US20040020781A1 - Electro-chemical deposition cell for face-up processing of single semiconductor substrates - Google Patents
Electro-chemical deposition cell for face-up processing of single semiconductor substrates Download PDFInfo
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- US20040020781A1 US20040020781A1 US10/630,185 US63018503A US2004020781A1 US 20040020781 A1 US20040020781 A1 US 20040020781A1 US 63018503 A US63018503 A US 63018503A US 2004020781 A1 US2004020781 A1 US 2004020781A1
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- substrate
- plating surface
- electroplating solution
- anode
- support member
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/004—Sealing devices
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
- C25D17/08—Supporting racks, i.e. not for suspending
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/20—Electroplating using ultrasonics, vibrations
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge clamping, e.g. clamping ring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft
Definitions
- the present invention generally relates to deposition of a metal layer onto a substrate. More particularly, the present invention relates to electroplating a metal layer onto a substrate.
- Sub-quarter micron multi-level metallization is one of the key technologies for the next generation of ultra large scale integration (ULSI).
- the multilevel interconnects that lie at the heart of this technology require planarization of interconnect features formed in high aspect ratio apertures, including contacts, vias, lines and other features. Reliable formation of these interconnect features is very important to the success of ULSI and to the continued effort to increase circuit density and quality on individual substrates and die.
- Elemental aluminum (Al) and its alloys have been the traditional metals used to form lines and plugs in semiconductor processing because of aluminum's perceived low electrical resistivity, its superior adhesion to silicon dioxide (SiO2), its ease of patterning, and the ability to obtain it in a highly pure form.
- Al has a higher electrical resistivity than other more conductive metals such as copper, and aluminum also can suffer from electromigration phenomena. Electromigration is believed to be the motion of ions of a metal conductor in response to the passage of high current through it, and it is a phenomenon that occurs in a metal circuit while the circuit is in operation, as opposed to a failure occurring during fabrication. Electromigration can lead to the formation of voids in the conductor.
- a void may accumulate and/or grow to a size where the immediate cross-section of the conductor is insufficient to support the quantity of current passing through the conductor, leading to an open circuit.
- the area of conductor available to conduct heat therealong likewise decreases where the void forms, increasing the risk of conductor failure.
- This problem is sometimes overcome by doping aluminum with copper and with tight texture or crystalline structure control of the material.
- electromigration in aluminum becomes increasingly problematic as the current density increases.
- Copper and its alloys have lower resistivities than aluminum and significantly higher electromigration resistance as compared to aluminum. These characteristics are important for supporting the higher current densities experienced at high levels of integration and increase device speed. Copper also has good thermal conductivity and is available in a highly pure state. Therefore, copper is becoming a choice metal for filling sub-quarter micron, high aspect ratio interconnect features on semiconductor substrates.
- FIG. 1 is a cross sectional view of a simplified fountain plater.
- the fountain plater 10 includes an electrolyte container 12 having a top opening, a substrate holder 14 disposed above the electrolyte container 12 , an anode 16 disposed at a bottom portion of the electrolyte container 12 and a cathode 20 contacting the substrate 18 .
- the cathode 20 comprises a plurality of contact pins distributed about the peripheral portion of the substrate 18 to provide a bias about the perimeter of the substrate.
- the contact pins generally provide a higher current density near the contact points on the substrate surface, resulting in a non-uniform deposition on the substrate surface.
- the semiconductor substrate 18 is positioned a fixed distance above the cylindrical electrolyte container 12 , and the electrolyte impinges perpendicularly on the substrate plating surface. Because of the dispersion effects of the electrical current at the exposed edges of the substrate 18 and the non-uniform flow of the electrolyte, the fountain plater 10 provides non-uniform current distribution, particularly at the region near the edges and at the center of the substrate 18 that results in non-uniform plating of the metal.
- the electrolyte flow uniformity at the center of the substrate 18 can be improved by rotating the substrate 18 . However, the plating uniformity still deteriorates as the boundaries or edges of the substrate are approached.
- the fountain plater 10 presents additional difficulties in substrate transfers because the substrate has to be flipped for face-down plating.
- substrates are transferred by robots having robot blades with a substrate supporting surface, and the substrates are transferred with the surface to be processed face-up.
- the robot blade does not contact the surface to be processed to eliminate risk of damaging the substrate surface.
- additional devices are required to flip the substrate from a face-up transferring position to a face-down processing position.
- the invention generally provides an apparatus and a method for electro-chemically depositing a uniform metal layer onto a substrate. More specifically, the invention provides an electro-chemical deposition cell for face-up processing of semiconductor substrates comprising a substrate support member, a cathode connected to the substrate plating surface, an anode disposed above the substrate support member and an electroplating solution inlet supplying an electroplating solution fluidly connecting the anode and the substrate plating surface.
- the anode comprises a consumable metal source disposed in a liquid permeable structure, and the anode and a cavity ring define a cavity for holding and distributing the electroplating solution to the substrate plating surface.
- the invention also provides a substrate support member for face-up electro-plating.
- the substrate support member comprises a vacuum chuck having vacuum ports disposed on the substrate supporting surface that serves to provide suction during processing and to provide a blow-off gas flow to prevent backside contamination during substrate transfers.
- the substrate support member also rotates and vibrates during processing to enhance the electrodeposition onto the substrate plating surface.
- Another aspect of the invention provides a dual catch-cup system comprising an electroplating solution catch-cup and a rinse catch-cup.
- the dual catch-cup system provides separation of the electroplating solution and the rinse solutions during processing and provides re-circulating systems for the different solutions of the electroplating system.
- the invention also provides an apparatus for delivering electrical power to a substrate surface comprising an annular ring electrically connected to a power supply, the annular ring having a contact portion to electrically contact a peripheral portion of the substrate surface.
- the contact portion comprises annular surface, such as a metal impregnated elastomer ring, to provide continuous or substantially continuous electrical contact with the peripheral portion of the substrate.
- the invention provides a uniform distribution of power to a substrate deposition surface by providing a uniform current density across the substrate deposition surface through the continuous annular contact portion.
- the invention also prevents process solution contamination of the backside of the substrate by providing a seal between the contact portion of the annular ring and the substrate deposition surface.
- a substrate holder having a substrate support surface and an annular ring electrically connected to a power supply, the annular ring having a contact portion to electrically contact a peripheral portion of the substrate surface.
- the substrate holder is preferably connected to one or more actuators that provide rotational movement and/or vibrational agitation to the substrate holder during processing to enhance deposition uniformity.
- the substrate holder comprises a vacuum chuck having a substrate supporting surface, and an O-ring is disposed around a substrate supporting surface to seal the backside of the substrate from contamination by the processing solutions.
- FIG. 1 is a cross sectional view of a simplified fountain plater.
- FIG. 2 is a partial cut-away perspective view of an electro-chemical deposition cell showing the interior components of the electro-chemical deposition cell.
- FIG. 3 is a cross sectional schematic view of an electro-chemical deposition cell 200 showing a robot blade transferring a substrate 202 into the electro-chemical deposition cell 200 .
- FIG. 4 is a cross sectional schematic view of an electro-chemical deposition cell 200 having a substrate 202 disposed on a substrate support member 204 in a processing position according to the invention.
- FIG. 5 is a cross sectional view of a substrate support member 204 in a transferring position having a substrate disposed on elevated lift pins.
- FIG. 6 is a cross sectional view of an alternative embodiment of the substrate support member 204 showing two separate fluid conduits and dual level lip seals.
- FIG. 7 is a bottom perspective view of a cathode clamp ring having an alternative embodiment of the contact portion comprising a plurality of contact pads.
- FIG. 8 is a partial cross sectional schematic view of another embodiment of a cathode clamp ring.
- FIG. 9 is a cross sectional partial view of a cathode clamp ring showing another embodiment of a contact portion of the clamp ring.
- FIG. 10 is a see-through perspective of a section of an embodiment of a metal impregnated elastomer ring 350 .
- FIG. 11 is a top view of an electroplating solution catch cup 246 .
- FIG. 12 is a cross sectional schematic view of an electro-chemical deposition cell 200 showing one embodiment of the anode/cavity ring assembly for drip control where a substrate support member 204 is shown positioned in a rinsing position according to the invention.
- FIG. 13 is a top view of a shutter plate 238 positioned above cathode clamp ring 210 , showing an alternative solution for controlling the dripping of residual electroplating solutions from the anode/cavity ring assembly.
- FIG. 14 is a side view of an electro-chemical deposition cell having a sub-chamber for the anode/cavity ring assembly.
- FIG. 15 is a bottom view of an electroplating solution catch cup 246 showing three rinse spouts 260 disposed on a bottom surface of the electroplating solution catch cup 246 .
- FIG. 16 is a top view of a rinse catch cup 264 .
- the invention generally provides an electro-chemical deposition cell wherein a substrate is positioned with a deposition surface “face up.” An electroplating solution is pumped through a top portion of the cell over the exposed substrate deposition surface and collected in a peripheral catch cup drain about the perimeter of the substrate. Additionally, the cell includes means for in situ cleaning and/or rinsing of the electro-chemically deposited substrate.
- FIG. 2 is a partial cut-away perspective view of an electro-chemical deposition cell showing the interior components of the electro-chemical deposition cell.
- the electro-chemical deposition cell 200 comprises a substrate support member 204 , a cathode clamp ring 210 , an anode plate 230 above the cathode clamp ring 210 and an electroplating solution inlet 240 supplying an electroplating solution into the electro-chemical deposition cell 200 above the substrate or in the flow direction of the substrate surface to be plated.
- the electro-chemical deposition cell 200 includes a cell enclosure 100 comprising an enclosure lid 102 , an enclosure side wall 104 and an enclosure bottom 106 .
- the enclosure 100 has a cylindrical interior and is made of an electrically insulative material.
- the enclosure side wall 104 includes a slit opening 280 for transfer of substrates into and out of the electro-chemical deposition cell 200 , and a slit valve 282 disposed on an outer surface of the enclosure side wall 104 opens only during the substrate transfer operation and covers the slit opening 280 during processing to provide a sealed processing environment.
- a drip awning 284 is preferably disposed above the slit opening 280 , extending inwardly from an inner surface of the enclosure side wall 104 , to guard the opening 280 from direct receipt of the electroplating solution and thus prevent a processing solution from leaking out of the cell through the slit opening 280 .
- the anode plate 230 is disposed within a cavity ring 236 at a top portion of the electro-chemical deposition cell 200 .
- the anode plate 230 is electrically connected to a power supply 90 .
- the substrate support member 204 is disposed at a bottom portion of the electro-chemical deposition cell 200 .
- the cathode clamp ring 210 preferably supported by an annular electroplating solution catch cup 246 , is disposed in a middle portion of the electro-chemical deposition cell 200 between the substrate support member 204 and the anode plate 230 .
- the cathode clamp ring 210 is positioned in the electro-chemical deposition cell 200 such that the movement of the substrate support member 204 from the load/transfer position (FIG. 3) to the processing position (FIG. 4) lifts the cathode clamp ring 210 slightly off the annular electroplating solution catch cup 246 .
- an electroplating solution pump 92 which is connected to the electroplating solution inlet 240 , pumps the electroplating solution from an electroplating solution reservoir 94 into the electro-chemical deposition cell 200 .
- an electroplating solution outlet 258 is connected to an electroplating solution drain 244 on the electroplating solution catch cup 246 to return the electroplating solution back to the electroplating solution reservoir 94 to be re-circulated through the electro-chemical deposition cell 200 .
- FIG. 3 is a cross sectional schematic view of an electro-chemical deposition cell 200 showing a robot blade 88 transferring a substrate 202 into the electro-chemical deposition cell 200
- FIG. 5 is a cross sectional schematic view of a substrate support member 204 in a transferring position according to the invention.
- FIGS. 2A and 3A the sequence for loading and unloading a substrate may be seen.
- a robot blade 88 transfers a substrate 202 into the electro-chemical deposition cell 200 through the slit opening 280 and positions the substrate 202 above the substrate support member 204 .
- the substrate support member 204 is retracted fully to a bottom portion of the electro-chemical deposition cell 200 . Then, as shown in FIG. 5, a plurality of lift pins 322 extend through vertical bores 324 in the substrate support member 204 and lift the substrate 202 above the robot blade 88 . The robot blade 88 then retracts out of the chamber, and the slit valve 282 closes the slit opening 280 .
- the substrate support member 204 comprises a vacuum chuck 290 made of an insulating material and a conductive base plate 292 providing a cathode connection to the cathode clamp ring 210 .
- the vacuum chuck 290 secures a substrate 202 onto a substrate supporting surface 206 on the substrate support member 204 during processing.
- one or more vacuum ports 294 are disposed in the substrate support member 204 and are connected to one or more vacuum channels 296 disposed on the substrate supporting surface 206 to secure the substrate 202 through vacuum suction.
- the vacuum channels 296 are generally disposed evenly across the surface of the substrate member in a web-like fashion (as shown in FIG. 2).
- An outer seal 298 comprising an O-ring, or alternatively, a double O-ring, disposed in a recess 300 surrounding the substrate supporting surface 206 is provided to create a vacuum seal between a backside 215 of the substrate 202 and the substrate supporting surface 206 when the vacuum chuck 290 is activated.
- the outer seal 298 also provides a seal against substrate backside contamination by the electroplating solution and other processing solutions. Eliminating the substrate backside contamination eliminates the need for a post deposition backside cleaning process, thus reducing system cost and complexity.
- a vacuum conduit 302 within the vacuum chuck 290 connects the vacuum ports 294 and vacuum channels 296 to a central vacuum conduit 304 within a rotating shaft 306 .
- the rotating shaft 306 extends through a shaft sleeve 308 and is connected to a rotary actuator 310 disposed on a platform 342 .
- the shaft sleeve 308 is also disposed on the platform 342 to maintain a fixed vertical relationship with the rotating shaft 306 .
- a set of lip seals 314 disposed between the rotating shaft 306 and the shaft sleeve 308 allows free rotational movement of the rotating shaft 306 within the shaft sleeve 308 while providing a sealed region 316 between an outer surface of the rotating shaft 306 and an inner surface of the shaft sleeve 308 .
- the central vacuum conduit 304 includes an opening 312 fluidly connecting the central vacuum conduit 304 and the sealed region 316 .
- a vacuum outlet 318 extends through the shaft sleeve 308 and fluidly connects to the sealed region 316 .
- a vacuum pump 360 is connected to the vacuum outlet 318 to provide a vacuum suction through the vacuum outlet 318 , the sealed region 316 , the opening 312 , the central vacuum conduit 304 , the vacuum conduit 302 , the vacuum ports 294 and the vacuum channels 296 to hold the substrate 202 on the substrate support surface 206 .
- a gas pump 370 connected to a gas supply 372 is selectively connected through a control valve 374 to the vacuum outlet 318 to supply a blow off gas to the vacuum ports 294 .
- the blow off gas prevents leftover rinsing agent from contaminating the backside of the processed substrate when the substrate is lifted above the substrate support member 204 and transferred out of the electro-chemical deposition cell 200 .
- the control valve 374 shuts the connection to the vacuum pump 360 when the gas pump 370 is activated to pump the blow-off gas to the vacuum ports 294 , and the control valve 274 shuts the connection to the gas supply 372 and the gas pump 370 when the vacuum pump 360 is activated to hold the substrate 202 on the support member 204 .
- the vacuum ports 294 direct the blow off gas toward the backside edge of the substrate 202 to prevent any leftover rinsing agent from reaching the backside 215 of the substrate 202 .
- FIG. 6 is a cross sectional view of an alternative embodiment of the substrate support member 204 showing two separate fluid conduits and dual level lip seals.
- the fluid delivery system may be adapted to accommodate a number of separate fluids by increasing the number of fluid conduits and lips seals.
- the embodiment as shown in FIG. 6 provides a substrate support member 204 capable of rotating while delivering two separate fluids through separate fluid conduits to the substrate support surface 206 .
- the first central fluid conduit 404 A includes a first opening 412 A fluidly connecting the first central fluid conduit 404 A and a first sealed region 416 A sealed by a first set of lip seals 414 A.
- a first fluid inlet 418 A extends through the shaft sleeve 308 and fluidly connects to the first seal region 416 A.
- a first fluid supply 420 A is connected to the first fluid inlet 418 A through a first pump 422 A.
- the second central fluid conduit 404 B includes a second opening 412 B fluidly connecting the second central fluid conduit 404 B and a second sealed region 416 B sealed by a second set of lip seals 414 B.
- a second fluid inlet 418 B extends through the shaft sleeve 308 and fluidly connects to the second seal region 416 B.
- a second fluid supply 420 B is connected to the second fluid inlet 418 B through a second pump 422 B.
- the sets of lip seals 414 A are provided.
- the rotating shaft 306 and the shaft sleeve 308 allows free rotational movement of the rotating shaft 306 within the shaft sleeve 308 while providing the sealed regions 416 A, 416 B between an outer surface of the rotating shaft 306 and an inner surface of the shaft sleeve 308 .
- two separate fluids can be simultaneously delivered to the substrate supporting surface 214 while the substrate support member 204 is rotated.
- one of the pumps 422 A and 422 B is substituted with a vacuum pump to provide separate routes of vacuum suction and gas delivery to the substrate supporting surface 214 .
- both of the gas pumps 422 A and 422 B may be substituted with two vacuum pumps to provide differential vacuum regions at the substrate supporting surface 214 .
- each sealed region described above preferably uses one set of lip seals (i.e., two lip seals), a subsequent sealed region (i.e., other than the first sealed region) requires only one additional lip seal.
- a subsequent sealed region i.e., other than the first sealed region
- three lip seals can create two sealed regions, one between the first lip seal and the second lip seal and another between the second lip seal and the third lip seal.
- the rotating shaft 306 extends through a lift pin platform 320 having a plurality of lift pins 322 disposed thereon.
- the lift pins 322 preferably a set of four, extend through bores 324 through the substrate support member 204 to lift a substrate 202 above the substrate support surface 206 .
- a lift platform actuator 326 moves the lift pin platform 320 vertically to lift and lower a substrate 202 for transfer into and out of the electro-chemical deposition cell 200 .
- the lift platform actuator 326 is disposed on an outer surface of the shaft sleeve 308 and includes a push rod 327 to actuate movement of the lift pin platform 320 .
- the lift platform actuator 326 extends the push rod 327 to contact a bottom surface of the lift pin platform 320 and push the lift pin platform 320 upwards. To lower the lift pin platform 320 , the lift platform actuator 326 retracts the push rod 327 to disengage the lift pin platform 320 . When the push rod 327 of the lift platform actuator 326 is fully retracted, the push rod 327 does not contact the lift pin platform 320 , and the lift pin platform 320 rests on a platform ridge 329 extending from an outer surface of the rotating shaft 306 above the shaft sleeve 308 .
- One or more vertical tabs 328 extend from an upper portion of the outer surface of the rotating shaft 306 into one or more matching vertical grooves 330 in the lift pin platform 320 so that the lift pin platform 320 rotates in unison with the rotating shaft 306 .
- the tabs 328 also guide the lift pin platform 320 vertically when the lift pin platform is being moved by the lift platform actuator 326 .
- a flexible bellow 332 preferably made of polyethylene, is disposed around each lift pin 322 to provide a splash seal against electroplating solutions, rinsing solutions and other process chemicals.
- the flexible bellow 332 is attached from a top surface of the lift pin platform 320 to a bottom surface of the conductive base plate 292 of the substrate support member 204 .
- the flexible bellow 332 compresses when the lift pin platform 320 is elevated by the lift platform actuator 326 and stretches when the lift pin platform 320 is resting on the platform ridge 329 .
- Each flexible bellow 332 also maintains a seal when subjected to a slight side load, such as when the substrate support member rotationally accelerates or decelerates.
- a splash guard 333 is attached to an outer portion of a lower surface of the lift pin platform 320 .
- the splash guard 333 includes a cylindrical downward extension 334 that is disposed radially outward of an upwardly extending inner container wall 336 .
- the inner container wall 336 is a cylindrical upward extension from the enclosure bottom 106 of the electro-chemical deposition cell 200 that holds the process solutions to be pumped out of the system through the outlet 259 .
- the splash guard 334 and the inner container wall 336 create a sufficient overlap so that when the lift pin platform 320 is raised to it highest position during processing, there is still an overlap between the tip of the splash guard 334 and the tip of the inner container wall 336 (as shown in FIG. 4).
- a rotary actuator 310 is disposed on a platform 342 and connected to the rotating shaft 306 .
- the rotary actuator 310 rotates the rotating shaft 306 freely within the shaft sleeve 308 .
- an actuator 346 extends and retracts a shaft 344 connected to the platform 342 .
- the actuator 346 is disposed outside of the enclosure 100 on the enclosure bottom 106 , and the shaft 344 extends through the enclosure bottom 106 and is attached to a bottom surface of the platform 342 .
- the shaft sleeve 308 is also disposed on the platform 342 .
- the actuator 346 also provides a vibrational agitation to the substrate support member 204 to enhance deposition onto the substrate deposition surface 214 .
- a vibrator (not shown) can be attached to the substrate support member 204 to provide the vibrational agitation.
- the catch cup 246 is an annular structure extending inwardly from the enclosure side wall 104 of the electro-chemical deposition cell 200 to a bottom surface 220 of the cathode clamp ring 210 .
- the cathode clamp ring 210 preferably includes an outer portion having a downwardly sloping surface 256 that overlaps an inner terminus 250 of the catch cup 246 to assist the electroplating solution flow into the catch cup 246 .
- the inner terminus 250 includes a ridge 252 corresponding to a recess 254 on the bottom surface 220 of the cathode clamp ring 210 .
- the ridge 252 supports the cathode clamp ring 210 when the substrate support member 204 is not engaged in a deposition position.
- the cathode clamp ring 210 is lifted from the ridge 252 and is supported on the substrate deposition surface 214 .
- the electrical power is delivered by the cathode clamp ring 210 to the substrate deposition surface 214 through a contact portion 208 of the cathode clamp ring 210 .
- one or more cathode contacts 216 are fixedly secured to a bottom surface 218 of the conductive base plate 292 of the substrate support member 204 and extends radially outwardly to electrically contact a bottom surface 220 of the cathode clamp ring 210 .
- the electrical power is conducted through the rotating shaft 306 to the conductive base plate 292 , then through one or more cathode contacts 216 secured onto the conductive base plate 292 , and then to a bottom surface 220 of the cathode clamp ring 210 .
- the cathode contact 216 comprises a spring loaded metal strip that maintains constant electrical contact with the bottom surface 220 of the cathode clamp ring 210 during processing when the substrate support member 204 is rotated and/or vibrated.
- the cathode clamp ring 210 is fixedly connected to the power supply through connection wires (not shown).
- a rotating cathode connection 340 is disposed at a top portion of the shaft sleeve 308 and connected to the power source 90 .
- the rotating shaft 306 preferably comprises an electrically conductive material, and the rotating cathode connection 340 movably contacts the outer surface of the rotating shaft 306 to maintain electrical conduction to the rotating shaft 306 while the rotating shaft 306 is rotating.
- the rotating cathode connection 340 preferably comprises a plurality of conductive ball bearings 341 disposed between a pair of ring seals 343 .
- the rotating cathode connection 340 is filled with mercury to enhance the electrical conductivity of the rotating cathode connection 340 while the rotating shaft 306 is rotated.
- the cathode clamp ring 210 comprises an annular conductive member having a central opening defining the deposition area on a substrate deposition surface that is exposed to the electroplating solution during processing.
- the cathode clamp ring 210 is electrically connected to the power source 90 through the cathode contacts 216 and the substrate support member 204 and includes a contact portion 208 to electrically contact the substrate deposition surface 214 and to provide an electrical power (voltage and current) to the substrate deposition surface 214 to enable the electro-chemical deposition process.
- the contact portion 208 preferably extends a minimal radial distance inward above a perimeter edge 212 of the substrate 202 , but a distance sufficient to electrically contact a metal seed layer on the substrate deposition surface 214 .
- the contact portion 208 includes an annular surface providing a continuous contact around a peripheral portion of the substrate deposition surface 214 .
- the electrical power is uniformly distributed on the substrate deposition surface 214 .
- the increase in the electrical interface, as compared to an individual contact finger arrangement, also minimizes the fringing effect that occurs with individual cathode contact pins that cause non-uniform deposition.
- the contact portion 208 comprises a plurality of contact pads 217 (as shown in FIG. 7) positioned to contact substantially around the peripheral portion of the substrate deposition surface 214 .
- cathode clamp ring 210 While the cathode clamp ring 210 is engaged with the substrate 202 , cathode clamp ring 210 rotates with the substrate support member 204 because of the frictional force between the contact portion 208 and the substrate deposition surface 214 .
- the cathode clamp ring 210 includes a plurality of locking grooves (not shown) disposed on the bottom surface 220 to receive the cathode contacts 216 . With the cathode contacts 216 engaged in the locking grooves, the cathode clamp ring 210 rotates synchronously with the substrate support member 204 without depending on the frictional force between the contact portion 208 and the substrate deposition surface 214 .
- FIG. 8 is a partial cross sectional schematic view of another embodiment of a cathode clamp ring.
- the cathode clamp ring 210 includes a contact portion 208 comprising a metal impregnated elastomer ring 350 electrically contacting a peripheral portion of the substrate deposition surface 214 .
- the metal impregnated elastomer ring 350 is disposed on a ridge 351 on a stepped surface 209 of the cathode clamp ring 210 .
- the metal impregnated elastomer ring 350 is secured to the stepped surface 209 of the cathode clamp ring 210 by an adhesive that is unaffected by the electroplating solution and process.
- the metal impregnated elastomer ring 350 is secured to the stepped surface 209 of the cathode clamp ring 210 by a fastener (not shown) such as a screw or a bolt.
- a fastener such as a screw or a bolt.
- the cathode clamp ring 210 includes an annular dove-tail groove (not shown) disposed on the stepped surface 209 that squeezes and holds the metal impregnated elastomer ring 350 .
- the metal impregnated elastomer ring 350 provides electrical conduction through metal particles or short wires disposed in a hydrophobic elastomer matrix.
- FIG. 9 is a cut-away perspective of a section of an embodiment of a metal impregnated elastomer ring 350 .
- the metal impregnated elastomer ring 350 generally comprises an outer elastomer ring 352 , an inner elastomer ring 354 and a metal ring 356 sandwiched between the inner elastomer ring 352 and the outer elastomer ring 354 .
- the metal ring 356 comprises a plurality of individual metal wires 358 extending at a slanted angle a (other than perpendicular to a top and/or a bottom surface of the elastomer ring 350 ) from a top surface of the elastomer ring 350 to a bottom surface of the elastomer ring 350 .
- the metal wires 358 conduct electrical power from the cathode clamp ring 210 to the substrate deposition surface 214 .
- a top end 357 of the metal wires 358 contacts the cathode clamp ring 210
- a bottom end 359 of the metal wires 358 contacts the substrate deposition surface 214 .
- the slanted angle a of the metal wires 358 enhances the ability of the metal impregnated elastomer ring 350 to compress and form a seal on the substrate deposition surface 214 while providing electrical contact to the substrate deposition surface 214 , i.e., by the individual metal wires sliding relative to each other and increasing the angle a as needed.
- One exemplary metal impregnated elastomer ring is available from Shin-Etsu Handotai America, Inc., Vancouver, Wash.
- the metal impregnated elastomer ring 350 provides a compliant contacting interface with the substrate deposition surface 214 that reduces the risk of scratching the substrate deposition surface 214 by the contact portion 208 of the cathode clamp ring 210 .
- the metal impregnated elastomer ring 350 also seals the contact interface from the process solutions so that the metal conductors in the elastomer matrix are not exposed to the processing solutions which can change the properties of the metal conductors.
- the invention contemplates other embodiments of metal impregnated elastomers having different arrangements of electrically conductive particles within the elastomer matrix for use as the contact portion 208 of the cathode clamp ring 210 .
- FIG. 10 is a cross sectional partial view of a cathode clamp ring showing another embodiment of a contact portion of the clamp ring.
- the contact portion 208 of the cathode clamp ring 210 comprises an annular downward extension of the conductive metal from a bottom surface 209 of the cathode clamp ring 210 .
- the annular down ward extension is preferably a wedge-shaped annular ring.
- An inner concentric O-ring 211 and an outer concentric O-ring 213 are attached to the bottom surface 209 of the cathode clamp ring 210 surrounding the contact portion 208 .
- the O-rings 211 and 213 provide a sealed environment for the contact portion 208 during the electro-chemical deposition process while the contact portion 208 conducts electrical power to the substrate deposition surface 214 .
- an alternative embodiment of a support for the cathode clamp ring 210 utilizes a kinematic coupling between the cathode clamp ring 210 and the inner terminus 250 of the catch cup 246 .
- Utilizing kinematic coupling allows positive location of concentric parts such as the cathode clamp ring 210 in relation with the electroplating solution catch cup 246 .
- the kinematic coupling generally comprises a plurality of ball bearings 361 (only one shown) disposed partially in a plurality of seats 363 on a top surface of the inner terminus 250 and a corresponding groove 362 on a bottom surface of the cathode clamp ring 210 to receive a top portion of the ball bearing 361 .
- the kinematic coupling uses three ball bearings 361 to center the cathode clamp ring 210 .
- One ball bearing locates the radial position while the other two ball bearings locate the angular position of the clamp ring 210 .
- FIG. 11 where a top view of an electroplating solution catch cup 246 is shown, preferably two electroplating solution drains 244 are disposed diametrically in opposing corners of the electro-chemical deposition cell 200 .
- the electroplating solution catch cup 246 is disposed in a middle portion of the electro-chemical deposition cell 200 to direct the electroplating solution to one or more electroplating solution drains 244 .
- the electroplating solution is pumped through the electroplating solution inlet 240 into the cavity 242 , passes through the anode plate 230 onto the substrate deposition surface 214 (see FIG.
- the catch cup 246 includes a downwardly sloping top surface 248 from an inner terminus 250 to the electroplating solution drain 244 to direct the electroplating solution overflowing the cathode clamp ring 210 to the electroplating solution drain 244 .
- the size (inner diameter) of the electroplating solution drain 244 and the slope and length of the top surface 248 is adapted to accommodate a particular flow rate so that the electroplating solution does not overflow the catch cup 246 and spill over the ridge 252 .
- the electroplating solution drain 244 is connected to an electroplating solution outlet 258 that transports the processed electroplating solution to the electroplating solution reservoir 94 .
- the electroplating solution is then pumped to the electroplating solution inlet 240 and re-circulates through the electro-chemical deposition cell 200 .
- a cavity ring 236 comprising a generally cylindrical structure is disposed at a top potion of the electro-chemical deposition cell 200 to hold an anode plate 230 and the electroplating solution to be distributed through the anode plate 230 .
- the anode plate 230 is disposed at a bottom portion of the cavity ring 236 on a ridge 232 extending inwardly from an inner surface 234 of the cavity ring 236 .
- the inner surface 234 of the cavity ring 236 and the top surface 231 of the anode plate 230 define a cavity 242 for holding the electroplating solution to be distributed through the anode plate 230 .
- An electroplating solution inlet 240 disposed on the enclosure lid 102 supplies the electroplating solution into the cavity 242 .
- the electroplating solution inlet 240 is connected to an electroplating solution pump 92 that pumps the electroplating solution from an electroplating solution reservoir 94 .
- the anode plate 230 has substantially the same shape as the substrate deposition surface 214 and includes a plurality of perforations to distribute the electroplating solution uniformly across the substrate deposition surface 214 .
- the anode plate 230 is electrically connected to a power source 90 and preferably comprises a consumable metal that can dissolve in the electroplating solution to provide the metal particles to be deposited onto the substrate deposition surface 214 .
- a power source 90 preferably comprises a consumable metal that can dissolve in the electroplating solution to provide the metal particles to be deposited onto the substrate deposition surface 214 .
- metal ions dissociate from the surface of the consumable metal anode plate 230 into the electroplating solution.
- the anode plate 230 comprises an electrode and consumable metal particles encased in a fluid permeable membrane such as a porous ceramic plate.
- a fluid permeable membrane such as a porous ceramic plate.
- An alternative to the consumable anode plate is a non-consumable anode plate that is perforated or porous for passage of the electroplating solution therethrough.
- the electroplating solution requires a metal particle supply to continually replenish the metal particles to be deposited in the process.
- an agitator 237 is preferably attached to the cavity ring 236 to agitate the electroplating solution.
- the agitator 237 generally comprises a megasonic or an ultrasonic finger that transfers a vibration to the electroplating solution by vibrating the cavity ring 236 .
- the electroplating solution is pumped into the cell 200 , and the electroplating solution is drained from the cell 200 through the electroplating solution drains 244 .
- some electroplating solution may collect on the anode plate 230 and the cavity ring 236 and then drip onto the processed substrate deposition surface 214 .
- the anode/cavity ring assembly is preferably moved away from the region above the substrate.
- FIG. 12 shows one embodiment of the anode/cavity ring assembly for drip control where a substrate support member 204 is shown positioned in a rinsing position according to the invention.
- the assembly of the cavity ring 236 and the anode plate 230 comprises two symmetrical halves split by a central vertical plane.
- An actuator 237 is connected to each half to pull apart the anode/cavity ring assembly after the deposition phase of the process.
- Each half of the anode/cavity ring assembly is moved to the region above the electroplating solution catch cup 246 so that the residual electroplating solution drips into the electroplating solution catch cup.
- FIG. 13 is a top view of a shutter plate 238 positioned above cathode clamp ring 210 , showing an alternative solution for controlling the dripping of residual electroplating solutions from the anode/cavity ring assembly.
- a shutter plate 238 moves into the region between the anode/cavity ring assembly and the cathode clamp ring 210 to block the dripping residual electroplating solution from contaminating the processed substrate deposition surface.
- the shutter plate 238 is attached to a rotary shutter actuator 239 and retracted into a shutter plate chamber 237 during the deposition process. Once the deposition phase is completed, the rotary shutter actuator 239 rotates the shutter plate 238 below the anode/cavity ring assembly and blocks the dripping residual electroplating solution.
- FIG. 14 is a side view of an electro-chemical deposition cell having a sub-chamber for the anode/cavity ring assembly.
- the anode/cavity ring assembly is attached to a rotary assembly actuator 241 that moves the anode/cavity ring assembly into a sub-chamber 243 after the deposition phase of the process.
- a rotary assembly actuator 241 that moves the anode/cavity ring assembly into a sub-chamber 243 after the deposition phase of the process.
- a layer of electroplating solution is typically left on the processed substrate deposition surface after the deposition phase of the process.
- a rinse agent is sprayed over the surface, and then the substrate is spun dry.
- a rinsing agent reservoir 96 supplies the rinse agent and is connected to a rinse agent manifold 261 through a rinse agent pump 97 .
- One or more rinse spray spouts 260 are connected to the rinse agent manifold 261 to spray a rinse agent, such as deionized water or nitrogen gas, over the processed substrate deposition surface.
- a substrate support member 204 is shown positioned in a rinsing position according to the invention.
- one or more rinse spray spouts 260 are disposed on a bottom surface 262 of the inner terminus 250 of the electroplating solution catch cup 246 .
- the rinse spray spouts 260 spray the rinse agent over the processed substrate deposition surface 214 after completion of the electro-chemical deposition process when the substrate support member 214 is lowered to a rinsing position.
- the substrate support member 204 is positioned below a horizontal plane defined by the rinse spray spouts 260 but above a horizontal plane defined by the tip of a rinse catch cup 264 .
- FIG. 15 is a bottom view of an electroplating solution catch cup 246 showing three rinse spouts 260 disposed on a bottom surface of the electroplating solution catch cup 246 .
- the rinse spouts 260 spray a mist of rinse agents over the processed substrate deposition surface 214 .
- the rinse agent collect on the processed substrate deposition surface 214 to create a sheeting action of the rinse agent that removes the residual electroplating solution from the processed substrate deposition surface 214 .
- the substrate support member 204 is then rotated to spin dry the substrate and remove the rinse agent from the processed substrate deposition surface 214 .
- FIG. 16 is a top view of a rinse catch cup 264 .
- a rinse catch cup 264 is disposed below the electroplating solution catch cup 246 and extends inwardly from the enclosure side wall 104 of the electro-chemical deposition cell 200 to direct overflowing rinse agents and any residual electroplating solution to a rinse drain 270 .
- the inner terminus 266 of the rinse catch cup 264 defines an opening which outlines the circumference of the substrate support member 204 and allows the passage of the substrate support member 204 therethrough.
- the rinse catch cup 264 includes a downwardly sloping top surface 268 from the inner terminus 266 to a rinse drain 270 .
- the rinse spray spout 260 sprays the rinse agent over the processed substrate deposition surface 214 to clean the deposited surface and to remove any excess electroplating solution remaining on the substrate deposition surface 214 .
- the rinse agent flows over the deposited substrate surface into the rinse catch cup 264 to the rinse drain 270 that drains the rinse agent to a bottom portion of the cell 200 .
- the lower portion of the electro-chemical deposition cell 200 serves as a catch bowl, and an outlet 259 on the enclosure bottom 106 returns the used rinse solution to a purifier 98 and then back to the rinse solution reservoir 96 to be re-used for subsequent rinses (shown in FIG. 3).
- the rinse agent is then pumped out of the electro-chemical deposition cell 200 through an outlet 259 into a rinse agent reservoir 96 .
- FIG. 3 is a cross sectional schematic view of an electro-chemical deposition cell 200 showing a robot blade transferring a substrate 202 into the electro-chemical deposition cell 200 .
- a slit valve 282 is opened during the substrate transfer, and a robot blade 88 having a substrate 202 thereon enters the electro-chemical deposition cell 200 through the slit opening 280 .
- the substrate 202 is positioned above the substrate support member 204 , and the lift pin platform is elevated.
- FIG. 3 is a cross sectional schematic view of the electro-chemical deposition cell 200 showing a substrate positioned over a substrate support member 204 and supported by lift pins 272 .
- the lift platform actuator 326 retracts the push rod 327 to lower the lift pin platform 320 and position the substrate 202 onto the substrate supporting surface 206 and the outer seal O-ring 298 .
- the vacuum chuck 290 engages the vacuum suction to hold the substrate 202 on the substrate supporting surface 206 , and the outer seal (O-ring) 298 seals the backside of the substrate 202 from the processing chemicals.
- FIG. 4 is a cross sectional schematic view of an electro-chemical deposition cell 200 having a substrate 202 disposed on a substrate support member 204 in a processing position according to the invention.
- the substrate 202 engages the cathode clamp ring 210 , and an electrical power is delivered through the contact portion 208 of the cathode clamp ring 210 to the substrate deposition surface 214 .
- An electroplating solution is pumped through the solution inlet 240 at the enclosure top 102 into the cavity ring 236 above the anode plate 230 .
- the electroplating solution passes through the anode plate 230 onto the substrate deposition surface 214 to deposit a metal layer thereon.
- the rotary actuator 310 rotates the substrate support member 204 about a central axis through the rotating shaft 306 at between about 10 revolutions per minute (RPM) to about 50 RPM, and the actuator 346 provides a vibrational agitation to the substrate support member 204 .
- the rotation and the agitation of the substrate support member 204 provide a uniform exposure of the electroplating solution to the substrate deposition surface 214 and promote uniform deposition thereon. Deposition uniformity is also improved by the continuous cathode contact provided by the cathode clamp ring 210 that distributes a uniform current density across the substrate deposition surface 214 .
- a plate/de-plate scheme is applied during the deposition phase of the process.
- the plate/deplate scheme generally comprises periodic reversal of the electrical current flowing through the electroplating solution between the cathode and the anode.
- the cathode and the anode are biased normally to cause electro-chemical deposition onto the cathode.
- the cathode and the anode are reverse biased and the electrical current is reversed to cause de-plating of the deposited surface.
- the de-plating period removes the crowning or bridging effect at the mouth of the aperture of high aspect ratio features and enhances filling of the feature for the subsequent plating period.
- the electroplating solution flows over the substrate deposition surface 214 , the electroplating solution flows over the cathode clamp ring 210 into the electrolyte catch cup 246 .
- the electroplating solution then flows through the electrolyte drain 244 and is pumped out of the electro-chemical deposition cell 200 through outlet 258 .
- the electroplating solution is re-circulated through the electro-chemical deposition cell 200 until the end of the deposition process.
- the electroplating solution is evacuated from the electro-chemical deposition cell 200 into the electrolyte reservoir 94 until the next deposition process.
- the rotational actuator 310 rotates the substrate support member 204 at a speed sufficient to spin dry the substrate deposition surface 214 by centrifugal force.
- the substrate support member 204 preferably spins at least about 100 RPM to spin dry the substrate 202 .
- the actuator 346 lowers the substrate support member 204 to a rinsing position.
- the substrate 202 is preferably positioned below a horizontal plane defined by the rinse spray spouts 260 but above a horizontal plane defined by the tip of the rinse catch cup 264 .
- the rinse spray spouts 260 spray the rinse agent over the processed substrate deposition surface 214 to clean the deposited surface and to remove any excess electroplating solution remaining on the substrate deposition surface 214 .
- the substrate support member 204 rotates at a speed at least about 100 RPM to spin dry the substrate deposition surface 214 through centrifugal force.
- the rinse agent is drained through the rinse drain 270 to the bottom of the cell 200 and pumped out of the cell 200 through outlet 259 into a rinse agent reservoir 96 .
- the actuator 346 retracts fully and lowers the substrate support member 204 to the transfer position as shown in FIG. 3.
- the vacuum chuck 290 disengages the vacuum suction and releases the substrate 202
- the lift platform actuator 326 extends the push rod 327 to elevate the lift pin platform 320 and the lift pins 272 to lift the processed substrate 202 above the substrate support surface 206 .
- a blow-off gas is pumped through the vacuum chuck 290 out of the vacuum port 294 to provide a gas flow directed at the backside edge of the substrate 202 .
- the blow-off gas prevents any remaining rinse agent from contaminating the backside 215 of the substrate 202 .
- the slit valve 282 opens, and the robot blade 88 extends into the electro-chemical deposition cell 200 through the slit 280 .
- the robot blade 88 is positioned under the elevated substrate 202 , and the lift pins 272 are lowered to position the substrate 202 onto the robot blade 88 .
- the robot blade 88 then retracts out of the electro-chemical deposition cell 200 with the processed substrate, and the process repeats for the next unprocessed substrate.
Abstract
An apparatus and method for electro-chemically depositing a uniform metal layer onto a substrate is provided. In one aspect, the apparatus includes a cathode connected to the substrate plating surface, an anode disposed above the substrate support member and an electroplating solution inlet supplying an electroplating solution fluidly connecting the anode and the substrate plating surface. In another aspect, the apparatus further includes a dual catch-cup system having an electroplating solution catch-cup and a rinse catch-cup. The dual catch-cup system provides separation of the electroplating solution and the rinse solutions during processing and provides re-circulating systems for the different solutions of the electroplating system.
Description
- This application is a divisional of co-pending U.S. patent application Ser. No. 10/178,469, filed on Jun. 24, 2003, which claims the benefit of U.S. patent application Ser. No. 09/294,240, filed on Apr. 19, 1999, which claims the benefit of U.S. Provisional Application Serial No. 60/082,494, filed on Apr. 21, 1998. Each of the aforementioned related patent applications are incorporated by reference herein.
- 1. Field of the Invention
- The present invention generally relates to deposition of a metal layer onto a substrate. More particularly, the present invention relates to electroplating a metal layer onto a substrate.
- 2. Background of the Related Art
- Sub-quarter micron multi-level metallization is one of the key technologies for the next generation of ultra large scale integration (ULSI). The multilevel interconnects that lie at the heart of this technology require planarization of interconnect features formed in high aspect ratio apertures, including contacts, vias, lines and other features. Reliable formation of these interconnect features is very important to the success of ULSI and to the continued effort to increase circuit density and quality on individual substrates and die.
- As circuit densities increase, the widths of vias, contacts and other features, as well as the dielectric materials between them, decrease to less than 250 nanometers, whereas the thickness of the dielectric layers remains substantially constant, with the result that the aspect ratios for the features, i.e., their height divided by width, increases. Many traditional deposition processes have difficulty filling structures where the aspect ratio exceed 4:1, and particularly where it exceeds 10:1. Therefore, there is a great amount of ongoing effort being directed at the formation of void-free, nanometer-sized features having high aspect ratios wherein the ratio of feature height to feature width can be 4:1 or higher. Additionally, as the feature widths decrease, the device current remains constant or increases, which results in an increased current density in the feature.
- Elemental aluminum (Al) and its alloys have been the traditional metals used to form lines and plugs in semiconductor processing because of aluminum's perceived low electrical resistivity, its superior adhesion to silicon dioxide (SiO2), its ease of patterning, and the ability to obtain it in a highly pure form. However, aluminum has a higher electrical resistivity than other more conductive metals such as copper, and aluminum also can suffer from electromigration phenomena. Electromigration is believed to be the motion of ions of a metal conductor in response to the passage of high current through it, and it is a phenomenon that occurs in a metal circuit while the circuit is in operation, as opposed to a failure occurring during fabrication. Electromigration can lead to the formation of voids in the conductor. A void may accumulate and/or grow to a size where the immediate cross-section of the conductor is insufficient to support the quantity of current passing through the conductor, leading to an open circuit. The area of conductor available to conduct heat therealong likewise decreases where the void forms, increasing the risk of conductor failure. This problem is sometimes overcome by doping aluminum with copper and with tight texture or crystalline structure control of the material. However, electromigration in aluminum becomes increasingly problematic as the current density increases.
- Copper and its alloys have lower resistivities than aluminum and significantly higher electromigration resistance as compared to aluminum. These characteristics are important for supporting the higher current densities experienced at high levels of integration and increase device speed. Copper also has good thermal conductivity and is available in a highly pure state. Therefore, copper is becoming a choice metal for filling sub-quarter micron, high aspect ratio interconnect features on semiconductor substrates.
- Despite the desirability of using copper for semiconductor device fabrication, choices of fabrication methods for depositing copper into very high aspect ratio features, such as a 10:1 aspect ratio, 0.1 micron wide vias are limited. Precursors for CVD deposition of copper are ill-developed, and physical vapor deposition into such features produces unsatisfactory results because of voids formed in the features.
- As a result of these process limitations, plating which had previously been limited to the fabrication of lines on circuit boards, is just now being used to fill vias and contacts on semiconductor devices. Metal electroplating in general is well known in the art and can be achieved by a variety of techniques. However, a number of obstacles impair consistent reliable electroplating of copper onto semiconductor substrates having nanometer-sized, high aspect ratio features. Generally, these obstacles deal with providing uniform power distribution and current density across the substrate plating surface to form a metal layer having uniform thickness.
- Present designs of cells for electroplating a metal on semiconductor substrates are based on a fountain plater configuration. FIG. 1 is a cross sectional view of a simplified fountain plater. Generally, the
fountain plater 10 includes anelectrolyte container 12 having a top opening, asubstrate holder 14 disposed above theelectrolyte container 12, ananode 16 disposed at a bottom portion of theelectrolyte container 12 and acathode 20 contacting thesubstrate 18. Thecathode 20 comprises a plurality of contact pins distributed about the peripheral portion of thesubstrate 18 to provide a bias about the perimeter of the substrate. The contact pins generally provide a higher current density near the contact points on the substrate surface, resulting in a non-uniform deposition on the substrate surface. Thesemiconductor substrate 18 is positioned a fixed distance above thecylindrical electrolyte container 12, and the electrolyte impinges perpendicularly on the substrate plating surface. Because of the dispersion effects of the electrical current at the exposed edges of thesubstrate 18 and the non-uniform flow of the electrolyte, thefountain plater 10 provides non-uniform current distribution, particularly at the region near the edges and at the center of thesubstrate 18 that results in non-uniform plating of the metal. The electrolyte flow uniformity at the center of thesubstrate 18 can be improved by rotating thesubstrate 18. However, the plating uniformity still deteriorates as the boundaries or edges of the substrate are approached. - Furthermore, the
fountain plater 10 presents additional difficulties in substrate transfers because the substrate has to be flipped for face-down plating. Generally, substrates are transferred by robots having robot blades with a substrate supporting surface, and the substrates are transferred with the surface to be processed face-up. Preferably, the robot blade does not contact the surface to be processed to eliminate risk of damaging the substrate surface. Because thefountain plater 10 requires face-down processing, additional devices are required to flip the substrate from a face-up transferring position to a face-down processing position. - Therefore, there remains a need for a reliable, consistent copper electroplating technique to deposit and form copper layers on semiconductor substrates having nanometer-sized, high aspect ratio features. There is also a need for a face-up electroplating system that allows fast substrate processing and increases throughput. Furthermore, there is a need for an apparatus for delivering a uniform electrical power distribution to a substrate surface and a need for an electroplating system that provides uniform deposition on the substrate surface.
- The invention generally provides an apparatus and a method for electro-chemically depositing a uniform metal layer onto a substrate. More specifically, the invention provides an electro-chemical deposition cell for face-up processing of semiconductor substrates comprising a substrate support member, a cathode connected to the substrate plating surface, an anode disposed above the substrate support member and an electroplating solution inlet supplying an electroplating solution fluidly connecting the anode and the substrate plating surface. Preferably, the anode comprises a consumable metal source disposed in a liquid permeable structure, and the anode and a cavity ring define a cavity for holding and distributing the electroplating solution to the substrate plating surface.
- The invention also provides a substrate support member for face-up electro-plating. Preferably, the substrate support member comprises a vacuum chuck having vacuum ports disposed on the substrate supporting surface that serves to provide suction during processing and to provide a blow-off gas flow to prevent backside contamination during substrate transfers. The substrate support member also rotates and vibrates during processing to enhance the electrodeposition onto the substrate plating surface.
- Another aspect of the invention provides a dual catch-cup system comprising an electroplating solution catch-cup and a rinse catch-cup. The dual catch-cup system provides separation of the electroplating solution and the rinse solutions during processing and provides re-circulating systems for the different solutions of the electroplating system.
- The invention also provides an apparatus for delivering electrical power to a substrate surface comprising an annular ring electrically connected to a power supply, the annular ring having a contact portion to electrically contact a peripheral portion of the substrate surface. Preferably, the contact portion comprises annular surface, such as a metal impregnated elastomer ring, to provide continuous or substantially continuous electrical contact with the peripheral portion of the substrate. The invention provides a uniform distribution of power to a substrate deposition surface by providing a uniform current density across the substrate deposition surface through the continuous annular contact portion. The invention also prevents process solution contamination of the backside of the substrate by providing a seal between the contact portion of the annular ring and the substrate deposition surface.
- Another aspect of the invention provides an apparatus for holding a substrate for electro-chemical deposition comprising a substrate holder having a substrate support surface and an annular ring electrically connected to a power supply, the annular ring having a contact portion to electrically contact a peripheral portion of the substrate surface. The substrate holder is preferably connected to one or more actuators that provide rotational movement and/or vibrational agitation to the substrate holder during processing to enhance deposition uniformity. Preferably, the substrate holder comprises a vacuum chuck having a substrate supporting surface, and an O-ring is disposed around a substrate supporting surface to seal the backside of the substrate from contamination by the processing solutions.
- So that the manner in which the above recited features, advantages and objects of the present invention are attained can be understood in detail, a more particular description of the invention, briefly summarized above, may be had by reference to the embodiments thereof which are illustrated in the appended drawings.
- It is to be noted, however, that the appended drawings illustrate only typical embodiments of this invention and are therefore not to be considered limiting of its scope, for the invention may admit to other equally effective embodiments.
- FIG. 1 is a cross sectional view of a simplified fountain plater.
- FIG. 2 is a partial cut-away perspective view of an electro-chemical deposition cell showing the interior components of the electro-chemical deposition cell.
- FIG. 3 is a cross sectional schematic view of an electro-
chemical deposition cell 200 showing a robot blade transferring asubstrate 202 into the electro-chemical deposition cell 200. - FIG. 4 is a cross sectional schematic view of an electro-
chemical deposition cell 200 having asubstrate 202 disposed on asubstrate support member 204 in a processing position according to the invention. - FIG. 5 is a cross sectional view of a
substrate support member 204 in a transferring position having a substrate disposed on elevated lift pins. - FIG. 6 is a cross sectional view of an alternative embodiment of the
substrate support member 204 showing two separate fluid conduits and dual level lip seals. - FIG. 7 is a bottom perspective view of a cathode clamp ring having an alternative embodiment of the contact portion comprising a plurality of contact pads.
- FIG. 8 is a partial cross sectional schematic view of another embodiment of a cathode clamp ring.
- FIG. 9 is a cross sectional partial view of a cathode clamp ring showing another embodiment of a contact portion of the clamp ring.
- FIG. 10 is a see-through perspective of a section of an embodiment of a metal impregnated
elastomer ring 350. - FIG. 11 is a top view of an electroplating
solution catch cup 246. - FIG. 12 is a cross sectional schematic view of an electro-
chemical deposition cell 200 showing one embodiment of the anode/cavity ring assembly for drip control where asubstrate support member 204 is shown positioned in a rinsing position according to the invention. - FIG. 13 is a top view of a
shutter plate 238 positioned abovecathode clamp ring 210, showing an alternative solution for controlling the dripping of residual electroplating solutions from the anode/cavity ring assembly. - FIG. 14 is a side view of an electro-chemical deposition cell having a sub-chamber for the anode/cavity ring assembly.
- FIG. 15 is a bottom view of an electroplating
solution catch cup 246 showing three rinsespouts 260 disposed on a bottom surface of the electroplatingsolution catch cup 246. - FIG. 16 is a top view of a rinse
catch cup 264. - The invention generally provides an electro-chemical deposition cell wherein a substrate is positioned with a deposition surface “face up.” An electroplating solution is pumped through a top portion of the cell over the exposed substrate deposition surface and collected in a peripheral catch cup drain about the perimeter of the substrate. Additionally, the cell includes means for in situ cleaning and/or rinsing of the electro-chemically deposited substrate.
- FIG. 2 is a partial cut-away perspective view of an electro-chemical deposition cell showing the interior components of the electro-chemical deposition cell. Generally, the electro-
chemical deposition cell 200 comprises asubstrate support member 204, acathode clamp ring 210, ananode plate 230 above thecathode clamp ring 210 and anelectroplating solution inlet 240 supplying an electroplating solution into the electro-chemical deposition cell 200 above the substrate or in the flow direction of the substrate surface to be plated. - The electro-
chemical deposition cell 200 includes acell enclosure 100 comprising anenclosure lid 102, anenclosure side wall 104 and anenclosure bottom 106. Preferably, theenclosure 100 has a cylindrical interior and is made of an electrically insulative material. Theenclosure side wall 104 includes a slit opening 280 for transfer of substrates into and out of the electro-chemical deposition cell 200, and aslit valve 282 disposed on an outer surface of theenclosure side wall 104 opens only during the substrate transfer operation and covers the slit opening 280 during processing to provide a sealed processing environment. Adrip awning 284 is preferably disposed above theslit opening 280, extending inwardly from an inner surface of theenclosure side wall 104, to guard theopening 280 from direct receipt of the electroplating solution and thus prevent a processing solution from leaking out of the cell through theslit opening 280. - Referring to FIG. 3, where the electro-
chemical deposition cell 200 is shown with thesubstrate support member 204 in a load/transfer position, as well as FIG. 4, where the electro-chemical deposition cell 200 is shown in a plating/processing position, theanode plate 230 is disposed within acavity ring 236 at a top portion of the electro-chemical deposition cell 200. Theanode plate 230 is electrically connected to apower supply 90. Thesubstrate support member 204 is disposed at a bottom portion of the electro-chemical deposition cell 200. Thecathode clamp ring 210, preferably supported by an annular electroplatingsolution catch cup 246, is disposed in a middle portion of the electro-chemical deposition cell 200 between thesubstrate support member 204 and theanode plate 230. Thecathode clamp ring 210 is positioned in the electro-chemical deposition cell 200 such that the movement of thesubstrate support member 204 from the load/transfer position (FIG. 3) to the processing position (FIG. 4) lifts thecathode clamp ring 210 slightly off the annular electroplatingsolution catch cup 246. Once in the processing position, anelectroplating solution pump 92, which is connected to theelectroplating solution inlet 240, pumps the electroplating solution from anelectroplating solution reservoir 94 into the electro-chemical deposition cell 200. Preferably, anelectroplating solution outlet 258 is connected to anelectroplating solution drain 244 on the electroplatingsolution catch cup 246 to return the electroplating solution back to theelectroplating solution reservoir 94 to be re-circulated through the electro-chemical deposition cell 200. - FIG. 3 is a cross sectional schematic view of an electro-
chemical deposition cell 200 showing arobot blade 88 transferring asubstrate 202 into the electro-chemical deposition cell 200, and FIG. 5 is a cross sectional schematic view of asubstrate support member 204 in a transferring position according to the invention. By comparing FIGS. 2A and 3A, the sequence for loading and unloading a substrate may be seen. Referring initially to FIG. 3, arobot blade 88 transfers asubstrate 202 into the electro-chemical deposition cell 200 through theslit opening 280 and positions thesubstrate 202 above thesubstrate support member 204. At the substrate transferring position, thesubstrate support member 204 is retracted fully to a bottom portion of the electro-chemical deposition cell 200. Then, as shown in FIG. 5, a plurality of lift pins 322 extend throughvertical bores 324 in thesubstrate support member 204 and lift thesubstrate 202 above therobot blade 88. Therobot blade 88 then retracts out of the chamber, and theslit valve 282 closes theslit opening 280. - Referring to FIG. 5, the
substrate support member 204 comprises avacuum chuck 290 made of an insulating material and aconductive base plate 292 providing a cathode connection to thecathode clamp ring 210. Thevacuum chuck 290 secures asubstrate 202 onto asubstrate supporting surface 206 on thesubstrate support member 204 during processing. Preferably, one ormore vacuum ports 294 are disposed in thesubstrate support member 204 and are connected to one ormore vacuum channels 296 disposed on thesubstrate supporting surface 206 to secure thesubstrate 202 through vacuum suction. Thevacuum channels 296 are generally disposed evenly across the surface of the substrate member in a web-like fashion (as shown in FIG. 2). - An
outer seal 298, comprising an O-ring, or alternatively, a double O-ring, disposed in arecess 300 surrounding thesubstrate supporting surface 206 is provided to create a vacuum seal between abackside 215 of thesubstrate 202 and thesubstrate supporting surface 206 when thevacuum chuck 290 is activated. Theouter seal 298 also provides a seal against substrate backside contamination by the electroplating solution and other processing solutions. Eliminating the substrate backside contamination eliminates the need for a post deposition backside cleaning process, thus reducing system cost and complexity. - To provide a vacuum passage to the
substrate supporting surface 206, avacuum conduit 302 within thevacuum chuck 290 connects thevacuum ports 294 andvacuum channels 296 to acentral vacuum conduit 304 within arotating shaft 306. Therotating shaft 306 extends through ashaft sleeve 308 and is connected to arotary actuator 310 disposed on aplatform 342. Theshaft sleeve 308 is also disposed on theplatform 342 to maintain a fixed vertical relationship with therotating shaft 306. A set of lip seals 314 disposed between therotating shaft 306 and theshaft sleeve 308 allows free rotational movement of therotating shaft 306 within theshaft sleeve 308 while providing a sealedregion 316 between an outer surface of therotating shaft 306 and an inner surface of theshaft sleeve 308. Thecentral vacuum conduit 304 includes anopening 312 fluidly connecting thecentral vacuum conduit 304 and the sealedregion 316. Avacuum outlet 318 extends through theshaft sleeve 308 and fluidly connects to the sealedregion 316. Avacuum pump 360 is connected to thevacuum outlet 318 to provide a vacuum suction through thevacuum outlet 318, the sealedregion 316, theopening 312, thecentral vacuum conduit 304, thevacuum conduit 302, thevacuum ports 294 and thevacuum channels 296 to hold thesubstrate 202 on thesubstrate support surface 206. - To provide a positive pressure between the substrate and the
substrate support member 204, agas pump 370 connected to agas supply 372 is selectively connected through acontrol valve 374 to thevacuum outlet 318 to supply a blow off gas to thevacuum ports 294. The blow off gas prevents leftover rinsing agent from contaminating the backside of the processed substrate when the substrate is lifted above thesubstrate support member 204 and transferred out of the electro-chemical deposition cell 200. Thecontrol valve 374 shuts the connection to thevacuum pump 360 when thegas pump 370 is activated to pump the blow-off gas to thevacuum ports 294, and the control valve 274 shuts the connection to thegas supply 372 and thegas pump 370 when thevacuum pump 360 is activated to hold thesubstrate 202 on thesupport member 204. Thevacuum ports 294 direct the blow off gas toward the backside edge of thesubstrate 202 to prevent any leftover rinsing agent from reaching thebackside 215 of thesubstrate 202. - FIG. 6 is a cross sectional view of an alternative embodiment of the
substrate support member 204 showing two separate fluid conduits and dual level lip seals. Although the following describes a fluid delivery system for two separate fluids, the fluid delivery system may be adapted to accommodate a number of separate fluids by increasing the number of fluid conduits and lips seals. The embodiment as shown in FIG. 6 provides asubstrate support member 204 capable of rotating while delivering two separate fluids through separate fluid conduits to thesubstrate support surface 206. Preferably, two separate sets offluid channels fluid ports substrate supporting surface 214, and two sets offluid conduits fluid conduits rotating shaft 306. The first centralfluid conduit 404A includes afirst opening 412A fluidly connecting the first centralfluid conduit 404A and a first sealedregion 416A sealed by a first set of lip seals 414A. Afirst fluid inlet 418A extends through theshaft sleeve 308 and fluidly connects to thefirst seal region 416A. Afirst fluid supply 420A is connected to the firstfluid inlet 418A through afirst pump 422A. Likewise, the second centralfluid conduit 404B includes asecond opening 412B fluidly connecting the second centralfluid conduit 404B and a second sealedregion 416B sealed by a second set of lip seals 414B. Asecond fluid inlet 418B extends through theshaft sleeve 308 and fluidly connects to thesecond seal region 416B. Asecond fluid supply 420B is connected to the secondfluid inlet 418B through asecond pump 422B. The sets of lip seals 414A. 414B disposed between therotating shaft 306 and theshaft sleeve 308 allows free rotational movement of therotating shaft 306 within theshaft sleeve 308 while providing the sealedregions rotating shaft 306 and an inner surface of theshaft sleeve 308. Thus, two separate fluids can be simultaneously delivered to thesubstrate supporting surface 214 while thesubstrate support member 204 is rotated. Alternatively, one of thepumps substrate supporting surface 214. As another alternative, both of thegas pumps substrate supporting surface 214. Furthermore, more than two vacuum or fluid pumps may be used depending on the processing requirement. Although each sealed region described above preferably uses one set of lip seals (i.e., two lip seals), a subsequent sealed region (i.e., other than the first sealed region) requires only one additional lip seal. For example, three lip seals can create two sealed regions, one between the first lip seal and the second lip seal and another between the second lip seal and the third lip seal. - Referring back to FIG. 5, the
rotating shaft 306 extends through alift pin platform 320 having a plurality of lift pins 322 disposed thereon. The lift pins 322, preferably a set of four, extend throughbores 324 through thesubstrate support member 204 to lift asubstrate 202 above thesubstrate support surface 206. Alift platform actuator 326 moves thelift pin platform 320 vertically to lift and lower asubstrate 202 for transfer into and out of the electro-chemical deposition cell 200. Preferably, thelift platform actuator 326 is disposed on an outer surface of theshaft sleeve 308 and includes apush rod 327 to actuate movement of thelift pin platform 320. To elevate thelift pin platform 320, thelift platform actuator 326 extends thepush rod 327 to contact a bottom surface of thelift pin platform 320 and push thelift pin platform 320 upwards. To lower thelift pin platform 320, thelift platform actuator 326 retracts thepush rod 327 to disengage thelift pin platform 320. When thepush rod 327 of thelift platform actuator 326 is fully retracted, thepush rod 327 does not contact thelift pin platform 320, and thelift pin platform 320 rests on aplatform ridge 329 extending from an outer surface of therotating shaft 306 above theshaft sleeve 308. - One or more
vertical tabs 328 extend from an upper portion of the outer surface of therotating shaft 306 into one or more matchingvertical grooves 330 in thelift pin platform 320 so that thelift pin platform 320 rotates in unison with therotating shaft 306. Thetabs 328 also guide thelift pin platform 320 vertically when the lift pin platform is being moved by thelift platform actuator 326. - A
flexible bellow 332, preferably made of polyethylene, is disposed around eachlift pin 322 to provide a splash seal against electroplating solutions, rinsing solutions and other process chemicals. Theflexible bellow 332 is attached from a top surface of thelift pin platform 320 to a bottom surface of theconductive base plate 292 of thesubstrate support member 204. Theflexible bellow 332 compresses when thelift pin platform 320 is elevated by thelift platform actuator 326 and stretches when thelift pin platform 320 is resting on theplatform ridge 329. Eachflexible bellow 332 also maintains a seal when subjected to a slight side load, such as when the substrate support member rotationally accelerates or decelerates. - To prevent electroplating solutions, rinsing solutions and other process chemicals from contacting components disposed in the central portion of the electro-
chemical deposition cell 200, such as thelift platform actuator 326 and theshaft sleeve 308, asplash guard 333 is attached to an outer portion of a lower surface of thelift pin platform 320. Thesplash guard 333 includes a cylindricaldownward extension 334 that is disposed radially outward of an upwardly extendinginner container wall 336. Theinner container wall 336 is a cylindrical upward extension from theenclosure bottom 106 of the electro-chemical deposition cell 200 that holds the process solutions to be pumped out of the system through theoutlet 259. Thesplash guard 334 and theinner container wall 336 create a sufficient overlap so that when thelift pin platform 320 is raised to it highest position during processing, there is still an overlap between the tip of thesplash guard 334 and the tip of the inner container wall 336 (as shown in FIG. 4). - To provide rotational movement to the
substrate support member 204, arotary actuator 310 is disposed on aplatform 342 and connected to therotating shaft 306. Therotary actuator 310 rotates therotating shaft 306 freely within theshaft sleeve 308. To move thesubstrate support member 204 vertically, anactuator 346 extends and retracts ashaft 344 connected to theplatform 342. Theactuator 346 is disposed outside of theenclosure 100 on theenclosure bottom 106, and theshaft 344 extends through theenclosure bottom 106 and is attached to a bottom surface of theplatform 342. To maintain a fixed vertical relation with therotating shaft 306 when thesubstrate support member 204 is elevated and lowered in the electro-chemical deposition cell 200, theshaft sleeve 308 is also disposed on theplatform 342. Preferably, theactuator 346 also provides a vibrational agitation to thesubstrate support member 204 to enhance deposition onto thesubstrate deposition surface 214. Alternatively, a vibrator (not shown) can be attached to thesubstrate support member 204 to provide the vibrational agitation. - Referring to FIG. 3 and FIG. 4, the structure, operation and positioning of a
cathode clamp ring 210 and an electroplatingsolution catch cup 246 will be discussed. Thecatch cup 246 is an annular structure extending inwardly from theenclosure side wall 104 of the electro-chemical deposition cell 200 to abottom surface 220 of thecathode clamp ring 210. Thecathode clamp ring 210 preferably includes an outer portion having a downwardly slopingsurface 256 that overlaps aninner terminus 250 of thecatch cup 246 to assist the electroplating solution flow into thecatch cup 246. Theinner terminus 250 includes aridge 252 corresponding to arecess 254 on thebottom surface 220 of thecathode clamp ring 210. Theridge 252 supports thecathode clamp ring 210 when thesubstrate support member 204 is not engaged in a deposition position. When the substrate support member is engaged in the deposition position as shown in FIG. 4, thecathode clamp ring 210 is lifted from theridge 252 and is supported on thesubstrate deposition surface 214. - The electrical power is delivered by the
cathode clamp ring 210 to thesubstrate deposition surface 214 through acontact portion 208 of thecathode clamp ring 210. To provide electrical power to thecathode clamp ring 210, one ormore cathode contacts 216 are fixedly secured to abottom surface 218 of theconductive base plate 292 of thesubstrate support member 204 and extends radially outwardly to electrically contact abottom surface 220 of thecathode clamp ring 210. The electrical power is conducted through therotating shaft 306 to theconductive base plate 292, then through one ormore cathode contacts 216 secured onto theconductive base plate 292, and then to abottom surface 220 of thecathode clamp ring 210. Preferably, thecathode contact 216 comprises a spring loaded metal strip that maintains constant electrical contact with thebottom surface 220 of thecathode clamp ring 210 during processing when thesubstrate support member 204 is rotated and/or vibrated. Alternatively, thecathode clamp ring 210 is fixedly connected to the power supply through connection wires (not shown). - To provide electrical power to the
cathode clamp ring 210 while rotating thesubstrate support member 204 and therotating shaft 306, a rotatingcathode connection 340 is disposed at a top portion of theshaft sleeve 308 and connected to thepower source 90. Therotating shaft 306 preferably comprises an electrically conductive material, and therotating cathode connection 340 movably contacts the outer surface of therotating shaft 306 to maintain electrical conduction to therotating shaft 306 while therotating shaft 306 is rotating. The rotatingcathode connection 340 preferably comprises a plurality ofconductive ball bearings 341 disposed between a pair of ring seals 343. Preferably, the rotatingcathode connection 340 is filled with mercury to enhance the electrical conductivity of therotating cathode connection 340 while therotating shaft 306 is rotated. - Preferably, the
cathode clamp ring 210 comprises an annular conductive member having a central opening defining the deposition area on a substrate deposition surface that is exposed to the electroplating solution during processing. Thecathode clamp ring 210 is electrically connected to thepower source 90 through thecathode contacts 216 and thesubstrate support member 204 and includes acontact portion 208 to electrically contact thesubstrate deposition surface 214 and to provide an electrical power (voltage and current) to thesubstrate deposition surface 214 to enable the electro-chemical deposition process. Thecontact portion 208 preferably extends a minimal radial distance inward above aperimeter edge 212 of thesubstrate 202, but a distance sufficient to electrically contact a metal seed layer on thesubstrate deposition surface 214. Preferably, thecontact portion 208 includes an annular surface providing a continuous contact around a peripheral portion of thesubstrate deposition surface 214. By providing a continuous electrical interface between the cathode and the substrate deposition surface, the electrical power is uniformly distributed on thesubstrate deposition surface 214. The increase in the electrical interface, as compared to an individual contact finger arrangement, also minimizes the fringing effect that occurs with individual cathode contact pins that cause non-uniform deposition. Alternatively, thecontact portion 208 comprises a plurality of contact pads 217 (as shown in FIG. 7) positioned to contact substantially around the peripheral portion of thesubstrate deposition surface 214. - While the
cathode clamp ring 210 is engaged with thesubstrate 202,cathode clamp ring 210 rotates with thesubstrate support member 204 because of the frictional force between thecontact portion 208 and thesubstrate deposition surface 214. Preferably, thecathode clamp ring 210 includes a plurality of locking grooves (not shown) disposed on thebottom surface 220 to receive thecathode contacts 216. With thecathode contacts 216 engaged in the locking grooves, thecathode clamp ring 210 rotates synchronously with thesubstrate support member 204 without depending on the frictional force between thecontact portion 208 and thesubstrate deposition surface 214. - FIG. 8 is a partial cross sectional schematic view of another embodiment of a cathode clamp ring. In this embodiment, the
cathode clamp ring 210 includes acontact portion 208 comprising a metal impregnatedelastomer ring 350 electrically contacting a peripheral portion of thesubstrate deposition surface 214. The metal impregnatedelastomer ring 350 is disposed on a ridge 351 on a steppedsurface 209 of thecathode clamp ring 210. The metal impregnatedelastomer ring 350 is secured to the steppedsurface 209 of thecathode clamp ring 210 by an adhesive that is unaffected by the electroplating solution and process. Alternatively, the metal impregnatedelastomer ring 350 is secured to the steppedsurface 209 of thecathode clamp ring 210 by a fastener (not shown) such as a screw or a bolt. As another alternative, thecathode clamp ring 210 includes an annular dove-tail groove (not shown) disposed on the steppedsurface 209 that squeezes and holds the metal impregnatedelastomer ring 350. - The metal impregnated
elastomer ring 350 provides electrical conduction through metal particles or short wires disposed in a hydrophobic elastomer matrix. FIG. 9 is a cut-away perspective of a section of an embodiment of a metal impregnatedelastomer ring 350. The metal impregnatedelastomer ring 350 generally comprises anouter elastomer ring 352, aninner elastomer ring 354 and ametal ring 356 sandwiched between theinner elastomer ring 352 and theouter elastomer ring 354. Preferably themetal ring 356 comprises a plurality ofindividual metal wires 358 extending at a slanted angle a (other than perpendicular to a top and/or a bottom surface of the elastomer ring 350) from a top surface of theelastomer ring 350 to a bottom surface of theelastomer ring 350. Themetal wires 358 conduct electrical power from thecathode clamp ring 210 to thesubstrate deposition surface 214. Atop end 357 of themetal wires 358 contacts thecathode clamp ring 210, and abottom end 359 of themetal wires 358 contacts thesubstrate deposition surface 214. The slanted angle a of themetal wires 358 enhances the ability of the metal impregnatedelastomer ring 350 to compress and form a seal on thesubstrate deposition surface 214 while providing electrical contact to thesubstrate deposition surface 214, i.e., by the individual metal wires sliding relative to each other and increasing the angle a as needed. One exemplary metal impregnated elastomer ring is available from Shin-Etsu Handotai America, Inc., Vancouver, Wash. The metal impregnatedelastomer ring 350 provides a compliant contacting interface with thesubstrate deposition surface 214 that reduces the risk of scratching thesubstrate deposition surface 214 by thecontact portion 208 of thecathode clamp ring 210. The metal impregnatedelastomer ring 350 also seals the contact interface from the process solutions so that the metal conductors in the elastomer matrix are not exposed to the processing solutions which can change the properties of the metal conductors. Although one embodiment of the metal impregnated matrix is discussed above, the invention contemplates other embodiments of metal impregnated elastomers having different arrangements of electrically conductive particles within the elastomer matrix for use as thecontact portion 208 of thecathode clamp ring 210. - FIG. 10 is a cross sectional partial view of a cathode clamp ring showing another embodiment of a contact portion of the clamp ring. In this embodiment, the
contact portion 208 of thecathode clamp ring 210 comprises an annular downward extension of the conductive metal from abottom surface 209 of thecathode clamp ring 210. The annular down ward extension is preferably a wedge-shaped annular ring. An inner concentric O-ring 211 and an outer concentric O-ring 213 are attached to thebottom surface 209 of thecathode clamp ring 210 surrounding thecontact portion 208. The O-rings contact portion 208 during the electro-chemical deposition process while thecontact portion 208 conducts electrical power to thesubstrate deposition surface 214. - Referring back to FIG. 8, an alternative embodiment of a support for the
cathode clamp ring 210 utilizes a kinematic coupling between thecathode clamp ring 210 and theinner terminus 250 of thecatch cup 246. Utilizing kinematic coupling allows positive location of concentric parts such as thecathode clamp ring 210 in relation with the electroplatingsolution catch cup 246. The kinematic coupling generally comprises a plurality of ball bearings 361 (only one shown) disposed partially in a plurality ofseats 363 on a top surface of theinner terminus 250 and acorresponding groove 362 on a bottom surface of thecathode clamp ring 210 to receive a top portion of theball bearing 361. Preferably, the kinematic coupling uses threeball bearings 361 to center thecathode clamp ring 210. One ball bearing locates the radial position while the other two ball bearings locate the angular position of theclamp ring 210. - Referring to FIG. 11, where a top view of an electroplating
solution catch cup 246 is shown, preferably two electroplating solution drains 244 are disposed diametrically in opposing corners of the electro-chemical deposition cell 200. Referring back to FIG. 3 and FIG. 4, the electroplatingsolution catch cup 246 is disposed in a middle portion of the electro-chemical deposition cell 200 to direct the electroplating solution to one or more electroplating solution drains 244. During processing, the electroplating solution is pumped through theelectroplating solution inlet 240 into thecavity 242, passes through theanode plate 230 onto the substrate deposition surface 214 (see FIG. 4) and then flows over acathode clamp ring 210 into anelectroplating solution drain 244 of acatch cup 246. Thecatch cup 246 includes a downwardly slopingtop surface 248 from aninner terminus 250 to theelectroplating solution drain 244 to direct the electroplating solution overflowing thecathode clamp ring 210 to theelectroplating solution drain 244. The size (inner diameter) of theelectroplating solution drain 244 and the slope and length of thetop surface 248 is adapted to accommodate a particular flow rate so that the electroplating solution does not overflow thecatch cup 246 and spill over theridge 252. Theelectroplating solution drain 244 is connected to anelectroplating solution outlet 258 that transports the processed electroplating solution to theelectroplating solution reservoir 94. The electroplating solution is then pumped to theelectroplating solution inlet 240 and re-circulates through the electro-chemical deposition cell 200. - Referring back to FIG. 3 and FIG. 4, a
cavity ring 236 comprising a generally cylindrical structure is disposed at a top potion of the electro-chemical deposition cell 200 to hold ananode plate 230 and the electroplating solution to be distributed through theanode plate 230. Theanode plate 230 is disposed at a bottom portion of thecavity ring 236 on aridge 232 extending inwardly from aninner surface 234 of thecavity ring 236. Theinner surface 234 of thecavity ring 236 and thetop surface 231 of theanode plate 230 define acavity 242 for holding the electroplating solution to be distributed through theanode plate 230. Anelectroplating solution inlet 240 disposed on theenclosure lid 102 supplies the electroplating solution into thecavity 242. Theelectroplating solution inlet 240 is connected to anelectroplating solution pump 92 that pumps the electroplating solution from anelectroplating solution reservoir 94. - Preferably, the
anode plate 230 has substantially the same shape as thesubstrate deposition surface 214 and includes a plurality of perforations to distribute the electroplating solution uniformly across thesubstrate deposition surface 214. Theanode plate 230 is electrically connected to apower source 90 and preferably comprises a consumable metal that can dissolve in the electroplating solution to provide the metal particles to be deposited onto thesubstrate deposition surface 214. As the electroplating solution passes through an energizedanode plate 230, metal ions dissociate from the surface of the consumablemetal anode plate 230 into the electroplating solution. - Alternatively, the
anode plate 230 comprises an electrode and consumable metal particles encased in a fluid permeable membrane such as a porous ceramic plate. An alternative to the consumable anode plate is a non-consumable anode plate that is perforated or porous for passage of the electroplating solution therethrough. However, when a non-consumable anode plate is used, the electroplating solution requires a metal particle supply to continually replenish the metal particles to be deposited in the process. - To enhance the deposition process, an
agitator 237 is preferably attached to thecavity ring 236 to agitate the electroplating solution. Theagitator 237 generally comprises a megasonic or an ultrasonic finger that transfers a vibration to the electroplating solution by vibrating thecavity ring 236. - After the electroplating process is finished, no more electroplating solution is pumped into the
cell 200, and the electroplating solution is drained from thecell 200 through the electroplating solution drains 244. However, some electroplating solution may collect on theanode plate 230 and thecavity ring 236 and then drip onto the processedsubstrate deposition surface 214. To control dripping of residual electroplating solution from the anode/cavity ring assembly to the substrate deposition surface after the deposition phase, the anode/cavity ring assembly is preferably moved away from the region above the substrate. - FIG. 12 shows one embodiment of the anode/cavity ring assembly for drip control where a
substrate support member 204 is shown positioned in a rinsing position according to the invention. Preferably, the assembly of thecavity ring 236 and theanode plate 230 comprises two symmetrical halves split by a central vertical plane. Anactuator 237 is connected to each half to pull apart the anode/cavity ring assembly after the deposition phase of the process. Each half of the anode/cavity ring assembly is moved to the region above the electroplatingsolution catch cup 246 so that the residual electroplating solution drips into the electroplating solution catch cup. - FIG. 13 is a top view of a
shutter plate 238 positioned abovecathode clamp ring 210, showing an alternative solution for controlling the dripping of residual electroplating solutions from the anode/cavity ring assembly. Ashutter plate 238 moves into the region between the anode/cavity ring assembly and thecathode clamp ring 210 to block the dripping residual electroplating solution from contaminating the processed substrate deposition surface. Preferably, theshutter plate 238 is attached to arotary shutter actuator 239 and retracted into ashutter plate chamber 237 during the deposition process. Once the deposition phase is completed, therotary shutter actuator 239 rotates theshutter plate 238 below the anode/cavity ring assembly and blocks the dripping residual electroplating solution. - FIG. 14 is a side view of an electro-chemical deposition cell having a sub-chamber for the anode/cavity ring assembly. The anode/cavity ring assembly is attached to a
rotary assembly actuator 241 that moves the anode/cavity ring assembly into a sub-chamber 243 after the deposition phase of the process. By moving theanode plate 230 and thecavity ring 236 into the sub-chamber 243, the residual electroplating solution drips in the sub-chamber 243 and is prevented from contaminating the processed substrate deposition surface. - A layer of electroplating solution is typically left on the processed substrate deposition surface after the deposition phase of the process. To remove residual electroplating solution from the processed substrate deposition surface, a rinse agent is sprayed over the surface, and then the substrate is spun dry. Referring back to FIG. 3, a rinsing agent reservoir96 supplies the rinse agent and is connected to a rinse
agent manifold 261 through a rinseagent pump 97. One or more rinse spray spouts 260 are connected to the rinseagent manifold 261 to spray a rinse agent, such as deionized water or nitrogen gas, over the processed substrate deposition surface. - Referring now to FIG. 12, a
substrate support member 204 is shown positioned in a rinsing position according to the invention. Preferably, one or more rinse spray spouts 260 are disposed on abottom surface 262 of theinner terminus 250 of the electroplatingsolution catch cup 246. The rinse spray spouts 260 spray the rinse agent over the processedsubstrate deposition surface 214 after completion of the electro-chemical deposition process when thesubstrate support member 214 is lowered to a rinsing position. At the rinsing position, thesubstrate support member 204 is positioned below a horizontal plane defined by the rinse spray spouts 260 but above a horizontal plane defined by the tip of a rinsecatch cup 264. - FIG. 15 is a bottom view of an electroplating
solution catch cup 246 showing three rinsespouts 260 disposed on a bottom surface of the electroplatingsolution catch cup 246. Preferably, the rinsespouts 260 spray a mist of rinse agents over the processedsubstrate deposition surface 214. The rinse agent collect on the processedsubstrate deposition surface 214 to create a sheeting action of the rinse agent that removes the residual electroplating solution from the processedsubstrate deposition surface 214. Thesubstrate support member 204 is then rotated to spin dry the substrate and remove the rinse agent from the processedsubstrate deposition surface 214. - FIG. 16 is a top view of a rinse
catch cup 264. Referring to both FIG. 12 and FIG. 16, a rinsecatch cup 264 is disposed below the electroplatingsolution catch cup 246 and extends inwardly from theenclosure side wall 104 of the electro-chemical deposition cell 200 to direct overflowing rinse agents and any residual electroplating solution to a rinsedrain 270. The inner terminus 266 of the rinsecatch cup 264 defines an opening which outlines the circumference of thesubstrate support member 204 and allows the passage of thesubstrate support member 204 therethrough. The rinsecatch cup 264 includes a downwardly sloping top surface 268 from the inner terminus 266 to a rinsedrain 270. The rinsespray spout 260 sprays the rinse agent over the processedsubstrate deposition surface 214 to clean the deposited surface and to remove any excess electroplating solution remaining on thesubstrate deposition surface 214. As the substrate is spun dry, the rinse agent flows over the deposited substrate surface into the rinsecatch cup 264 to the rinsedrain 270 that drains the rinse agent to a bottom portion of thecell 200. The lower portion of the electro-chemical deposition cell 200 serves as a catch bowl, and anoutlet 259 on theenclosure bottom 106 returns the used rinse solution to apurifier 98 and then back to the rinse solution reservoir 96 to be re-used for subsequent rinses (shown in FIG. 3). The rinse agent is then pumped out of the electro-chemical deposition cell 200 through anoutlet 259 into a rinse agent reservoir 96. - In operation, a
substrate 202 is transferred into the electro-chemical deposition cell 200 by arobot blade 88 through the slit opening 280 over asubstrate support member 204 that is retracted fully. FIG. 3 is a cross sectional schematic view of an electro-chemical deposition cell 200 showing a robot blade transferring asubstrate 202 into the electro-chemical deposition cell 200. Aslit valve 282 is opened during the substrate transfer, and arobot blade 88 having asubstrate 202 thereon enters the electro-chemical deposition cell 200 through theslit opening 280. Thesubstrate 202 is positioned above thesubstrate support member 204, and the lift pin platform is elevated. Thesubstrate 202 is lift above therobot blade 88 by the lift pins 272 on thelift pin platform 320 that is elevated by thelift platform actuator 326 extending thepush rod 327. Therobot blade 88 then retracts out of the electro-chemical deposition cell 200 and theslit valve 282 closes to seal the processing environment. FIG. 3 is a cross sectional schematic view of the electro-chemical deposition cell 200 showing a substrate positioned over asubstrate support member 204 and supported by lift pins 272. Thelift platform actuator 326 retracts thepush rod 327 to lower thelift pin platform 320 and position thesubstrate 202 onto thesubstrate supporting surface 206 and the outer seal O-ring 298. Thevacuum chuck 290 engages the vacuum suction to hold thesubstrate 202 on thesubstrate supporting surface 206, and the outer seal (O-ring) 298 seals the backside of thesubstrate 202 from the processing chemicals. - The
actuator 346 then elevates thesupport member 204 to the processing position. FIG. 4 is a cross sectional schematic view of an electro-chemical deposition cell 200 having asubstrate 202 disposed on asubstrate support member 204 in a processing position according to the invention. At the processing position, thesubstrate 202 engages thecathode clamp ring 210, and an electrical power is delivered through thecontact portion 208 of thecathode clamp ring 210 to thesubstrate deposition surface 214. An electroplating solution is pumped through thesolution inlet 240 at theenclosure top 102 into thecavity ring 236 above theanode plate 230. The electroplating solution passes through theanode plate 230 onto thesubstrate deposition surface 214 to deposit a metal layer thereon. - During the deposition process, the
rotary actuator 310 rotates thesubstrate support member 204 about a central axis through therotating shaft 306 at between about 10 revolutions per minute (RPM) to about 50 RPM, and theactuator 346 provides a vibrational agitation to thesubstrate support member 204. The rotation and the agitation of thesubstrate support member 204 provide a uniform exposure of the electroplating solution to thesubstrate deposition surface 214 and promote uniform deposition thereon. Deposition uniformity is also improved by the continuous cathode contact provided by thecathode clamp ring 210 that distributes a uniform current density across thesubstrate deposition surface 214. - To enhance filling of high aspect ratio features on the substrate deposition surface, a plate/de-plate scheme is applied during the deposition phase of the process. The plate/deplate scheme generally comprises periodic reversal of the electrical current flowing through the electroplating solution between the cathode and the anode. During the plating period, the cathode and the anode are biased normally to cause electro-chemical deposition onto the cathode. During the deplating period, the cathode and the anode are reverse biased and the electrical current is reversed to cause de-plating of the deposited surface. However, because a higher electrical current is applied for a shorter duration during the de-plating period, as compared to the plating period, the de-plating period removes the crowning or bridging effect at the mouth of the aperture of high aspect ratio features and enhances filling of the feature for the subsequent plating period.
- After the electroplating solution flows over the
substrate deposition surface 214, the electroplating solution flows over thecathode clamp ring 210 into theelectrolyte catch cup 246. The electroplating solution then flows through theelectrolyte drain 244 and is pumped out of the electro-chemical deposition cell 200 throughoutlet 258. Preferably, the electroplating solution is re-circulated through the electro-chemical deposition cell 200 until the end of the deposition process. Then, the electroplating solution is evacuated from the electro-chemical deposition cell 200 into theelectrolyte reservoir 94 until the next deposition process. Preferably, as the electroplating solution is evacuated, therotational actuator 310 rotates thesubstrate support member 204 at a speed sufficient to spin dry thesubstrate deposition surface 214 by centrifugal force. Thesubstrate support member 204 preferably spins at least about 100 RPM to spin dry thesubstrate 202. - After the deposition process, the
actuator 346 lowers thesubstrate support member 204 to a rinsing position. Thesubstrate 202 is preferably positioned below a horizontal plane defined by the rinse spray spouts 260 but above a horizontal plane defined by the tip of the rinsecatch cup 264. The rinse spray spouts 260 spray the rinse agent over the processedsubstrate deposition surface 214 to clean the deposited surface and to remove any excess electroplating solution remaining on thesubstrate deposition surface 214. To end the rinse process, thesubstrate support member 204 rotates at a speed at least about 100 RPM to spin dry thesubstrate deposition surface 214 through centrifugal force. The rinse agent is drained through the rinsedrain 270 to the bottom of thecell 200 and pumped out of thecell 200 throughoutlet 259 into a rinse agent reservoir 96. - After the rinse process, the
actuator 346 retracts fully and lowers thesubstrate support member 204 to the transfer position as shown in FIG. 3. Thevacuum chuck 290 disengages the vacuum suction and releases thesubstrate 202, and thelift platform actuator 326 extends thepush rod 327 to elevate thelift pin platform 320 and the lift pins 272 to lift the processedsubstrate 202 above thesubstrate support surface 206. As the lift pins 272 lift thesubstrate 202 above thesubstrate support surface 206, a blow-off gas is pumped through thevacuum chuck 290 out of thevacuum port 294 to provide a gas flow directed at the backside edge of thesubstrate 202. The blow-off gas prevents any remaining rinse agent from contaminating thebackside 215 of thesubstrate 202. Theslit valve 282 opens, and therobot blade 88 extends into the electro-chemical deposition cell 200 through theslit 280. Therobot blade 88 is positioned under theelevated substrate 202, and the lift pins 272 are lowered to position thesubstrate 202 onto therobot blade 88. Therobot blade 88 then retracts out of the electro-chemical deposition cell 200 with the processed substrate, and the process repeats for the next unprocessed substrate. - While the foregoing is directed to the preferred embodiment of the present invention, other and further embodiments of the invention may be devised without departing from the basic scope thereof. The scope of the invention is determined by the claims which follow.
Claims (27)
1. A method for electroplating a metal onto a substrate plating surface, comprising:
holding a substrate with the substrate plating surface face-up on a rotatable substrate support member having means for holding and rotating the substrate during an electroplating process;
positioning an anode above the substrate plating surface;
flowing an electroplating solution between the anode and the substrate plating surface; and
applying a plating bias between the substrate plating surface and the anode to electroplate the metal onto the plating surface.
2. The method of claim 1 wherein the step of holding the substrate comprises providing a vacuum suction between the substrate support member and a back side of the substrate.
3. The method of claim 1 , wherein the step of holding the substrate further comprises providing a peripheral seal between the substrate support member and a back side of the substrate.
4. The method of claim 1 , wherein applying a plating bias comprises positioning a cathode contact ring in electrical contact with the plating surface, the cathode contact ring defining a fluid processing volume between the ring and the substrate surface.
5. The method of claim 4 , wherein the cathode contact ring contacts the plating surface annular ring and a plurality of contact pins extending radially inwardly therefrom, and positioning an annular seal radially inward of the contact pins.
6. The method of claim 1 , wherein the electroplating solution flows through perforations in the anode.
7. The method of claim 1 , wherein the anode is consumed during the operation of the electroplating method.
8. The method of claim 1 , further comprising rotating the substrate while flowing the electroplating solution between the anode and the substrate plating surface.
9. The method of claim 1 , further comprising vibrating the substrate while flowing the electroplating solution between the anode and the substrate plating surface.
10. The method of claim 4 , wherein flowing the electroplating solution further comprises filling the fluid processing volume.
11. The method of claim 10 , wherein the positioning the anode further comprises positioning the anode in electrical communication with the fluid processing volume.
12. The method of claim 4 , further comprising removing the cathode contact ring and rinsing the substrate plating surface with a rinse agent.
13. The method of claim 12 , wherein the step of rinsing the substrate plating surface comprises spraying a rinse agent over the substrate plating surface while rotating the substrate support within.
14. The method of claim 12 , further comprising draining the rinse agent back to a rinse agent reservoir.
15. The method of claim 12 , further comprising purifying the rinse agent in a purifier.
16. The method of claim 12 , further comprising spin-drying the substrate.
17. The method of claim 1 , further comprising supplying the electroplating solution into a cavity ring disposed above the anode.
18. The method of claim 17 , further comprising moving the cavity ring while flowing the electroplating solution.
19. A method for electroplating a metal onto a substrate plating surface, comprising:
positioning the substrate plating surface face-up on a support member;
positioning the support member at a first vertical position in a processing cell;
electrically contacting a cathode clamp ring to the substrate plating surface;
flowing an electroplating solution from an anode to the substrate plating surface while rotating the substrate plating surface at the first vertical position;
positioning the support member at a second vertical position in the cell, the second position being different from the first position; and
rinsing the substrate plating surface with a rinse agent at the second vertical position.
20. The method of claim 19 , further comprising spin-drying the substrate plating surface.
21. The method of claim 19 , further comprising draining the electroplating solution to an electroplating solution reservoir.
22. The method of claim 19 , further comprising draining the rinse agent to a rinse drain and purifying the rinse agent.
23. A method for plating and rinsing a substrate in a processing cell, comprising:
positioning the substrate face-up on a rotatable substrate support member and positioning the substrate support member at a plating position in the cell;
electrically contacting a plating surface of the substrate with a cathode electrode;
forming a fluid processing volume above the plating surface;
positioning an anode in electrical communication with the processing volume;
applying a plating bias between the anode and the cathode electrode to plate a metal from the fluid processing volume onto the plating surface in the plating position;
moving the substrate support member to a rinsing position; and
dispensing a rinsing solution onto the plating surface while rotating the substrate.
24. The method of claim 23 , further comprising capturing a plating solution used in the plating process with a first fluid receiving member and capturing the rinsing solution with a second fluid receiving member.
25. The method of claim 23 , wherein electrically contacting the plating surface comprises positioning a cathode contact ring having a plurality of radially positioned substrate contact pins positioned thereon such that the contact pins electrically engage a perimeter of the substrate.
26. The method of claim 25 , further comprising sealably engaging the perimeter of the plating surface with an annular seal positioned radially inward of the contact pins.
27. The method of claim 23 , further comprising flowing an electroplating solution through a plurality of perforations in the anode to fill the fluid processing volume.
Priority Applications (2)
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US11/090,919 US20050199489A1 (en) | 2002-01-28 | 2005-03-25 | Electroless deposition apparatus |
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US8249498P | 1998-04-21 | 1998-04-21 | |
US09/294,240 US6416647B1 (en) | 1998-04-21 | 1999-04-19 | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
US10/178,469 US6599402B2 (en) | 1998-04-21 | 2002-06-24 | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
US10/630,185 US20040020781A1 (en) | 1998-04-21 | 2003-07-29 | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
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US10/178,469 Division US6599402B2 (en) | 1998-04-21 | 2002-06-24 | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
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US10/178,469 Expired - Fee Related US6599402B2 (en) | 1998-04-21 | 2002-06-24 | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
US10/630,185 Abandoned US20040020781A1 (en) | 1998-04-21 | 2003-07-29 | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
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US10/178,469 Expired - Fee Related US6599402B2 (en) | 1998-04-21 | 2002-06-24 | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
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US (3) | US6416647B1 (en) |
EP (1) | EP0992062A2 (en) |
JP (1) | JP2002506489A (en) |
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Families Citing this family (293)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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US6248222B1 (en) * | 1998-09-08 | 2001-06-19 | Acm Research, Inc. | Methods and apparatus for holding and positioning semiconductor workpieces during electropolishing and/or electroplating of the workpieces |
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US6673216B2 (en) * | 1999-08-31 | 2004-01-06 | Semitool, Inc. | Apparatus for providing electrical and fluid communication to a rotating microelectronic workpiece during electrochemical processing |
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WO2001027357A1 (en) * | 1999-10-12 | 2001-04-19 | Semitool, Inc. | Method and apparatus for executing plural processes on a microelectronic workpiece at a single processing station |
US6423636B1 (en) * | 1999-11-19 | 2002-07-23 | Applied Materials, Inc. | Process sequence for improved seed layer productivity and achieving 3mm edge exclusion for a copper metalization process on semiconductor wafer |
CN1319130C (en) * | 1999-12-24 | 2007-05-30 | 株式会社荏原制作所<Del/> | Apparatus for plating semiconductor substrate, method for plating semiconductor substrate |
US6632335B2 (en) * | 1999-12-24 | 2003-10-14 | Ebara Corporation | Plating apparatus |
US6689257B2 (en) * | 2000-05-26 | 2004-02-10 | Ebara Corporation | Substrate processing apparatus and substrate plating apparatus |
US6454927B1 (en) | 2000-06-26 | 2002-09-24 | Applied Materials, Inc. | Apparatus and method for electro chemical deposition |
US7134934B2 (en) * | 2000-08-30 | 2006-11-14 | Micron Technology, Inc. | Methods and apparatus for electrically detecting characteristics of a microelectronic substrate and/or polishing medium |
US7078308B2 (en) * | 2002-08-29 | 2006-07-18 | Micron Technology, Inc. | Method and apparatus for removing adjacent conductive and nonconductive materials of a microelectronic substrate |
US7192335B2 (en) * | 2002-08-29 | 2007-03-20 | Micron Technology, Inc. | Method and apparatus for chemically, mechanically, and/or electrolytically removing material from microelectronic substrates |
US7094131B2 (en) | 2000-08-30 | 2006-08-22 | Micron Technology, Inc. | Microelectronic substrate having conductive material with blunt cornered apertures, and associated methods for removing conductive material |
US7074113B1 (en) * | 2000-08-30 | 2006-07-11 | Micron Technology, Inc. | Methods and apparatus for removing conductive material from a microelectronic substrate |
US7129160B2 (en) * | 2002-08-29 | 2006-10-31 | Micron Technology, Inc. | Method for simultaneously removing multiple conductive materials from microelectronic substrates |
US7153195B2 (en) * | 2000-08-30 | 2006-12-26 | Micron Technology, Inc. | Methods and apparatus for selectively removing conductive material from a microelectronic substrate |
US7112121B2 (en) * | 2000-08-30 | 2006-09-26 | Micron Technology, Inc. | Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrate |
US7160176B2 (en) * | 2000-08-30 | 2007-01-09 | Micron Technology, Inc. | Methods and apparatus for electrically and/or chemically-mechanically removing conductive material from a microelectronic substrate |
US7220166B2 (en) * | 2000-08-30 | 2007-05-22 | Micron Technology, Inc. | Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate |
US7153410B2 (en) * | 2000-08-30 | 2006-12-26 | Micron Technology, Inc. | Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces |
US6610189B2 (en) * | 2001-01-03 | 2003-08-26 | Applied Materials, Inc. | Method and associated apparatus to mechanically enhance the deposition of a metal film within a feature |
US6478937B2 (en) * | 2001-01-19 | 2002-11-12 | Applied Material, Inc. | Substrate holder system with substrate extension apparatus and associated method |
US6869515B2 (en) | 2001-03-30 | 2005-03-22 | Uri Cohen | Enhanced electrochemical deposition (ECD) filling of high aspect ratio openings |
US6908540B2 (en) | 2001-07-13 | 2005-06-21 | Applied Materials, Inc. | Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process |
JP2003060012A (en) * | 2001-08-08 | 2003-02-28 | Asm Japan Kk | Reaction chamber for semiconductor treatment |
JP3681670B2 (en) * | 2001-09-25 | 2005-08-10 | シャープ株式会社 | Semiconductor integrated circuit manufacturing apparatus and manufacturing method |
US6824666B2 (en) * | 2002-01-28 | 2004-11-30 | Applied Materials, Inc. | Electroless deposition method over sub-micron apertures |
US7138014B2 (en) * | 2002-01-28 | 2006-11-21 | Applied Materials, Inc. | Electroless deposition apparatus |
US6905622B2 (en) * | 2002-04-03 | 2005-06-14 | Applied Materials, Inc. | Electroless deposition method |
US6899816B2 (en) * | 2002-04-03 | 2005-05-31 | Applied Materials, Inc. | Electroless deposition method |
US6843897B2 (en) * | 2002-05-28 | 2005-01-18 | Applied Materials, Inc. | Anode slime reduction method while maintaining low current |
US6855235B2 (en) * | 2002-05-28 | 2005-02-15 | Applied Materials, Inc. | Anode impedance control through electrolyte flow control |
WO2004001813A2 (en) * | 2002-06-21 | 2003-12-31 | Ebara Corporation | Substrate holder and plating apparatus |
US9624596B2 (en) | 2002-07-22 | 2017-04-18 | Ebara Corporation | Electrochemical deposition method |
US7128823B2 (en) | 2002-07-24 | 2006-10-31 | Applied Materials, Inc. | Anolyte for copper plating |
US7247222B2 (en) * | 2002-07-24 | 2007-07-24 | Applied Materials, Inc. | Electrochemical processing cell |
US6821909B2 (en) * | 2002-10-30 | 2004-11-23 | Applied Materials, Inc. | Post rinse to improve selective deposition of electroless cobalt on copper for ULSI application |
US20040084318A1 (en) * | 2002-11-05 | 2004-05-06 | Uri Cohen | Methods and apparatus for activating openings and for jets plating |
US20040104119A1 (en) * | 2002-12-02 | 2004-06-03 | Applied Materials, Inc. | Small volume electroplating cell |
US20040108213A1 (en) * | 2002-12-09 | 2004-06-10 | Talasek Robert T. | Plating bath composition control |
US7270735B2 (en) * | 2003-01-21 | 2007-09-18 | Seagate Technology Llc | System and method for holding and releasing a workpiece for electrochemical machining |
US7146994B2 (en) * | 2003-03-17 | 2006-12-12 | Novellus Systems, Inc. | Active rinse shield for electrofill chemical bath and method of use |
JP2005029830A (en) * | 2003-07-10 | 2005-02-03 | Ebara Corp | Plating device and plating method |
US20050051437A1 (en) * | 2003-09-04 | 2005-03-10 | Keiichi Kurashina | Plating apparatus and plating method |
US7112122B2 (en) * | 2003-09-17 | 2006-09-26 | Micron Technology, Inc. | Methods and apparatus for removing conductive material from a microelectronic substrate |
US7654221B2 (en) * | 2003-10-06 | 2010-02-02 | Applied Materials, Inc. | Apparatus for electroless deposition of metals onto semiconductor substrates |
US7827930B2 (en) * | 2004-01-26 | 2010-11-09 | Applied Materials, Inc. | Apparatus for electroless deposition of metals onto semiconductor substrates |
US7465358B2 (en) * | 2003-10-15 | 2008-12-16 | Applied Materials, Inc. | Measurement techniques for controlling aspects of a electroless deposition process |
US7064065B2 (en) * | 2003-10-15 | 2006-06-20 | Applied Materials, Inc. | Silver under-layers for electroless cobalt alloys |
WO2005038084A2 (en) * | 2003-10-17 | 2005-04-28 | Applied Materials, Inc. | Selective self-initiating electroless capping of copper with cobalt-containing alloys |
US20050095830A1 (en) * | 2003-10-17 | 2005-05-05 | Applied Materials, Inc. | Selective self-initiating electroless capping of copper with cobalt-containing alloys |
US7205233B2 (en) * | 2003-11-07 | 2007-04-17 | Applied Materials, Inc. | Method for forming CoWRe alloys by electroless deposition |
US20050098198A1 (en) * | 2003-11-10 | 2005-05-12 | Reg Yang | Washing device for packaging the image |
US7044476B2 (en) * | 2003-11-25 | 2006-05-16 | N&K Technology, Inc. | Compact pinlifter assembly integrated in wafer chuck |
US20060003570A1 (en) * | 2003-12-02 | 2006-01-05 | Arulkumar Shanmugasundram | Method and apparatus for electroless capping with vapor drying |
US20050121329A1 (en) * | 2003-12-05 | 2005-06-09 | Taiwan Semiconductor Manufacturing Co., Ltd. | Thrust pad assembly for ECP system |
US20050161338A1 (en) * | 2004-01-26 | 2005-07-28 | Applied Materials, Inc. | Electroless cobalt alloy deposition process |
US20050181226A1 (en) * | 2004-01-26 | 2005-08-18 | Applied Materials, Inc. | Method and apparatus for selectively changing thin film composition during electroless deposition in a single chamber |
US20050170650A1 (en) * | 2004-01-26 | 2005-08-04 | Hongbin Fang | Electroless palladium nitrate activation prior to cobalt-alloy deposition |
US7153777B2 (en) * | 2004-02-20 | 2006-12-26 | Micron Technology, Inc. | Methods and apparatuses for electrochemical-mechanical polishing |
KR101248182B1 (en) * | 2004-02-26 | 2013-03-27 | 어플라이드 머티어리얼스, 인코포레이티드 | In-situ clean chamber for front end of line fabrication |
US20050230350A1 (en) | 2004-02-26 | 2005-10-20 | Applied Materials, Inc. | In-situ dry clean chamber for front end of line fabrication |
US7371312B2 (en) * | 2004-03-31 | 2008-05-13 | Intel Corporation | Using cell voltage as a monitor for deposition coverage |
US20050253268A1 (en) * | 2004-04-22 | 2005-11-17 | Shao-Ta Hsu | Method and structure for improving adhesion between intermetal dielectric layer and cap layer |
US7226860B2 (en) * | 2004-04-28 | 2007-06-05 | Taiwan Semiconductor Manfacturing Co. Ltd. | Method and apparatus for fabricating metal layer |
US7566391B2 (en) * | 2004-09-01 | 2009-07-28 | Micron Technology, Inc. | Methods and systems for removing materials from microfeature workpieces with organic and/or non-aqueous electrolytic media |
US7292427B1 (en) * | 2004-10-12 | 2007-11-06 | Kla-Tencor Technologies Corporation | Pin lift chuck assembly for warped substrates |
US7790633B1 (en) | 2004-10-26 | 2010-09-07 | Novellus Systems, Inc. | Sequential deposition/anneal film densification method |
TWI259538B (en) * | 2004-11-22 | 2006-08-01 | Au Optronics Corp | Thin film transistor and fabrication method thereof |
US20090107545A1 (en) | 2006-10-09 | 2009-04-30 | Soltaix, Inc. | Template for pyramidal three-dimensional thin-film solar cell manufacturing and methods of use |
US8399331B2 (en) | 2007-10-06 | 2013-03-19 | Solexel | Laser processing for high-efficiency thin crystalline silicon solar cell fabrication |
US8420435B2 (en) * | 2009-05-05 | 2013-04-16 | Solexel, Inc. | Ion implantation fabrication process for thin-film crystalline silicon solar cells |
US9508886B2 (en) | 2007-10-06 | 2016-11-29 | Solexel, Inc. | Method for making a crystalline silicon solar cell substrate utilizing flat top laser beam |
US20060240187A1 (en) * | 2005-01-27 | 2006-10-26 | Applied Materials, Inc. | Deposition of an intermediate catalytic layer on a barrier layer for copper metallization |
US7155319B2 (en) | 2005-02-23 | 2006-12-26 | Applied Materials, Inc. | Closed loop control on liquid delivery system ECP slim cell |
TW200734482A (en) * | 2005-03-18 | 2007-09-16 | Applied Materials Inc | Electroless deposition process on a contact containing silicon or silicide |
US7651934B2 (en) | 2005-03-18 | 2010-01-26 | Applied Materials, Inc. | Process for electroless copper deposition |
TW200707640A (en) * | 2005-03-18 | 2007-02-16 | Applied Materials Inc | Contact metallization scheme using a barrier layer over a silicide layer |
US20070238265A1 (en) * | 2005-04-05 | 2007-10-11 | Keiichi Kurashina | Plating apparatus and plating method |
JP2006299367A (en) * | 2005-04-22 | 2006-11-02 | Yamamoto Mekki Shikenki:Kk | Electroplating tester |
WO2007035880A2 (en) * | 2005-09-21 | 2007-03-29 | Applied Materials, Inc. | Method and apparatus for forming device features in an integrated electroless deposition system |
US7737035B1 (en) * | 2006-03-31 | 2010-06-15 | Novellus Systems, Inc. | Dual seal deposition process chamber and process |
JP4937655B2 (en) * | 2006-07-18 | 2012-05-23 | 株式会社東設 | Electroplating equipment |
US8035028B2 (en) * | 2006-10-09 | 2011-10-11 | Solexel, Inc. | Pyramidal three-dimensional thin-film solar cells |
US20080264477A1 (en) * | 2006-10-09 | 2008-10-30 | Soltaix, Inc. | Methods for manufacturing three-dimensional thin-film solar cells |
US7999174B2 (en) * | 2006-10-09 | 2011-08-16 | Solexel, Inc. | Solar module structures and assembly methods for three-dimensional thin-film solar cells |
US8193076B2 (en) | 2006-10-09 | 2012-06-05 | Solexel, Inc. | Method for releasing a thin semiconductor substrate from a reusable template |
US8293558B2 (en) * | 2006-10-09 | 2012-10-23 | Solexel, Inc. | Method for releasing a thin-film substrate |
US20100304521A1 (en) * | 2006-10-09 | 2010-12-02 | Solexel, Inc. | Shadow Mask Methods For Manufacturing Three-Dimensional Thin-Film Solar Cells |
US7993457B1 (en) | 2007-01-23 | 2011-08-09 | Novellus Systems, Inc. | Deposition sub-chamber with variable flow |
US9383138B2 (en) * | 2007-03-30 | 2016-07-05 | Tokyo Electron Limited | Methods and heat treatment apparatus for uniformly heating a substrate during a bake process |
US20080241400A1 (en) * | 2007-03-31 | 2008-10-02 | Tokyo Electron Limited | Vacuum assist method and system for reducing intermixing of lithography layers |
WO2009026240A1 (en) * | 2007-08-17 | 2009-02-26 | Solexel, Inc. | Methods for liquid transfer coating of three-dimensional substrates |
US7867900B2 (en) * | 2007-09-28 | 2011-01-11 | Applied Materials, Inc. | Aluminum contact integration on cobalt silicide junction |
KR100957366B1 (en) | 2008-03-13 | 2010-05-12 | 현대자동차주식회사 | Jig apparatus for fuel cell separator |
US20100144080A1 (en) * | 2008-06-02 | 2010-06-10 | Solexel, Inc. | Method and apparatus to transfer coat uneven surface |
US20100101730A1 (en) * | 2008-10-29 | 2010-04-29 | Jusung Engineering Co., Ltd. | Substrate processing apparatus |
US8288195B2 (en) * | 2008-11-13 | 2012-10-16 | Solexel, Inc. | Method for fabricating a three-dimensional thin-film semiconductor substrate from a template |
EP2356675B1 (en) | 2008-11-13 | 2016-06-01 | Solexel, Inc. | Three dimensional thin film solar cell and manufacturing method thereof |
WO2010063003A1 (en) * | 2008-11-26 | 2010-06-03 | Solexel, Inc. | Truncated pyramid structures for see-through solar cells |
EP2387458B1 (en) * | 2009-01-15 | 2014-03-05 | Solexel, Inc. | Porous silicon electro-etching system and method |
US8906218B2 (en) | 2010-05-05 | 2014-12-09 | Solexel, Inc. | Apparatus and methods for uniformly forming porous semiconductor on a substrate |
US9076642B2 (en) | 2009-01-15 | 2015-07-07 | Solexel, Inc. | High-Throughput batch porous silicon manufacturing equipment design and processing methods |
MY162405A (en) * | 2009-02-06 | 2017-06-15 | Solexel Inc | Trench Formation Method For Releasing A Thin-Film Substrate From A Reusable Semiconductor Template |
US8828517B2 (en) | 2009-03-23 | 2014-09-09 | Solexel, Inc. | Structure and method for improving solar cell efficiency and mechanical strength |
US8656860B2 (en) * | 2009-04-14 | 2014-02-25 | Solexel, Inc. | High efficiency epitaxial chemical vapor deposition (CVD) reactor |
US9099584B2 (en) * | 2009-04-24 | 2015-08-04 | Solexel, Inc. | Integrated three-dimensional and planar metallization structure for thin film solar cells |
MY165969A (en) | 2009-05-05 | 2018-05-18 | Solexel Inc | High-productivity porous semiconductor manufacturing equipment |
US9318644B2 (en) | 2009-05-05 | 2016-04-19 | Solexel, Inc. | Ion implantation and annealing for thin film crystalline solar cells |
US8445314B2 (en) * | 2009-05-22 | 2013-05-21 | Solexel, Inc. | Method of creating reusable template for detachable thin film substrate |
MY159405A (en) * | 2009-05-29 | 2016-12-30 | Solexel Inc | Three-dimensional thin-film semiconductor substrate with through-holes and methods of manufacturing |
CN102763226B (en) | 2009-12-09 | 2016-01-27 | 速力斯公司 | Use high-efficiency photovoltaic back of the body contact solar cell structure and the manufacture method of thin plate semiconductor |
US8241940B2 (en) | 2010-02-12 | 2012-08-14 | Solexel, Inc. | Double-sided reusable template for fabrication of semiconductor substrates for photovoltaic cell and microelectronics device manufacturing |
KR20110106178A (en) * | 2010-03-22 | 2011-09-28 | 삼성전자주식회사 | Apparatus and method for treating substrate |
US9324576B2 (en) | 2010-05-27 | 2016-04-26 | Applied Materials, Inc. | Selective etch for silicon films |
WO2011156657A2 (en) | 2010-06-09 | 2011-12-15 | Solexel, Inc. | High productivity thin film deposition method and system |
US8946547B2 (en) | 2010-08-05 | 2015-02-03 | Solexel, Inc. | Backplane reinforcement and interconnects for solar cells |
CN106073843B (en) | 2010-10-11 | 2019-05-17 | 库克医学技术有限责任公司 | Medical Devices with detachable pivotable jaws |
US9728435B2 (en) | 2010-10-21 | 2017-08-08 | Ebara Corporation | Plating apparatus and plating method |
US10283321B2 (en) | 2011-01-18 | 2019-05-07 | Applied Materials, Inc. | Semiconductor processing system and methods using capacitively coupled plasma |
US8771539B2 (en) | 2011-02-22 | 2014-07-08 | Applied Materials, Inc. | Remotely-excited fluorine and water vapor etch |
US8999856B2 (en) | 2011-03-14 | 2015-04-07 | Applied Materials, Inc. | Methods for etch of sin films |
US9064815B2 (en) | 2011-03-14 | 2015-06-23 | Applied Materials, Inc. | Methods for etch of metal and metal-oxide films |
US9748414B2 (en) | 2011-05-20 | 2017-08-29 | Arthur R. Zingher | Self-activated front surface bias for a solar cell |
US9117856B2 (en) * | 2011-07-06 | 2015-08-25 | Tel Nexx, Inc. | Substrate loader and unloader having an air bearing support |
SG10201605873QA (en) * | 2011-07-19 | 2016-09-29 | Ebara Corp | Plating apparatus and plating method |
US8771536B2 (en) | 2011-08-01 | 2014-07-08 | Applied Materials, Inc. | Dry-etch for silicon-and-carbon-containing films |
US8679982B2 (en) | 2011-08-26 | 2014-03-25 | Applied Materials, Inc. | Selective suppression of dry-etch rate of materials containing both silicon and oxygen |
US8679983B2 (en) | 2011-09-01 | 2014-03-25 | Applied Materials, Inc. | Selective suppression of dry-etch rate of materials containing both silicon and nitrogen |
US10269615B2 (en) * | 2011-09-09 | 2019-04-23 | Lam Research Ag | Apparatus for treating surfaces of wafer-shaped articles |
US8927390B2 (en) | 2011-09-26 | 2015-01-06 | Applied Materials, Inc. | Intrench profile |
US8808563B2 (en) | 2011-10-07 | 2014-08-19 | Applied Materials, Inc. | Selective etch of silicon by way of metastable hydrogen termination |
WO2013070436A1 (en) | 2011-11-08 | 2013-05-16 | Applied Materials, Inc. | Methods of reducing substrate dislocation during gapfill processing |
NL2009689A (en) * | 2011-12-01 | 2013-06-05 | Asml Netherlands Bv | Support, lithographic apparatus and device manufacturing method. |
US9267739B2 (en) | 2012-07-18 | 2016-02-23 | Applied Materials, Inc. | Pedestal with multi-zone temperature control and multiple purge capabilities |
US9373517B2 (en) | 2012-08-02 | 2016-06-21 | Applied Materials, Inc. | Semiconductor processing with DC assisted RF power for improved control |
US9034770B2 (en) | 2012-09-17 | 2015-05-19 | Applied Materials, Inc. | Differential silicon oxide etch |
US9023734B2 (en) | 2012-09-18 | 2015-05-05 | Applied Materials, Inc. | Radical-component oxide etch |
US9390937B2 (en) | 2012-09-20 | 2016-07-12 | Applied Materials, Inc. | Silicon-carbon-nitride selective etch |
US9132436B2 (en) | 2012-09-21 | 2015-09-15 | Applied Materials, Inc. | Chemical control features in wafer process equipment |
US8765574B2 (en) | 2012-11-09 | 2014-07-01 | Applied Materials, Inc. | Dry etch process |
US8969212B2 (en) | 2012-11-20 | 2015-03-03 | Applied Materials, Inc. | Dry-etch selectivity |
US8980763B2 (en) | 2012-11-30 | 2015-03-17 | Applied Materials, Inc. | Dry-etch for selective tungsten removal |
US9064816B2 (en) | 2012-11-30 | 2015-06-23 | Applied Materials, Inc. | Dry-etch for selective oxidation removal |
US9111877B2 (en) | 2012-12-18 | 2015-08-18 | Applied Materials, Inc. | Non-local plasma oxide etch |
US8921234B2 (en) | 2012-12-21 | 2014-12-30 | Applied Materials, Inc. | Selective titanium nitride etching |
US10256079B2 (en) | 2013-02-08 | 2019-04-09 | Applied Materials, Inc. | Semiconductor processing systems having multiple plasma configurations |
US9362130B2 (en) | 2013-03-01 | 2016-06-07 | Applied Materials, Inc. | Enhanced etching processes using remote plasma sources |
US9040422B2 (en) | 2013-03-05 | 2015-05-26 | Applied Materials, Inc. | Selective titanium nitride removal |
US8801952B1 (en) | 2013-03-07 | 2014-08-12 | Applied Materials, Inc. | Conformal oxide dry etch |
US10170282B2 (en) | 2013-03-08 | 2019-01-01 | Applied Materials, Inc. | Insulated semiconductor faceplate designs |
US20140271097A1 (en) | 2013-03-15 | 2014-09-18 | Applied Materials, Inc. | Processing systems and methods for halide scavenging |
US20140263275A1 (en) * | 2013-03-15 | 2014-09-18 | Applied Materials, Inc. | Rotation enabled multifunctional heater-chiller pedestal |
US9353439B2 (en) | 2013-04-05 | 2016-05-31 | Lam Research Corporation | Cascade design showerhead for transient uniformity |
US8895449B1 (en) | 2013-05-16 | 2014-11-25 | Applied Materials, Inc. | Delicate dry clean |
US9114438B2 (en) | 2013-05-21 | 2015-08-25 | Applied Materials, Inc. | Copper residue chamber clean |
US9493879B2 (en) | 2013-07-12 | 2016-11-15 | Applied Materials, Inc. | Selective sputtering for pattern transfer |
US9773648B2 (en) | 2013-08-30 | 2017-09-26 | Applied Materials, Inc. | Dual discharge modes operation for remote plasma |
US8956980B1 (en) | 2013-09-16 | 2015-02-17 | Applied Materials, Inc. | Selective etch of silicon nitride |
US8951429B1 (en) | 2013-10-29 | 2015-02-10 | Applied Materials, Inc. | Tungsten oxide processing |
US9236265B2 (en) | 2013-11-04 | 2016-01-12 | Applied Materials, Inc. | Silicon germanium processing |
US9576809B2 (en) | 2013-11-04 | 2017-02-21 | Applied Materials, Inc. | Etch suppression with germanium |
US9520303B2 (en) | 2013-11-12 | 2016-12-13 | Applied Materials, Inc. | Aluminum selective etch |
US9245762B2 (en) | 2013-12-02 | 2016-01-26 | Applied Materials, Inc. | Procedure for etch rate consistency |
US9117855B2 (en) | 2013-12-04 | 2015-08-25 | Applied Materials, Inc. | Polarity control for remote plasma |
US9287095B2 (en) | 2013-12-17 | 2016-03-15 | Applied Materials, Inc. | Semiconductor system assemblies and methods of operation |
US9263278B2 (en) | 2013-12-17 | 2016-02-16 | Applied Materials, Inc. | Dopant etch selectivity control |
US9190293B2 (en) | 2013-12-18 | 2015-11-17 | Applied Materials, Inc. | Even tungsten etch for high aspect ratio trenches |
US9287134B2 (en) | 2014-01-17 | 2016-03-15 | Applied Materials, Inc. | Titanium oxide etch |
US9293568B2 (en) | 2014-01-27 | 2016-03-22 | Applied Materials, Inc. | Method of fin patterning |
US9396989B2 (en) | 2014-01-27 | 2016-07-19 | Applied Materials, Inc. | Air gaps between copper lines |
US9385028B2 (en) | 2014-02-03 | 2016-07-05 | Applied Materials, Inc. | Air gap process |
US9499898B2 (en) | 2014-03-03 | 2016-11-22 | Applied Materials, Inc. | Layered thin film heater and method of fabrication |
US9299575B2 (en) | 2014-03-17 | 2016-03-29 | Applied Materials, Inc. | Gas-phase tungsten etch |
US9299538B2 (en) | 2014-03-20 | 2016-03-29 | Applied Materials, Inc. | Radial waveguide systems and methods for post-match control of microwaves |
US9299537B2 (en) | 2014-03-20 | 2016-03-29 | Applied Materials, Inc. | Radial waveguide systems and methods for post-match control of microwaves |
US9136273B1 (en) | 2014-03-21 | 2015-09-15 | Applied Materials, Inc. | Flash gate air gap |
US9903020B2 (en) | 2014-03-31 | 2018-02-27 | Applied Materials, Inc. | Generation of compact alumina passivation layers on aluminum plasma equipment components |
US9269590B2 (en) | 2014-04-07 | 2016-02-23 | Applied Materials, Inc. | Spacer formation |
US9309598B2 (en) | 2014-05-28 | 2016-04-12 | Applied Materials, Inc. | Oxide and metal removal |
US9847289B2 (en) | 2014-05-30 | 2017-12-19 | Applied Materials, Inc. | Protective via cap for improved interconnect performance |
US9378969B2 (en) | 2014-06-19 | 2016-06-28 | Applied Materials, Inc. | Low temperature gas-phase carbon removal |
US9406523B2 (en) | 2014-06-19 | 2016-08-02 | Applied Materials, Inc. | Highly selective doped oxide removal method |
US9425058B2 (en) | 2014-07-24 | 2016-08-23 | Applied Materials, Inc. | Simplified litho-etch-litho-etch process |
US9378978B2 (en) | 2014-07-31 | 2016-06-28 | Applied Materials, Inc. | Integrated oxide recess and floating gate fin trimming |
US9159606B1 (en) | 2014-07-31 | 2015-10-13 | Applied Materials, Inc. | Metal air gap |
US9496167B2 (en) | 2014-07-31 | 2016-11-15 | Applied Materials, Inc. | Integrated bit-line airgap formation and gate stack post clean |
US9165786B1 (en) | 2014-08-05 | 2015-10-20 | Applied Materials, Inc. | Integrated oxide and nitride recess for better channel contact in 3D architectures |
US9659753B2 (en) | 2014-08-07 | 2017-05-23 | Applied Materials, Inc. | Grooved insulator to reduce leakage current |
US9553102B2 (en) | 2014-08-19 | 2017-01-24 | Applied Materials, Inc. | Tungsten separation |
US9355856B2 (en) | 2014-09-12 | 2016-05-31 | Applied Materials, Inc. | V trench dry etch |
US9368364B2 (en) | 2014-09-24 | 2016-06-14 | Applied Materials, Inc. | Silicon etch process with tunable selectivity to SiO2 and other materials |
US9478434B2 (en) | 2014-09-24 | 2016-10-25 | Applied Materials, Inc. | Chlorine-based hardmask removal |
US9613822B2 (en) | 2014-09-25 | 2017-04-04 | Applied Materials, Inc. | Oxide etch selectivity enhancement |
US9355922B2 (en) | 2014-10-14 | 2016-05-31 | Applied Materials, Inc. | Systems and methods for internal surface conditioning in plasma processing equipment |
US9966240B2 (en) | 2014-10-14 | 2018-05-08 | Applied Materials, Inc. | Systems and methods for internal surface conditioning assessment in plasma processing equipment |
US11637002B2 (en) | 2014-11-26 | 2023-04-25 | Applied Materials, Inc. | Methods and systems to enhance process uniformity |
US9299583B1 (en) | 2014-12-05 | 2016-03-29 | Applied Materials, Inc. | Aluminum oxide selective etch |
US10573496B2 (en) | 2014-12-09 | 2020-02-25 | Applied Materials, Inc. | Direct outlet toroidal plasma source |
US10224210B2 (en) | 2014-12-09 | 2019-03-05 | Applied Materials, Inc. | Plasma processing system with direct outlet toroidal plasma source |
US9502258B2 (en) | 2014-12-23 | 2016-11-22 | Applied Materials, Inc. | Anisotropic gap etch |
US9343272B1 (en) | 2015-01-08 | 2016-05-17 | Applied Materials, Inc. | Self-aligned process |
US11257693B2 (en) | 2015-01-09 | 2022-02-22 | Applied Materials, Inc. | Methods and systems to improve pedestal temperature control |
US9373522B1 (en) | 2015-01-22 | 2016-06-21 | Applied Mateials, Inc. | Titanium nitride removal |
US9449846B2 (en) | 2015-01-28 | 2016-09-20 | Applied Materials, Inc. | Vertical gate separation |
US9728437B2 (en) | 2015-02-03 | 2017-08-08 | Applied Materials, Inc. | High temperature chuck for plasma processing systems |
US20160225652A1 (en) | 2015-02-03 | 2016-08-04 | Applied Materials, Inc. | Low temperature chuck for plasma processing systems |
US9881805B2 (en) | 2015-03-02 | 2018-01-30 | Applied Materials, Inc. | Silicon selective removal |
JP6222145B2 (en) | 2015-03-11 | 2017-11-01 | トヨタ自動車株式会社 | Metal film forming apparatus and film forming method |
US10023959B2 (en) | 2015-05-26 | 2018-07-17 | Lam Research Corporation | Anti-transient showerhead |
US9741593B2 (en) | 2015-08-06 | 2017-08-22 | Applied Materials, Inc. | Thermal management systems and methods for wafer processing systems |
US9691645B2 (en) | 2015-08-06 | 2017-06-27 | Applied Materials, Inc. | Bolted wafer chuck thermal management systems and methods for wafer processing systems |
US9349605B1 (en) | 2015-08-07 | 2016-05-24 | Applied Materials, Inc. | Oxide etch selectivity systems and methods |
US20170053822A1 (en) * | 2015-08-23 | 2017-02-23 | Camtek Ltd. | Warped wafers vacuum chuck |
US10504700B2 (en) | 2015-08-27 | 2019-12-10 | Applied Materials, Inc. | Plasma etching systems and methods with secondary plasma injection |
US10522371B2 (en) | 2016-05-19 | 2019-12-31 | Applied Materials, Inc. | Systems and methods for improved semiconductor etching and component protection |
US10504754B2 (en) | 2016-05-19 | 2019-12-10 | Applied Materials, Inc. | Systems and methods for improved semiconductor etching and component protection |
US9865484B1 (en) | 2016-06-29 | 2018-01-09 | Applied Materials, Inc. | Selective etch using material modification and RF pulsing |
CN107768270B (en) * | 2016-08-16 | 2020-04-07 | 沈阳芯源微电子设备股份有限公司 | Device for preventing backsplash liquid from polluting wafer |
US10062575B2 (en) | 2016-09-09 | 2018-08-28 | Applied Materials, Inc. | Poly directional etch by oxidation |
US10629473B2 (en) | 2016-09-09 | 2020-04-21 | Applied Materials, Inc. | Footing removal for nitride spacer |
US9721789B1 (en) | 2016-10-04 | 2017-08-01 | Applied Materials, Inc. | Saving ion-damaged spacers |
US9934942B1 (en) | 2016-10-04 | 2018-04-03 | Applied Materials, Inc. | Chamber with flow-through source |
US10546729B2 (en) | 2016-10-04 | 2020-01-28 | Applied Materials, Inc. | Dual-channel showerhead with improved profile |
US10062585B2 (en) | 2016-10-04 | 2018-08-28 | Applied Materials, Inc. | Oxygen compatible plasma source |
US10062579B2 (en) | 2016-10-07 | 2018-08-28 | Applied Materials, Inc. | Selective SiN lateral recess |
US9947549B1 (en) | 2016-10-10 | 2018-04-17 | Applied Materials, Inc. | Cobalt-containing material removal |
US9768034B1 (en) | 2016-11-11 | 2017-09-19 | Applied Materials, Inc. | Removal methods for high aspect ratio structures |
US10163696B2 (en) | 2016-11-11 | 2018-12-25 | Applied Materials, Inc. | Selective cobalt removal for bottom up gapfill |
US10242908B2 (en) | 2016-11-14 | 2019-03-26 | Applied Materials, Inc. | Airgap formation with damage-free copper |
US10026621B2 (en) | 2016-11-14 | 2018-07-17 | Applied Materials, Inc. | SiN spacer profile patterning |
US11802340B2 (en) * | 2016-12-12 | 2023-10-31 | Applied Materials, Inc. | UHV in-situ cryo-cool chamber |
US10566206B2 (en) | 2016-12-27 | 2020-02-18 | Applied Materials, Inc. | Systems and methods for anisotropic material breakthrough |
GB201701166D0 (en) * | 2017-01-24 | 2017-03-08 | Picofluidics Ltd | An apparatus for electrochemically processing semiconductor substrates |
US10431429B2 (en) | 2017-02-03 | 2019-10-01 | Applied Materials, Inc. | Systems and methods for radial and azimuthal control of plasma uniformity |
US10403507B2 (en) | 2017-02-03 | 2019-09-03 | Applied Materials, Inc. | Shaped etch profile with oxidation |
US10043684B1 (en) | 2017-02-06 | 2018-08-07 | Applied Materials, Inc. | Self-limiting atomic thermal etching systems and methods |
JP6697640B2 (en) | 2017-02-08 | 2020-05-20 | ピコサン オーワイPicosun Oy | Deposition or cleaning device with movable structure and method of operation |
US10319739B2 (en) | 2017-02-08 | 2019-06-11 | Applied Materials, Inc. | Accommodating imperfectly aligned memory holes |
US10943834B2 (en) | 2017-03-13 | 2021-03-09 | Applied Materials, Inc. | Replacement contact process |
US10319649B2 (en) | 2017-04-11 | 2019-06-11 | Applied Materials, Inc. | Optical emission spectroscopy (OES) for remote plasma monitoring |
US11276559B2 (en) | 2017-05-17 | 2022-03-15 | Applied Materials, Inc. | Semiconductor processing chamber for multiple precursor flow |
US11276590B2 (en) | 2017-05-17 | 2022-03-15 | Applied Materials, Inc. | Multi-zone semiconductor substrate supports |
US10049891B1 (en) | 2017-05-31 | 2018-08-14 | Applied Materials, Inc. | Selective in situ cobalt residue removal |
US10497579B2 (en) | 2017-05-31 | 2019-12-03 | Applied Materials, Inc. | Water-free etching methods |
US10920320B2 (en) | 2017-06-16 | 2021-02-16 | Applied Materials, Inc. | Plasma health determination in semiconductor substrate processing reactors |
US10541246B2 (en) | 2017-06-26 | 2020-01-21 | Applied Materials, Inc. | 3D flash memory cells which discourage cross-cell electrical tunneling |
US10727080B2 (en) | 2017-07-07 | 2020-07-28 | Applied Materials, Inc. | Tantalum-containing material removal |
US10541184B2 (en) | 2017-07-11 | 2020-01-21 | Applied Materials, Inc. | Optical emission spectroscopic techniques for monitoring etching |
US10354889B2 (en) | 2017-07-17 | 2019-07-16 | Applied Materials, Inc. | Non-halogen etching of silicon-containing materials |
US10043674B1 (en) | 2017-08-04 | 2018-08-07 | Applied Materials, Inc. | Germanium etching systems and methods |
US10170336B1 (en) | 2017-08-04 | 2019-01-01 | Applied Materials, Inc. | Methods for anisotropic control of selective silicon removal |
US10297458B2 (en) | 2017-08-07 | 2019-05-21 | Applied Materials, Inc. | Process window widening using coated parts in plasma etch processes |
US10128086B1 (en) | 2017-10-24 | 2018-11-13 | Applied Materials, Inc. | Silicon pretreatment for nitride removal |
US10283324B1 (en) | 2017-10-24 | 2019-05-07 | Applied Materials, Inc. | Oxygen treatment for nitride etching |
US10256112B1 (en) | 2017-12-08 | 2019-04-09 | Applied Materials, Inc. | Selective tungsten removal |
US10903054B2 (en) | 2017-12-19 | 2021-01-26 | Applied Materials, Inc. | Multi-zone gas distribution systems and methods |
US11328909B2 (en) | 2017-12-22 | 2022-05-10 | Applied Materials, Inc. | Chamber conditioning and removal processes |
US10854426B2 (en) | 2018-01-08 | 2020-12-01 | Applied Materials, Inc. | Metal recess for semiconductor structures |
US10679870B2 (en) | 2018-02-15 | 2020-06-09 | Applied Materials, Inc. | Semiconductor processing chamber multistage mixing apparatus |
US10964512B2 (en) | 2018-02-15 | 2021-03-30 | Applied Materials, Inc. | Semiconductor processing chamber multistage mixing apparatus and methods |
TWI766433B (en) | 2018-02-28 | 2022-06-01 | 美商應用材料股份有限公司 | Systems and methods to form airgaps |
US10593560B2 (en) | 2018-03-01 | 2020-03-17 | Applied Materials, Inc. | Magnetic induction plasma source for semiconductor processes and equipment |
US10319600B1 (en) | 2018-03-12 | 2019-06-11 | Applied Materials, Inc. | Thermal silicon etch |
US10497573B2 (en) | 2018-03-13 | 2019-12-03 | Applied Materials, Inc. | Selective atomic layer etching of semiconductor materials |
TWI810269B (en) * | 2018-03-29 | 2023-08-01 | 美商應用材料股份有限公司 | Electroplating apparatus and method for rinsing a substrate |
US10573527B2 (en) | 2018-04-06 | 2020-02-25 | Applied Materials, Inc. | Gas-phase selective etching systems and methods |
US10490406B2 (en) | 2018-04-10 | 2019-11-26 | Appled Materials, Inc. | Systems and methods for material breakthrough |
US10699879B2 (en) | 2018-04-17 | 2020-06-30 | Applied Materials, Inc. | Two piece electrode assembly with gap for plasma control |
CN112004965B (en) * | 2018-04-20 | 2023-02-28 | 应用材料公司 | Cleaning member and method in electroplating system |
US10886137B2 (en) | 2018-04-30 | 2021-01-05 | Applied Materials, Inc. | Selective nitride removal |
JP6971922B2 (en) * | 2018-06-27 | 2021-11-24 | 株式会社荏原製作所 | Board holder |
US10872778B2 (en) | 2018-07-06 | 2020-12-22 | Applied Materials, Inc. | Systems and methods utilizing solid-phase etchants |
US10755941B2 (en) | 2018-07-06 | 2020-08-25 | Applied Materials, Inc. | Self-limiting selective etching systems and methods |
US10672642B2 (en) | 2018-07-24 | 2020-06-02 | Applied Materials, Inc. | Systems and methods for pedestal configuration |
US11049755B2 (en) | 2018-09-14 | 2021-06-29 | Applied Materials, Inc. | Semiconductor substrate supports with embedded RF shield |
US10892198B2 (en) | 2018-09-14 | 2021-01-12 | Applied Materials, Inc. | Systems and methods for improved performance in semiconductor processing |
US11062887B2 (en) | 2018-09-17 | 2021-07-13 | Applied Materials, Inc. | High temperature RF heater pedestals |
US11417534B2 (en) | 2018-09-21 | 2022-08-16 | Applied Materials, Inc. | Selective material removal |
WO2020067246A1 (en) * | 2018-09-27 | 2020-04-02 | 東京エレクトロン株式会社 | Substrate processing device and substrate processing method |
US11682560B2 (en) | 2018-10-11 | 2023-06-20 | Applied Materials, Inc. | Systems and methods for hafnium-containing film removal |
US11121002B2 (en) | 2018-10-24 | 2021-09-14 | Applied Materials, Inc. | Systems and methods for etching metals and metal derivatives |
US11437242B2 (en) | 2018-11-27 | 2022-09-06 | Applied Materials, Inc. | Selective removal of silicon-containing materials |
US11721527B2 (en) | 2019-01-07 | 2023-08-08 | Applied Materials, Inc. | Processing chamber mixing systems |
US10920319B2 (en) | 2019-01-11 | 2021-02-16 | Applied Materials, Inc. | Ceramic showerheads with conductive electrodes |
JP2021044336A (en) * | 2019-09-10 | 2021-03-18 | キオクシア株式会社 | Semiconductor manufacturing device |
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US11602064B2 (en) * | 2020-09-01 | 2023-03-07 | Applied Materials, Inc. | Dynamic electrical and fluid delivery system with indexing motion for batch processing chambers |
US11848218B2 (en) * | 2020-10-22 | 2023-12-19 | Applied Materials, Inc. | Semiconductor chamber component cleaning systems |
CN112795970B (en) * | 2020-12-30 | 2021-12-21 | 安徽持恒电子科技有限公司 | Copper plating device for circuit board printing |
Citations (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3727620A (en) * | 1970-03-18 | 1973-04-17 | Fluoroware Of California Inc | Rinsing and drying device |
US3770598A (en) * | 1972-01-21 | 1973-11-06 | Oxy Metal Finishing Corp | Electrodeposition of copper from acid baths |
US4304641A (en) * | 1980-11-24 | 1981-12-08 | International Business Machines Corporation | Rotary electroplating cell with controlled current distribution |
US4861452A (en) * | 1987-04-13 | 1989-08-29 | Texas Instruments Incorporated | Fixture for plating tall contact bumps on integrated circuit |
US4874476A (en) * | 1987-04-13 | 1989-10-17 | Texas Instruments Incorporated | Fixture for plating tall contact bumps on integrated circuit |
US4894260A (en) * | 1987-09-19 | 1990-01-16 | Pioneer Electronic Corporation | Electroless plating method and apparatus |
US4931149A (en) * | 1987-04-13 | 1990-06-05 | Texas Instruments Incorporated | Fixture and a method for plating contact bumps for integrated circuits |
US5024746A (en) * | 1987-04-13 | 1991-06-18 | Texas Instruments Incorporated | Fixture and a method for plating contact bumps for integrated circuits |
US5156174A (en) * | 1990-05-18 | 1992-10-20 | Semitool, Inc. | Single wafer processor with a bowl |
US5168887A (en) * | 1990-05-18 | 1992-12-08 | Semitool, Inc. | Single wafer processor apparatus |
US5168886A (en) * | 1988-05-25 | 1992-12-08 | Semitool, Inc. | Single wafer processor |
US5222310A (en) * | 1990-05-18 | 1993-06-29 | Semitool, Inc. | Single wafer processor with a frame |
US5224504A (en) * | 1988-05-25 | 1993-07-06 | Semitool, Inc. | Single wafer processor |
US5230743A (en) * | 1988-05-25 | 1993-07-27 | Semitool, Inc. | Method for single wafer processing in which a semiconductor wafer is contacted with a fluid |
US5441629A (en) * | 1993-03-30 | 1995-08-15 | Mitsubishi Denki Kabushiki Kaisha | Apparatus and method of electroplating |
US5489341A (en) * | 1993-08-23 | 1996-02-06 | Semitool, Inc. | Semiconductor processing with non-jetting fluid stream discharge array |
US5544421A (en) * | 1994-04-28 | 1996-08-13 | Semitool, Inc. | Semiconductor wafer processing system |
US5620581A (en) * | 1995-11-29 | 1997-04-15 | Aiwa Research And Development, Inc. | Apparatus for electroplating metal films including a cathode ring, insulator ring and thief ring |
US5837120A (en) * | 1994-09-30 | 1998-11-17 | Electroplating Technologies, Inc. | Method and apparatus for electrochemical processing |
US5879520A (en) * | 1994-08-26 | 1999-03-09 | Griego; Thomas P. | Rotary electrodeposition apparatus |
US6017437A (en) * | 1997-08-22 | 2000-01-25 | Cutek Research, Inc. | Process chamber and method for depositing and/or removing material on a substrate |
US6099702A (en) * | 1998-06-10 | 2000-08-08 | Novellus Systems, Inc. | Electroplating chamber with rotatable wafer holder and pre-wetting and rinsing capability |
US6132857A (en) * | 1996-02-29 | 2000-10-17 | Societe Nationale D'etude Et De Construction De Moterus D'aviation "Snecma" | Hybrid component with high strength/mass ratio and method of manufacturing said component |
US6136163A (en) * | 1999-03-05 | 2000-10-24 | Applied Materials, Inc. | Apparatus for electro-chemical deposition with thermal anneal chamber |
US6228232B1 (en) * | 1998-07-09 | 2001-05-08 | Semitool, Inc. | Reactor vessel having improved cup anode and conductor assembly |
US6241825B1 (en) * | 1999-04-16 | 2001-06-05 | Cutek Research Inc. | Compliant wafer chuck |
US6258220B1 (en) * | 1998-11-30 | 2001-07-10 | Applied Materials, Inc. | Electro-chemical deposition system |
US6270635B1 (en) * | 1999-04-27 | 2001-08-07 | Advanced Micro Devices, Inc. | Consistent plating system for electroplating |
US6352263B1 (en) * | 1998-12-03 | 2002-03-05 | Mtu Motoren-Und Turbinen-Union | Brush seals with bristles arranged at an angle |
US6383352B1 (en) * | 1998-11-13 | 2002-05-07 | Mykrolis Corporation | Spiral anode for metal plating baths |
US6391166B1 (en) * | 1998-02-12 | 2002-05-21 | Acm Research, Inc. | Plating apparatus and method |
US6416647B1 (en) * | 1998-04-21 | 2002-07-09 | Applied Materials, Inc. | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
Family Cites Families (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4027686A (en) | 1973-01-02 | 1977-06-07 | Texas Instruments Incorporated | Method and apparatus for cleaning the surface of a semiconductor slice with a liquid spray of de-ionized water |
GB1526076A (en) | 1975-03-11 | 1978-09-27 | Oxy Metal Industries Corp | Electrodeposition of copper |
JPS5271871A (en) | 1975-12-11 | 1977-06-15 | Nec Corp | Washing apparatus |
JPS5819350B2 (en) | 1976-04-08 | 1983-04-18 | 富士写真フイルム株式会社 | Spin coating method |
US4315059A (en) | 1980-07-18 | 1982-02-09 | The United States Of America As Represented By The United States Department Of Energy | Molten salt lithium cells |
US4405416A (en) | 1980-07-18 | 1983-09-20 | Raistrick Ian D | Molten salt lithium cells |
US4336114A (en) | 1981-03-26 | 1982-06-22 | Hooker Chemicals & Plastics Corp. | Electrodeposition of bright copper |
US4376685A (en) | 1981-06-24 | 1983-03-15 | M&T Chemicals Inc. | Acid copper electroplating baths containing brightening and leveling additives |
DE3272891D1 (en) | 1981-10-01 | 1986-10-02 | Emi Ltd | Electroplating arrangements |
JPS58182823A (en) | 1982-04-21 | 1983-10-25 | Nec Corp | Plating apparatus for semiconductor wafer |
US4489740A (en) | 1982-12-27 | 1984-12-25 | General Signal Corporation | Disc cleaning machine |
US4428815A (en) | 1983-04-28 | 1984-01-31 | Western Electric Co., Inc. | Vacuum-type article holder and methods of supportively retaining articles |
US4510176A (en) | 1983-09-26 | 1985-04-09 | At&T Bell Laboratories | Removal of coating from periphery of a semiconductor wafer |
US4518678A (en) | 1983-12-16 | 1985-05-21 | Advanced Micro Devices, Inc. | Selective removal of coating material on a coated substrate |
US4519846A (en) | 1984-03-08 | 1985-05-28 | Seiichiro Aigo | Process for washing and drying a semiconductor element |
US4693805A (en) | 1986-02-14 | 1987-09-15 | Boe Limited | Method and apparatus for sputtering a dielectric target or for reactive sputtering |
US4732785A (en) | 1986-09-26 | 1988-03-22 | Motorola, Inc. | Edge bead removal process for spin on films |
JPS63118093A (en) | 1986-11-05 | 1988-05-23 | Tanaka Electron Ind Co Ltd | Method for tinning electronic parts |
JPH01255684A (en) | 1988-04-01 | 1989-10-12 | Nec Corp | Equipment for producing semiconductor wafer |
US5235995A (en) | 1989-03-27 | 1993-08-17 | Semitool, Inc. | Semiconductor processor apparatus with dynamic wafer vapor treatment and particulate volatilization |
US5316974A (en) | 1988-12-19 | 1994-05-31 | Texas Instruments Incorporated | Integrated circuit copper metallization process using a lift-off seed layer and a thick-plated conductor layer |
JPH02205697A (en) | 1989-02-03 | 1990-08-15 | Nec Corp | Bump plating device |
US5039381A (en) | 1989-05-25 | 1991-08-13 | Mullarkey Edward J | Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like |
US5055425A (en) | 1989-06-01 | 1991-10-08 | Hewlett-Packard Company | Stacked solid via formation in integrated circuit systems |
US5162260A (en) | 1989-06-01 | 1992-11-10 | Hewlett-Packard Company | Stacked solid via formation in integrated circuit systems |
US5155336A (en) | 1990-01-19 | 1992-10-13 | Applied Materials, Inc. | Rapid thermal heating apparatus and method |
US5259407A (en) | 1990-06-15 | 1993-11-09 | Matrix Inc. | Surface treatment method and apparatus for a semiconductor wafer |
US5252807A (en) | 1990-07-02 | 1993-10-12 | George Chizinsky | Heated plate rapid thermal processor |
US5368711A (en) | 1990-08-01 | 1994-11-29 | Poris; Jaime | Selective metal electrodeposition process and apparatus |
US5256274A (en) | 1990-08-01 | 1993-10-26 | Jaime Poris | Selective metal electrodeposition process |
JPH04131395A (en) | 1990-09-21 | 1992-05-06 | Toshiba Corp | Method and device for plating semiconductor wafer |
EP0496605B1 (en) | 1991-01-24 | 2001-08-01 | Wako Pure Chemical Industries Ltd | Surface treating solutions for semiconductors |
JP2697773B2 (en) | 1991-03-11 | 1998-01-14 | 日本エレクトロプレイテイング・エンジニヤース 株式会社 | Plating method |
JP3200468B2 (en) | 1992-05-21 | 2001-08-20 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | Wafer plating equipment |
JP2654314B2 (en) | 1992-06-04 | 1997-09-17 | 東京応化工業株式会社 | Backside cleaning device |
JPH0617291A (en) | 1992-07-03 | 1994-01-25 | Nec Corp | Metal plating device |
US5328589A (en) | 1992-12-23 | 1994-07-12 | Enthone-Omi, Inc. | Functional fluid additives for acid copper electroplating baths |
US5718813A (en) | 1992-12-30 | 1998-02-17 | Advanced Energy Industries, Inc. | Enhanced reactive DC sputtering system |
US5608943A (en) | 1993-08-23 | 1997-03-11 | Tokyo Electron Limited | Apparatus for removing process liquid |
US5625170A (en) | 1994-01-18 | 1997-04-29 | Nanometrics Incorporated | Precision weighing to monitor the thickness and uniformity of deposited or etched thin film |
US5651865A (en) | 1994-06-17 | 1997-07-29 | Eni | Preferential sputtering of insulators from conductive targets |
US5705223A (en) | 1994-07-26 | 1998-01-06 | International Business Machine Corp. | Method and apparatus for coating a semiconductor wafer |
US5807469A (en) | 1995-09-27 | 1998-09-15 | Intel Corporation | Flexible continuous cathode contact circuit for electrolytic plating of C4, tab microbumps, and ultra large scale interconnects |
EP0876519B1 (en) * | 1996-01-23 | 2001-06-27 | Minnesota Mining And Manufacturing Company | Apparatus and method for electroplating a metal onto a substrate |
JP3462970B2 (en) * | 1997-04-28 | 2003-11-05 | 三菱電機株式会社 | Plating apparatus and plating method |
US6027631A (en) | 1997-11-13 | 2000-02-22 | Novellus Systems, Inc. | Electroplating system with shields for varying thickness profile of deposited layer |
JP2002086327A (en) | 2000-01-27 | 2002-03-26 | Seiko Epson Corp | Jig for machining |
-
1999
- 1999-04-19 US US09/294,240 patent/US6416647B1/en not_active Expired - Fee Related
- 1999-04-20 TW TW088106310A patent/TW589408B/en not_active IP Right Cessation
- 1999-04-21 EP EP99921430A patent/EP0992062A2/en not_active Withdrawn
- 1999-04-21 WO PCT/US1999/008784 patent/WO1999054920A2/en not_active Application Discontinuation
- 1999-04-21 JP JP55332299A patent/JP2002506489A/en active Pending
- 1999-04-21 KR KR19997012100A patent/KR20010014064A/en not_active Application Discontinuation
-
2002
- 2002-06-24 US US10/178,469 patent/US6599402B2/en not_active Expired - Fee Related
-
2003
- 2003-07-29 US US10/630,185 patent/US20040020781A1/en not_active Abandoned
Patent Citations (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3727620A (en) * | 1970-03-18 | 1973-04-17 | Fluoroware Of California Inc | Rinsing and drying device |
US3770598A (en) * | 1972-01-21 | 1973-11-06 | Oxy Metal Finishing Corp | Electrodeposition of copper from acid baths |
US4304641A (en) * | 1980-11-24 | 1981-12-08 | International Business Machines Corporation | Rotary electroplating cell with controlled current distribution |
US4861452A (en) * | 1987-04-13 | 1989-08-29 | Texas Instruments Incorporated | Fixture for plating tall contact bumps on integrated circuit |
US4874476A (en) * | 1987-04-13 | 1989-10-17 | Texas Instruments Incorporated | Fixture for plating tall contact bumps on integrated circuit |
US4931149A (en) * | 1987-04-13 | 1990-06-05 | Texas Instruments Incorporated | Fixture and a method for plating contact bumps for integrated circuits |
US5024746A (en) * | 1987-04-13 | 1991-06-18 | Texas Instruments Incorporated | Fixture and a method for plating contact bumps for integrated circuits |
US4894260A (en) * | 1987-09-19 | 1990-01-16 | Pioneer Electronic Corporation | Electroless plating method and apparatus |
US5224504A (en) * | 1988-05-25 | 1993-07-06 | Semitool, Inc. | Single wafer processor |
US5168886A (en) * | 1988-05-25 | 1992-12-08 | Semitool, Inc. | Single wafer processor |
US5230743A (en) * | 1988-05-25 | 1993-07-27 | Semitool, Inc. | Method for single wafer processing in which a semiconductor wafer is contacted with a fluid |
US5168887A (en) * | 1990-05-18 | 1992-12-08 | Semitool, Inc. | Single wafer processor apparatus |
US5222310A (en) * | 1990-05-18 | 1993-06-29 | Semitool, Inc. | Single wafer processor with a frame |
US5573023A (en) * | 1990-05-18 | 1996-11-12 | Semitool, Inc. | Single wafer processor apparatus |
US5156174A (en) * | 1990-05-18 | 1992-10-20 | Semitool, Inc. | Single wafer processor with a bowl |
US5441629A (en) * | 1993-03-30 | 1995-08-15 | Mitsubishi Denki Kabushiki Kaisha | Apparatus and method of electroplating |
US5489341A (en) * | 1993-08-23 | 1996-02-06 | Semitool, Inc. | Semiconductor processing with non-jetting fluid stream discharge array |
US5544421A (en) * | 1994-04-28 | 1996-08-13 | Semitool, Inc. | Semiconductor wafer processing system |
US5879520A (en) * | 1994-08-26 | 1999-03-09 | Griego; Thomas P. | Rotary electrodeposition apparatus |
US5837120A (en) * | 1994-09-30 | 1998-11-17 | Electroplating Technologies, Inc. | Method and apparatus for electrochemical processing |
US5620581A (en) * | 1995-11-29 | 1997-04-15 | Aiwa Research And Development, Inc. | Apparatus for electroplating metal films including a cathode ring, insulator ring and thief ring |
US6132857A (en) * | 1996-02-29 | 2000-10-17 | Societe Nationale D'etude Et De Construction De Moterus D'aviation "Snecma" | Hybrid component with high strength/mass ratio and method of manufacturing said component |
US6017437A (en) * | 1997-08-22 | 2000-01-25 | Cutek Research, Inc. | Process chamber and method for depositing and/or removing material on a substrate |
US6391166B1 (en) * | 1998-02-12 | 2002-05-21 | Acm Research, Inc. | Plating apparatus and method |
US6416647B1 (en) * | 1998-04-21 | 2002-07-09 | Applied Materials, Inc. | Electro-chemical deposition cell for face-up processing of single semiconductor substrates |
US6099702A (en) * | 1998-06-10 | 2000-08-08 | Novellus Systems, Inc. | Electroplating chamber with rotatable wafer holder and pre-wetting and rinsing capability |
US6214193B1 (en) * | 1998-06-10 | 2001-04-10 | Novellus Systems, Inc. | Electroplating process including pre-wetting and rinsing |
US6228232B1 (en) * | 1998-07-09 | 2001-05-08 | Semitool, Inc. | Reactor vessel having improved cup anode and conductor assembly |
US6383352B1 (en) * | 1998-11-13 | 2002-05-07 | Mykrolis Corporation | Spiral anode for metal plating baths |
US6258220B1 (en) * | 1998-11-30 | 2001-07-10 | Applied Materials, Inc. | Electro-chemical deposition system |
US6352263B1 (en) * | 1998-12-03 | 2002-03-05 | Mtu Motoren-Und Turbinen-Union | Brush seals with bristles arranged at an angle |
US6136163A (en) * | 1999-03-05 | 2000-10-24 | Applied Materials, Inc. | Apparatus for electro-chemical deposition with thermal anneal chamber |
US6241825B1 (en) * | 1999-04-16 | 2001-06-05 | Cutek Research Inc. | Compliant wafer chuck |
US6270635B1 (en) * | 1999-04-27 | 2001-08-07 | Advanced Micro Devices, Inc. | Consistent plating system for electroplating |
Cited By (48)
Publication number | Priority date | Publication date | Assignee | Title |
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US20060185976A1 (en) * | 1999-11-08 | 2006-08-24 | Satoshi Sendai | Plating apparatus and method |
US20050003737A1 (en) * | 2003-06-06 | 2005-01-06 | P.C.T. Systems, Inc. | Method and apparatus to process substrates with megasonic energy |
US7628864B2 (en) * | 2004-04-28 | 2009-12-08 | Tokyo Electron Limited | Substrate cleaning apparatus and method |
US20050241770A1 (en) * | 2004-04-28 | 2005-11-03 | Tokyo Electron Limited | Substrate cleaning apparatus and method |
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Also Published As
Publication number | Publication date |
---|---|
EP0992062A2 (en) | 2000-04-12 |
US6599402B2 (en) | 2003-07-29 |
TW589408B (en) | 2004-06-01 |
KR20010014064A (en) | 2001-02-26 |
JP2002506489A (en) | 2002-02-26 |
WO1999054920A3 (en) | 2000-04-06 |
US20020157960A1 (en) | 2002-10-31 |
US6416647B1 (en) | 2002-07-09 |
WO1999054920A2 (en) | 1999-10-28 |
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