hotter than the other in use.
- the hotter arm could have less heat sinking than the other arm.
- the cold arm could be in cooling water, whereas the hot arm might not be in the water.
- the hotter arm might have lower mass than the colder arm.
- a greater current might be passed through one arm making it hotter than the other.
- the arm to be made hotter might have greater resistance than the other arm. More electrical power might be applied to one arm, thus making it hotter than the other, or the arm to be made hotter might have more thermal insulation applied to it.
- an ink jet nozzle assembly including: a nozzle chamber having an inlet in fluid communication with an ink reservoir and a nozzle through which ink from the chamber can be ejected;
- the chamber including a fixed portion and a movable portion configured for relative movement in an ejection phase and alternate relative movement in a refill phase;
- the inlet being positioned and dimensioned relative to the nozzle such that ink is ejected preferentially from the chamber through the nozzle in droplet form during the ejection phase, and ink is alternately drawn preferentially into the chamber from the reservoir through the inlet during the refill phase.
- the movable portion includes the nozzle and the fixed portion is mounted on a substrate.
- the fixed portion includes the nozzle mounted on a substrate and the movable portion includes an ejection paddle.
- the arms extend between the paddle and the substrate.
- the arms are located substantially within the chamber.
- the arms are located substantially outside the chamber.
- the fixed portion includes a slot a sidewall of the chamber through which the arms are connected to the paddle.
- the arms are of substantially the same cross-sectional profile relative to one another.
- the arms are of differing cross-sectional profile relative to one another.
- the arms are heated simultaneously.
- one arm is heated to a higher temperature than the other arm.
- the arms are of substantially the same material composition relative to one another.
- the arms are of substantially different material composition relative to one another.
- the arms are substantially parallel to one another.
- the arms are substantially non-parallel to one another.
- the assembly is manufactured using micro-electro-mechanical systems (MEMS) techniques.
- MEMS micro-electro-mechanical systems
- an effective volume of the chamber is reduced in said ejection phase and enlarged in said refill phase.
- FIG. 1 illustrates a perspective view of an ink jet nozzle arrangement in accordance with the preferred embodiment
- FIG. 2 illustrates the arrangement of FIG. 1 when the actuator is in an activated position
- FIG. 3 illustrates an exploded perspective view of the major components of the preferred embodiment
- FIG. 4 provides a legend of the materials indicated in FIGS. 5 to 16 ;
- FIGS. 5 to 16 illustrate sectional views of the manufacturing steps in one form of construction of an ink jet printhead nozzle
- FIG. 17 shows a three dimensional, schematic view of a nozzle assembly for an ink jet printhead in accordance with the invention
- FIGS. 18 to 20 show a three dimensional, schematic illustration of an operation of the nozzle assembly of FIG. 17;
- FIG. 21 shows a three dimensional view of a nozzle array constituting an ink jet printhead
- FIG. 22 shows, on an enlarged scale, part of the array of FIG. 21;
- FIG. 23 shows a three dimensional view of an ink jet printhead including a nozzle guard
- FIGS. 24 a to 24 r show three-dimensional views of steps in the manufacture of a nozzle assembly of an ink jet printhead
- FIGS. 25 a to 25 r show sectional side views of the manufacturing steps
- FIGS. 26 a to 26 k show layouts of masks used in various steps in the manufacturing process
- FIGS. 27 a to 27 c show three dimensional views of an operation of the nozzle assembly manufactured according to the method of FIGS. 24 and 25;
- FIGS. 28 a to 28 c show sectional side views of an operation of the nozzle assembly manufactured according to the method of FIGS. 24 and 25.
- each nozzle has a nozzle chamber having a slotted side wall through which is formed an actuator mechanism attached to a vane within the nozzle chamber such that the actuator can be activated to move the vane within the nozzle chamber to thereby cause ejection of ink from the nozzle chamber.
- FIG. 1 an example of an ink jet nozzle arrangement 1 as constructed in accordance with the preferred embodiment.
- the nozzle arrangement includes a nozzle chamber 2 normally filled with ink and an actuator mechanism 3 for actuating a vane 4 for the ejection of ink from the nozzle chamber 2 via an ink ejection port 5 .
- FIG. 1 is a perspective view of the ink jet nozzle arrangement of the preferred embodiment in its idle or quiescent position.
- FIG. 2 illustrates a perspective view after actuation of the actuator 3 .
- the actuator 3 includes two arms 6 , 7 .
- the two arms can be formed from titanium di-boride (TiB 2 ) which has a high Young's modulus and therefore provides a large degree of bending strength.
- a current is passed along the arms 6 , 7 with the arm 7 having a substantially thicker portion along most of its length.
- the arm 7 is stiff but for in the area of thinned portion 8 and hence the bending moment is concentrated in the area 8 .
- the thinned arm 6 is of a thinner form and is heated by means of resistive heating of a current passing through the arms 6 , 7 .
- the arms 6 , 7 are interconnected with electrical circuitry via connections 10 , 11 .
- the arm 6 Upon heating of the arm 6 , the arm 6 is expanded with the bending of the arm 7 being concentrated in the area 8 . This results in movement of the end of the actuator mechanism 3 which proceeds through a slot 19 in a wall of the nozzle chamber 2 . The bending further causes movement of vane 4 so as to increase the pressure of the ink within the nozzle chamber and thereby cause its subsequent ejection from ink ejection port 5 .
- the nozzle chamber 2 is refilled via an ink channel 13 (FIG. 3) formed in a wafer substrate 14 . After movement of the vane 4 , so as to cause the ejection of ink, the current to arm 6 is turned off which results in a corresponding back movement of the vane 4 .
- the ink within nozzle chamber 2 is then replenished by means of wafer ink supply channel 13 which is attached to an ink supply formed on the back of wafer 14 .
- the refill can be by means of a surface tension reduction effect of the ink within nozzle chamber 2 across ink ejection port 5 .
- FIG. 3 illustrates an exploded perspective view of the components of the ink jet nozzle arrangement.
- the preferred embodiment can be constructed utilizing semiconductor processing techniques in addition to micro machining and micro fabrication process technology (MEMS) and a full familiarity with these technologies is hereinafter assumed.
- MEMS micro machining and micro fabrication process technology
- MEMS micro-electro mechanical system
- the nozzles can preferably be constructed by constructing a large array of nozzles on a single silicon wafer at a time.
- the array of nozzles can be divided into multiple printheads, with each printhead itself having nozzles grouped into multiple colors to provide for full color image reproduction.
- the arrangement can be constructed via the utilization of a standard silicon wafer substrate 14 upon which is deposited an electrical circuitry layer 16 which can comprise a standard CMOS circuitry layer.
- the CMOS layer can include an etched portion defining pit 17 .
- a protective layer (not shown) which comprise silicon nitride or the like.
- a sacrificial material which is initially suitably etched so as to form cavities for the portion of the thermal actuator 3 and bottom portion of the vane 4 , in addition to the bottom rim of nozzle chamber 2 . These cavities can then be filled with titanium diboride.
- a similar process is used to form the glass portions of the actuator.
- a further layer of sacrificial material is deposited and suitably etched so as to form the rest of the vane 4 in addition to a portion of the nozzle chamber walls to the same height of vane 4 .
- a further sacrificial layer is deposited and etched in a suitable manner so as to form the rest of the nozzle chamber 2 .
- the top surface of the nozzle chamber is further etched so as to form the nozzle rim rounding the ejection port 5 .
- the sacrificial material is etched away so as to release the construction of the preferred embodiment. It will be readily evident to those skilled in the art that other MEMS processing steps could be utilized.
- the thermal actuator and vane portions 3 and 4 in addition to the nozzle chamber 2 are constructed from titanium di-boride.
- the utilization of titanium di-boride is standard in the construction of semiconductor systems and, in addition, its material properties, including a high Young's modulus, is utilized to advantage in the construction of the thermal actuator 3 .
- the actuator 3 is covered with a hydrophobic material, such as Teflon, so as to prevent any leaking of the liquid out of the slot 19 .
- the ink channel can be etched through the wafer utilizing a high anisotropic silicon wafer etch. This can be done as an anisotropic crystallographic silicon etch, or an anisotropic dry etch.
- a dry etch system capable of high aspect ratio deep silicon trench etching such as the Surface Technology Systems (STS) Advance Silicon Etch (ASE) system is recommended for volume production, as the chip size can be reduced over a wet etch.
- STS Surface Technology Systems
- ASE Advance Silicon Etch
- the wet etch is suitable for small volume production where a suitable plasma etch system is not available.
- ink access can be around the sides of the printhead chips.
- ink access is through the wafer higher ink flow is possible, and there is less requirement for high accuracy assembly. If ink access is around the edge of the chip, ink flow is severely limited, and the printhead chips must be carefully assembled onto ink channel chips. This latter process is difficult due to the possibility of damaging the fragile nozzle plate. If plasma etching is used, the chips can be effectively diced at the same time. Separating the chips by plasma etching allows them to be spaced as little as 35 ⁇ m apart, increasing the number of chips on a wafer.
- FIG. 5 is a key to representations of various materials in these manufacturing diagrams, and those of other cross referenced ink jet configurations.
- heater material 22 for example titanium nitride (TiN) or titanium diboride (TiB 2 ).
- a nozzle assembly in accordance with a further embodiment of the invention is designated generally by the reference numeral 110 .
- An ink jet printhead has a plurality of nozzle assemblies 110 arranged in an array 114 (FIGS. 21 and 22) on a silicon substrate 116 .
- the array 114 will be described in greater detail below.
- the assembly 110 includes a silicon substrate or wafer 116 on which a dielectric layer 118 is deposited.
- a CMOS passivation layer 120 is deposited on the dielectric layer 118 .
- Each nozzle assembly 110 includes a nozzle 122 defining a nozzle opening 124 , a connecting member in the form of a lever arm 126 and an actuator 128 .
- the lever arm 126 connects the actuator 128 to the nozzle 122 .
- the nozzle 122 comprises a crown portion 130 with a skirt portion 132 depending from the crown portion 130 .
- the skirt portion 132 forms part of a peripheral wall of a nozzle chamber 134 (FIGS. 18 to 20 of the drawings).
- the nozzle opening 124 is in fluid communication with the nozzle chamber 134 . It is to be noted that the nozzle opening 124 is surrounded by a raised rim 136 which “pins” a meniscus 138 (FIG. 18) of a body of ink 140 in the nozzle chamber 134 .
- An ink inlet aperture 142 (shown most clearly in FIG. 22 of the drawing) is defined in a floor 146 of the nozzle chamber 134 .
- the aperture 142 is in fluid communication with an ink inlet channel 148 defined through the substrate 116 .
- a wall portion 150 bounds the aperture 142 and extends upwardly from the floor portion 146 .
- the skirt portion 132 , as indicated above, of the nozzle 122 defines a first part of a peripheral wall of the nozzle chamber 134 and the wall portion 150 defines a second part of the peripheral wall of the nozzle chamber 134 .
- the wall 150 has an inwardly directed lip 152 at its free end which serves as a fluidic seal which inhibits the escape of ink when the nozzle 122 is displaced, as will be described in greater detail below. It will be appreciated that, due to the viscosity of the ink 140 and the small dimensions of the spacing between the lip 152 and the skirt portion 132 , the inwardly directed lip 152 and surface tension function as a seal for inhibiting the escape of ink from the nozzle chamber 134 .
- the actuator 128 is a thermal bend actuator and is connected to an anchor 154 extending upwardly from the substrate 116 or, more particularly, from the CMOS passivation layer 120 .
- the anchor 154 is mounted on conductive pads 156 which form an electrical connection with the actuator 128 .
- the actuator 128 comprises a first, active beam 158 arranged above a second, passive beam 160 .
- both beams 158 and 160 are of, or include, a conductive ceramic material such as titanium nitride (TiN).
- Both beams 158 and 160 have their first ends anchored to the anchor 154 and their opposed ends connected to the arm 126 .
- thermal expansion of the beam 158 results.
- the passive beam 160 through which there is no current flow, does not expand at the same rate, a bending moment is created causing the arm 126 and, hence, the nozzle 122 to be displaced downwardly towards the substrate 116 as shown in FIG. 19 of the drawings. This causes an ejection of ink through the nozzle opening 124 as shown at 162 in FIG. 19 of the drawings.
- the source of heat is removed from the active beam 158 , i.e.
- the nozzle 122 returns to its quiescent position as shown in FIG. 20 of the drawings.
- an ink droplet 164 is formed as a result of the breaking of an ink droplet neck as illustrated at 166 in FIG. 20 of the drawings.
- the ink droplet 164 then travels on to the print media such as a sheet of paper.
- a “negative” meniscus is formed as shown at 168 in FIG. 20 of the drawings.
- This “negative” meniscus 168 results in an inflow of ink 140 into the nozzle chamber 134 such that a new meniscus 138 (FIG. 18) is formed in readiness for the next ink drop ejection from the nozzle assembly 110 .
- the array 114 is for a four color printhead. Accordingly, the array 114 includes four groups 170 of nozzle assemblies, one for each color. Each group 170 has its nozzle assemblies 110 arranged in two rows 172 and 174 . One of the groups 170 is shown in greater detail in FIG. 22 of the drawings.
- each nozzle assembly 110 in the row 174 is offset or staggered with respect to the nozzle assemblies 110 in the row 172 . Also, the nozzle assemblies 110 in the row 172 are spaced apart sufficiently far from each other to enable the lever arms 126 of the nozzle assemblies 110 in the row 174 to pass between adjacent nozzles 122 of the assemblies 110 in the row 172 . It is to be noted that each nozzle assembly 110 is substantially dumbbell shaped so that the nozzles 122 in the row 172 nest between the nozzles 122 and the actuators 128 of adjacent nozzle assemblies 110 in the row 174 .
- each nozzle 122 is substantially hexagonally shaped.
- the substrate 116 has bond pads 176 arranged thereon which provide the electrical connections, via the pads 156 , to the actuators 128 of the nozzle assemblies 110 . These electrical connections are formed via the CMOS layer (not shown).
- FIG. 23 of the drawings a development of the invention is shown. With reference to the previous drawings, like reference numerals refer to like parts, unless otherwise specified.
- a nozzle guard 180 is mounted on the substrate 116 of the array 114 .
- the nozzle guard 180 includes a body member 182 having a plurality of passages 184 defined therethrough.
- the passages 184 are in register with the nozzle openings 124 of the nozzle assemblies 110 of the array 114 such that, when ink is ejected from any one of the nozzle openings 124 , the ink passes through the associated passage 184 before striking the print media.
- the body member 182 is mounted in spaced relationship relative to the nozzle assemblies 110 by limbs or struts 186 .
- One of the struts 186 has air inlet openings 188 defined therein.
- the ink is not entrained in the air as the air is charged through the passages 184 at a different velocity from that of the ink droplets 164 .
- the ink droplets 164 are ejected from the nozzles 122 at a velocity of approximately 3 m/s.
- the air is charged through the passages 184 at a velocity of approximately 1 m/s.
- FIGS. 24 to 26 of the drawings a process for manufacturing the nozzle assemblies 110 is described.
- the dielectric layer 118 is deposited on a surface of the wafer 116 .
- the dielectric layer 118 is in the form of approximately 1.5 microns of CVD oxide. Resist is spun on to the layer 118 and the layer 118 is exposed to mask 200 and is subsequently developed.
- the layer 118 is plasma etched down to the silicon layer 116 .
- the resist is then stripped and the layer 118 is cleaned. This step defines the ink inlet aperture 142 .
- approximately 0.8 microns of aluminum 202 is deposited on the layer 118 .
- Resist is spun on and the aluminum 202 is exposed to mask 204 and developed.
- the aluminum 202 is plasma etched down to the oxide layer 118 , the resist is stripped and the device is cleaned. This step provides the bond pads and interconnects to the ink jet actuator 128 .
- This interconnect is to an NMOS drive transistor and a power plane with connections made in the CMOS layer (not shown).
- CMOS passivation layer 120 Approximately 0.5 microns of PECVD nitride is deposited as the CMOS passivation layer 120 . Resist is spun on and the layer 120 is exposed to mask 206 whereafter it is developed. After development, the nitride is plasma etched down to the aluminum layer 202 and the silicon layer 116 in the region of the inlet aperture 142 . The resist is stripped and the device cleaned.
- a layer 208 of a sacrificial material is spun on to the layer 120 .
- the layer 208 is 6 microns of photo-sensitive polyimide or approximately 4 ⁇ m of high temperature resist.
- the layer 208 is softbaked and is then exposed to mask 210 whereafter it is developed.
- the layer 208 is then hardbaked at 400° C. for one hour where the layer 208 is comprised of polyimide or at greater than 300° C. where the layer 208 is high temperature resist. It is to be noted in the drawings that the pattern-dependent distortion of the polyimide layer 208 caused by shrinkage is taken into account in the design of the mask 210 .
- a second sacrificial layer 212 is applied.
- the layer 212 is either 2 ⁇ m of photo-sensitive polyimide which is spun on or approximately 1.3 ⁇ m of high temperature resist.
- the layer 212 is softbaked and exposed to mask 214 .
- the layer 212 is developed. In the case of the layer 212 being polyimide, the layer 212 is hardbaked at 400° C. for approximately one hour. Where the layer 212 is resist, it is hardbaked at greater than 300° C. for approximately one hour.
- a 0.2 micron multi-layer metal layer 216 is then deposited. Part of this layer 216 forms the passive beam 160 of the actuator 128 .
- the layer 216 is formed by sputtering 1,000 ⁇ of titanium nitride (TiN) at around 300° C. followed by sputtering 50 ⁇ of tantalum nitride (TaN). A further 1,000 ⁇ of TiN is sputtered on followed by 50 ⁇ of TaN and a further 1,000 ⁇ of TiN.
- TiN titanium nitride
- TaN tantalum nitride
- TiN TiB 2 , MoSi 2 or (Ti, Al)N.
- the layer 216 is then exposed to mask 218 , developed and plasma etched down to the layer 212 whereafter resist, applied for the layer 216 , is wet stripped taking care not to remove the cured layers 208 or 212 .
- a third sacrificial layer 220 is applied by spinning on 4 ⁇ m of photo-sensitive polyimide or approximately 2.6 ⁇ m high temperature resist.
- the layer 220 is softbaked whereafter it is exposed to mask 222 .
- the exposed layer is then developed followed by hardbaking.
- the layer 220 is hardbaked at 400° C. for approximately one hour or at greater than 300° C. where the layer 220 comprises resist.
- a second multi-layer metal layer 224 is applied to the layer 220 .
- the constituents of the layer 224 are the same as the layer 216 and are applied in the same manner. It will be appreciated that both layers 216 and 224 are electrically conductive layers.
- the layer 224 is exposed to mask 226 and is then developed.
- the layer 224 is plasma etched down to the polyimide or resist layer 220 whereafter resist applied for the layer 224 is wet stripped taking care not to remove the cured layers 208 , 212 or 220 . It will be noted that the remaining part of the layer 224 defines the active beam 158 of the actuator 128 .
- a fourth sacrificial layer 228 is applied by spinning on 4 ⁇ m of photo-sensitive polyimide or approximately 2.6 ⁇ m of high temperature resist.
- the layer 228 is softbaked, exposed to the mask 230 and is then developed to leave the island portions as shown in FIG. 9 k of the drawings.
- the remaining portions of the layer 228 are hardbaked at 400° C. for approximately one hour in the case of polyimide or at greater than 300° C. for resist.
- a high Young's modulus dielectric layer 232 is deposited.
- the layer 232 is constituted by approximately 1 ⁇ m of silicon nitride or aluminum oxide.
- the layer 232 is deposited at a temperature below the hardbaked temperature of the sacrificial layers 208 , 212 , 220 , 228 .
- the primary characteristics required for this dielectric layer 232 are a high elastic modulus, chemical inertness and good adhesion to TiN.
- a fifth sacrificial layer 234 is applied by spinning on 2 ⁇ m of photo-sensitive polyimide or approximately 1.3 ⁇ m of high temperature resist.
- the layer 234 is softbaked, exposed to mask 236 and developed.
- the remaining portion of the layer 234 is then hardbaked at 400° C. for one hour in the case of the polyimide or at greater than 300° C. for the resist.
- the dielectric layer 232 is plasma etched down to the sacrificial layer 228 taking care not to remove any of the sacrificial layer 234 .
- This step defines the nozzle opening 124 , the lever arm 126 and the anchor 154 of the nozzle assembly 110 .
- a high Young's modulus dielectric layer 238 is deposited. This layer 238 is formed by depositing 0.2 ⁇ m of silicon nitride or aluminum nitride at a temperature below the hardbaked temperature of the sacrificial layers 208 , 212 , 220 and 228 .
- the layer 238 is anisotropically plasma etched to a depth of 0.35 microns. This etch is intended to clear the dielectric from all of the surface except the side walls of the dielectric layer 232 and the sacrificial layer 234 . This step creates the nozzle rim 136 around the nozzle opening 124 which “pins” the meniscus of ink, as described above.
- UV release tape 240 is applied. 4 ⁇ m of resist is spun on to a rear of the silicon wafer 116 . The wafer 116 is exposed to mask 242 to back etch the wafer 116 to define the ink inlet channel 148 . The resist is then stripped from the wafer 116 .
- a further UV release tape (not shown) is applied to a rear of the wafer 16 and the tape 240 is removed.
- the sacrificial layers 208 , 212 , 220 , 228 and 234 are stripped in oxygen plasma to provide the final nozzle assembly 110 as shown in FIGS. 24 r and 25 r of the drawings.
- the reference numerals illustrated in these two drawings are the same as those in FIG. 17 of the drawings to indicate the relevant parts of the nozzle assembly 110 .
- FIGS. 27 and 28 show the operation of the nozzle assembly 110 , manufactured in accordance with the process described above with reference to FIGS. 24 and 25, and these figures correspond to FIGS. 18 to 20 of the drawings.
- the presently disclosed ink jet printing technology is potentially suited to a wide range of printing system including: color and monochrome office printers, short run digital printers, high speed digital printers, offset press supplemental printers, low cost scanning printers high speed pagewidth printers, notebook computers with in-built pagewidth printers, portable color and monochrome printers, color and monochrome copiers, color and monochrome facsimile machines, combined printer, facsimile and copying machines, label printers, large format plotters, photograph copiers, printers for digital photographic “minilabs”, video printers, PHOTO CD (PHOTO CD is a registered trademark of the Eastman Kodak Company) printers, portable printers for PDAs, wallpaper printers, indoor sign printers, billboard printers, fabric printers, camera printers and fault tolerant commercial printer arrays.
- PHOTO CD PHOTO CD is a registered trademark of the Eastman Kodak Company
Abstract
Description
- This is a C-I-P of application Ser. No. 09/112,754 as filed on Jul. 10, 1998
- The present invention relates to ink jet printing systems and, in particular, discloses a thermally actuated slotted chamber wall ink jet printer.
- Many different types of printing have been invented, a large number of which are presently in use. The known forms of print have a variety of methods for marking the print media with a relevant marking media. Commonly used forms of printing include offset printing, laser printing and copying devices, dot matrix type impact printers, thermal paper printers, film recorders, thermal wax printers, dye sublimation printers and ink jet printers both of the drop on demand and continuous flow type. Each type of printer has its own advantages and problems when considering cost, speed, quality, reliability, simplicity of construction and operation etc.
- In recent years, the field of ink jet printing, wherein each individual pixel of ink is derived from one or more ink nozzles has become increasingly popular primarily due to its inexpensive and versatile nature.
- Many different techniques on ink jet printing have been invented. For a survey of the field, reference is made to an article by J Moore, “Non-Impact Printing: Introduction and Historical Perspective”, Output Hard Copy Devices, Editors R Dubeck and S Sherr, pages 207-220 (1988).
- Ink Jet printers themselves come in many different types. The utilisation of a continuous stream of ink in ink jet printing appears to date back to at least 1929 wherein U.S. Pat. No. 1,941,001 by Hansell discloses a simple form of continuous stream electrostatic ink jet printing.
- U.S. Pat. No. 3,596,275 by Sweet also discloses a process of continuous ink jet printing including the step wherein the inkjet stream is modulated by a high frequency electrostatic field so as to cause drop separation. This technique is still utilized by several manufacturers including Elmjet and Scitex (see also U.S. Pat. No.3,373,437 by Sweet et al)
- Piezoelectric ink jet printers are also one form of commonly utilized ink jet printing device. Piezoelectric systems are disclosed by Kyser et. al. in U.S. Pat. No. 3,946,398 (1970) which utilizes a diaphragm mode of operation, by Zolten in U.S. Pat. No. 3,683,212 (1970) which discloses a squeeze mode of operation of a piezoelectric crystal, by Stemme in U.S. Pat. No. 3,747,120 (1972) which discloses a bend mode of piezoelectric operation, by Howkins in U.S. Pat. No. 4,459,601 which discloses a Piezoelectric push mode actuation of the ink jet stream and by Fischbeck in U.S. Pat. No. 4,584,590 which discloses a sheer mode type of piezoelectric transducer element.
- Recently, thermal ink jet printing has become an extremely popular form of ink jet printing. The ink jet printing techniques include those disclosed by Endo et al in GB 2007162 (1979) and by Vaught et al in U.S. Pat. No. 4,490,728. Both the aforementioned referenced ink jet printing techniques rely upon the activation of an electrothermal actuator which results in the creation of a bubble in a constricted space, such as a nozzle, which thereby causes the ejection of ink from an aperture in communication with the confined space onto a relevant print media. Printing devices utilizing the electrothermal actuator are manufactured by manufacturers such as Canon and Hewlett Packard.
- As can be seen from the foregoing, many different types of printing technologies are available. Ideally, a printing technology should have a number of desirable attributes. These include inexpensive construction and operation, high speed operation, safe and continuous long term operation etc. Each technology may have its own advantages and disadvantages in the areas of cost, speed, quality, reliability, power usage, simplicity of construction, operation, durability and consumables.
- There is disclosed herein an ink jet nozzle assembly including a nozzle chamber having a nozzle, the chamber including a movable portion configured for movement to effect ejection of ink from the chamber via said nozzle, and a pair of actuating arms attached to or formed integrally with the movable portion, the arms effecting movement of said movable portion as a result of one of said arms being periodically hotter than the other said arm in use.
- There are many ways in which one of the arms can be made hotter than the other in use. For example, the hotter arm could have less heat sinking than the other arm. The cold arm could be in cooling water, whereas the hot arm might not be in the water. The hotter arm might have lower mass than the colder arm. A greater current might be passed through one arm making it hotter than the other. The arm to be made hotter might have greater resistance than the other arm. More electrical power might be applied to one arm, thus making it hotter than the other, or the arm to be made hotter might have more thermal insulation applied to it.
- There is further disclosed herein an ink jet nozzle assembly including: a nozzle chamber having an inlet in fluid communication with an ink reservoir and a nozzle through which ink from the chamber can be ejected;
- the chamber including a fixed portion and a movable portion configured for relative movement in an ejection phase and alternate relative movement in a refill phase;
- a pair of spaced apart actuating arms connected with the movable portion and undergoing differential thermal expansion upon heating to effect periodically said relative movement; and
- the inlet being positioned and dimensioned relative to the nozzle such that ink is ejected preferentially from the chamber through the nozzle in droplet form during the ejection phase, and ink is alternately drawn preferentially into the chamber from the reservoir through the inlet during the refill phase.
- Preferably the movable portion includes the nozzle and the fixed portion is mounted on a substrate.
- Preferably the fixed portion includes the nozzle mounted on a substrate and the movable portion includes an ejection paddle.
- Preferably the arms extend between the paddle and the substrate.
- Preferably the arms are located substantially within the chamber.
- Alternately the arms are located substantially outside the chamber.
- Preferably the fixed portion includes a slot a sidewall of the chamber through which the arms are connected to the paddle.
- Preferably the arms are of substantially the same cross-sectional profile relative to one another.
- Alternatively the arms are of differing cross-sectional profile relative to one another.
- Preferably the arms are heated simultaneously.
- Preferably one arm is heated to a higher temperature than the other arm.
- Preferably the arms are of substantially the same material composition relative to one another.
- Alternatively the arms are of substantially different material composition relative to one another.
- Preferably the arms are substantially parallel to one another.
- Alternatively the arms are substantially non-parallel to one another.
- Preferably the assembly is manufactured using micro-electro-mechanical systems (MEMS) techniques.
- Preferably an effective volume of the chamber is reduced in said ejection phase and enlarged in said refill phase.
- Notwithstanding any other forms which may fall within the scope of the present invention, preferred forms of the invention will now be described, by way of example only, with reference to the accompanying drawings in which:
- FIG. 1 illustrates a perspective view of an ink jet nozzle arrangement in accordance with the preferred embodiment;
- FIG. 2 illustrates the arrangement of FIG. 1 when the actuator is in an activated position;
- FIG. 3 illustrates an exploded perspective view of the major components of the preferred embodiment;
- FIG. 4 provides a legend of the materials indicated in FIGS.5 to 16;
- FIGS.5 to 16 illustrate sectional views of the manufacturing steps in one form of construction of an ink jet printhead nozzle;
- FIG. 17 shows a three dimensional, schematic view of a nozzle assembly for an ink jet printhead in accordance with the invention;
- FIGS.18 to 20 show a three dimensional, schematic illustration of an operation of the nozzle assembly of FIG. 17;
- FIG. 21 shows a three dimensional view of a nozzle array constituting an ink jet printhead;
- FIG. 22 shows, on an enlarged scale, part of the array of FIG. 21;
- FIG. 23 shows a three dimensional view of an ink jet printhead including a nozzle guard;
- FIGS. 24a to 24 r show three-dimensional views of steps in the manufacture of a nozzle assembly of an ink jet printhead;
- FIGS. 25a to 25 r show sectional side views of the manufacturing steps;
- FIGS. 26a to 26 k show layouts of masks used in various steps in the manufacturing process;
- FIGS. 27a to 27 c show three dimensional views of an operation of the nozzle assembly manufactured according to the method of FIGS. 24 and 25; and
- FIGS. 28a to 28 c show sectional side views of an operation of the nozzle assembly manufactured according to the method of FIGS. 24 and 25.
- In the preferred embodiment, there is provided an ink jet printing system wherein each nozzle has a nozzle chamber having a slotted side wall through which is formed an actuator mechanism attached to a vane within the nozzle chamber such that the actuator can be activated to move the vane within the nozzle chamber to thereby cause ejection of ink from the nozzle chamber.
- Turning now to the figures, there is illustrated in FIG. 1 an example of an ink
jet nozzle arrangement 1 as constructed in accordance with the preferred embodiment. The nozzle arrangement includes anozzle chamber 2 normally filled with ink and anactuator mechanism 3 for actuating avane 4 for the ejection of ink from thenozzle chamber 2 via anink ejection port 5. - FIG. 1 is a perspective view of the ink jet nozzle arrangement of the preferred embodiment in its idle or quiescent position. FIG. 2 illustrates a perspective view after actuation of the
actuator 3. - The
actuator 3 includes twoarms 6, 7. The two arms can be formed from titanium di-boride (TiB2) which has a high Young's modulus and therefore provides a large degree of bending strength. A current is passed along thearms 6, 7 with thearm 7 having a substantially thicker portion along most of its length. Thearm 7 is stiff but for in the area of thinnedportion 8 and hence the bending moment is concentrated in thearea 8. The thinned arm 6 is of a thinner form and is heated by means of resistive heating of a current passing through thearms 6, 7. Thearms 6, 7 are interconnected with electrical circuitry viaconnections - Upon heating of the arm6, the arm 6 is expanded with the bending of the
arm 7 being concentrated in thearea 8. This results in movement of the end of theactuator mechanism 3 which proceeds through aslot 19 in a wall of thenozzle chamber 2. The bending further causes movement ofvane 4 so as to increase the pressure of the ink within the nozzle chamber and thereby cause its subsequent ejection fromink ejection port 5. Thenozzle chamber 2 is refilled via an ink channel 13 (FIG. 3) formed in awafer substrate 14. After movement of thevane 4, so as to cause the ejection of ink, the current to arm 6 is turned off which results in a corresponding back movement of thevane 4. The ink withinnozzle chamber 2 is then replenished by means of waferink supply channel 13 which is attached to an ink supply formed on the back ofwafer 14. The refill can be by means of a surface tension reduction effect of the ink withinnozzle chamber 2 acrossink ejection port 5. - FIG. 3 illustrates an exploded perspective view of the components of the ink jet nozzle arrangement.
- Referring now specifically to FIG. 3, the preferred embodiment can be constructed utilizing semiconductor processing techniques in addition to micro machining and micro fabrication process technology (MEMS) and a full familiarity with these technologies is hereinafter assumed.
- For a general introduction to a micro-electro mechanical system (MEMS) reference is made to standard proceedings in this field including the proceeding of the SPIE (International Society for Optical Engineering) including volumes 2642 and 2882 which contain the proceedings of recent advances and conferences in this field.
- The nozzles can preferably be constructed by constructing a large array of nozzles on a single silicon wafer at a time. The array of nozzles can be divided into multiple printheads, with each printhead itself having nozzles grouped into multiple colors to provide for full color image reproduction. The arrangement can be constructed via the utilization of a standard
silicon wafer substrate 14 upon which is deposited anelectrical circuitry layer 16 which can comprise a standard CMOS circuitry layer. The CMOS layer can include an etchedportion defining pit 17. On top of the CMOS layer is initially deposited a protective layer (not shown) which comprise silicon nitride or the like. On top of this layer is deposited a sacrificial material which is initially suitably etched so as to form cavities for the portion of thethermal actuator 3 and bottom portion of thevane 4, in addition to the bottom rim ofnozzle chamber 2. These cavities can then be filled with titanium diboride. Next, a similar process is used to form the glass portions of the actuator. Next, a further layer of sacrificial material is deposited and suitably etched so as to form the rest of thevane 4 in addition to a portion of the nozzle chamber walls to the same height ofvane 4. - Subsequently, a further sacrificial layer is deposited and etched in a suitable manner so as to form the rest of the
nozzle chamber 2. The top surface of the nozzle chamber is further etched so as to form the nozzle rim rounding theejection port 5. Subsequently, the sacrificial material is etched away so as to release the construction of the preferred embodiment. It will be readily evident to those skilled in the art that other MEMS processing steps could be utilized. - Preferably, the thermal actuator and
vane portions nozzle chamber 2 are constructed from titanium di-boride. The utilization of titanium di-boride is standard in the construction of semiconductor systems and, in addition, its material properties, including a high Young's modulus, is utilized to advantage in the construction of thethermal actuator 3. - Further, preferably the
actuator 3 is covered with a hydrophobic material, such as Teflon, so as to prevent any leaking of the liquid out of theslot 19. - Further, as a final processing step, the ink channel can be etched through the wafer utilizing a high anisotropic silicon wafer etch. This can be done as an anisotropic crystallographic silicon etch, or an anisotropic dry etch. A dry etch system capable of high aspect ratio deep silicon trench etching such as the Surface Technology Systems (STS) Advance Silicon Etch (ASE) system is recommended for volume production, as the chip size can be reduced over a wet etch. The wet etch is suitable for small volume production where a suitable plasma etch system is not available. Alternatively, but undesirably, ink access can be around the sides of the printhead chips. If ink access is through the wafer higher ink flow is possible, and there is less requirement for high accuracy assembly. If ink access is around the edge of the chip, ink flow is severely limited, and the printhead chips must be carefully assembled onto ink channel chips. This latter process is difficult due to the possibility of damaging the fragile nozzle plate. If plasma etching is used, the chips can be effectively diced at the same time. Separating the chips by plasma etching allows them to be spaced as little as 35 μm apart, increasing the number of chips on a wafer.
- One form of detailed manufacturing process which can be used to fabricate monolithic ink jet print heads operating in accordance with the principles taught by the present embodiment can proceed utilizing the following steps:
- 1. Using a double sided polished wafer, complete drive transistors, data distribution, and timing circuits using a 0.5 micron, one poly, 2 metal CMOS process. Relevant features of the wafer at this step are shown in FIG. 5. For clarity, these diagrams may not be to scale, and may not represent a cross section though any single plane of the nozzle. FIG. 4 is a key to representations of various materials in these manufacturing diagrams, and those of other cross referenced ink jet configurations.
- 2. Etch oxide down to silicon or
aluminum using Mask 1. This mask defines the ink inlet, the heater contact vias, and the edges of the printhead chips. This step is shown in FIG. 6. - 3.
Deposit 1 micron of sacrificial material 21 (e.g. aluminum) - 4. Etch the
sacrificial layer 21 usingMask 2, defining the nozzle chamber wall and the actuator anchor point. This step is shown in FIG. 7. - 5.
Deposit 1 micron ofheater material 22, for example titanium nitride (TiN) or titanium diboride (TiB2). - 6. Etch the
heater material 22 usingMask 3, which defines the actuator loop and the lowest layer of the nozzle wall. This step is shown in FIG. 8. - 7. Wafer probe. All electrical connections are complete at this point, bond pads are accessible, and the chips are not yet separated.
- 8.
Deposit 1 micron oftitanium nitride 23. - 9. Etch the
titanium nitride 23 usingMask 4, which defines the nozzle chamber wall, with the exception of the nozzle chamber actuator slot, and the paddle. This step is shown in FIG. 9. - 10.
Deposit 8 microns ofsacrificial material 24. - 11. Etch the
sacrificial material 24 down totitanium nitride 23 usingMask 5. This mask defines the nozzle chamber wall and the paddle. This step is shown in FIG. 10. - 12. Deposit a 0.5 micron conformal layer of
titanium nitride 25 and planarize down to the sacrificial layer using CMP. - 13.
Deposit 1 micron ofsacrificial material 26. - 14. Etch the
sacrificial material 26 down totitanium nitride 25 using Mask 6. This mask defines the nozzle chamber wall. This step is shown in FIG. 11. - 15.
Deposit 1 micron oftitanium nitride 27. - 16. Etch to a depth of (approx.) 0.5
micron using Mask 7. This mask defines thenozzle rim 28. This step is shown in FIG. 12. - 17. Etch down to the
sacrificial layer 26 usingMask 8. This mask defines the roof of thenozzle chamber 2, and theport 5. This step is shown in FIG. 13. - 18. Back-etch completely through the silicon wafer14 (with, for example, an ASE Advanced Silicon Etcher from Surface Technology Systems) using Mask 9. This mask defines the ink inlets which are etched through the
wafer 14. Thewafer 14 is also diced by this etch. This step is shown in FIG. 14. - 19. Etch the
sacrificial material 24. Thenozzle chambers 2 are cleared, theactuators 3 freed, and the chips are separated by this etch. This step is shown in FIG. 15. - 20. Mount the printheads in their packaging, which may be a molded plastic former incorporating ink channels which supply the appropriate color ink to the ink inlets at the back of the wafer.
- 21. Connect the printheads to their interconnect systems. For a low profile connection with minimum disruption of airflow, TAB may be used. Wire bonding may also be used if the printer is to be operated with sufficient clearance to the paper.
- 22. Hydrophobize the front surface of the printheads.
- 23. Fill the completed printheads with
ink 29 and test them. A filled nozzle is shown in FIG. 16. - Referring now to FIG. 17 of the drawings, a nozzle assembly, in accordance with a further embodiment of the invention is designated generally by the
reference numeral 110. An ink jet printhead has a plurality ofnozzle assemblies 110 arranged in an array 114 (FIGS. 21 and 22) on asilicon substrate 116. Thearray 114 will be described in greater detail below. - The
assembly 110 includes a silicon substrate orwafer 116 on which adielectric layer 118 is deposited. ACMOS passivation layer 120 is deposited on thedielectric layer 118. - Each
nozzle assembly 110 includes anozzle 122 defining anozzle opening 124, a connecting member in the form of alever arm 126 and anactuator 128. Thelever arm 126 connects theactuator 128 to thenozzle 122. - As shown in greater detail in FIGS.18 to 20 of the drawings, the
nozzle 122 comprises acrown portion 130 with askirt portion 132 depending from thecrown portion 130. Theskirt portion 132 forms part of a peripheral wall of a nozzle chamber 134 (FIGS. 18 to 20 of the drawings). Thenozzle opening 124 is in fluid communication with thenozzle chamber 134. It is to be noted that thenozzle opening 124 is surrounded by a raisedrim 136 which “pins” a meniscus 138 (FIG. 18) of a body ofink 140 in thenozzle chamber 134. - An ink inlet aperture142 (shown most clearly in FIG. 22 of the drawing) is defined in a
floor 146 of thenozzle chamber 134. Theaperture 142 is in fluid communication with anink inlet channel 148 defined through thesubstrate 116. - A
wall portion 150 bounds theaperture 142 and extends upwardly from thefloor portion 146. Theskirt portion 132, as indicated above, of thenozzle 122 defines a first part of a peripheral wall of thenozzle chamber 134 and thewall portion 150 defines a second part of the peripheral wall of thenozzle chamber 134. - The
wall 150 has an inwardly directedlip 152 at its free end which serves as a fluidic seal which inhibits the escape of ink when thenozzle 122 is displaced, as will be described in greater detail below. It will be appreciated that, due to the viscosity of theink 140 and the small dimensions of the spacing between thelip 152 and theskirt portion 132, the inwardly directedlip 152 and surface tension function as a seal for inhibiting the escape of ink from thenozzle chamber 134. - The
actuator 128 is a thermal bend actuator and is connected to ananchor 154 extending upwardly from thesubstrate 116 or, more particularly, from theCMOS passivation layer 120. Theanchor 154 is mounted onconductive pads 156 which form an electrical connection with theactuator 128. - The
actuator 128 comprises a first,active beam 158 arranged above a second,passive beam 160. In a preferred embodiment, bothbeams - Both
beams anchor 154 and their opposed ends connected to thearm 126. When a current is caused to flow through theactive beam 158 thermal expansion of thebeam 158 results. As thepassive beam 160, through which there is no current flow, does not expand at the same rate, a bending moment is created causing thearm 126 and, hence, thenozzle 122 to be displaced downwardly towards thesubstrate 116 as shown in FIG. 19 of the drawings. This causes an ejection of ink through thenozzle opening 124 as shown at 162 in FIG. 19 of the drawings. When the source of heat is removed from theactive beam 158, i.e. by stopping current flow, thenozzle 122 returns to its quiescent position as shown in FIG. 20 of the drawings. When thenozzle 122 returns to its quiescent position, anink droplet 164 is formed as a result of the breaking of an ink droplet neck as illustrated at 166 in FIG. 20 of the drawings. Theink droplet 164 then travels on to the print media such as a sheet of paper. As a result of the formation of theink droplet 164, a “negative” meniscus is formed as shown at 168 in FIG. 20 of the drawings. This “negative”meniscus 168 results in an inflow ofink 140 into thenozzle chamber 134 such that a new meniscus 138 (FIG. 18) is formed in readiness for the next ink drop ejection from thenozzle assembly 110. - Referring now to FIGS. 21 and 22 of the drawings, the
nozzle array 114 is described in greater detail. Thearray 114 is for a four color printhead. Accordingly, thearray 114 includes fourgroups 170 of nozzle assemblies, one for each color. Eachgroup 170 has itsnozzle assemblies 110 arranged in tworows groups 170 is shown in greater detail in FIG. 22 of the drawings. - To facilitate close packing of the
nozzle assemblies 110 in therows nozzle assemblies 110 in therow 174 are offset or staggered with respect to thenozzle assemblies 110 in therow 172. Also, thenozzle assemblies 110 in therow 172 are spaced apart sufficiently far from each other to enable thelever arms 126 of thenozzle assemblies 110 in therow 174 to pass betweenadjacent nozzles 122 of theassemblies 110 in therow 172. It is to be noted that eachnozzle assembly 110 is substantially dumbbell shaped so that thenozzles 122 in therow 172 nest between thenozzles 122 and theactuators 128 ofadjacent nozzle assemblies 110 in therow 174. - Further, to facilitate close packing of the
nozzles 122 in therows nozzle 122 is substantially hexagonally shaped. - It will be appreciated by those skilled in the art that, when the
nozzles 122 are displaced towards thesubstrate 116, in use, due to thenozzle opening 124 being at a slight angle with respect to thenozzle chamber 134 ink is ejected slightly off the perpendicular. It is an advantage of the arrangement shown in FIGS. 21 and 22 of the drawings that theactuators 128 of thenozzle assemblies 110 in therows rows nozzles 122 in therow 172 and the ink droplets ejected from thenozzles 122 in therow 174 are parallel to one another resulting in an improved print quality. - Also, as shown in FIG. 21 of the drawings, the
substrate 116 hasbond pads 176 arranged thereon which provide the electrical connections, via thepads 156, to theactuators 128 of thenozzle assemblies 110. These electrical connections are formed via the CMOS layer (not shown). - Referring to FIG. 23 of the drawings, a development of the invention is shown. With reference to the previous drawings, like reference numerals refer to like parts, unless otherwise specified.
- In this development, a
nozzle guard 180 is mounted on thesubstrate 116 of thearray 114. Thenozzle guard 180 includes abody member 182 having a plurality ofpassages 184 defined therethrough. Thepassages 184 are in register with thenozzle openings 124 of thenozzle assemblies 110 of thearray 114 such that, when ink is ejected from any one of thenozzle openings 124, the ink passes through the associatedpassage 184 before striking the print media. - The
body member 182 is mounted in spaced relationship relative to thenozzle assemblies 110 by limbs or struts 186. One of thestruts 186 hasair inlet openings 188 defined therein. - In use, when the
array 114 is in operation, air is charged through theinlet openings 188 to be forced through thepassages 184 together with ink travelling through thepassages 184. - The ink is not entrained in the air as the air is charged through the
passages 184 at a different velocity from that of theink droplets 164. For example, theink droplets 164 are ejected from thenozzles 122 at a velocity of approximately 3 m/s. The air is charged through thepassages 184 at a velocity of approximately 1 m/s. - The purpose of the air is to maintain the
passages 184 clear of foreign particles. A danger exists that these foreign particles, such as dust particles, could fall onto thenozzle assemblies 110 adversely affecting their operation. With the provision of the air inlet openings 88 in thenozzle guard 180 this problem is, to a large extent, obviated. - Referring now to FIGS.24 to 26 of the drawings, a process for manufacturing the
nozzle assemblies 110 is described. - Starting with the silicon substrate or
wafer 116, thedielectric layer 118 is deposited on a surface of thewafer 116. Thedielectric layer 118 is in the form of approximately 1.5 microns of CVD oxide. Resist is spun on to thelayer 118 and thelayer 118 is exposed tomask 200 and is subsequently developed. - After being developed, the
layer 118 is plasma etched down to thesilicon layer 116. The resist is then stripped and thelayer 118 is cleaned. This step defines theink inlet aperture 142. - In FIG. 24b of the drawings, approximately 0.8 microns of
aluminum 202 is deposited on thelayer 118. Resist is spun on and thealuminum 202 is exposed tomask 204 and developed. Thealuminum 202 is plasma etched down to theoxide layer 118, the resist is stripped and the device is cleaned. This step provides the bond pads and interconnects to theink jet actuator 128. This interconnect is to an NMOS drive transistor and a power plane with connections made in the CMOS layer (not shown). - Approximately 0.5 microns of PECVD nitride is deposited as the
CMOS passivation layer 120. Resist is spun on and thelayer 120 is exposed to mask 206 whereafter it is developed. After development, the nitride is plasma etched down to thealuminum layer 202 and thesilicon layer 116 in the region of theinlet aperture 142. The resist is stripped and the device cleaned. - A
layer 208 of a sacrificial material is spun on to thelayer 120. Thelayer 208 is 6 microns of photo-sensitive polyimide or approximately 4 μm of high temperature resist. Thelayer 208 is softbaked and is then exposed tomask 210 whereafter it is developed. Thelayer 208 is then hardbaked at 400° C. for one hour where thelayer 208 is comprised of polyimide or at greater than 300° C. where thelayer 208 is high temperature resist. It is to be noted in the drawings that the pattern-dependent distortion of thepolyimide layer 208 caused by shrinkage is taken into account in the design of themask 210. - In the next step, shown in FIG. 24e of the drawings, a second
sacrificial layer 212 is applied. Thelayer 212 is either 2 μm of photo-sensitive polyimide which is spun on or approximately 1.3 μm of high temperature resist. Thelayer 212 is softbaked and exposed tomask 214. After exposure to themask 214, thelayer 212 is developed. In the case of thelayer 212 being polyimide, thelayer 212 is hardbaked at 400° C. for approximately one hour. Where thelayer 212 is resist, it is hardbaked at greater than 300° C. for approximately one hour. - A 0.2 micron
multi-layer metal layer 216 is then deposited. Part of thislayer 216 forms thepassive beam 160 of theactuator 128. - The
layer 216 is formed by sputtering 1,000Å of titanium nitride (TiN) at around 300° C. followed by sputtering 50Å of tantalum nitride (TaN). A further 1,000Å of TiN is sputtered on followed by 50Å of TaN and a further 1,000Å of TiN. - Other materials which can be used instead of TiN are TiB2, MoSi2 or (Ti, Al)N.
- The
layer 216 is then exposed tomask 218, developed and plasma etched down to thelayer 212 whereafter resist, applied for thelayer 216, is wet stripped taking care not to remove the curedlayers - A third
sacrificial layer 220 is applied by spinning on 4 μm of photo-sensitive polyimide or approximately 2.6 μm high temperature resist. Thelayer 220 is softbaked whereafter it is exposed tomask 222. The exposed layer is then developed followed by hardbaking. In the case of polyimide, thelayer 220 is hardbaked at 400° C. for approximately one hour or at greater than 300° C. where thelayer 220 comprises resist. - A second
multi-layer metal layer 224 is applied to thelayer 220. The constituents of thelayer 224 are the same as thelayer 216 and are applied in the same manner. It will be appreciated that bothlayers - The
layer 224 is exposed tomask 226 and is then developed. Thelayer 224 is plasma etched down to the polyimide or resistlayer 220 whereafter resist applied for thelayer 224 is wet stripped taking care not to remove the curedlayers layer 224 defines theactive beam 158 of theactuator 128. - A fourth
sacrificial layer 228 is applied by spinning on 4 μm of photo-sensitive polyimide or approximately 2.6 μm of high temperature resist. Thelayer 228 is softbaked, exposed to themask 230 and is then developed to leave the island portions as shown in FIG. 9k of the drawings. The remaining portions of thelayer 228 are hardbaked at 400° C. for approximately one hour in the case of polyimide or at greater than 300° C. for resist. - As shown in FIG. 24l of the drawing a high Young's
modulus dielectric layer 232 is deposited. Thelayer 232 is constituted by approximately 1 μm of silicon nitride or aluminum oxide. Thelayer 232 is deposited at a temperature below the hardbaked temperature of thesacrificial layers dielectric layer 232 are a high elastic modulus, chemical inertness and good adhesion to TiN. - A fifth
sacrificial layer 234 is applied by spinning on 2 μm of photo-sensitive polyimide or approximately 1.3 μm of high temperature resist. Thelayer 234 is softbaked, exposed tomask 236 and developed. The remaining portion of thelayer 234 is then hardbaked at 400° C. for one hour in the case of the polyimide or at greater than 300° C. for the resist. - The
dielectric layer 232 is plasma etched down to thesacrificial layer 228 taking care not to remove any of thesacrificial layer 234. - This step defines the
nozzle opening 124, thelever arm 126 and theanchor 154 of thenozzle assembly 110. - A high Young's
modulus dielectric layer 238 is deposited. Thislayer 238 is formed by depositing 0.2 μm of silicon nitride or aluminum nitride at a temperature below the hardbaked temperature of thesacrificial layers - Then, as shown in FIG. 24p of the drawings, the
layer 238 is anisotropically plasma etched to a depth of 0.35 microns. This etch is intended to clear the dielectric from all of the surface except the side walls of thedielectric layer 232 and thesacrificial layer 234. This step creates thenozzle rim 136 around thenozzle opening 124 which “pins” the meniscus of ink, as described above. - An ultraviolet (UV)
release tape 240 is applied. 4 μm of resist is spun on to a rear of thesilicon wafer 116. Thewafer 116 is exposed to mask 242 to back etch thewafer 116 to define theink inlet channel 148. The resist is then stripped from thewafer 116. - A further UV release tape (not shown) is applied to a rear of the
wafer 16 and thetape 240 is removed. Thesacrificial layers final nozzle assembly 110 as shown in FIGS. 24r and 25 r of the drawings. For ease of reference, the reference numerals illustrated in these two drawings are the same as those in FIG. 17 of the drawings to indicate the relevant parts of thenozzle assembly 110. FIGS. 27 and 28 show the operation of thenozzle assembly 110, manufactured in accordance with the process described above with reference to FIGS. 24 and 25, and these figures correspond to FIGS. 18 to 20 of the drawings. - The presently disclosed ink jet printing technology is potentially suited to a wide range of printing system including: color and monochrome office printers, short run digital printers, high speed digital printers, offset press supplemental printers, low cost scanning printers high speed pagewidth printers, notebook computers with in-built pagewidth printers, portable color and monochrome printers, color and monochrome copiers, color and monochrome facsimile machines, combined printer, facsimile and copying machines, label printers, large format plotters, photograph copiers, printers for digital photographic “minilabs”, video printers, PHOTO CD (PHOTO CD is a registered trademark of the Eastman Kodak Company) printers, portable printers for PDAs, wallpaper printers, indoor sign printers, billboard printers, fabric printers, camera printers and fault tolerant commercial printer arrays.
- It would be appreciated by a person skilled in the art that numerous variations and/or modifications any be made to the present invention as shown in the specific embodiment without departing from the spirit or scope of the invention as broadly described. The present embodiment is, therefore, to be considered in all respects to be illustrative and not restrictive.
Claims (18)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/798,416 US6416170B2 (en) | 1997-07-15 | 2001-03-02 | Differential thermal ink jet printing mechanism |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AUPO7991 | 1997-07-15 | ||
AUPO7991A AUPO799197A0 (en) | 1997-07-15 | 1997-07-15 | Image processing method and apparatus (ART01) |
AUPP0888 | 1997-12-12 | ||
AUPP0888A AUPP088897A0 (en) | 1997-12-12 | 1997-12-12 | Image creation method and apparatus (IJ33) |
US09/112,754 US6238040B1 (en) | 1997-07-15 | 1998-07-10 | Thermally actuated slotted chamber wall ink jet printing mechanism |
US09/798,416 US6416170B2 (en) | 1997-07-15 | 2001-03-02 | Differential thermal ink jet printing mechanism |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/112,754 Continuation-In-Part US6238040B1 (en) | 1997-07-15 | 1998-07-10 | Thermally actuated slotted chamber wall ink jet printing mechanism |
Publications (2)
Publication Number | Publication Date |
---|---|
US20010009430A1 true US20010009430A1 (en) | 2001-07-26 |
US6416170B2 US6416170B2 (en) | 2002-07-09 |
Family
ID=27158023
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/798,416 Expired - Fee Related US6416170B2 (en) | 1997-07-15 | 2001-03-02 | Differential thermal ink jet printing mechanism |
Country Status (1)
Country | Link |
---|---|
US (1) | US6416170B2 (en) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6460971B2 (en) * | 1997-07-15 | 2002-10-08 | Silverbrook Research Pty Ltd | Ink jet with high young's modulus actuator |
US7950777B2 (en) | 1997-07-15 | 2011-05-31 | Silverbrook Research Pty Ltd | Ejection nozzle assembly |
US8020970B2 (en) | 1997-07-15 | 2011-09-20 | Silverbrook Research Pty Ltd | Printhead nozzle arrangements with magnetic paddle actuators |
US8025366B2 (en) | 1997-07-15 | 2011-09-27 | Silverbrook Research Pty Ltd | Inkjet printhead with nozzle layer defining etchant holes |
US8029101B2 (en) | 1997-07-15 | 2011-10-04 | Silverbrook Research Pty Ltd | Ink ejection mechanism with thermal actuator coil |
US8029102B2 (en) | 1997-07-15 | 2011-10-04 | Silverbrook Research Pty Ltd | Printhead having relatively dimensioned ejection ports and arms |
US8061812B2 (en) | 1997-07-15 | 2011-11-22 | Silverbrook Research Pty Ltd | Ejection nozzle arrangement having dynamic and static structures |
US8075104B2 (en) | 1997-07-15 | 2011-12-13 | Sliverbrook Research Pty Ltd | Printhead nozzle having heater of higher resistance than contacts |
US8083326B2 (en) | 1997-07-15 | 2011-12-27 | Silverbrook Research Pty Ltd | Nozzle arrangement with an actuator having iris vanes |
US8113629B2 (en) | 1997-07-15 | 2012-02-14 | Silverbrook Research Pty Ltd. | Inkjet printhead integrated circuit incorporating fulcrum assisted ink ejection actuator |
US8123336B2 (en) | 1997-07-15 | 2012-02-28 | Silverbrook Research Pty Ltd | Printhead micro-electromechanical nozzle arrangement with motion-transmitting structure |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ITVA20040003A1 (en) * | 2004-01-23 | 2004-04-23 | St Microelectronics Srl | METHOD AND CONFINING DEVICE OF A CELL |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1941001A (en) * | 1929-01-19 | 1933-12-26 | Rca Corp | Recorder |
US3373437A (en) * | 1964-03-25 | 1968-03-12 | Richard G. Sweet | Fluid droplet recorder with a plurality of jets |
US3596275A (en) * | 1964-03-25 | 1971-07-27 | Richard G Sweet | Fluid droplet recorder |
US3946398A (en) * | 1970-06-29 | 1976-03-23 | Silonics, Inc. | Method and apparatus for recording with writing fluids and drop projection means therefor |
US3683212A (en) * | 1970-09-09 | 1972-08-08 | Clevite Corp | Pulsed droplet ejecting system |
SE349676B (en) * | 1971-01-11 | 1972-10-02 | N Stemme | |
US4459601A (en) * | 1981-01-30 | 1984-07-10 | Exxon Research And Engineering Co. | Ink jet method and apparatus |
US4490728A (en) * | 1981-08-14 | 1984-12-25 | Hewlett-Packard Company | Thermal ink jet printer |
DE3378966D1 (en) * | 1982-05-28 | 1989-02-23 | Xerox Corp | Pressure pulse droplet ejector and array |
AUPO804497A0 (en) * | 1997-07-15 | 1997-08-07 | Silverbrook Research Pty Ltd | Image creation method and apparatus (IJ07) |
US6171875B1 (en) * | 1997-07-15 | 2001-01-09 | Silverbrook Research Pty Ltd | Method of manufacture of a radial back-curling thermoelastic ink jet printer |
US6180427B1 (en) * | 1997-07-15 | 2001-01-30 | Silverbrook Research Pty. Ltd. | Method of manufacture of a thermally actuated ink jet including a tapered heater element |
US6247792B1 (en) * | 1997-07-15 | 2001-06-19 | Silverbrook Research Pty Ltd | PTFE surface shooting shuttered oscillating pressure ink jet printing mechanism |
AUPP398498A0 (en) * | 1998-06-09 | 1998-07-02 | Silverbrook Research Pty Ltd | A method of manufacture of an image creation apparatus (ijm44) |
US6239821B1 (en) * | 1997-07-15 | 2001-05-29 | Silverbrook Research Pty Ltd | Direct firing thermal bend actuator ink jet printing mechanism |
AUPP398798A0 (en) * | 1998-06-09 | 1998-07-02 | Silverbrook Research Pty Ltd | Image creation method and apparatus (ij43) |
AUPP259398A0 (en) * | 1998-03-25 | 1998-04-23 | Silverbrook Research Pty Ltd | Image creation method and apparatus (IJ41) |
US6087638A (en) * | 1997-07-15 | 2000-07-11 | Silverbrook Research Pty Ltd | Corrugated MEMS heater structure |
AUPO804797A0 (en) * | 1997-07-15 | 1997-08-07 | Silverbrook Research Pty Ltd | Image creation method and apparatus (IJ05) |
US6220694B1 (en) * | 1997-07-15 | 2001-04-24 | Silverbrook Research Pty Ltd. | Pulsed magnetic field ink jet printing mechanism |
US6245246B1 (en) * | 1997-07-15 | 2001-06-12 | Silverbrook Research Pty Ltd | Method of manufacture of a thermally actuated slotted chamber wall ink jet printer |
AUPP089397A0 (en) * | 1997-12-12 | 1998-01-08 | Silverbrook Research Pty Ltd | Image creation method and apparatus (IJ37) |
US6247796B1 (en) * | 1997-07-15 | 2001-06-19 | Silverbrook Research Pty Ltd | Magnetostrictive ink jet printing mechanism |
EP1108093B1 (en) * | 1999-06-18 | 2005-03-02 | Toronto GmbH | Planing device mounted on machines for processing ice |
US6217183B1 (en) * | 1999-09-15 | 2001-04-17 | Michael Shipman | Keyboard having illuminated keys |
-
2001
- 2001-03-02 US US09/798,416 patent/US6416170B2/en not_active Expired - Fee Related
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6460971B2 (en) * | 1997-07-15 | 2002-10-08 | Silverbrook Research Pty Ltd | Ink jet with high young's modulus actuator |
US7950777B2 (en) | 1997-07-15 | 2011-05-31 | Silverbrook Research Pty Ltd | Ejection nozzle assembly |
US8020970B2 (en) | 1997-07-15 | 2011-09-20 | Silverbrook Research Pty Ltd | Printhead nozzle arrangements with magnetic paddle actuators |
US8025366B2 (en) | 1997-07-15 | 2011-09-27 | Silverbrook Research Pty Ltd | Inkjet printhead with nozzle layer defining etchant holes |
US8029101B2 (en) | 1997-07-15 | 2011-10-04 | Silverbrook Research Pty Ltd | Ink ejection mechanism with thermal actuator coil |
US8029102B2 (en) | 1997-07-15 | 2011-10-04 | Silverbrook Research Pty Ltd | Printhead having relatively dimensioned ejection ports and arms |
US8061812B2 (en) | 1997-07-15 | 2011-11-22 | Silverbrook Research Pty Ltd | Ejection nozzle arrangement having dynamic and static structures |
US8075104B2 (en) | 1997-07-15 | 2011-12-13 | Sliverbrook Research Pty Ltd | Printhead nozzle having heater of higher resistance than contacts |
US8083326B2 (en) | 1997-07-15 | 2011-12-27 | Silverbrook Research Pty Ltd | Nozzle arrangement with an actuator having iris vanes |
US8113629B2 (en) | 1997-07-15 | 2012-02-14 | Silverbrook Research Pty Ltd. | Inkjet printhead integrated circuit incorporating fulcrum assisted ink ejection actuator |
US8123336B2 (en) | 1997-07-15 | 2012-02-28 | Silverbrook Research Pty Ltd | Printhead micro-electromechanical nozzle arrangement with motion-transmitting structure |
Also Published As
Publication number | Publication date |
---|---|
US6416170B2 (en) | 2002-07-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7891779B2 (en) | Inkjet printhead with nozzle layer defining etchant holes | |
US7461924B2 (en) | Printhead having inkjet actuators with contractible chambers | |
US6464340B2 (en) | Ink jet printing apparatus with balanced thermal actuator | |
US6416170B2 (en) | Differential thermal ink jet printing mechanism | |
US20010008408A1 (en) | Ink jet nozzle assembly including a fluidic seal | |
US20010008410A1 (en) | Ink jet printer mechanism with colinear nozzle and inlet | |
US7021745B2 (en) | Ink jet with thin nozzle wall | |
US7022250B2 (en) | Method of fabricating an ink jet printhead chip with differential expansion actuators |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: SILVERBROOK RESEARCH PTY. LTD., AUSTRALIA Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:SILVERBROOK, KIA;REEL/FRAME:011585/0087 Effective date: 20010226 |
|
FEPP | Fee payment procedure |
Free format text: PAT HOLDER NO LONGER CLAIMS SMALL ENTITY STATUS, ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: STOL); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
REFU | Refund |
Free format text: REFUND - SURCHARGE, PETITION TO ACCEPT PYMT AFTER EXP, UNINTENTIONAL (ORIGINAL EVENT CODE: R2551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
FPAY | Fee payment |
Year of fee payment: 4 |
|
FPAY | Fee payment |
Year of fee payment: 8 |
|
AS | Assignment |
Owner name: ZAMTEC LIMITED, IRELAND Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:SILVERBROOK RESEARCH PTY. LIMITED AND CLAMATE PTY LIMITED;REEL/FRAME:028537/0396 Effective date: 20120503 |
|
REMI | Maintenance fee reminder mailed | ||
LAPS | Lapse for failure to pay maintenance fees | ||
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
|
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 20140709 |